CN217094873U

CN217094873U - Anti-pollution high-efficient cleaning equipment is used in wafer production

Info

Publication number: CN217094873U
Application number: CN202122132708.0U
Authority: CN
Inventors: 山世清
Original assignee: Shanghai Jingfu Electromechanical Technology Co ltd
Current assignee: Shanghai Jingfu Electromechanical Technology Co ltd
Priority date: 2021-09-06
Filing date: 2021-09-06
Publication date: 2022-08-02
Anticipated expiration: 2031-09-06

Abstract

The utility model provides an anti-pollution high-efficiency cleaning device for wafer production, which comprises a cleaning box, a scrubbing mechanism, a wafer fixing mechanism and a multi-angle washing mechanism, wherein the cleaning box is provided with a box door, the inner side of the cleaning box is provided with a cavity, and the bottom side of the cleaning box is provided with a water outlet communicated with the cavity; the scrubbing mechanism and the multi-angle flushing mechanism are both arranged on the inner side of the cleaning box cavity, the multi-angle flushing mechanism comprises an outer frame, an inner toothed plate, a flushing assembly, a driving assembly and a water tank, the outer frame is provided with two groups and fixed on two sides of the cleaning box through mounting blocks, the cross section of the outer frame is semi-annular, and an annular sliding groove is formed in the inner side of the outer frame; the inner toothed plate is arranged on the front side of the outer frame and is in a semi-annular shape matched with the outer frame, a toothed block is arranged at the outer side end of the inner toothed plate, and the inner toothed plate is in sliding connection with the annular sliding groove through a sliding block. The utility model discloses can wash, scrub in step, enable the washing of wafer more high-efficient, and avoided the pollution that washs, washes, scrub the in-process and produce.

Description

Anti-pollution high-efficient cleaning equipment is used in wafer production

Technical Field

The utility model relates to a wafer production cleaning equipment especially relates to a wafer production is with anti-pollution high-efficient cleaning equipment.

Background

At present, the surface of the wafer needs to be cleaned during the production and processing processes of the wafer. However, the conventional manual cleaning method is still adopted by each conventional manufacturer, including the cleaning and drying processes, the conventional manual cleaning method needs to be carried repeatedly, the efficiency is extremely low, the labor capacity is large, the operation difficulty coefficient is large, the product quality is difficult to guarantee, the labor cost is high, and the wafer market competitiveness is weak.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a wafer production is with anti-pollution high-efficient cleaning equipment to solve the problem that proposes among the above-mentioned background art.

In order to achieve the above purpose, the utility model adopts the following technical scheme:

the utility model provides an anti-pollution high-efficiency cleaning device for wafer production, which comprises a cleaning box, a brushing mechanism, a wafer fixing mechanism and a multi-angle washing mechanism, wherein the cleaning box is provided with a box door, the inner side of the cleaning box is provided with a cavity, and the bottom side of the cleaning box is provided with a water outlet communicated with the cavity; the scrubbing mechanism and the multi-angle flushing mechanism are both arranged on the inner side of the cleaning box cavity, the multi-angle flushing mechanism comprises an outer frame, an inner toothed plate, a flushing assembly, a driving assembly and a water tank, the outer frame is provided with two groups and fixed on two sides of the cleaning box through mounting blocks, the cross section of the outer frame is semi-annular, and an annular sliding groove is formed in the inner side of the outer frame; the inner toothed plate is arranged on the front side of the outer frame and is in a semi-annular shape matched with the outer frame, a toothed block is arranged at the outer side end of the inner toothed plate, and the inner toothed plate is in sliding connection with the annular sliding groove through a sliding block; the washing assembly is installed on the internal tooth plate and comprises a washing nozzle and a hose, and the washing nozzle is provided with a plurality of inner walls which are fixed on the internal tooth plate and far away from the tooth block.

Preferably, the water tank is fixed outside the washing tank, and the plurality of washing nozzles are connected with the water tank through hoses.

Preferably, the driving assembly comprises a motor, a first gear, a second gear and a belt, the motor is fixed on the outer frame, and the shaft end of the motor is connected with the first gear.

Preferably, the first gear and the second gear are distributed on the two groups of outer frames, and the first gear and the second gear are meshed with the tooth blocks on the inner toothed plate. The shaft ends of the first gear and the second gear are respectively connected with a belt wheel A and a belt wheel B, and the belt wheels A and the belt wheels B are linked through a first belt.

Preferably, the wafer fixing mechanism comprises two sets of cylinders and a wafer fixing seat, and the cylinders are respectively fixed on the top wall and the bottom wall of the cleaning box. The cylinder axle head is connected the wafer fixing base, and the wafer fixing base is used for fixed wafer.

Preferably, scrubbing mechanism includes installation arm board, brush-holder stud and band pulley C, and the installation arm board is transversely fixed at the washing incasement side, is connected with band pulley C through the axostylus axostyle on the installation arm board, and band pulley C passes through second belt linkage band pulley A.

