CN216765034U - Magnetron sputtering cathode with target material capable of being replaced quickly - Google Patents
Magnetron sputtering cathode with target material capable of being replaced quickly Download PDFInfo
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- CN216765034U CN216765034U CN202123387644.5U CN202123387644U CN216765034U CN 216765034 U CN216765034 U CN 216765034U CN 202123387644 U CN202123387644 U CN 202123387644U CN 216765034 U CN216765034 U CN 216765034U
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Abstract
The magnetron sputtering cathode with the target material capable of being replaced quickly comprises a target material mounting seat and a target material, wherein the target material is positioned between a chimney ejection device and a magnetic yoke cooling assembly, the chimney ejection device is mounted on a cathode shielding cover, and the cathode shielding cover is fixed on the magnetic yoke cooling assembly through screws. When the target is replaced, a sample conveying system arranged on the magnetron sputtering equipment is used for grabbing the support lug on the edge of the target mounting seat, and the target mounting seat and the target therein are taken out from an opening on the side edge of the cathode shielding case and then are conveyed into a cavity of the sample conveying system; and then, a new target material mounting seat in the cavity and a target material in the new target material mounting seat are conveyed to an opening in the side edge of the original cathode shielding case by using the sample conveying system, a notch of the target material mounting seat is tightly pressed by using the chimney ejection device, and the target material mounting seat is positioned so as to be positioned right above the magnetic yoke cooling assembly. The utility model discloses a under the condition of not destroying main vacuum cavity vacuum environment, realize trading the target fast, reduce the time of changing the target by a wide margin, also reduced the pollution of main vacuum cavity.
Description
Technical Field
The utility model relates to the technical field of vacuum coating, in particular to a magnetron sputtering cathode capable of quickly replacing a target material.
Background
Magnetron sputtering belongs to one of Physical Vapor Deposition (PVD) and is widely applied to the field of material coating. One of the key core technologies of magnetron sputtering is the design and manufacture of a magnetron sputtering cathode, and the basic principle is to increase the plasma density by utilizing the confinement of a magnetic field to charged particles so as to increase the sputtering rate. When the target in the magnetron sputtering cathode needs to be replaced, the magnetron sputtering cathode is taken out for target replacement after the main vacuum cavity is deflated in the traditional mode. After the replacement is finished, the magnetron sputtering cathode is put back, and the main vacuum cavity needs to be pumped to the limit vacuum again to normally work. This is cumbersome and time consuming and can easily result in contamination of the main vacuum chamber.
SUMMERY OF THE UTILITY MODEL
The magnetron sputtering cathode with the target material capable of being rapidly replaced provided by the utility model can at least solve one of the technical problems provided by the background technology.
In order to achieve the purpose, the utility model adopts the following technical scheme:
a magnetron sputtering cathode with a target material capable of being replaced quickly comprises a target material, a target material mounting seat and a magnet yoke cooling assembly, wherein the target material is mounted on the target material mounting seat,
the device also comprises a chimney ejection device and a cathode shielding case;
the target mounting seat is positioned between the chimney ejection device and the magnetic yoke cooling assembly, the chimney ejection device is arranged on the cathode shielding cover, and the cathode shielding cover is fixed on the magnetic yoke cooling assembly;
wherein, the first and the second end of the pipe are connected with each other,
the chimney ejection device has the functions of elastically compressing and positioning the target mounting seat;
the target mounting seat is provided with a support lug and a limiting notch;
the side of the cathode shielding cover is provided with an opening.
Furthermore, the chimney ejection device comprises a chimney, an ejection pin, a pressure spring and a plug screw;
the ejection pin through hole has a guiding function;
the chimney comprises a guide limiting hole, the bottom of the chimney is provided with threads, and the ejection pin, the pressure spring and the plug screw are sequentially arranged in the guide limiting hole of the chimney;
the plug screw has screw threads and is the same as the screw threads at the bottom of the guide limiting hole of the chimney, at the moment, the plug screw extrudes the pressure spring, the pressure spring extrudes the elastic ejection pin, and the guide limiting hole of the chimney plays a role in fixing and guiding.
Furthermore, the ejection pin, the pressure spring and the screw plug are matched for use.
Further, the target mounting seat comprises a bottom heat transfer seat and a target compression ring;
the target material pressing ring is used for fixing a target material right above the bottom heat transfer seat and is connected through a screw.
Furthermore, the end part of the spring ejection pin is provided with a radian, and the upper part of the target compression ring is provided with a chamfer inclination surface.
Furthermore, the target material pressure ring comprises a support lug and a limiting notch.
Further, the magnetic yoke cooling assembly comprises a magnet, a magnetic yoke and a magnetic hoop;
the magnet yoke is located under the magnetic hoop and fixed through a screw, the magnet is installed in an installation hole in the magnetic hoop, and the magnet yoke is made of magnetic conductive materials.
Further, the magnet is a permanent magnet or an electromagnet.
Furthermore, the ejection pin is made of ceramic materials.
On the other hand, the target material replacing method of the magnetron sputtering cathode, based on the magnetron sputtering cathode with the quickly replaceable target material, comprises the following steps,
when the target material of the magnetron sputtering cathode needs to be replaced, a sample conveying system arranged on the magnetron sputtering device is used for grabbing the support lug on the edge of the target material mounting seat, and the target material mounting seat and the target material therein are taken out from an opening on the side edge of the cathode shielding case and then are conveyed into a cavity of the sample conveying system; and then, a new target material mounting seat in the cavity and a target material in the new target material mounting seat are conveyed to the side opening of the original cathode shielding case by using the sample conveying system, the notch of the target material mounting seat is pressed by using the chimney ejection device, and the target material mounting seat is positioned so that the target material mounting seat is positioned right above the magnetic yoke cooling assembly.
According to the technical scheme, the magnetron sputtering cathode with the target material capable of being replaced quickly comprises a chimney ejection device, the target material, a target material mounting seat, a magnet yoke cooling assembly and a cathode shielding case. When the target material of the magnetron sputtering cathode needs to be replaced, the sample transmission system of the magnetron sputtering device is used for grabbing the support lug on the edge of the target material mounting seat, and the target material mounting seat and the target material therein are taken out from the opening on the side edge of the cathode shielding case and then are conveyed into a cavity of the sample transmission system. The standby target is stored in a chamber in the sample transfer system for replacement at any time. And then a sample transmission system is utilized to transmit the new target material mounting seat in the cavity and the target material therein to the magnetron sputtering cathode through the side opening of the original cathode shielding case. And the chimney ejection device is used for compressing the notch of the target mounting seat and positioning the target mounting seat, so that the target mounting seat is positioned right above the magnetic yoke cooling assembly.
Compared with the prior art, the utility model has the following advantages:
the target is fixed on the target mounting seat through the target pressing ring, and the whole replacement of the target mounting seat and the target is realized through the support lugs on the edge of the target mounting seat. And meanwhile, the target mounting seat after replacement is positioned and fixed through a chimney ejection device. The utility model discloses a under the condition of not destroying main vacuum cavity vacuum environment, realize trading the target fast, reduce the time of changing the target by a wide margin, also reduced the pollution of main vacuum cavity simultaneously.
Drawings
FIG. 1 is a schematic cross-sectional view of the present invention;
FIG. 2 is a cross-sectional view of the yoke cooling assembly of the present invention;
FIG. 3 is a schematic view of a chimney ejection device according to an embodiment of the present invention;
FIG. 4 is a schematic view of a target mount according to an embodiment of the present invention;
in the figure: 1-chimney ejection device, 2-target, 3-target mounting base, 4-magnetic yoke cooling component, 5-cathode shielding case, 11-chimney, 12-ejection pin, 13-pressure spring, 14-screw plug, 31-bottom heat transfer base, 32-target compression ring, 41-magnet, 42-magnetic yoke, and 43-magnetic hoop.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention.
As shown in fig. 1, the magnetron sputtering cathode with a fast target replacement according to the present embodiment includes a chimney ejection device 1, a target 2, a target mount 3, a yoke cooling assembly 4, and a cathode shield 5. The target 2 is installed on the target installation seat 3, the target installation seat 3 is located between the chimney ejection device 1 and the magnetic yoke cooling assembly 4, the chimney ejection device 1 is installed on the cathode shielding cover 5, and the cathode shielding cover 5 is fixed on the magnetic yoke cooling assembly 4 through screws.
The chimney ejection device 1 has the functions of elastically compressing and positioning the target mounting seat 3; the target mounting base 3 is provided with a support lug and a limiting notch; the side of the cathode shielding case 5 is provided with an opening.
The chimney ejection device 1 comprises a chimney 11, an ejection pin 12, a pressure spring 13 and a screw plug 14; the chimney 11 comprises a guide limiting hole, the bottom of the chimney is provided with threads, and the ejection pin 12, the pressure spring and the screw plug 14 are sequentially arranged in the guide limiting hole of the chimney 11; the screw plug 14 is provided with threads and is the same as the threads at the bottom of the guide limiting hole of the chimney 11, at the moment, the screw plug 14 extrudes the pressure spring 13, the pressure spring 13 extrudes the ejection pin 12, and the guide limiting hole of the chimney 11 plays a role in fixing and guiding;
the ejection pin 12, the pressure spring 13 and the plug screw 14 are used in a matched manner, the number of the sets is not fixed, and only the target mounting seat 3 needs to be pressed and positioned. The ejection pin 12 has a guiding function through a hole.
The target mounting base 3 comprises a bottom heat transfer base 31 and a target pressing ring 32; the target material pressing ring 32 is used for fixing the target material 2 right above the bottom heat transfer seat 31 and is connected with the bottom heat transfer seat through a screw;
the target material pressing ring 32 comprises a support lug and a limiting notch.
The magnetic yoke cooling assembly 4 comprises a magnet 41, a magnetic yoke 42 and a magnetic hoop 43; the magnetic yoke 42 is located right below the magnetic hoop 43 and fixed by screws, the magnet 41 is installed in the installation hole on the magnetic hoop 43, and the magnetic yoke 42 is made of magnetic conductive material.
The magnet 41 is a permanent magnet or an electromagnet.
Specifically, the magnetron sputtering cathode with the target capable of being replaced quickly in the embodiment includes that the side edge of the cathode shielding case 5 is provided with an opening, and when the target of the magnetron sputtering cathode needs to be replaced, a sample transferring system arranged on the magnetron sputtering device is used for grabbing a support lug on the side of the target mounting seat 3 to provide lateral tension. The end of the ejection pin 12 is provided with a radian, the upper part of the target compression ring 32 of the target mounting seat 3 is provided with a chamfer inclination surface, and when the target mounting seat 3 is subjected to lateral tension, the ejection pin 12 can be contracted due to the extrusion of the inclination surface, so that the target mounting seat 3 and the target 2 can penetrate through a side opening of the cathode shielding case 5 to be taken out by a sample transferring system of the magnetron sputtering equipment, and then are conveyed into a chamber of the sample transferring system. The spare target mounting seat 3 and the target 2 therein are stored in a chamber of the sample transfer system for replacement at any time. When the target material is replaced, the support lug on the side of the standby target material mounting seat 3 in the chamber of the sample-transferring system is grabbed and sent to the position near the opening on the side of the cathode shielding case 5; pass a appearance system and give 3 lugs side thrust on the limit of target mount pad, after passing 5 side openings of former cathode shield cover, 3 slope of target mount pad extrude bullet knock pin 12, and bullet knock pin 12 contracts because of the slope extrusion, and the location of kick-backing is carried out to the recess department on the panel clamping ring 32 when bullet knock pin 12. The target material mounting seat 3 is tightly attached to the upper surface of the magnet yoke cooling component 4 under the extrusion of the spring top pin 12.
In this embodiment, the ejection pin 12 is made of ceramic material, so as to prevent the target material and the cathode casing from conducting electricity.
In summary, the embodiment of the utility model discloses a magnetron sputtering cathode capable of quickly replacing a target, which comprises a chimney ejection device, a target mounting seat, a magnetic yoke cooling assembly and a cathode shielding cover. The target mounting seat and the target are located between the chimney ejection device and the magnetic yoke cooling assembly, the chimney ejection device is mounted on the cathode shielding cover, and the cathode shielding cover is fixed on the magnetic yoke cooling assembly through screws. When the target material of the magnetron sputtering cathode needs to be replaced, a sample conveying system arranged on the magnetron sputtering device is used for grabbing the support lug on the edge of the target material mounting seat, and the target material mounting seat and the target material therein are taken out from an opening on the side edge of the cathode shielding case and then are conveyed into a cavity of the sample conveying system; and then, a new target material mounting seat in the cavity and a target material in the new target material mounting seat are conveyed to the side opening of the original cathode shielding case by using the sample conveying system, the notch of the target material mounting seat is pressed by using the chimney ejection device, and the target material mounting seat is positioned so as to be positioned right above the magnetic yoke cooling assembly. The utility model discloses a under the condition of not destroying main vacuum cavity vacuum environment, realize trading the target fast, reduce the time of changing the target by a wide margin, also reduced the pollution of main vacuum cavity simultaneously.
