CN216688299U - Evaporation plating machine device for monitoring thickness of adhesive material film at bottom of small baffle in real time - Google Patents
Evaporation plating machine device for monitoring thickness of adhesive material film at bottom of small baffle in real time Download PDFInfo
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- CN216688299U CN216688299U CN202220063839.XU CN202220063839U CN216688299U CN 216688299 U CN216688299 U CN 216688299U CN 202220063839 U CN202220063839 U CN 202220063839U CN 216688299 U CN216688299 U CN 216688299U
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Abstract
The utility model discloses an evaporation machine device for monitoring the thickness of a material film adhered to the bottom of a small baffle in real time, which comprises an evaporation source, wherein the small baffle is arranged above the evaporation source, two sides of the small baffle are arranged on a carrying platform, a movable monitoring mechanism is arranged on a carrying platform on the upper surface of the evaporation source, the monitoring mechanism comprises a guide rail, a thickness measuring device and a transmission device, the guide rail is laid on the upper surface of the carrying platform, the thickness measuring device is arranged on the guide rail in a sliding manner, the transmission device is arranged on one side of the evaporation source and drives the thickness measuring device to reciprocate, the thickness measuring device is provided with a probe, and the probe vertically faces to the bottom surface of the small baffle. The utility model adds a movable monitoring mechanism on the heating source of the evaporator, the monitoring mechanism is provided with a probe, and the thickness of the material attached on the small baffle is detected by testing the interval between the probe and the small baffle through the monitoring mechanism.
Description
Technical Field
The utility model relates to the technical field of OLED evaporation, in particular to an evaporation machine device for monitoring the thickness of a material film attached to the bottom of a small baffle in real time.
Background
As shown in fig. 1, a small baffle (small baffle or small shutter) used in the OLED evaporation process is an indispensable baffle existing at the upper part of an evaporation source, a crucible containing a material is heated by a heating source to raise the temperature, and when a certain temperature is reached, the material vapor is evaporated only when the small baffle is opened, and the evaporation rate of the evaporation source is displayed after the small baffle is detected by a Crystal sensor. After a plurality of vacuum coating operations, the materials attached to the small baffle can be continuously deposited, as shown in fig. 2, when a certain amount of materials is reached, if the materials are not cleaned in time, part of the materials attached to the small baffle can fall to pollute the evaporation source.
Disclosure of Invention
The utility model aims to provide an evaporation machine device for monitoring the thickness of a material film attached to the bottom of a small baffle in real time.
The technical scheme adopted by the utility model is as follows:
the utility model provides a thick coating by vaporization machine device of real-time supervision little baffle bottom attached material membrane, it includes the evaporation source, the top of evaporation source is equipped with little baffle, the both sides of little baffle are installed on the microscope carrier, be equipped with mobilizable monitoring mechanism on the plummer of the upper surface of evaporation source, monitoring mechanism includes the guide rail, thickness measuring device and transmission, the guide rail is laid on the plummer upper surface, thickness measuring device slides and is established on the guide rail, transmission configuration is in evaporation source one side and drive thickness measuring device reciprocating motion, thickness measuring device has a probe, the probe is perpendicular towards the bottom surface of little baffle.
Furthermore, the inner surface of the small baffle plate opposite to the bottom is plated with a magnetic layer.
Further, the magnetic layer is formed by a material with a magnetic material, or a material doped with a partially magnetic metal material.
Further, the magnetic material includes iron, cobalt, nickel and alloys thereof, and hard magnetic steel materials.
Furthermore, the transmission device comprises a motor, a wire rotating disc and a telescopic wire, the motor drives the wire rotating disc to rotate so that the telescopic coil can freely stretch out and draw back in the guide rail, one end of the telescopic wire is provided with a sliding sleeve, and a probe of the thickness measuring device is arranged in the sliding sleeve so as to ensure that the probe is safely and stably positioned and maintain proper contact pressure of the probe.
Furthermore, the output end of the thickness measuring device is connected with a computer, and the thickness value of the film attached to the material is displayed on a computer screen.
Further, the thickness measuring device is an eddy current coating thickness gauge or an ultrasonic thickness gauge.
Furthermore, the evaporation source comprises a crucible, a heat conducting sheet is arranged at the upper end of the crucible, a plurality of nozzles are arranged on the heat conducting sheet at intervals, and a bearing platform is arranged on the upper surface formed by the nozzles.
According to the technical scheme, the movable monitoring mechanism is additionally arranged on the heating source of the evaporation machine, the monitoring mechanism is provided with the probe, the monitoring mechanism is used for testing the interval between the probe and the small baffle plate so as to detect the thickness of the attached material on the small baffle plate, the monitoring mechanism is provided with the eddy current coating thickness gauge, and the thickness of the covering layer on the small baffle plate is monitored in real time by detecting the size of eddy current; the small baffle plate can be coated with a layer of magnetic material or doped with partial magnetic metal material, such as nickel, iron, cobalt, alloy, hard magnetic steel and the like. The eddy current is detected and converted into a data signal, the data signal is displayed on a screen of a computer, and the thickness of the covering layer on the small baffle is monitored in real time.
