CN216449892U

CN216449892U - Lithographic apparatus

Info

Publication number: CN216449892U
Application number: CN202122568625.6U
Authority: CN
Inventors: 陈国军; 吴景舟; 马迪
Original assignee: Jiangsu Desheng Intelligent Technology Co ltd
Current assignee: Jiangsu Desheng Intelligent Technology Co ltd
Priority date: 2021-10-25
Filing date: 2021-10-25
Publication date: 2022-05-06
Anticipated expiration: 2031-10-25

Abstract

The utility model relates to the technical field of photoetching, in particular to photoetching equipment, which comprises a machine table assembly, a supporting frame and a photoetching assembly, wherein the machine table assembly comprises a reference table and an object carrying plate, the object carrying plate is arranged on the reference table, and the object carrying plate is used for placing a workpiece to be machined; the support frame is arranged on the reference table, and the support frame and the object carrying plate can move relatively along a first direction; the photoetching assembly is arranged on the supporting frame and used for projecting photoetching light spots, the photoetching assembly and the carrying plate can move relatively along a second direction, and the second direction and the first direction form an included angle. Compared with the photoetching equipment which can only move the photoetching in one direction in the prior art, the photoetching equipment provided by the utility model can move the photoetching assembly in two directions to carry out photoetching, so that the photoetching efficiency is higher.

Description

Lithographic apparatus

Technical Field

The utility model relates to the technical field of photoetching, in particular to photoetching equipment.

Background

A lithographic apparatus generally includes a machine table on which a stage is arranged, a beam frame on which a workpiece to be processed is arranged, a lithographic system arranged on the beam frame, a stage, a motion system, and a position control system. And the photoetching system and the carrying platform move relatively to realize photoetching. The photoetching equipment in the prior art can only provide relative movement in one direction for photoetching, and the photoetching efficiency is low.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide a photoetching device which can carry out photoetching on a workpiece to be processed by relative movement from two directions and has higher photoetching efficiency.

In order to achieve the purpose, the utility model adopts the following technical scheme:

a lithographic apparatus, comprising:

the machine table assembly comprises a reference table and an object carrying plate, wherein the object carrying plate is arranged on the reference table and is used for placing a workpiece to be machined;

the supporting frame is arranged on the reference table, and the supporting frame and the objective plate can relatively move along a first direction;

the photoetching assembly is arranged on the support frame and used for projecting photoetching light spots, the photoetching assembly and the carrying plate can move relatively along a second direction, and the second direction and the first direction form an included angle.

Preferably, during the relative movement of the lithography component and the carrier plate along the second direction, a plurality of lithography light spots can be projected.

Preferably, the photoetching device further comprises a first driving assembly, wherein the first driving assembly comprises a first rotating motor, a first transmission piece and a first driven wheel, the first rotating motor and the first driven wheel are respectively arranged at two ends of the supporting frame in the length direction, the first transmission piece is in transmission connection with the first rotating motor and the first driven wheel and is fixedly connected with the photoetching assembly, and the first rotating motor drives the first transmission piece to drive the photoetching assembly to move relative to the object carrying plate along the second direction.

Preferably, the first transmission member is a belt or a chain.

Preferably, the device further comprises a second driving assembly, the second driving assembly comprises a second rotating motor, a second transmission piece and a second driven wheel, the second rotating motor is arranged at two ends of the length direction of the reference table, the second driven wheel is arranged at two ends of the length direction of the reference table, the second transmission piece is in transmission connection with the second rotating motor and the second driven wheel, the second transmission piece is fixedly connected with the supporting frame, the second rotating motor drives the second transmission piece to drive the supporting frame to move relative to the carrying plate along the first direction, and the second transmission piece is a belt or a chain.

Preferably, the lithographic apparatus further comprises a position reading mechanism for reading movement position data of the first direction relative movement and/or the second direction relative movement.

Preferably, the position reading mechanism is arranged on the support frame for reading the position of the lithography component on the support frame.

Preferably, the position reading mechanism is arranged on the reference table and is used for reading the position of the object plate and/or the support frame on the reference table.

Preferably, the object carrying plate is provided with a mounting hole, and a fixing member passes through the mounting hole and is connected to the reference table to fix the object carrying plate.

Preferably, the support frame is a portal frame.

The utility model has the beneficial effects that: compared with the photoetching equipment which can only move the photoetching in one direction in the prior art, the photoetching equipment provided by the embodiment can move the photoetching assembly in two directions for photoetching, so that the photoetching efficiency is higher.

Drawings

FIG. 1 is a schematic diagram of the overall structure of a lithographic apparatus of the present invention;

FIG. 2 is a schematic diagram of a second drive assembly in a lithographic apparatus according to the present invention.

