CN216901000U - high-Q three-dimensional metal micro-nano optical device based on film stack structure - Google Patents
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- CN216901000U CN216901000U CN202220083750.XU CN202220083750U CN216901000U CN 216901000 U CN216901000 U CN 216901000U CN 202220083750 U CN202220083750 U CN 202220083750U CN 216901000 U CN216901000 U CN 216901000U
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Abstract
The utility model discloses a high-Q three-dimensional metal micro-nano optical device based on a film stack structure, which comprises a low-refractive-index dielectric layer substrate, three high-low-refractive-index mixed dielectric film stack structures and a periodic metal micro-nano structure, wherein each high-low-refractive-index mixed dielectric film stack structure consists of a high-refractive-index dielectric layer and a low-refractive-index dielectric layer. The periodic metal micro-nano structure and the high-low refractive index mixed medium film stack structure form a surface plasmon multi-order hybrid waveguide mode to inhibit light transmission; meanwhile, a multi-order cavity mode is formed by the high-low refractive index mixed dielectric film stack structure, and the transmission of light is enhanced. By tuning the multi-order hybrid waveguide mode and the multi-order cavity mode, a plurality of resonance peaks with extremely high optical quality factors are obtained. The metal micro-nano optical device has wide application prospect in the aspects of filtering, sensing and detection.
Description
Technical Field
The utility model relates to the technical field of metal micro-nano optical devices, in particular to a high-Q three-dimensional metal micro-nano optical device based on a membrane stack structure.
Background
Surface plasmons (SPPs), which are evanescent waves propagating along the metal and dielectric interface, have potential applications in overcoming diffraction limits. As a 'combination' of photons and electrons, the optical field can be limited within the size range of sub-wavelength, so that the interaction between light and substances within the nanoscale range can be regulated, and the optical fiber is widely applied to the fields of sensing, nano laser, detection and the like. However, in the near infrared and visible light bands, the half-peak width is severely broadened due to the resistance loss of the metal, the optical quality factor is reduced, and the application performance of the metal micro-nano optical device is severely limited. In order to reduce the influence of resistance loss, the dielectric material with weak field enhancement and lower loss is used for structural design, and is an effective method for solving the problem of low optical quality factor of the device.
At present, researchers are difficult to realize multi-wavelength resonance and high-quality factor resonance at the same time although more dielectric materials are used when designing and developing micro-nano optical devices in near infrared and visible light wave bands. In practical applications, however, multi-wavelength high-q resonance has wider application. Therefore, it is necessary to design a high-Q three-dimensional metal micro-nano optical device based on a film stack structure.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide a high-Q three-dimensional metal micro-nano optical device based on a membrane stack structure, and aims to solve the problem that the metal micro-nano optical device in the prior art cannot realize high-quality-factor resonance and multi-wavelength resonance at the same time.
In order to achieve the purpose, the utility model provides a high-Q three-dimensional metal micro-nano optical device based on a film stack structure, which comprises a low-refractive-index dielectric layer substrate, three high-low-refractive-index mixed dielectric film stack structures and a periodic metal micro-nano structure, wherein the three high-low-refractive-index mixed dielectric film stack structures are sequentially stacked on the top of the low-refractive-index dielectric layer substrate, and the metal micro-nano structure is arranged on the top of the high-low-refractive-index mixed dielectric film stack structure at the highest position.
Each high-low refractive index mixed dielectric film stack structure comprises a low refractive index dielectric layer and a high refractive index dielectric layer, and the high refractive index dielectric layer is arranged on the top of the low refractive index dielectric layer.
The periodic metal micro-nano structure is made of noble metal.
The refractive index of the low-refractive-index dielectric layer substrate is greater than 1, the refractive index of the low-refractive-index dielectric layer substrate is the same as that of the low-refractive-index dielectric layer substrate, and the refractive index of the high-refractive-index dielectric layer substrate is higher than that of the low-refractive-index dielectric layer by 0.2 or more.
The height of the low-refractive-index dielectric layer is 400-600 nm, and the height of the high-refractive-index dielectric layer is 200-300 nm.
The periodic metal micro-nano structure is 100-200 nm in transverse length, 0.1-0.2 in transverse duty ratio, 800-1000 nm in transverse period, 200-400 nm in longitudinal length, 0.2-0.3 in longitudinal duty ratio, 900-1200 nm in longitudinal period and 200-400 nm in height.
