CN114318265A - Magnetron sputtering cathode capable of quickly replacing target material and method for replacing target material - Google Patents
Magnetron sputtering cathode capable of quickly replacing target material and method for replacing target material Download PDFInfo
- Publication number
- CN114318265A CN114318265A CN202111646259.XA CN202111646259A CN114318265A CN 114318265 A CN114318265 A CN 114318265A CN 202111646259 A CN202111646259 A CN 202111646259A CN 114318265 A CN114318265 A CN 114318265A
- Authority
- CN
- China
- Prior art keywords
- target
- mounting seat
- chimney
- magnetron sputtering
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a magnetron sputtering cathode capable of quickly replacing a target and a target replacing method. When the target is replaced, the magnetic hoop cooling assembly moves downwards under the driving of the telescopic driving mechanism, the sample conveying system arranged on the magnetron sputtering equipment is used for grabbing the support lugs on the edge of the target mounting seat, the target mounting seat and the target in the target are taken out from the side edge of the cathode shielding case and then are conveyed into a chamber of the sample conveying system; and then, a sample transmission system is utilized to send the new target material mounting seat and the target material in the cavity to the position right above the original magnetic hoop cooling assembly, so that the chimney pressing device presses the target material mounting seat. The invention realizes the rapid target replacement without damaging the vacuum environment of the main vacuum cavity, greatly reduces the time for replacing the target material and also reduces the pollution of the main vacuum cavity.
Description
Technical Field
The invention relates to the technical field of vacuum coating, in particular to a magnetron sputtering cathode capable of quickly replacing a target material.
Background
Magnetron sputtering belongs to one of Physical Vapor Deposition (PVD) and is widely applied to the field of material coating. One of the key core technologies of magnetron sputtering is the design and manufacture of a magnetron sputtering cathode, and the basic principle is to increase the plasma density by utilizing the confinement of a magnetic field to charged particles so as to increase the sputtering rate. When the target in the magnetron sputtering cathode needs to be replaced, the magnetron sputtering cathode is taken out for target replacement after the main vacuum cavity is deflated in the traditional mode. After the replacement is finished, the magnetron sputtering cathode is put back, and the main vacuum cavity needs to be pumped to the limit vacuum again to normally work. This is cumbersome and time consuming and can easily result in contamination of the main vacuum chamber.
Disclosure of Invention
The magnetron sputtering cathode capable of rapidly replacing the target material provided by the invention can at least solve one of the problems provided by the background technology.
In order to achieve the purpose, the invention adopts the following technical scheme:
a magnetron sputtering cathode capable of quickly replacing a target comprises the target and a target mounting seat, wherein the target is mounted on the target mounting seat, and the magnetron sputtering cathode also comprises a magnetic hoop cooling assembly, a cathode shielding case, a cavity mounting flange and a telescopic driving mechanism;
the target mounting seat and the target are positioned between the chimney pressing device and the magnetic hoop cooling assembly, the chimney pressing device is mounted on the cavity mounting flange, the cathode shielding case is fixed on the magnetic hoop cooling assembly, the magnetic hoop cooling assembly penetrates through the cavity mounting flange and is connected with the telescopic driving mechanism, and the other end of the telescopic driving mechanism is mounted on the cavity mounting flange;
the chimney pressing device has the functions of pressing and positioning the target mounting seat;
the target mounting seat is provided with a support lug and a limiting notch;
and an opening for avoiding the support lug of the target mounting seat is arranged on the side edge of the chimney pressing device.
Furthermore, the chimney pressing device comprises a chimney, an insulating pressing block and a supporting rod, wherein the insulating pressing block is arranged at the bottom of the chimney, and the bottom of the chimney is connected with the supporting rod and is fixed on the cavity mounting flange;
the insulating pressing block is used for positioning and pressing the target mounting seat.
Furthermore, the target mounting seat comprises a bottom heat transfer seat and a target pressing ring, and the target pressing ring fixes the target right above the bottom heat transfer seat and is connected with the bottom heat transfer seat through a screw.