In the figure:

1. a machine table assembly; 11. a reference table; 12. a loading plate;

2. a support frame;

3. a lithographic assembly;

4. a first drive assembly; 41. a first rotating electrical machine; 42. a first transmission member; 43. a first driven wheel;

5. a second drive assembly; 51. a second rotating electrical machine; 52. a second transmission member; 53. a second driven wheel; 6. a position reading mechanism.

Detailed Description

The technical scheme of the utility model is further explained by combining the attached drawings and the embodiment. It is to be understood that the specific embodiments described herein are merely illustrative of the utility model and are not limiting of the utility model. It should be further noted that, for the convenience of description, only some but not all of the elements associated with the present invention are shown in the drawings.

In the description of the present invention, it should be noted that unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection or a removable connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.

In the present invention, unless expressly stated or limited otherwise, the recitation of a first feature "on" or "under" a second feature may include the recitation of the first and second features being in direct contact, and may also include the recitation that the first and second features are not in direct contact, but are in contact via another feature between them. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.

As shown in fig. 1, the embodiment provides a lithographic apparatus, which includes a stage assembly 1, a support frame 2, and a lithographic assembly 3, wherein the stage assembly 1 includes a reference stage 11 and a stage plate 12, the stage plate 12 is disposed on the reference stage 11, and the stage plate 12 is used for placing a workpiece to be processed; the support frame 2 is arranged on the reference table 11, and the support frame 2 and the object carrying plate 12 can move relatively along a first direction; the lithography component 3 is arranged on the support frame 2 and used for projecting lithography light spots, the lithography component 3 and the object carrying plate 12 can move relatively along a second direction, the second direction and the first direction form an included angle, and further, the included angle is a right angle in the embodiment.

Compared with the prior art in which the lithography device can only move in one direction, the lithography device provided by the embodiment can move the lithography component 3 in two directions to perform lithography, so that the lithography efficiency is higher.

In particular, the lithographic assembly 3 and the carrier plate 12 are capable of projecting a plurality of lithographic spots during relative movement in the second direction, the shape of the lithographic spots varying in accordance with the frame image of the actual lithography, and further the lithographic assembly 3 comprises a processor and a projector. The processor divides the large-size photoetching pattern into a plurality of strip graphs, then generates a plurality of frame images according to the size of the light spot by each strip graph, and then transmits corresponding frame image data to the projector by combining the time, displacement or position of the movement of the photoetching assembly 3, and the projector generates photoetching light spots with specific shapes.

Specifically, the lithography apparatus further comprises a first driving assembly 4, the first driving assembly 4 comprises a first rotating motor 41, a first transmission member 42 and a first driven wheel 43, the first rotating motor 41 and the first driven wheel 43 are respectively disposed at two ends of the support frame 2 in the length direction, the first transmission member 42 is in transmission connection with the first rotating motor 41 and the first driven wheel 43, the first transmission member 42 is fixedly connected with the lithography assembly 3, the first rotating motor 41 drives the first transmission member 42 to drive the lithography assembly 3 to move along the second direction relative to the carrying plate 12, further, the first transmission member 42 is a belt or a chain, in this embodiment, the first transmission member 42 is a belt, compared with the prior art in which the lithography assembly 3 is driven by a linear motor, the lithography apparatus provided in this embodiment drives the belt by a rotating motor, drives the lithography assembly 3 by a belt, and the manufacturing cost is low, and because the rotating electrical machines and all install at the outer peripheral face of support frame 2 from the driving wheel for it is more convenient to install or maintain the rotating electrical machines.

Specifically, the device further comprises a second driving assembly 5, wherein the second driving assembly 5 includes a second rotating motor 51, a second transmission element 52 and a second driven wheel 53, the second rotating motor 51 and the second driven wheel 53 are respectively disposed at two ends of the length direction of the reference table 11, the second transmission element 52 is in transmission connection with the second rotating motor 51 and the second driven wheel 53, the second transmission element 52 is fixedly connected with the support frame 2, the second rotating motor 51 drives the second transmission element 52 to drive the support frame 2 to move along the first direction relative to the object carrying plate 12, the second transmission element 52 is a belt or a chain, in this embodiment, the second transmission element 52 is also a belt, and the support frame 2 is driven to move smoothly and noiselessly.

In particular, the lithographic apparatus further comprises a position reading mechanism 6 for reading movement position data of the first direction relative movement and/or the second direction relative movement.

Further, in this embodiment, the position reading mechanism 6 is disposed on the support frame 2, and is configured to read the position of the lithography component 3 on the support frame 2, and feed back the position of the lithography component 3 in real time to calculate the error in the lithography process.

Further, as a preferable mode of the present embodiment, the position reading mechanism 6 is provided on the reference table 11 for reading the position of the object plate 12 and/or the support frame 2 on the reference table 11.