Preferably, the brush rod is arranged on the inner side of the mounting arm plate close to the wafer fixing seat, and the shaft end of the brush rod is in transmission connection with the belt wheel C.

Compared with the prior art, the technical scheme of the utility model following beneficial effect has:

the utility model discloses a wafer is fixed through wafer fixed establishment, treats that the wafer is fixed the back, washes the mechanism through the operation multi-angle, washes the mechanism and carries out the cleaning process, wherein the multi-angle washes the mechanism, washes and links through the mode of drive belt between the mechanism, can wash in step, scrub. The wafer cleaning is more efficient, and the pollution generated in the cleaning, washing and brushing processes is avoided.

Drawings

The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the application and, together with the description, serve to explain the application and are not intended to limit the application. In the drawings:

FIG. 1 is a schematic structural view of a brushing mechanism and a multi-angle washing mechanism according to an embodiment of the present invention;

fig. 2 is a schematic view of the overall structure of the present invention.

Illustration of the drawings:

1. a cleaning tank; 2. an outer frame; 3. an inner toothed plate; 4. a water tank; 5. washing the spray head; 6. a hose; 7. a first gear; 8. a second gear; 9. a first belt; 10. a pulley A; 11. a belt pulley B; 12. a cylinder; 13. a chip holder; 14. mounting an arm plate; 15. a brush bar; 16. and a pulley C.

Detailed Description

The utility model provides a wafer production is with anti-pollution high-efficient cleaning equipment, for making the utility model discloses a purpose, technical scheme and effect are clearer, clear and definite, and it is right that the following reference drawing and example are right the utility model discloses further detailed description. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.

It should be noted that the terms "first," "second," and the like in the description and claims of the present invention and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order, it being understood that the data so used may be interchanged under appropriate circumstances. Furthermore, the terms "comprises" and "comprising," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a system, article, or apparatus that comprises a list of elements is not necessarily limited to those elements explicitly listed, but may include other elements not expressly listed or inherent to such system, article, or apparatus.

Referring to fig. 1-2, the present embodiment provides an anti-pollution high-efficiency cleaning apparatus for wafer production, including a cleaning box 1, a brushing mechanism, a wafer fixing mechanism and a multi-angle washing mechanism, wherein the cleaning box 1 has a box door, a cavity is disposed inside the cleaning box 1, and a water outlet communicated with the cavity is disposed at the bottom side of the cleaning box 1; the scrubbing mechanism and the multi-angle washing mechanism are both arranged on the inner side of the cavity of the washing box 1, the multi-angle washing mechanism comprises an outer frame 2, an inner toothed plate 3, a washing component, a driving component and a water tank 4, the outer frame 2 is provided with two groups and fixed on two sides of the washing box 1 through mounting blocks, the cross section of the outer frame 2 is semi-annular, and an annular sliding groove is formed in the inner side of the outer frame; the inner toothed plate 3 is arranged on the front side of the outer frame 2 and is in a semi-annular shape matched with the outer frame 2, a toothed block is arranged at the outer side end of the inner toothed plate 3, and the inner toothed plate 3 is in sliding connection with the annular sliding groove through a sliding block; the washing component is arranged on the inner toothed plate 3 and comprises a washing nozzle 5 and a hose 6, and the washing nozzle 5 is provided with a plurality of inner walls which are fixed on the inner toothed plate 3 and far away from the toothed block.

In this embodiment, a water tank 4 is fixed outside the washing tank 1, and a plurality of the washing heads 5 are connected to the water tank 4 through hoses 6.

In this embodiment, the driving assembly includes a motor, a first gear 7, a second gear 8 and a first belt 9, the motor is fixed on the outer frame 2, and the first gear 7 is connected to the shaft end of the motor.

In this embodiment, the first gear 7 and the second gear 8 are distributed on the two sets of outer frames 2, and the first gear 7 and the second gear 8 are both engaged with the tooth blocks on the inner toothed plate 3.

In the present embodiment, the first gear 7 and the second gear 8 are connected to the pulley a10 and the pulley B11 at the shaft ends, respectively, and the pulley a10 and the pulley B11 are linked by the first belt 9.

In this embodiment, the wafer fixing mechanism includes two sets of air cylinders 12 and a wafer fixing seat 13, and the air cylinders 12 are respectively fixed on the top wall and the bottom wall of the cleaning tank 1.

In this embodiment, the air cylinder 12 is connected to the wafer holder 13 at the axial end, and the wafer holder 13 is used for fixing the wafer.

In this embodiment, the brush mechanism includes a mounting arm 14, a brush bar 15, and a pulley C16, the mounting arm 14 is fixed laterally inside the washing tank 1, the pulley C16 is connected to the mounting arm 14 via a shaft, and the pulley C16 links with the pulley a10 via a second belt.

In this embodiment, the brush bar 15 is disposed on the inner side of the mounting arm plate 14 near the wafer holder 13, and the shaft end of the brush bar 15 is drivingly connected to the pulley C16.