Further, the target pressing ring comprises a support lug.
Further, the magnetic hoop cooling assembly comprises a magnet, a magnetic yoke, a magnetic hoop, a connecting pipe and a corrugated pipe;
the magnetic yoke is positioned right below the magnetic hoop and is fixed through a screw;
the magnet is arranged in the mounting hole on the magnetic hoop, and the magnetic yoke is made of magnetic conductive material; one end of the connecting pipe is connected with the magnetic hoop, and the other end of the connecting pipe penetrates through the corrugated pipe to be connected with the flange of the corrugated pipe; the other end of the corrugated pipe is connected to the cavity flange, so that the components such as the magnet, the magnet yoke and the magnetic hoop can move up and down relative to the cavity flange, the distance between the components and an insulating pressing block below the chimney pressing device is reduced, and the target material mounting seat is pressed.
Further, the magnet is a permanent magnet or an electromagnet.
Further, the upper surface of the cathode shielding case is lower than the upper surface of the magnetic hoop.
Furthermore, the insulating pressing block is made of ceramic materials.
On the other hand, the invention also discloses a target replacing method of the magnetron sputtering cathode capable of quickly replacing the target, which comprises the following steps:
when the target needs to be replaced for the magnetron sputtering cathode, the flexible driving mechanism drives the magnetic hoop cooling assembly to move downwards, the distance between the magnetic hoop cooling assembly and the chimney pressing device is pulled, a sample conveying system arranged on the magnetron sputtering device is used for grabbing the support lug on the edge of the target mounting seat, the target mounting seat and the target in the target mounting seat are taken out from the side edge of the cathode shielding cover, and then the target is conveyed into a chamber of the sample conveying system; and then, a sample transmission system is used for conveying a new target material mounting seat in the cavity and the target material in the cavity to the position right above the original magnetic hoop cooling assembly, the flexible driving mechanism drives the magnetic hoop cooling assembly to move upwards, the distance between the magnetic hoop cooling assembly and the chimney pressing device is shortened, and the chimney pressing device presses the target material mounting seat.
According to the technical scheme, the magnetron sputtering cathode capable of rapidly replacing the target comprises a chimney pressing device, the target, a target mounting seat, a magnetic hoop cooling assembly, a cathode shielding cover, a cavity mounting flange and a telescopic driving mechanism. The target mounting seat and the target are located between the chimney pressing device and the magnetic hoop cooling assembly, the chimney pressing device is mounted on the cavity mounting flange, the cathode shielding case is fixed on the magnetic hoop cooling assembly through screws, the magnetic hoop cooling assembly penetrates through the cavity mounting flange to be connected with the telescopic driving mechanism, and the other end of the telescopic driving mechanism is mounted on the cavity mounting flange. When the target needs to be replaced for the magnetron sputtering cathode, the flexible driving mechanism drives the magnetic hoop cooling assembly to move downwards, the distance between the magnetic hoop cooling assembly and the chimney pressing device is pulled, a sample conveying system arranged on the magnetron sputtering device is used for grabbing the support lug on the edge of the target mounting seat, the target mounting seat and the target in the target mounting seat are taken out from the side edge of the cathode shielding cover, and then the target is conveyed into a chamber of the sample conveying system; and then, a sample transmission system is used for conveying a new target material mounting seat in the cavity and the target material in the cavity to the position right above the original magnetic hoop cooling assembly, the flexible driving mechanism drives the magnetic hoop cooling assembly to move upwards, the distance between the magnetic hoop cooling assembly and the chimney pressing device is shortened, and the chimney pressing device presses the target material mounting seat.
Compared with the prior art, the invention has the following advantages:
the target material is fixed on the target material mounting seat, and the target material is replaced from the side by utilizing the support lug on the edge of the target material mounting seat and the sample transmission system of the magnetron sputtering device. The magnetic hoop cooling assembly comprises a corrugated pipe, can stretch out and draw back the target mounting seat and the target above the mounting seat, and can compress and fix the target mounting seat by the magnetic hoop cooling assembly and the chimney pressing device. The invention realizes the rapid target replacement without damaging the vacuum environment of the main vacuum cavity, greatly reduces the time for replacing the target material and simultaneously reduces the pollution of the main vacuum cavity.
