CN216487972U - Wafer processing device with protection function - Google Patents

Wafer processing device with protection function Download PDF

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Publication number
CN216487972U
CN216487972U CN202123075495.9U CN202123075495U CN216487972U CN 216487972 U CN216487972 U CN 216487972U CN 202123075495 U CN202123075495 U CN 202123075495U CN 216487972 U CN216487972 U CN 216487972U
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Prior art keywords
plate
wafer
thing
lower extreme
backup pad
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CN202123075495.9U
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Chinese (zh)
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唐李敏
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Changzhou Jingyou Microelectronics Technology Co ltd
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Changzhou Jingyou Microelectronics Technology Co ltd
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Abstract

The utility model discloses a wafer processingequipment with protect function relates to wafer processing technology field, for solving current wafer and need cut with man-hour, has dust and coolant liquid to glue in the wafer upper end easily after the cutting finishes, leads to the wafer to pollute easily, influences the problem of wafer quality. The utility model discloses a washing machine, including main part support, rubber layer, water absorbing layer, heating cabinet, upper end of installation fixed plate, the otter board is installed to one side of main part support upper end, control push rod is all installed to the both sides of going up the otter board lower extreme, the installation fixed plate is installed to control push rod's lower extreme, rotatory top board is installed to the inside upper end of installation fixed plate, the rubber layer is installed to the lower extreme of rotatory top board, the layer that absorbs water is installed to the lower extreme on rubber layer, the lower extreme on the layer that absorbs water is provided with the fine hair that absorbs water, the heating cabinet is installed to the inside lower extreme of installation fixed plate, the internally mounted of heating cabinet has the heating pipe, miscellaneous brush is installed out to the upper end of heating cabinet, the upper end of heating cabinet one side is installed and is scrubbed the motor.

