CN216871006U

CN216871006U - Portable maskless exposure machine of desktop

Info

Publication number: CN216871006U
Application number: CN202220190994.8U
Authority: CN
Inventors: 周锐; 陈哲堃; 王振忠; 朱宇超; 严星; 洪明辉
Original assignee: Xiamen University; Tan Kah Kee Innovation Laboratory
Current assignee: Xiamen University; Tan Kah Kee Innovation Laboratory
Priority date: 2022-01-24
Filing date: 2022-01-24
Publication date: 2022-07-01
Anticipated expiration: 2032-01-24

Abstract

The utility model discloses a desktop portable maskless exposure machine, which is characterized in that: the laser system, the micro lens array module, the mobile platform and the power supply are arranged in the shell, the micro lens array module is arranged between the laser system and the mobile platform, the mobile platform bears a processing substrate, and a laser beam emitted by the laser system irradiates the micro lens array module, is split and focused and then projects on the processing substrate on the mobile platform for exposure. It has the following advantages: the mask-free photoetching is realized, the processing efficiency is high, and the mask-free photoetching machine is particularly suitable for exposure processing of periodic patterns, is miniaturized and is convenient to move and carry.

Description

Portable no mask exposure machine of desktop

Technical Field

The utility model relates to an exposure machine, in particular to a desktop portable maskless exposure machine.

Background

Exposure processing techniques have been widely used in many modern technology areas including very large scale integrated circuits, micro-electro-mechanical systems, micro-fluidic devices, biochips, photonic band gap structures, and diffractive optical elements. Most of these advanced techniques require a large number of repeating ordered periodic building blocks. Photomask exposure is a conventional and well-established technique, and the main disadvantage of this technique is that it takes a long time to fabricate a complex photomask plate with electron beams. The reticle needs to be remanufactured even if there is only one irreparable defect or modification of the pattern design. Meanwhile, the contamination on the mask during the processing process also causes serious problems in the semiconductor manufacturing. Therefore, maskless exposure techniques such as electron beam exposure, ion beam exposure, and scanning probe microscopy have been applied to mask fabrication. Their advantage is to create patterns at high resolution. However, their application is limited by low yield and the generation of multiple defects. In order to improve productivity, the development of multi-electron beam exposure techniques has attracted considerable interest, but the equipment is always very complex and costly. The existing maskless exposure method has high requirements on the quality of light beams and low processing speed, and the processing of periodic patterns in many applications is often required to be repeated for many times.

SUMMERY OF THE UTILITY MODEL

The utility model provides a desktop portable maskless exposure machine, which overcomes the defects of the prior art in the background art.

The technical scheme adopted by the utility model for solving the technical problems is as follows:

the utility model provides a portable maskless exposure machine of desktop, includes the casing and installs laser system, microlens array module, moving platform and the power in the casing, microlens array module establish between laser system and moving platform, moving platform bear the processing substrate, the laser beam that laser system sent shines and is thrown the processing substrate on the moving platform after being split beam and focus on the microlens array module and expose.

In one embodiment: the shell is a rectangular shell.

In one embodiment: the micro-lens array module is characterized by further comprising a light path redirection structure arranged in the shell, the light path redirection structure is arranged between the laser system and the micro-lens array module, and laser beams emitted by the laser system irradiate the micro-lens array module after passing through the light path redirection structure.

In one embodiment: the light path redirecting structure includes at least one mirror.

In one embodiment: the laser system is characterized by further comprising an aperture diaphragm arranged in the shell, the aperture diaphragm is arranged between the laser system and the micro-lens array module, and a laser beam emitted by the laser system irradiates the micro-lens array module after passing through the aperture diaphragm.

In one embodiment: the laser system comprises a shell, and is characterized by further comprising a beam expander arranged in the shell, wherein the beam expander is arranged between the laser system and the micro lens array module, and a laser beam emitted by the laser system irradiates the micro lens array module after passing through the beam expander.