Drawings
FIG. 1 is a schematic cross-sectional view of the present invention;
FIG. 2 is a cross-sectional view of the magnetic collar cooling assembly of the present invention;
FIG. 3 is a schematic view of a chimney hold down according to an embodiment of the present invention;
FIG. 4 is a schematic view of a target mount according to an embodiment of the present invention;
in the figure: the method comprises the following steps of 1-chimney pressing device, 2-target, 3-target mounting seat, 4-magnetic hoop cooling assembly, 5-cathode shielding case, 6-cavity mounting flange, 7-telescopic driving mechanism, 11-chimney, 12-insulating pressing block, 13-supporting rod, 31-bottom heat transfer seat, 32-target pressing ring, 41-magnet, 42-magnetic yoke, 43-magnetic hoop, 44-connecting pipe and 45-corrugated pipe.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention.
As shown in fig. 1, this embodiment is a novel magnetron sputtering cathode capable of rapidly replacing a target, including a chimney pressing device 1, a target 2, a target mounting seat 3, a magnetic hoop cooling assembly 4, a cathode shielding case 5, a cavity mounting flange 6 and a telescopic driving mechanism 7, wherein the target mounting seat 3 and the target 2 are located between the chimney pressing device 1 and the magnetic hoop cooling assembly 4, the chimney pressing device 1 is installed on the cavity mounting flange 6, the cathode shielding case 5 is fixed on the magnetic hoop cooling assembly 4 through screws, the magnetic hoop cooling assembly 4 passes through the cavity mounting flange 6 and is connected with the telescopic driving mechanism 7, and the other end of the telescopic driving mechanism 7 is installed on the cavity mounting flange 6.
Specifically, the chimney pressing device 1 has the functions of pressing and positioning the target mounting seat 3;
the target mounting base 3 is provided with a support lug and a limiting notch;
the side of the chimney pressing device 1 is provided with a lug opening avoiding the target mounting seat 3.
The chimney pressing device 1 comprises a chimney 11, an insulating pressing block 12 and a supporting rod 13. The insulating pressing block 12 is installed at the bottom of the chimney 11, and the bottom of the chimney 11 is connected with the supporting rod 13 and fixed on the cavity installation flange 6. The insulating pressing block 12 has insulating property and mainly functions in positioning and pressing the target mounting seat.
The target mounting seat 3 comprises a bottom heat transfer seat 31 and a target compression ring 32; the target material pressing ring 32 fixes the target material 2 right above the bottom heat transfer seat 31 and is connected through screws.
The magnetic yoke cooling assembly 4 includes a magnet 41, a yoke 42, a magnetic yoke 43, a connection tube 44, a bellows 45, and the like. The magnetic yoke 42 is positioned right below the magnetic hoop 43 and is fixed through screws; the magnet 41 is arranged in an installation hole on the magnetic hoop 43, and the magnetic yoke 42 is made of magnetic conductive material; one end of the connecting pipe 44 is connected with the magnetic hoop 43, and the other end passes through the corrugated pipe 45 to be connected with the flange thereof. The other end of the corrugated pipe 45 is connected to the cavity flange 6, and the up-and-down movement of the magnet 41, the magnetic yoke 42, the magnetic hoop 43 and other components relative to the cavity flange 6 can be realized, so that the distance between the chimney pressing device 1 and an insulating pressing block below the chimney pressing device is reduced, and the target mounting seat 3 is pressed.
The number of the insulating press blocks 12 is not fixed, and only the target mounting base 3 is required to be pressed and positioned.
The magnet 41 is a permanent magnet or an electromagnet.
The cathode shield 5 is mounted on the magnetic hoop cooling assembly 4 with its upper surface slightly lower than the upper surface of the magnetic hoop 43.