Description

Wafer processing device with protection function
Technical Field
The utility model relates to a wafer processing technology field specifically is a wafer processingequipment with protect function.
Background
Wafer refers to a silicon wafer used for making silicon semiconductor circuits, the starting material of which is silicon. And dissolving the high-purity polycrystalline silicon, doping the dissolved high-purity polycrystalline silicon into silicon crystal seed crystals, and slowly pulling out the silicon crystal seed crystals to form cylindrical monocrystalline silicon. After the silicon crystal bar is ground, polished and sliced, a silicon wafer, namely a wafer, is formed. Domestic wafer production lines are dominated by 8 inches and 12 inches. The main processing modes of the wafer are sheet processing and batch processing, i.e. 1 or more wafers are processed simultaneously. As semiconductor feature sizes become smaller and smaller, processing and measurement equipment becomes more and more advanced, so that new data characteristics appear in wafer processing. Meanwhile, the characteristic size is reduced, so that the influence of the particle number in the air on the quality and the reliability of the processed wafer is increased during wafer processing, and the particle number has new data characteristics along with the improvement of cleanness.
However, the existing wafer needs to be cut during processing, and dust and cooling liquid are easily adhered to the upper end of the wafer after cutting, so that the wafer is easily polluted, and the quality of the wafer is affected; therefore, the existing requirements are not satisfied, and a wafer processing device with a protection function is provided for the existing requirements.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a wafer processingequipment with protect function to the wafer that proposes in solving above-mentioned background art need cut with man-hour, has dust and coolant liquid to glue in the wafer upper end easily after the cutting finishes, leads to the wafer to pollute easily, influences the problem of wafer quality.
In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a wafer processingequipment with protect function, includes the main part support, the otter board is installed to one side of main part support upper end, control push rod is all installed to the both sides of going up the otter board lower extreme, the installation fixed plate is installed to control push rod's lower extreme, rotatory top board is installed to the inside upper end of installation fixed plate, the rubber layer is installed to the lower extreme of rotatory top board, the layer that absorbs water is installed to the lower extreme on rubber layer, the lower extreme on layer that absorbs water is provided with the fine hair that absorbs water, the heating cabinet is installed to the inside lower extreme of installation fixed plate, the internally mounted of heating cabinet has the heating pipe, miscellaneous brush is installed out to the upper end of heating cabinet, the upper end of heating cabinet one side is installed and is scrubbed the motor, the fan of blowing is installed to the lower extreme of installation fixed plate.
Preferably, the other side in the main body support is provided with an object placing support plate, the upper end of the object placing support plate is provided with an object placing rotating plate, the object placing rotating plate is connected with the object placing support plate through a bearing, the upper end of the object placing rotating plate is provided with a buffer rubber pad, the buffer rubber pad is fixedly connected with the object placing rotating plate, the upper end of the buffer rubber pad is provided with a rubber table, the lower end of the object placing support plate is provided with an object driving motor, and the object driving motor is connected with the object placing support plate through a coupling.
Preferably, the mounting panel is installed to the opposite side of main part support, mounting panel and main part support fixed connection, the striker plate is installed to the lower extreme of mounting panel, the striker plate passes through the coupling joint with the mounting panel, the adjustment motor is installed to the upper end of mounting panel, adjustment motor and mounting panel fixed connection, the adjustment motor passes through the coupling joint with the striker plate.
Preferably, the upper end of the object placing support plate is provided with a bottom support piece, and the bottom support piece is fixedly connected with the object placing support plate.
Preferably, an upper supporting member is mounted at the upper end inside the mounting and fixing plate, and the upper supporting member is fixedly connected with the mounting and fixing plate.
Preferably, the upper end of the mounting fixing plate is provided with a rotating motor, and the rotating motor is connected with the rotating upper pressing plate through a coupler.
Compared with the prior art, the beneficial effects of the utility model are that:
1. the utility model discloses an installation top board play support ventilative effect, guarantee that damp and hot air discharges fast, make the device inside keep dry, guarantee the functional completeness of device, installation rotatory top board makes its cooperation control push rod can make the device utilize the layer and the fine hair that absorbs water that absorb water, carry out the edulcoration to the material, get rid of the dust and the coolant liquid outside the material fast, avoid material pollution, influence material quality, installation heating pipe can the heated air, make hot air dry the layer that absorbs water fast and absorb water the fine hair, guarantee the functional completeness of device;
2. the utility model discloses an installation goes out miscellaneous brush and can get rid of the dry layer that absorbs water and absorb water the debris of fine hair lower extreme fast, makes it keep clean, and the result of use of reinforcing device, installation rubber cushion pad can play the effect of support, and the device of being convenient for absorbs water, guarantees the functional complete of device, and the material after the installation striker plate can be separated with the material of not handling, and installation bottom support piece and upper portion support piece can play the effect of support.
Drawings
Fig. 1 is a schematic structural diagram of a wafer processing apparatus with a protection function according to the present invention;
fig. 2 is a front view of a wafer processing apparatus with a protection function according to the present invention;
fig. 3 is an enlarged view of a portion a of the present invention.
In the figure: 1. a main body support; 2. a screen plate is arranged; 3. a control push rod; 4. mounting a fixed plate; 5. a rotating electric machine; 6. rotating the upper pressing plate; 7. a rubber layer; 8. a water-absorbing layer; 9. water absorption fluff; 10. an upper support; 11. a heating box; 12. heating a tube; 13. a sundry discharging brush; 14. a brushing motor; 15. a blowing fan; 16. a placement support plate; 17. placing the rotating plate; 18. a cushion rubber pad; 19. a rubber table; 20. a striker plate; 21. an adjustment motor; 22. mounting a plate; 23. an object driving motor; 24. a bottom support.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments.