Drawings
The utility model is described in further detail below with reference to the accompanying drawings and the detailed description;
FIG. 1 is a schematic view of a conventional evaporation apparatus;
FIG. 2 is a schematic view showing the thickness of the film of the material attached to the bottom of the small baffle;
FIG. 3 is a schematic structural diagram of an evaporation apparatus for monitoring the thickness of a material attached to the bottom of a small baffle in real time according to the present invention;
FIG. 4 is a schematic diagram of a top view of the monitoring mechanism of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions of the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application.
As shown in one of fig. 3 to 4, the present invention discloses an evaporation apparatus for real-time monitoring of the thickness of a material film attached to the bottom of a small baffle plate, which includes an evaporation source 1, wherein the small baffle plate 2 is disposed above the evaporation source 1, two sides of the small baffle plate 2 are mounted on a stage 3, a movable monitoring mechanism is disposed on a stage 14 on the upper surface of the evaporation source 1, the monitoring mechanism includes a guide rail 4, a thickness measuring device 5 and a transmission device 6, the guide rail 4 is laid on the upper surface of the stage 14, the thickness measuring device 5 is slidably disposed on the guide rail 4, the transmission device 6 is disposed on one side of the evaporation source 1 and drives the thickness measuring device 5 to reciprocate, and the thickness measuring device 5 has a probe vertically facing the bottom surface of the small baffle plate 2.
Further, the inner surface of the small baffle 2 opposite to the bottom is plated with a magnetic layer 7.
Further, the magnetic layer 7 is formed of a material with a magnetic material or a material doped with a partially magnetic metal material.
Further, the magnetic material includes iron, cobalt, nickel and alloys thereof, and hard magnetic steel materials.
Further, the transmission device 6 comprises a motor 61, a wire rotating disc 62 and a retractable wire 63, wherein the motor 61 drives the wire rotating disc 62 to rotate so that the retractable coil can freely retract and retract in the guide rail 4, a sliding sleeve is arranged at one end of the retractable wire 63, and a probe of the thickness measuring device 5 is arranged in the sliding sleeve to ensure that the probe is safely and stably positioned and maintain proper contact pressure of the probe.
Further, the output end of the thickness measuring device 5 is connected with a computer, and the thickness value of the film attached to the material is displayed on a computer screen.
Further, the thickness measuring device 5 is an eddy current coating thickness gauge or an ultrasonic thickness gauge.
Further, the evaporation source 1 comprises a crucible 11, a heat conducting sheet 12 is arranged at the upper end of the crucible 11, a plurality of nozzles 13 are arranged on the heat conducting sheet 12 at intervals, and a bearing platform 14 is arranged on the upper surface formed by the plurality of nozzles 13.
The utility model adds a movable measuring component on the heating source of the evaporator, the measuring component is a vortex coating thickness meter or an ultrasonic thickness meter, can be used for forming a film conductive layer material, is provided with a detecting head, and can show the distance between the detecting head and the small baffle 2, namely the thickness of the organic material covering layer 8, by detecting the size of the vortex. The measuring component judges the film thickness of the covering layer on the small baffle plate 2 by judging the size of eddy current, the eddy current can generate feedback action on a coil in the detecting head, and the size of the feedback action can show the distance between the detecting head and the small baffle plate 2, namely the thickness of the non-conductive covering layer on the small baffle plate 2. Meanwhile, data signals can be generated and displayed on a screen of a computer.
The evaporation source 1 is additionally provided with an eddy current coating thickness gauge which can move back and forth and is provided with a probe coil, if the thickness of an organic material coating layer on the small baffle 2 needs to be measured, a probe can move from the left end to the right end along a guide rail 4 additionally arranged on a heating source, and the thickness of the organic material coated on the small baffle 2 is judged by judging the size of the eddy current.
The probe is arranged in the sliding sleeve to ensure that the probe is safely and stably positioned and to maintain proper contact pressure of the probe. When measuring, the measuring head is vertically hit on the main interface with the test surface, the computer screen displays the measured value, the probe is descended, the probe moves to the next test place through the transmission device 6 (the transmission device 6 is composed of the motor 61, the wire turntable 62 and the telescopic wire 63, the motor 61 drives the wire turntable 62 to rotate, so that the telescopic coil can freely stretch in the guide rail 4), and the probe is lifted, so that the next measurement can be carried out.