Specifically, the novel magnetron sputtering cathode capable of rapidly replacing the target material comprises a chimney pressing device 1, wherein an opening for avoiding a support lug of a target material mounting seat 3 is formed in the side edge of the chimney pressing device 1, when the target material of the magnetron sputtering cathode needs to be replaced, a telescopic driving mechanism 7 drives the opening to move down a magnetic hoop cooling assembly 4, the distance between the opening and the chimney pressing device 1 is pulled open, the support lug on the side edge of the target material mounting seat is grabbed by a sample transmission system arranged on a magnetron sputtering device, the target material mounting seat 3 and a target material 2 in the target material mounting seat are taken out from the side edge of a cathode shielding case 5 and then are conveyed into a chamber of the sample transmission system; and then, a sample transmission system is used for sending a new target material mounting seat 3 in the cavity and a target material 2 in the cavity to a position right above the original magnetic hoop cooling assembly 4, the flexible driving mechanism 7 drives the magnetic hoop cooling assembly 4 to move upwards, the distance between the chimney compressing device 1 and the chimney compressing device 1 is shortened, and the chimney compressing device 1 is enabled to compress the target material mounting seat 3.
In this embodiment, the insulating compact 12 is made of a ceramic material, so as to prevent the target material and the cathode housing from being electrically conductive.
From above, but novel magnetron sputtering negative pole of quick replacement target of this embodiment, including chimney closing device, target mount pad, magnetic hoop cooling module, cathode shielding cover, cavity mounting flange and flexible actuating mechanism. The target mounting seat and the target are located between the chimney pressing device and the magnetic hoop cooling assembly, the chimney pressing device is mounted on the cavity mounting flange, the cathode shielding case is fixed on the magnetic hoop cooling assembly through screws, the magnetic hoop cooling assembly penetrates through the cavity mounting flange to be connected with the telescopic driving mechanism, and the other end of the telescopic driving mechanism is mounted on the cavity mounting flange. When the target needs to be replaced for the magnetron sputtering cathode, the flexible driving mechanism drives the magnetic hoop cooling assembly to move downwards, the distance between the magnetic hoop cooling assembly and the chimney pressing device is pulled, a sample conveying system arranged on the magnetron sputtering device is used for grabbing the support lug on the edge of the target mounting seat, the target mounting seat and the target in the target mounting seat are taken out from the side edge of the cathode shielding cover, and then the target is conveyed into a chamber of the sample conveying system; and then, a sample transmission system is used for conveying a new target material mounting seat in the cavity and the target material in the cavity to the position right above the original magnetic hoop cooling assembly, the flexible driving mechanism drives the magnetic hoop cooling assembly to move upwards, the distance between the magnetic hoop cooling assembly and the chimney pressing device is shortened, and the chimney pressing device presses the target material mounting seat. The invention realizes the rapid target replacement without damaging the vacuum environment of the main vacuum cavity, greatly reduces the time for replacing the target material and simultaneously reduces the pollution of the main vacuum cavity.
The above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (9)
1. A magnetron sputtering cathode capable of quickly replacing a target comprises a target (2) and a target mounting seat (3), wherein the target (2) is mounted on the target mounting seat (3), and is characterized by further comprising a magnetic hoop cooling assembly (4), a cathode shielding case (5), a cavity mounting flange (6) and a telescopic driving mechanism (7);
the target mounting seat (3) and the target (2) are located between the chimney pressing device (1) and the magnetic hoop cooling assembly (4), the chimney pressing device (1) is mounted on the cavity mounting flange (6), the cathode shielding cover (5) is fixed on the magnetic hoop cooling assembly (4), the magnetic hoop cooling assembly (4) penetrates through the cavity mounting flange (6) to be connected with the telescopic driving mechanism (7), and the other end of the telescopic driving mechanism (7) is mounted on the cavity mounting flange (6);
the chimney pressing device (1) has the functions of pressing and positioning the target mounting seat (3);
the target mounting seat (3) is provided with a support lug and a limiting notch;
the side edge of the chimney pressing device (1) is provided with a lug opening for avoiding the target mounting seat (3).