In one embodiment: still include at least one speculum, aperture diaphragm, beam expander, the laser beam that laser system sent passes through the speculum adjust the light path direction and pass through in proper order aperture diaphragm beam expander shines behind the beam expander on the microlens array module.

In one embodiment: including three speculum, be first speculum, second mirror and third speculum respectively, first speculum the second mirror with the third speculum be located the three continuous angular position of casing respectively according to the preface, the light beam that laser system sent passes through in proper order first speculum the second mirror aperture diaphragm the beam expanding mirror shine on the microlens array module behind the third speculum.

In one embodiment: the laser system comprises a laser light source and a laser shutter.

In one embodiment: the periphery of the laser system is covered with a shielding cover for shielding interference signals.

Compared with the background technology, the technical scheme has the following advantages:

(1) the exposure machine can realize maskless photoetching on a large-area substrate, can manufacture a plurality of nano structures/microstructures by one-time exposure, and improves the exposure processing efficiency. The characteristic size of the nanostructures/microstructures can be controlled by exposure time and light source intensity. The periodic pattern is exposed once. More complex structures may use the system to achieve mixing through a scheme of multiple exposure combinations.

(2) The utility model adopts few and simple optical components, namely, adopts a light path redirection structure to change the direction of a light path; the aperture diaphragm is used for adjusting the size of the sectional area of the light beam, and the aperture diaphragm intercepts the initial light beam part emitted by the laser system to form the light beam with a specific sectional shape so as to adapt to the effective area of the micro-lens array module and achieve a good exposure effect; adopt the beam expanding lens to be used for enlarging beam cross sectional area size to the effective area of adaptation microlens array module, thereby realize maskless exposure when realizing light path control, and carry out reasonable installation planning with each part that exposure system relates to, integrated the installation in the casing, form an independent machine equipment, have with low costs, miniaturized advantage, also realized the desktop and be convenient for remove, had portable advantage.

Drawings

The utility model is further illustrated by the following figures and examples.

Fig. 1 is a schematic structural diagram of a desktop portable maskless exposure machine according to the first embodiment.

Fig. 2 is a schematic structural view of a desktop portable maskless exposure machine according to the second embodiment.

Fig. 3 is a schematic structural diagram of a desktop portable maskless exposure machine according to a third embodiment.

Fig. 4 is a schematic structural diagram of a desktop portable maskless exposure machine according to the fourth embodiment.

Fig. 5 is a schematic structural view of a desktop portable maskless exposure machine according to the fifth embodiment.

Fig. 6 is a schematic structural view of a desktop portable maskless exposure machine according to a sixth embodiment.

Description of reference numerals: 100-a housing; 200-a lighting fixture; 300-fixing the bracket; 10-a laser system; 20-a microlens array module; 30-a mobile platform; 40-a power supply; 50-an optical path redirection structure; 60-aperture diaphragm; 70-a beam expander; 80-a clamp; 11-a shield; 12-a laser light source; 13-laser shutter; 511-a first mirror; 512-a second mirror; 513-third mirror.

Detailed Description

In the first embodiment, please refer to fig. 1:

a portable desktop maskless exposure machine comprises a shell 100, a laser system 10 which is arranged in the shell 100 and used for emitting laser beams, a micro-lens array module 20 with a plurality of micro-lenses distributed in an array (any array distribution in a rectangular array, a circular array and the like can be used according to requirements), a movable platform 30 which is used for bearing a processed substrate and controlling the processed substrate to move in a three-dimensional space, and a power supply 40 which is used for supplying power to the exposure machine. A lighting fixture 200 (e.g., a yellow light) is disposed within the housing 100 to provide illumination within the housing 100. The housing 100 is used for the assembly and closure of the entire system to make a unitary device that is easy to move. The shell 100 is made of a transmission-proof material, so that the interference of external light to the processing process can be reduced, and the support of the shell 100 can be provided with an air floatation system to reduce the influence of external vibration; a specific location inside the housing 100 may have a fixing means for fixing and positioning the relevant components. The housing 100 may be a rectangular housing.