In the embodiment, the wafer is fixed by the wafer fixing mechanism, and after the wafer is fixed, the cleaning process is carried out by operating the multi-angle washing mechanism and the brushing mechanism, wherein the multi-angle washing mechanism and the brushing mechanism are linked in a transmission belt manner; the specific cleaning process comprises the following steps: the motor is started to drive the first gear 7 to operate, the belt wheel A10 and the belt wheel B11 are linked through the first belt 9, so that the first gear 7 can be linked with the second gear 8 to operate, the first gear 7 and the second gear 8 can be meshed with the tooth blocks on the inner toothed plate 3, the inner toothed plate 3 can move along the sliding groove, and the flushing nozzle 5 is arranged on the inner side wall of the inner toothed plate 3, so that the flushing nozzle 5 can flush wafers at multiple angles along with the movement of the inner toothed plate 3; because the belt wheel C16 is linked with the belt wheel A10 through the second belt, when the belt wheel A10 operates, the belt wheel C16 drives the brush rod 15 to synchronously brush, so that the wafer is more efficiently cleaned, and the pollution generated in the cleaning, washing and brushing processes is avoided.

The present invention has been described in detail with reference to the specific embodiments, but the present invention is only by way of example and is not limited to the specific embodiments described above. Any equivalent modifications and substitutions to those skilled in the art are intended to be within the scope of the present invention. Accordingly, variations and modifications in equivalents may be made without departing from the spirit and scope of the invention, which is intended to be covered by the following claims.

Claims

1. The anti-pollution efficient cleaning equipment for wafer production is characterized by comprising a cleaning box (1), a brushing mechanism, a wafer fixing mechanism and a multi-angle washing mechanism, wherein the cleaning box (1) is provided with a box door, a cavity is arranged on the inner side of the cleaning box (1), and a water outlet communicated with the cavity is formed in the bottom side of the cleaning box (1); the scrubbing mechanism and the multi-angle washing mechanism are both arranged on the inner side of the cavity of the washing box (1), the multi-angle washing mechanism comprises an outer frame (2), an inner toothed plate (3), a washing component, a driving component and a water tank (4), the outer frame (2) is provided with two groups and fixed on two sides of the washing box (1) through mounting blocks, the cross section of the outer frame (2) is semi-annular, and an annular sliding groove is formed in the inner side of the outer frame; the inner toothed plate (3) is arranged on the front side of the outer frame (2) and is in a semi-annular shape matched with the outer frame (2), a toothed block is arranged at the outer side end of the inner toothed plate (3), and the inner toothed plate (3) is in sliding connection with the annular sliding groove through a sliding block; the washing assembly is arranged on the inner toothed plate (3) and comprises a washing nozzle (5) and a hose (6), and the washing nozzle (5) is provided with a plurality of inner walls which are fixed on the inner toothed plate (3) and far away from the toothed block.

2. The efficient contamination-preventive cleaning equipment for wafer production according to claim 1, wherein the water tank (4) is fixed outside the cleaning tank (1), and the plurality of rinse nozzles (5) are connected to the water tank (4) through hoses (6).

3. The anti-pollution efficient cleaning equipment for wafer production according to claim 1, wherein the driving assembly comprises a motor, a first gear (7), a second gear (8) and a first belt (9), the motor is fixed on the outer frame (2), and the first gear (7) is connected to the shaft end of the motor.

4. The anti-pollution efficient cleaning equipment for wafer production according to claim 3, wherein the first gear (7) and the second gear (8) are distributed on the two groups of outer frames (2), and the first gear (7) and the second gear (8) are meshed with the tooth blocks on the inner toothed plate (3).

5. The anti-pollution efficient cleaning equipment for wafer production according to claim 4, wherein shaft ends of the first gear (7) and the second gear (8) are respectively connected with a belt wheel A (10) and a belt wheel B (11), and the belt wheels A (10) and the belt wheel B (11) are linked through a first belt (9).

6. The anti-pollution efficient cleaning equipment for wafer production according to claim 1, wherein the wafer fixing mechanism comprises two groups of air cylinders (12) and wafer fixing seats (13), and the air cylinders (12) are respectively fixed on the top wall and the bottom wall of the cleaning box (1).

7. The contamination-preventive, efficient cleaning equipment for wafer production according to claim 6, wherein the cylinder (12) is axially connected to a wafer holder (13), and the wafer holder (13) is used for holding a wafer.

8. The efficient contamination-preventive cleaning equipment for wafer production according to claim 1, wherein the brushing mechanism comprises a mounting arm plate (14), a brush rod (15) and a belt wheel C (16), the mounting arm plate (14) is transversely fixed on the inner side of the cleaning box (1), the belt wheel C (16) is connected to the mounting arm plate (14) through a shaft rod, and the belt wheel C (16) is linked with the belt wheel A (10) through a second belt.

9. The efficient contamination-prevention cleaning equipment for wafer production according to claim 8, wherein the brush rod (15) is arranged on the inner side of the mounting arm plate (14) close to the wafer fixing seat (13), and the shaft end of the brush rod (15) is in transmission connection with the belt wheel C (16).