2. The magnetron sputtering cathode capable of rapidly replacing the target according to claim 1, wherein: the chimney pressing device (1) comprises a chimney (11), an insulation pressing block (12) and a supporting rod (13), wherein the insulation pressing block (12) is installed at the bottom of the chimney (11), and the bottom of the chimney (11) is connected with the supporting rod (13) and fixed on the cavity mounting flange (6);
the insulating pressing block (12) is used for positioning and pressing the target mounting seat (3).
3. The magnetron sputtering cathode capable of rapidly replacing the target according to claim 1, wherein: the target mounting seat (3) comprises a bottom heat transfer seat (31) and a target pressing ring (32), wherein the target pressing ring (32) fixes a target right above the bottom heat transfer seat (31) and is connected with the bottom heat transfer seat through a screw.
4. The magnetron sputtering cathode capable of rapidly replacing the target according to claim 3, wherein: the target pressing ring (32) comprises a support lug.
5. The magnetron sputtering cathode capable of rapidly replacing the target according to claim 1, wherein: the following steps:
the magnetic hoop cooling assembly (4) comprises a magnet (41), a magnetic yoke (42), a magnetic hoop (43), a connecting pipe (44) and a corrugated pipe (45);
the magnetic yoke (42) is positioned right below the magnetic hoop (43) and is fixed through screws;
the magnet (41) is arranged in an installation hole on the magnetic hoop (43), and the magnetic yoke (42) is made of magnetic conductive material; one end of the connecting pipe (44) is connected with the magnetic hoop (43), and the other end of the connecting pipe passes through the corrugated pipe (45) and is connected with the flange thereof; the other end of the corrugated pipe (45) is connected to the cavity flange (6), so that the components such as the magnet (41), the magnetic yoke (42) and the magnetic hoop (43) can move up and down relative to the cavity flange (6), the distance between the corrugated pipe and an insulating pressing block below the chimney pressing device (1) is reduced, and the target mounting seat (3) is pressed.
6. The magnetron sputtering cathode capable of rapidly replacing the target according to claim 5, wherein:
the magnet (41) is a permanent magnet or an electromagnet.
7. The magnetron sputtering cathode capable of rapidly replacing the target according to claim 5, wherein:
the upper surface of the cathode shielding case (5) is lower than the upper surface of the magnetic hoop (43).
8. The magnetron sputtering cathode capable of rapidly replacing the target according to claim 2, wherein:
the insulating pressing block (12) is made of ceramic materials.
9. A method for replacing a target of a magnetron sputtering cathode capable of quickly replacing the target is characterized by comprising the following steps: the method comprises the following steps:
when the target needs to be replaced by the magnetron sputtering cathode, the flexible driving mechanism (6) drives the magnetic hoop cooling assembly (4) to move downwards, the distance between the magnetic hoop cooling assembly and the chimney pressing device (1) is pulled, a sample transmission system carried by the magnetron sputtering equipment is used for grabbing a support lug on the edge of the target mounting seat (3), and the target mounting seat (3) and the target (2) in the target mounting seat are taken out from the side edge of the cathode shielding case (5) and then are conveyed into a chamber of the sample transmission system; and then, a sample transmission system is used for conveying a new target material mounting seat (3) in the cavity and a target material (2) in the cavity to a position right above the original magnetic hoop cooling assembly (4), the magnetic hoop cooling assembly (4) moves upwards under the driving of a telescopic driving mechanism (7), the distance between the chimney pressing device and the chimney pressing device (1) is shortened, and the chimney pressing device presses the target material mounting seat (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111646259.XA CN114318265A (en) | 2021-12-29 | 2021-12-29 | Magnetron sputtering cathode capable of quickly replacing target material and method for replacing target material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111646259.XA CN114318265A (en) | 2021-12-29 | 2021-12-29 | Magnetron sputtering cathode capable of quickly replacing target material and method for replacing target material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114318265A true CN114318265A (en) | 2022-04-12 |