Specifically, the object carrying plate 12 is provided with a mounting hole, and the fixing member passes through the mounting hole and is connected to the reference table 11 so as to fix the object carrying plate 12, thereby preventing the object carrying plate 12 of the to-be-tested piece from moving relative to the base plate in the photoetching process to cause the photoetching position deviation of the to-be-processed piece and influence the photoetching effect.

Specifically, the support frame 2 is a gantry frame, the gantry frame is arranged on two sides of the object carrying plate 12 on the reference table 11, and the gantry frame and the object carrying plate 12 do not interfere with each other in the sliding process.

The specific operation method of the lithographic apparatus of this embodiment is: firstly, the photoetching assembly 3 is adjusted to one end above the workpiece to be processed, a plurality of workpieces to be processed are arranged on the machine table assembly 1 at intervals along a first direction, photoetching equipment is started, the photoetching assembly 3 slides along a second direction to perform photoetching operation on the workpiece to be processed, after the photoetching operation is completed, the supporting frame 2 slides along the first direction, the photoetching assembly 3 is moved to the position above the next workpiece to be processed, at the moment, the photoetching assembly 3 continues to slide back to the original position along the first direction to perform photoetching on the workpiece to be processed, and the operation is repeated.

Generally, the precision of the rotating motor and the transmission mechanism is low, but in particular, when the motion system moves at a constant speed, the fluctuation of the speed is not large, so that the requirement of scanning motion can be met, but due to the elastic extension of the belt, the error needs to be compensated in the stepping motion.

A position control system is also required in the lithographic apparatus to assist in controlling the position of the lithographic assembly 3, and the operating principle is the same as in the prior art. The precision of the movement of the rotating motor driving belt is ensured by means of error compensation. Given a position point x, the position control system reads the position point x at which the actual lithography assembly 3 is located and calculates the error Δ x value. The compensation value x is calculated through multiple experiments, the movement of the photoetching assembly 3 is compensated according to x, and the photoetching assembly is set to factory settings.

It should be understood that the above-described embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.

Claims

1. A lithographic apparatus, comprising:

the machine table assembly (1) comprises a reference table (11) and an object carrying plate (12), wherein the object carrying plate (12) is arranged on the reference table (11), and the object carrying plate (12) is used for placing a workpiece to be machined;

the support frame (2) is arranged on the reference table (11), and the support frame (2) and the object carrying plate (12) can move relatively along a first direction;

the photoetching assembly (3) is arranged on the support frame (2) and used for projecting photoetching light spots, the photoetching assembly (3) and the object carrying plate (12) can move relatively along a second direction, and the second direction and the first direction form an included angle.

2. The lithographic apparatus according to claim 1, wherein a plurality of lithographic spots can be projected during the relative movement of the lithographic assembly (3) and the carrier plate (12) in the second direction.

3. The lithography apparatus according to claim 1, further comprising a first driving assembly (4), wherein the first driving assembly (4) comprises a first rotating motor (41), a first transmission member (42) and a first driven wheel (43), the first rotating motor (41) and the first driven wheel (43) are respectively disposed at two ends of the support frame (2) in the length direction, the first transmission member (42) is in transmission connection with the first rotating motor (41) and the first driven wheel (43), the first transmission member (42) is fixedly connected with the lithography assembly (3), and the first rotating motor (41) drives the first transmission member (42) to drive the lithography assembly (3) to move along the second direction relative to the object carrying plate (12).

4. A lithographic apparatus according to claim 3, wherein the first transmission member (42) is a belt or a chain.

5. The lithography apparatus according to claim 1, further comprising a second driving assembly (5), wherein the second driving assembly (5) comprises a second rotating motor (51), a second transmission member (52) and a second driven wheel (53), the second rotating motor (51) and the second driven wheel (53) are respectively disposed at two ends of the reference table (11) in the length direction, the second transmission member (52) is in transmission connection with the second rotating motor (51) and the second driven wheel (53), the second transmission member (52) is fixedly connected with the support frame (2), the second rotating motor (51) drives the second transmission member (52) to drive the support frame (2) to move along the first direction relative to the object carrying plate (12), and the second transmission member (52) is a belt or a chain.

6. The lithographic apparatus according to claim 1, further comprising a position reading mechanism (6) for reading movement position data of the first direction relative movement and/or the second direction relative movement.

7. A lithographic apparatus according to claim 6, wherein the position reading mechanism is provided on the support frame (2) for reading the position of the lithographic assembly (3) on the support frame (2).

8. Lithographic apparatus according to claim 6, wherein the position reading mechanism is arranged on the reference table (11) for reading the position of the object plate (12) and/or support frame (2) on the reference table (11).

9. The lithographic apparatus according to claim 1, wherein the object plate (12) is provided with mounting holes through which fasteners are connected to the reference stage (11) for fastening the object plate (12).

10. The lithographic apparatus according to claim 1, wherein the support frame (2) is a gantry.