Referring to fig. 1-3, the present invention provides an embodiment: a wafer processing device with a protection function comprises a main body support 1, an upper screen plate 2 is installed on one side of the upper end of the main body support 1, the upper screen plate 2 is installed to play a role in supporting and ventilating to ensure that humid and hot air is quickly discharged to keep the interior of the device dry and ensure the integrity of the functionality of the device, the upper screen plate 2 is fixedly connected with the main body support 1, control push rods 3 are installed on two sides of the lower end of the upper screen plate 2, the control push rods 3 are fixedly connected with the upper screen plate 2, an installation fixing plate 4 is installed at the lower end of the control push rods 3, a rotary upper pressing plate 6 is installed at the upper end of the interior of the installation fixing plate 4, the rotary upper pressing plate 6 is installed to be matched with the control push rods 3 to enable the device to utilize a water absorption layer 8 and water absorption fluff 9 to remove impurities from materials, dust and cooling liquid outside the materials are quickly removed, material pollution is avoided, the quality of the materials is influenced, the rotary upper pressing plate 6 is connected with the installation fixing plate 4 through a bearing, the lower end of the rotary upper press plate 6 is provided with a rubber layer 7, the lower end of the rubber layer 7 is provided with a water absorbing layer 8, the lower end of the water absorbing layer 8 is provided with water absorbing fluff 9, the lower end inside the mounting and fixing plate 4 is provided with a heating box 11, the heating box 11 is internally provided with a heating pipe 12, the mounting and heating pipe 12 can heat air to ensure that the hot air quickly dries the water absorbing layer 8 and the water absorbing fluff 9 and ensure the functional integrity of the device, the heating pipe 12 is fixedly connected with the heating box 11, the upper end of the heating box 11 is provided with an impurity outlet brush 13, the impurity at the lower ends of the water absorbing layer 8 and the water absorbing fluff 9 can be quickly removed by the mounting and heating brush 13 to keep the device clean and enhance the using effect of the device, the impurity outlet brush 13 is rotatably connected with the heating box 11, the upper end of one side of the heating box 11 is provided with a scrubbing motor 14, the scrubbing motor 14 is connected with the impurity outlet brush 13 through a coupler, the lower end of the mounting and fixing plate 4 is provided with a blowing fan 15, the blowing fan 15 is fixedly connected with the mounting fixing plate 4.
Further, the inside opposite side of main part support 1 is installed and is put thing backup pad 16, the upper end of putting thing backup pad 16 is installed and is put thing rotor plate 17, it is connected through the bearing with putting thing backup pad 16 to put thing rotor plate 17, put the upper end of thing rotor plate 17 and install cushion rubber pad 18, cushion rubber pad 18 with put thing rotor plate 17 fixed connection, rubber platform 19 is installed to cushion rubber pad 18's upper end, installation cushion rubber pad 18 can play the effect of support, the device of being convenient for absorbs water, guarantee the functional complete of device, rubber platform 19 and cushion rubber pad 18 fixed connection, it drives thing motor 23 to install the lower extreme of putting thing backup pad 16, it drives thing motor 23 and puts thing backup pad 16 and passes through the coupling joint to drive thing motor.
Further, mounting panel 22 is installed to main part support 1's opposite side, mounting panel 22 and main part support 1 fixed connection, striker plate 20 is installed to mounting panel 22's lower extreme, striker plate 20 passes through the coupling joint with mounting panel 22, adjustment motor 21 is installed to mounting panel 22's upper end, adjustment motor 21 and mounting panel 22 fixed connection, adjustment motor 21 passes through the coupling joint with striker plate 20, installation striker plate 20 can separate the material after handling with unprocessed material.
Further, put the upper end of thing backup pad 16 and install bottom support piece 24, bottom support piece 24 with put thing backup pad 16 fixed connection, upper portion support piece 10 is installed to the inside upper end of installation fixed plate 4, upper portion support piece 10 and 4 fixed connection of installation fixed plate, rotating electrical machines 5 is installed to the upper end of installation fixed plate 4, rotating electrical machines 5 passes through the coupling joint with rotatory top board 6, installation bottom support piece 24 and upper portion support piece 10 can play the effect of support.
The working principle is as follows: when the device is used, a worker places materials on the upper end of the rubber table 19, the storage rotating plate 17 rotates to move the materials into the device, the push rod 3 is controlled to extend to remove the impurities outside the materials from the drying water absorption layer 8 and the water absorption fluff 9, the storage rotating plate 17 rotates to continue rotating, the push rod 3 is controlled to retract, the upper pressing plate 6 rotates for a certain angle, the blowing fan 15 blows hot air to the upper ends of the drying water absorption layer 8 and the water absorption fluff 9 to dry the drying water absorption layer, the impurity outlet brush 13 rotates to remove the impurities on the upper ends of the drying water absorption layer 8 and the water absorption fluff 9, and continuous impurity removal can be realized by continuously repeating the operations, the device is provided with the upper screen plate 2 to play a role in supporting and ventilating, the wet and hot air is rapidly discharged, the inside of the device is kept dry, the functionality of the device is ensured to be complete, the rotary upper pressing plate 6 is arranged to be matched with the control push rod 3 to enable the device to utilize the water absorption layer 8 and the water absorption fluff 9, carry out the edulcoration to the material, get rid of the outside dust of material and coolant liquid fast, avoid material pollution, influence the material quality, installation heating pipe 12 can the heated air, make hot-air rapid draing absorb water layer 8 and absorb water fine hair 9, guarantee the functional complete of device, install out miscellaneous brush 13 and can get rid of the dry layer 8 that absorbs water and absorb water the debris of fine hair 9 lower extreme fast, make it keep clean, the result of use of reinforcing device, installation cushion rubber pad 18 can play the effect of support, the device of being convenient for absorbs water, guarantee the functional complete of device, installation striker plate 20 can separate the material after handling with unprocessed material, installation bottom support piece 24 and upper portion support piece 10 can play the effect of support.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.