The microlens array module 20 is disposed between the laser system 10 and the moving platform 30, wherein the microlens array module 20 is fixed by the fixing bracket 300. The laser beam emitted by the laser system 10 irradiates the microlens array module 20, is split and focused, and then is projected onto the processing substrate on the moving platform 30 for exposure. The microlens array module 20 is used for dividing incident light beams into a plurality of groups of tiny light beams, the tiny light beams are in an array shape with the same shape as the lens array according to the arrangement mode of the microlens array, a processing light beam array projected to a to-be-exposed area of a processing substrate is formed, the microlens array module 20 can be a 10mm rectangular chip, and 100 × 100 microlenses are distributed in an array shape.

The movable platform 30 is used as a movable exposure platform, can be used for placing a processed substrate sample and moving the sample according to the instruction of a control system, has 3 degrees of freedom, can move by a single step length with the precision less than 0.1 μm, and can repeatedly position by the precision less than 0.3 μm. The control system can control the moving direction and distance of the moving platform and the opening and closing frequency (the frequency can be 10Hz) of the laser shutter through electric signals so as to realize the process of exposing a specific area of a processed substrate and gradually forming an exposure pattern.

The processing substrate can be silicon wafer, semiconductor epitaxial wafer, glass, metal and other materials.

In the second embodiment, please refer to fig. 2:

on the basis of the first embodiment, the desktop portable maskless exposure machine further includes an optical path redirecting structure 50 for changing the direction of the optical path, the optical path redirecting structure 50 is disposed between the laser system 10 and the microlens array module 20, the optical path redirecting structure 50 at least includes a mirror, and the laser beam emitted by the laser system 10 can be irradiated onto the microlens array module 20 after passing through the optical path redirecting structure 50. In the present embodiment, the light path redirecting structure 50 includes a first mirror 511, a second mirror 512, and a third mirror 513, and reflects the light beam to a predetermined direction. The light beam emitted from the laser source 12 passes through the first mirror 511, the second mirror 512, and the third mirror 513 in sequence and then irradiates the micro lens array module 20. The first reflector 511, the second reflector 512 and the third reflector 513 are provided with special coating treatment, and the reflectivity is more than 98%.

In the third embodiment, please refer to fig. 3:

on the basis of the first embodiment, the desktop portable maskless exposure machine further includes an aperture stop 60 for adjusting the size of the cross-sectional area of the light beam, and the aperture stop 60 is disposed between the laser system 10 and the microlens array module 20. The laser beam emitted from the laser system 10 passes through the aperture stop 60 and then irradiates the microlens array module 20. The aperture stop 60 intercepts a portion of the initial light emitted from the laser system 10 to form a beam having a specific cross-sectional shape to fit the active area of the microlens array module 20.

In the fourth embodiment, please refer to fig. 4:

on the basis of the first embodiment, the desktop portable maskless exposure machine further includes a beam expander 70 for expanding the size of the cross-sectional area of the light beam, and the beam expander 70 is disposed between the laser system 10 and the microlens array module 20. The laser beam emitted from the laser system 10 passes through the beam expander 70 and then irradiates the microlens array module 20. The beam expander 70 is used to expand the beam diameter to fit the active area of the microlens array module 20.

Example five, please refer to fig. 5:

on the basis of the second embodiment, the desktop portable maskless exposure machine further comprises an aperture stop 60 for adjusting the size of the cross-sectional area of the light beam, and a beam expanding lens 70 for expanding the size of the cross-sectional area of the light beam, wherein the beam expanding lens 70 is clamped and fixed by a clamping piece 80. The aperture stop 60 intercepts a portion of the received light to form a beam having a specific cross-sectional shape to fit the active area of the microlens array module 20. The beam expander 70 is used to expand the beam diameter to fit the active area of the microlens array module 20.

In the present embodiment, the laser system 10 is covered with a shielding cover 11 for shielding the interference signal; the aperture stop 60 used may be a circular stop with a radius of 1mm to 5mm adjustable. The beam expander can be of a three-lens structure, the magnification is 20x, the beam expander is provided with a coating suitable for 405nm laser, the energy loss rate is about 6%, the maximum emergent light spot is larger than 45mm, and the divergence angle of parallel light during incidence is smaller than 10 mrad.

When the maskless exposure machine of this embodiment works, a laser beam emitted by the laser system 10 sequentially irradiates the aperture stop 60 and the beam expander 70 through the first reflector 511 and the second reflector 512 according to a preset path to perform beam shaping, and then irradiates the microlens array module 20 through the third reflector 513, and the laser beam is split and focused by the microlens array module 20 and then projected onto a processing substrate of the movable platform 30 to perform exposure. As the moving stage 30 moves, the divided beam moves on the processed substrate and forms an exposure pattern on a specific processing area of the processed substrate, which is the same as the moving track of the moving stage 30. The exposure process does not require a mask. With the movement of the moving platform 30, the multiple beamlets formed by the microlens array module 20 by light splitting directly perform direct-write exposure on the processed substrate, and perform single/multiple exposure on the repeated periodic pattern located in the processed area.

In the sixth embodiment, please refer to fig. 6:

on the basis of the fifth embodiment, the laser system 10 in the desktop portable maskless exposure machine includes a laser light source 12 and a laser shutter 13 for controlling the duration of the light beam emitted from the laser light source 12. The laser source 12 can use a semiconductor continuous laser with a wavelength of 405nm, the power is 0-500 mW, and a femtosecond laser with a wavelength of 400nm can also be used.

The above description is only a preferred embodiment of the present invention, and therefore should not be taken as limiting the scope of the utility model, which is defined by the appended claims and their equivalents.

Claims

1. The utility model provides a portable maskless exposure machine of desktop which characterized in that: the laser exposure device comprises a shell, and a laser system, a micro lens array module, a mobile platform and a power supply which are arranged in the shell, wherein the micro lens array module is arranged between the laser system and the mobile platform, the mobile platform bears a processing substrate, and a laser beam emitted by the laser system irradiates the micro lens array module to be split and focused and then projects to the processing substrate on the mobile platform for exposure.

2. The desktop portable maskless exposure machine of claim 1, wherein: the shell is a rectangular shell.

3. The desktop portable maskless exposure machine of claim 1, wherein: the laser system is characterized by further comprising a light path redirection structure arranged in the shell, the light path redirection structure is arranged between the laser system and the micro lens array module, and laser beams emitted by the laser system irradiate the micro lens array module after passing through the light path redirection structure.

4. The desktop portable maskless exposure machine of claim 3, wherein: the light path redirecting structure includes at least one mirror.

5. The desktop portable maskless exposure machine of claim 1, wherein: the laser system is characterized by further comprising an aperture diaphragm arranged in the shell, the aperture diaphragm is arranged between the laser system and the micro-lens array module, and a laser beam emitted by the laser system irradiates the micro-lens array module after passing through the aperture diaphragm.

6. The desktop portable maskless exposure machine of claim 1, wherein: the laser system comprises a shell, and is characterized by further comprising a beam expander arranged in the shell, wherein the beam expander is arranged between the laser system and the micro lens array module, and a laser beam emitted by the laser system irradiates the micro lens array module after passing through the beam expander.

7. The desktop portable maskless exposure machine of claim 1, wherein: still include at least one speculum, aperture diaphragm, beam expander, the laser beam that laser system sent passes through the speculum adjust the light path direction and pass through in proper order aperture diaphragm beam expander shines behind the beam expander on the microlens array module.

8. The desktop portable maskless exposure machine of claim 7, further comprising: including three speculum, be first speculum, second mirror and third speculum respectively, first speculum the second mirror with the third speculum be located the three continuous angular position of casing respectively according to the preface, the light beam that laser system sent passes through in proper order first speculum the second mirror aperture diaphragm the beam expanding mirror shine on the microlens array module behind the third speculum.

9. The desktop portable maskless exposure machine of claim 1, wherein: the laser system comprises a laser light source and a laser shutter.

10. The desktop portable maskless exposure machine of claim 1, wherein: the periphery of the laser system is covered with a shielding cover for shielding interference signals.