According to the eddy current principle, the measuring head part changes the distance movement into the resistance impedance, the host part converts the resistance impedance change into the voltage and frequency change, the singlechip counts the frequency to obtain the thickness value and displays the thickness value on a computer screen, and the measuring head part is connected with the transmission device 6 of the heating source (the transmission device 6 realizes the reel linkage by the motor 61 driving the wire turntable 62). When a probe coil carrying high-frequency current is close to a conductor, eddy current is generated in the conductor due to the action of a high-frequency magnetic field, the magnetic field generated by the eddy current reacts on the probe coil to change the impedance of the probe coil, and the change quantity is related to the distance between the probe coil and the conductor (namely the thickness of a covering layer), so that the thickness of the covering layer on the metal surface can be indirectly measured according to the change of the impedance of the probe coil.
According to the technical scheme, the movable monitoring mechanism is additionally arranged on the heating source of the evaporation machine, the monitoring mechanism is provided with the probe, the monitoring mechanism is used for testing the interval between the probe and the small baffle 2 so as to detect the thickness of the attached material on the small baffle 2, the monitoring mechanism is provided with the eddy current coating thickness gauge, and the thickness of the covering layer on the small baffle 2 is monitored in real time by detecting the size of eddy current; the small baffle 2 can be coated with a layer of magnetic material or doped with a part of magnetic metal material, such as nickel, iron, cobalt, alloy, hard magnetic steel, etc. The eddy current is detected and converted into a data signal, the data signal is displayed on a screen of a computer, and the thickness of the covering layer on the small baffle 2 is monitored in real time.
It is to be understood that the embodiments described are only a few embodiments of the present application and not all embodiments. The embodiments and features of the embodiments in the present application may be combined with each other without conflict. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations. Thus, the detailed description of the embodiments of the present application is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
Claims (8)
1. The utility model provides a thick coating by vaporization machine of real-time supervision little baffle bottom attached material membrane, its includes the evaporation source, and the top of evaporation source is equipped with little baffle, and its characterized in that is installed on the microscope carrier to the both sides of little baffle: the movable monitoring mechanism is arranged on a bearing table on the upper surface of the evaporation source and comprises a guide rail, a thickness measuring device and a transmission device, the guide rail is laid on the upper surface of the bearing table, the thickness measuring device is arranged on the guide rail in a sliding mode, the transmission device is arranged on one side of the evaporation source and drives the thickness measuring device to reciprocate, and the thickness measuring device is provided with a probe which vertically faces the bottom surface of the small baffle.
2. The evaporation machine device for monitoring the thickness of the film of the material attached to the bottom of the small baffle in real time according to claim 1, wherein: the inner surface of the small baffle plate opposite to the bottom is plated with a magnetic layer.
3. The evaporation machine device for monitoring the thickness of the film of the material attached to the bottom of the small baffle in real time according to claim 2, wherein: the magnetic layer is formed by a material with magnetic material or a material doped with partial magnetic metal material.
4. The evaporation machine device for monitoring the thickness of the film of the material attached to the bottom of the small baffle in real time according to claim 3, wherein: magnetic materials include iron, cobalt, nickel, and alloys thereof, as well as hard magnetic steel materials.
5. The evaporation machine device for monitoring the thickness of the film of the material attached to the bottom of the small baffle in real time according to claim 1, wherein: the transmission device comprises a motor, a wire turntable and a telescopic wire, the motor drives the wire turntable to rotate so that the telescopic coil can freely stretch out and draw back in the guide rail, one end of the telescopic wire is provided with a sliding sleeve, and a probe of the thickness measuring device is arranged in the sliding sleeve so as to ensure the safe and stable positioning of the probe and maintain the proper contact pressure of the probe.
6. The vapor deposition machine device for monitoring the thickness of the film of the material attached to the bottom of the small baffle in real time according to claim 1, wherein: the output end of the thickness measuring device is connected with a computer, and the thickness value of the film attached with the material is displayed on a computer screen.
7. The evaporation machine device for monitoring the thickness of the film of the material attached to the bottom of the small baffle in real time according to claim 1, wherein: the thickness measuring device is an eddy current coating thickness gauge or an ultrasonic thickness gauge.
8. The evaporation machine device for monitoring the thickness of the film of the material attached to the bottom of the small baffle in real time according to claim 1, wherein: the evaporation source comprises a crucible, a heat conducting sheet is arranged at the upper end of the crucible, a plurality of nozzles are arranged on the heat conducting sheet at intervals, and a bearing platform is arranged on the upper surface formed by the nozzles.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220063839.XU CN216688299U (en) | 2022-01-11 | 2022-01-11 | Evaporation plating machine device for monitoring thickness of adhesive material film at bottom of small baffle in real time |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220063839.XU CN216688299U (en) | 2022-01-11 | 2022-01-11 | Evaporation plating machine device for monitoring thickness of adhesive material film at bottom of small baffle in real time |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216688299U true CN216688299U (en) | 2022-06-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220063839.XU Active CN216688299U (en) | 2022-01-11 | 2022-01-11 | Evaporation plating machine device for monitoring thickness of adhesive material film at bottom of small baffle in real time |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216688299U (en) |
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2022
- 2022-01-11 CN CN202220063839.XU patent/CN216688299U/en active Active
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