Claims (6)

1. The utility model provides a wafer processingequipment with protect function, includes main part support (1), its characterized in that: an upper mesh plate (2) is installed on one side of the upper end of a main body support (1), control push rods (3) are installed on two sides of the lower end of the upper mesh plate (2), an installation fixing plate (4) is installed at the lower end of each control push rod (3), a rotary upper pressing plate (6) is installed at the upper end of the interior of the installation fixing plate (4), a rubber layer (7) is installed at the lower end of the rotary upper pressing plate (6), a water absorption layer (8) is installed at the lower end of the rubber layer (7), water absorption fluff (9) is arranged at the lower end of the water absorption layer (8), a heating box (11) is installed at the lower end of the interior of the installation fixing plate (4), a heating pipe (12) is installed inside the heating box (11), a miscellaneous brush (13) is installed at the upper end of the heating box (11), and a scrubbing motor (14) is installed at the upper end of one side of the heating box (11), and a blowing fan (15) is arranged at the lower end of the mounting fixing plate (4).
2. The wafer processing apparatus with protection function as claimed in claim 1, wherein: the utility model discloses a storage device, including main body support (1), main body support, thing backup pad (16) are installed to inside opposite side of main body support (1), the upper end of putting thing backup pad (16) is installed and is put thing rotor plate (17), put thing rotor plate (17) and put thing backup pad (16) and pass through the bearing and be connected, put the upper end of thing rotor plate (17) and install cushion rubber pad (18), cushion rubber pad (18) with put thing rotor plate (17) fixed connection, rubber platform (19) are installed to the upper end of cushion rubber pad (18), the lower extreme of putting thing backup pad (16) is installed and is driven thing motor (23), it passes through the coupling joint with putting thing backup pad (16) to drive thing motor (23).
3. The wafer processing apparatus with protection function as claimed in claim 1, wherein: mounting panel (22) are installed to the opposite side of main part support (1), mounting panel (22) and main part support (1) fixed connection, striker plate (20) are installed to the lower extreme of mounting panel (22), striker plate (20) pass through the coupling joint with mounting panel (22), adjusting motor (21) is installed to the upper end of mounting panel (22), adjusting motor (21) and mounting panel (22) fixed connection, adjusting motor (21) passes through the coupling joint with striker plate (20).
4. The wafer processing apparatus with protection function as claimed in claim 2, wherein: put the upper end of thing backup pad (16) and install bottom sprag piece (24), bottom sprag piece (24) with put thing backup pad (16) fixed connection.
5. The wafer processing apparatus with protection function as claimed in claim 1, wherein: an upper supporting piece (10) is installed at the upper end inside the installation fixing plate (4), and the upper supporting piece (10) is fixedly connected with the installation fixing plate (4).
6. The wafer processing apparatus with protection function as claimed in claim 1, wherein: the upper end of the installation fixing plate (4) is provided with a rotating motor (5), and the rotating motor (5) is connected with a rotating upper pressing plate (6) through a coupler.
CN202123075495.9U 2021-12-08 2021-12-08 Wafer processing device with protection function Active CN216487972U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202123075495.9U CN216487972U (en) 2021-12-08 2021-12-08 Wafer processing device with protection function

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202123075495.9U CN216487972U (en) 2021-12-08 2021-12-08 Wafer processing device with protection function

Publications (1)

Publication Number Publication Date
CN216487972U true CN216487972U (en) 2022-05-10

Family

ID=81420753

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202123075495.9U Active CN216487972U (en) 2021-12-08 2021-12-08 Wafer processing device with protection function

Country Status (1)

Country Link
CN (1) CN216487972U (en)

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