The embodiment of the utility model is provided with the magnetron sputtering cathode capable of quickly replacing the target material, the target material is fixed on the target material mounting seat through the target material compression ring, and the whole replacement of the target material mounting seat and the target material is realized through the support lug on the edge of the target material mounting seat. And meanwhile, the target mounting seat after replacement is positioned and fixed through a chimney ejection device. The utility model discloses a under the condition of not destroying main vacuum cavity vacuum environment, realize trading the target fast, reduce the time of changing the target by a wide margin, also reduced the pollution of main vacuum cavity simultaneously.
The above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (9)
1. The utility model provides a magnetron sputtering cathode with but quick replacement target, includes target (2), target mount pad (3) and yoke cooling module (4), and target (2) are installed on target mount pad (3), its characterized in that:
the chimney ejection device also comprises a chimney ejection device (1) and a cathode shielding case (5);
the target mounting seat (3) is positioned between the chimney ejection device (1) and the magnetic yoke cooling assembly (4), the chimney ejection device (1) is mounted on the cathode shielding case (5), and the cathode shielding case (5) is fixed on the magnetic yoke cooling assembly (4);
wherein the content of the first and second substances,
the chimney ejection device (1) has the functions of elastically compressing and positioning the target mounting seat (3);
the target mounting seat (3) is provided with a support lug and a limiting notch;
the side of the cathode shielding cover (5) is provided with an opening.
2. The magnetron sputtering cathode with a rapidly replaceable target according to claim 1, wherein:
the chimney ejection device (1) comprises a chimney (11), an ejection pin (12), a pressure spring (13) and a plug screw (14);
the ejection pin (12) has a guiding function through the hole;
the chimney (11) comprises a guide limiting hole, the bottom of the chimney is provided with threads, and the ejection pin (12), the pressure spring (13) and the plug screw (14) are sequentially arranged in the guide limiting hole of the chimney (11);
the plug screw (14) is provided with threads and is the same as the threads at the bottom of the guide limiting hole of the chimney (11), at the moment, the plug screw (14) extrudes the pressure spring (13), the pressure spring (13) extrudes the ejection pin (12), and the guide limiting hole of the chimney (11) plays a role in fixing and guiding.
3. The magnetron sputtering cathode with a rapidly replaceable target according to claim 2, wherein: the ejection pin (12), the pressure spring (13) and the screw plug (14) are matched for use.
4. The magnetron sputtering cathode with a rapidly replaceable target according to claim 2, wherein: the target mounting seat (3) comprises a bottom heat transfer seat (31) and a target pressing ring (32);
the target material pressing ring (32) is used for fixing the target material (2) right above the bottom heat transfer seat (31) and is connected with the bottom heat transfer seat through screws.
5. The magnetron sputtering cathode with a rapidly replaceable target according to claim 4, wherein: the end part of the ejection pin (12) is provided with a radian, and the upper part of the target material compression ring (32) is provided with a chamfer slope surface.
6. The magnetron sputtering cathode with a rapidly replaceable target according to claim 4, wherein: the target material pressing ring (32) comprises a support lug and a limiting notch.
7. The magnetron sputtering cathode with a rapidly replaceable target according to claim 1, wherein: the magnet yoke cooling assembly (4) comprises a magnet (41), a magnet yoke (42) and a magnetic hoop (43);
the magnetic yoke (42) is located under the magnetic hoop (43) and fixed through screws, the magnet (41) is installed in an installation hole in the magnetic hoop (43), and the magnetic yoke (42) is made of magnetic conductive materials.
8. The magnetron sputtering cathode with a rapidly replaceable target according to claim 7, wherein: the magnet (41) is a permanent magnet or an electromagnet.
9. The magnetron sputtering cathode with a rapidly replaceable target according to claim 2, wherein: the ejection pin (12) is made of ceramic materials.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123387644.5U CN216765034U (en) | 2021-12-29 | 2021-12-29 | Magnetron sputtering cathode with target material capable of being replaced quickly |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202123387644.5U CN216765034U (en) | 2021-12-29 | 2021-12-29 | Magnetron sputtering cathode with target material capable of being replaced quickly |
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| CN216765034U true CN216765034U (en) | 2022-06-17 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115466932A (en) * | 2022-10-19 | 2022-12-13 | 浙江大学 | Magnetron sputtering target quick-change structure and method |
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- 2021-12-29 CN CN202123387644.5U patent/CN216765034U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115466932A (en) * | 2022-10-19 | 2022-12-13 | 浙江大学 | Magnetron sputtering target quick-change structure and method |
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