The utility model has the beneficial effects that: the high-refractive index dielectric layer and the low-refractive index dielectric layer form the high-low refractive index mixed dielectric film stack structure, and the periodic metal micro-nano structure and the high-low refractive index mixed dielectric film stack structure form a surface plasmon multi-order hybrid waveguide mode to inhibit light transmission; meanwhile, a multi-order cavity mode is formed in the high-low refractive index mixed dielectric film stack structure, and light transmission is enhanced. By tuning the effect between the multi-order hybrid waveguide mode and the multi-order cavity mode, a plurality of resonance peaks with extremely high optical quality factors are obtained.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a high-Q three-dimensional metal micro-nano optical device based on a film stack structure provided by the utility model.
Fig. 2 is a schematic structural diagram of a high-Q three-dimensional metal micro-nano optical device according to a first embodiment.
FIG. 3 is a diagram of simulation data provided in accordance with one embodiment.
Fig. 4 is a schematic structural diagram of a high-Q three-dimensional metal micro-nano optical device according to a second embodiment.
Fig. 5 is a simulation data diagram provided in the second embodiment.
The structure comprises a 1-low refractive index medium layer substrate, a 2-high-low refractive index mixed medium film stack structure, a 3-periodic metal micro-nano structure, a 21-low refractive index medium layer and a 22-high refractive index medium layer.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the utility model and are not to be construed as limiting the utility model.
In the description of the present invention, it is to be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships illustrated in the drawings, and are used merely for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, are not to be construed as limiting the present invention. In addition, in the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
Referring to fig. 1, the utility model provides a high-Q three-dimensional metal micro-nano optical device based on a film stack structure, which includes a low-refractive-index dielectric layer substrate 1, three high-low-refractive-index mixed dielectric film stack structures 2 and a periodic metal micro-nano structure 3, wherein the three high-low-refractive-index mixed dielectric film stack structures 2 are sequentially stacked on the top of the low-refractive-index dielectric layer substrate 1, and the metal micro-nano structure is arranged on the top of the high-low-refractive-index mixed dielectric film stack structure 2 located at the highest position.
Each high-low refractive index mixed dielectric film stack structure 2 comprises a low refractive index dielectric layer 21 and a high refractive index dielectric layer 22, and the high refractive index dielectric layer 22 is arranged on the top of the low refractive index dielectric layer 21.
Further, the periodic metal micro-nano structure 3 is made of a noble metal.
Further, the refractive index of the low refractive index medium layer substrate 1 is greater than 1, the refractive index of the low refractive index medium layer 21 is the same as that of the low refractive index medium layer substrate 1, and the refractive index of the high refractive index medium layer 22 is higher than that of the low refractive index medium layer 21 by 0.2 or more.
Further, the height of the low refractive index medium layer 21 is 400-600 nm, and the height of the high refractive index medium layer 22 is 200-300 nm.
Further, the transverse length of the periodic metal micro-nano structure 3 is 100-200 nm, the transverse duty ratio is 0.1-0.2, the transverse period is 800-1000 nm, the longitudinal length is 200-400 nm, the longitudinal duty ratio is 0.2-0.3, the longitudinal period is 900-1200 nm, and the height is 200-400 nm.
The first embodiment is as follows:
when the number of layers of the high-low refractive index mixed dielectric layer 2 is 3.
Referring to FIG. 2, the refractive index n of the low-refractive-index dielectric substrate 1LThe refractive index of the low refractive index medium layer 3 in the high-low refractive index mixed medium layer 2 is n, which is the same as the refractive index of the low refractive index medium layer substrate 1L1.5, layer height 500 nm; the refractive index n of the high refractive index medium layer 4H2.1, the layer height is 250 nm. The periodic metal micro-nano structure 5 is made of gold, the transverse length a of the structure is 150nm, the transverse duty ratio is 0.167, and the transverse period is 900 nm; the longitudinal length is 300nm, the longitudinal duty ratio is 0.3, and the longitudinal period is 1000 nm; the height is 300 nm. Incident light is incident perpendicular to the surface of the periodic metal micro-nano structure 5, is polarized along the x direction and is transmitted along the z axis. Periodic boundary conditions are adopted in the x and y directions; the z-direction uses a Perfectly Matched Layer (PML) as a boundary condition.
Referring to fig. 3, the minimum unit structure of the metal micro-nano optical device based on multi-wavelength high-quality factor resonance is simulated by using a Finite Difference Time Domain (FDTD), and corresponding boundary conditions are set for simulation, so as to obtain a corresponding simulation result: 6 resonances with high quality factors are formed, which are respectively located at 1333nm, 1403nm, 1457nm, 1597nm, 1659nm and 1721nm, the quality factors of the resonances are respectively 135, 935, 3645, 470, 976 and 3741, and all the resonances are resonance peaks with high quality factors.
The second embodiment is as follows:
when the number of layers of the high-low refractive index mixed dielectric layer 2 is 2.
Referring to FIG. 4, the refractive index n of the low-refractive-index dielectric substrate 1LThe refractive index of the low refractive index dielectric layer 21 in the high-low refractive index mixed dielectric layer 2 is n, which is the same as the refractive index of the low refractive index dielectric layer substrate 1L1.5, layer height 500 nm; the refractive index n of the high refractive index dielectric layer 22H2.1, the layer height is 250 nm. The periodic metal micro-nano structure 3 is made of gold, the transverse length a of the structure is 150nm, the transverse duty ratio is 0.167, and the transverse period is 900 nm; the longitudinal length is 300nm, the longitudinal duty ratio is 0.3, and the longitudinal period is 1000 nm; the height is 300 nm. Incident light is incident perpendicular to the surface of the periodic metal micro-nano structure 3, is polarized along the x direction and is transmitted along the z axis. Periodic boundary conditions are adopted in the x and y directions; the z-direction uses a Perfectly Matched Layer (PML) as a boundary condition.
Referring to fig. 5, the minimum unit structure of the metal micro-nano optical device based on multi-wavelength high-quality factor resonance is simulated by using a Finite Difference Time Domain (FDTD), and corresponding boundary conditions are set for simulation, so as to obtain a corresponding simulation result: 4 resonances with high quality factors are formed, which are respectively located at 1342nm, 1436nm, 1609nm and 1700nm, the quality factors of the resonances are respectively 115, 1197, 488 and 1546, and all are resonance peaks with high quality factors.
The high-refractive index medium layer 22 and the low-refractive index medium layer 21 form the high-low refractive index mixed medium film stack structure 2, and the periodic metal micro-nano structure 3 and the high-low refractive index mixed medium film stack structure 2 form a surface plasmon multi-order hybrid waveguide mode to inhibit light transmission; meanwhile, a multi-order cavity mode is formed in the high-low refractive index mixed dielectric film stack structure, and light transmission is enhanced. By optimizing the structural parameters (such as the transverse length a, the longitudinal length b, the transverse period Px, the longitudinal period Py, the height t and the like) of the periodic metal micro-nano structure 3 and the structural parameters (such as the layer height t and the like) of the high-low refractive index mixed medium film stack structure 2L、tHRefractive index nL、nHEtc.) to tune the interaction between the multi-order hybrid waveguide mode and the multi-order cavity mode, thereby obtaining a multi-wavelength resonance peak with a very high quality factor.
While the utility model has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the utility model as defined by the appended claims.
Claims (5)
1. A high Q three-dimensional metal micro-nano optical device based on a membrane stack structure is characterized in that,
the high-low refractive index micro-nano structure comprises a low refractive index dielectric layer substrate, three high-low refractive index mixed dielectric film stack structures and a periodic metal micro-nano structure, wherein the three high-low refractive index mixed dielectric film stack structures are sequentially stacked on the top of the low refractive index dielectric layer substrate, the metal micro-nano structure is arranged on the top of the high-low refractive index mixed dielectric film stack structure positioned at the highest position,
each high-low refractive index mixed dielectric film stack structure comprises a low refractive index dielectric layer and a high refractive index dielectric layer, and the high refractive index dielectric layer is arranged on the top of the low refractive index dielectric layer.
2. The high Q three-dimensional metal micro-nano optical device based on the film stack structure of claim 1,
the periodic metal micro-nano structure is made of noble metal.
3. The high Q three-dimensional metal micro-nano optical device based on the film stack structure of claim 2,
the refractive index of the low-refractive-index dielectric layer substrate is greater than 1, the refractive index of the low-refractive-index dielectric layer substrate is the same as that of the low-refractive-index dielectric layer substrate, and the refractive index of the high-refractive-index dielectric layer substrate is higher than that of the low-refractive-index dielectric layer by 0.2 or more.
4. The high Q three-dimensional metal micro-nano optical device based on the film stack structure of claim 3,
the height of the low-refractive-index dielectric layer is 400-600 nm, and the height of the high-refractive-index dielectric layer is 200-300 nm.
5. The high Q three-dimensional metal micro-nano optical device based on the film stack structure of claim 4,
the transverse length of the periodic metal micro-nano structure is 100-200 nm, the transverse duty ratio is 0.1-0.2, the transverse period is 800-1000 nm, the longitudinal length is 200-400 nm, the longitudinal duty ratio is 0.2-0.3, the longitudinal period is 900-1200 nm, and the height is 200-400 nm.
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