Family
ID=81016477
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111646259.XA Pending CN114318265A (en) | 2021-12-29 | 2021-12-29 | Magnetron sputtering cathode capable of quickly replacing target material and method for replacing target material |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114318265A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06272036A (en) * | 1993-03-17 | 1994-09-27 | Shibaura Eng Works Co Ltd | Sputtering system |
| CN101857951A (en) * | 2009-04-08 | 2010-10-13 | 鸿富锦精密工业（深圳）有限公司 | Magnetron sputtering device |
| JP2011102432A (en) * | 2009-10-14 | 2011-05-26 | Canon Anelva Corp | Apparatus and method for replacing magnetic target |
| CN105154837A (en) * | 2015-10-16 | 2015-12-16 | 京东方科技集团股份有限公司 | Target replacement device for sputtering facility and sputtering facility |
| CN211783075U (en) * | 2020-03-20 | 2020-10-27 | 中建材（内江）玻璃高新技术有限公司 | Target changing trolley device |
-
2021
- 2021-12-29 CN CN202111646259.XA patent/CN114318265A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06272036A (en) * | 1993-03-17 | 1994-09-27 | Shibaura Eng Works Co Ltd | Sputtering system |
| CN101857951A (en) * | 2009-04-08 | 2010-10-13 | 鸿富锦精密工业（深圳）有限公司 | Magnetron sputtering device |
| JP2011102432A (en) * | 2009-10-14 | 2011-05-26 | Canon Anelva Corp | Apparatus and method for replacing magnetic target |
| CN105154837A (en) * | 2015-10-16 | 2015-12-16 | 京东方科技集团股份有限公司 | Target replacement device for sputtering facility and sputtering facility |
| CN211783075U (en) * | 2020-03-20 | 2020-10-27 | 中建材（内江）玻璃高新技术有限公司 | Target changing trolley device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1293620C (en) | High temperature electrostatic chuck | |
| US9303311B2 (en) | Substrate processing system with mechanically floating target assembly | |
| KR20110139267A (en) | Combined pumping system comprising a getter pump and an ion pump | |
| CN1063572C (en) | Magnetism-holding electromagnet and fabrication method thereof | |
| CN114318265A (en) | Magnetron sputtering cathode capable of quickly replacing target material and method for replacing target material | |
| CN201392752Y (en) | Adapter button for controlling microswitch | |
| CN109338310A (en) | One kind being used for multi-arc ion plating equipment circular flat multi sphere target assembly | |
| WO2022121361A1 (en) | Static contact of grounding switch, and straight-swing plug-in type grounding switch | |
| CN109860968A (en) | A kind of highly reliable novel microwave circulator of aerospace | |
| KR102039758B1 (en) | Movable grounding arrangements in a plasma processing chamber and methods therefor | |
| CN109616365B (en) | Permanent magnet power-assisted double-end vacuum insulation grounding switch | |
| CN113732219B (en) | Vacuum hot extrusion forming device for rare earth terbium target | |
| CN217628599U (en) | Physical vapor deposition equipment with adjustable magnet position | |
| CN1255832C (en) | High frequency relay | |
| CN217183354U (en) | Outer protection mechanism for spherical camera | |
| CN215789335U (en) | Quick clamping frock is used in opto-coupler product processing | |
| CN113897583A (en) | Magnetron sputtering cathode compatible with magnetic target material and non-magnetic target material | |
| CN2775823Y (en) | Electromagnetic relay with spring push structure | |
| CN217018247U (en) | Cylinder push-and-pull mould convenient to installation | |
| CN217902898U (en) | Capacitor convenient to replace | |
| CN210545669U (en) | Vertical ring magnetic separator for removing iron from fly ash | |
| CN218447699U (en) | Vacuum contactor for inflating cabinet | |
| CN214312809U (en) | Locking electromagnet | |
| CN117690752B (en) | Over-travel setting method for permanent magnet vacuum circuit breaker | |
| CN114050101B (en) | Reaction chamber and semiconductor processing equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |