CN216378482U - Resistance furnace internal gas environment adjusting system - Google Patents
Resistance furnace internal gas environment adjusting system Download PDFInfo
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- CN216378482U CN216378482U CN202122533538.7U CN202122533538U CN216378482U CN 216378482 U CN216378482 U CN 216378482U CN 202122533538 U CN202122533538 U CN 202122533538U CN 216378482 U CN216378482 U CN 216378482U
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Abstract
The utility model discloses a system for regulating the internal gas environment of a resistance furnace; comprises a gas storage bottle, a flow meter, an inflation valve, a stop valve and a pressure stabilizing valve; the gas storage bottle is sequentially connected with the flow meter and the inflation valve, the inflation valve is communicated with the hearth through an air inlet pipeline, the stop valve is communicated with the hearth through an air outlet pipeline, and the rear end of the stop valve is connected with the pressure stabilizing valve; through this scheme can reduce the interior volatilization influence crystal quality that leads to because of the unfavorable gas that produces under the high temperature, effectual reduction crystal scattering defect, the use of parts such as the protection stove interior temperature field simultaneously prolongs the life of each part.
Description
Technical Field
The utility model relates to the technical field of crystal growth, in particular to a system for regulating the internal gas environment of a resistance furnace.
Background
When a resistance furnace grows crystals, the furnace body filled with the furnace is vacuumized, and inert gas argon and a small amount of carbon dioxide are filled into the furnace body to protect parts such as a heating device, a temperature field and the like in the furnace, so that the crystals grow in a relatively stable environment.
However, trace air remaining after the furnace is vacuumized in the growth process and graphite devices, temperature field devices and raw materials (raw materials are mainly oxides) can generate trace oxygen and other gases at high temperature, the graphite and the oxygen can cause graphite volatilization (volatile matters are more and more along with the growth time) at high temperature and generate a small amount of carbon monoxide and carbon dioxide which are all factors unfavorable for crystal growth, and not only can the loss of temperature field components be accelerated, but also the main factor of scattering defects in the crystal growth process can be generated.
Experience of crystal growth for many years shows that the crystal growth process with a large amount of volatile matters in a furnace (the loss of a graphite device is serious) is not well controlled, and most of the obtained crystals are relatively serious in scattering. Often, the scattering at the upper section of the crystal is more severe than at the lower section, and very few crystals can be obtained without any scattering. The analysis reason is mainly that the oxygen amount generated by the raw material (oxide) in the early growth stage of the crystal at high temperature is relatively large, and the oxygen amount is gradually consumed and reduced in the later growth stage, so that the scattering of the next stage is less.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide the adjustment system for the internal gas environment of the resistance furnace aiming at the defects, and solves the problem that impurity gas causes scattering defects in the crystal growth process in the prior art.
The scheme is realized as follows:
a gas environment adjusting system in a resistance furnace comprises a gas storage bottle, a flow meter, an inflation valve, a stop valve and a pressure stabilizing valve; the gas storage cylinder is sequentially connected with the flow meter and the inflation valve, the inflation valve is in through connection with the hearth through an air inlet pipeline, the stop valve is in through connection with the hearth through an air outlet pipeline, and the rear end of the stop valve is connected with the pressure stabilizing valve.
Based on the above structure of the system for regulating the gas environment in the resistance furnace, the rear end of the pressure stabilizing valve is provided with a gas absorption device.
Based on the structure of the gas environment adjusting system in the resistance furnace, the gas absorbing device can be a gas inlet pipe, a gas outlet pipe and a liquid storage bottle, the gas inlet pipe is connected with a pressure stabilizing valve, and gas coming out of the pressure stabilizing valve is directly introduced into the gas absorbing device; the air inlet pipe extends to the position below the liquid level of the liquid storage bottle, and the air outlet pipe is arranged above the liquid level.
Based on above-mentioned resistance furnace inside gas environment governing system structure, the gas bomb is the argon gas bottle, and inside storage gas is the argon gas.
Based on the above structure of the system for adjusting the internal gas environment of the resistance furnace, the gas inlet pipeline and the gas outlet pipeline are respectively symmetrical.
Based on the above-mentioned resistance furnace inside gas environment governing system structure, be provided with the receiving flask behind the gas absorbing device.
Based on the above-mentioned resistance furnace internal gas environment governing system structure, can also set up the gas disturbance device in the furnace, the gas disturbance device is electric fan.
Compared with the prior art, the utility model has the beneficial effects that:
1. through this scheme can reduce the interior volatilization influence crystal quality that leads to because of the unfavorable gas that produces under the high temperature, effectual reduction crystal scattering defect, the use of parts such as the protection stove interior temperature field simultaneously prolongs the life of each part.
Drawings
FIG. 1 is a schematic structural view of the present invention as a whole;
fig. 2 is a schematic structural view of a gas absorption device:
in the figure: 1. a gas cylinder; 2. a flow meter; 3. an inflation valve; 4. a stop valve; 5. a pressure maintaining valve; 61. an air inlet pipe; 62. an air outlet pipe; 63. a liquid storage bottle; 7. a collection bottle; 8. a hearth; 81. an air intake line; 82. and an air outlet pipeline.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the utility model and are not intended to limit the utility model.
In the description of the present invention, it is to be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships illustrated in the drawings, and are used merely for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, are not to be construed as limiting the present invention. Further, in the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
Example 1
Referring to fig. 1' 2, the present invention provides a technical solution:
the inventors have conducted research and development based on the following ideas;
if the gases which are unfavorable for the crystal growth in the furnace body are reduced as much as possible or discharged from the furnace body in the growth process, the crystal grows in a relatively stable atmosphere, and whether more high-quality crystal wools with little or no scattering can be obtained or not can be obtained.
The reduction of these gases (volatile matters) which are not beneficial to growth is mainly determined by the vacuum degree of the furnace body and the state of the raw materials in the crucible (the raw materials do not overflow out of the crucible), the volatilization is increased, and the vacuum reaches the required value before the furnace is started, so the furnace can be normally started. In the case where there is no abnormality in the vacuum of the furnace, the raw material, and various growth indexes, it is almost impossible to reduce the amount of gas which is generated at high temperature and is not favorable for growth. What we can do is to exhaust the gases unfavorable for growth out of the furnace body as much as possible, how do the gases unfavorable for growth out of the furnace body? The gas which is originally sealed in the furnace body flows, inert gas argon is filled into the furnace body under the condition of ensuring normal furnace pressure (+ about 25 Kpa) of crystal growth, and the diluted gas is continuously discharged out of the furnace body under the condition of ensuring the furnace pressure, so that the content of gas which is unfavorable for growth in the furnace body can be effectively reduced;
and then proposed this scheme:
a system for regulating the gas environment in a resistance furnace; comprises a gas storage bottle 1, a flowmeter 2, an inflation valve 3, a stop valve 4 and a pressure stabilizing valve 5; the gas storage bottle 1 is sequentially connected with the flow meter 2 and the inflation valve 3, the inflation valve 3 is communicated with the hearth 8 through an air inlet pipeline 81, the stop valve 4 is communicated with the hearth 8 through an air outlet pipeline 82, and the rear end of the stop valve 4 is connected with the pressure stabilizing valve 5;
the gas storage cylinder 1 is filled with inert gas, preferably an argon gas cylinder in the embodiment, and the internal storage gas is argon gas;
based on the structure, the inertia is slowly charged into the hearth 8 through the charging valve 3 according to a certain flow and is rapidly and fully mixed and diluted with the original gas (including the gas which is not beneficial to crystal growth) in the hearth 8, at the moment, the air pressure in the hearth 8 can gradually rise along with the increase of the charging quantity, when the furnace pressure rises to the required air pressure set by the pressure stabilizing valve 5, the pressure stabilizing valve 5 can be automatically opened, and the pressure stabilizing valve 5 can discharge the mixed (diluted gas which is not beneficial to crystal growth) redundant gas out of the hearth 8 and stabilize the gas pressure required by the normal crystal growth; the crystal can grow in an ideal gas environment, and the purposes of reducing scattering and improving the internal quality of the crystal are achieved.
The flowmeter 2 is used for recording the flow rate of gas rushing into the hearth 8, so that the pressure in the hearth 8 can be monitored conveniently.
A gas absorption device can be arranged at the rear end of the pressure stabilizing valve 5, the gas absorption device absorbs impurities and recycles inert gas, and the use cost of the whole body is reduced;
the inlet pipeline 81 and the outlet pipeline 82 are respectively symmetrical.
The gas absorption device can be a water absorption device, as shown in the figure, the gas absorption device can be a gas inlet pipe 61, a gas outlet pipe 62 and a liquid storage bottle 63, the gas inlet pipe 61 is connected with the pressure stabilizing valve 5, and gas from the pressure stabilizing valve 5 is directly introduced into the gas absorption device; the gas inlet pipe 61 extends to the position below the liquid level of the liquid storage bottle 63, the gas outlet pipe 62 is arranged above the liquid level, impurities in the inert gas are absorbed through the medicament, and then the gas is transmitted to the rear end from the gas outlet pipe 62;
and a collecting bottle 7 is arranged behind the gas absorption device, and the inert gas can be recycled after the collecting bottle 7 is listened.
A gas disturbance device can be arranged in the hearth 8 and can be an electric fan, and the gas flow in the hearth 8 can be disturbed in an acceleration mode through the electric fan, so that the inert gas and the impurity gas are mixed.
Through this scheme can reduce the interior volatilization influence crystal quality that leads to because of the unfavorable gas that produces under the high temperature, effectual reduction crystal scattering defect, the use of parts such as the protection stove interior temperature field simultaneously prolongs the life of each part.
The present invention is not limited to the above preferred embodiments, and any modifications, equivalent substitutions and improvements made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (7)
1. The utility model provides an inside gaseous environment governing system of resistance furnace which characterized in that: comprises a gas storage bottle, a flow meter, an inflation valve, a stop valve and a pressure stabilizing valve; the gas storage cylinder is sequentially connected with the flow meter and the inflation valve, the inflation valve is in through connection with the hearth through an air inlet pipeline, the stop valve is in through connection with the hearth through an air outlet pipeline, and the rear end of the stop valve is connected with the pressure stabilizing valve.
2. The system for regulating the internal gas environment of the electric resistance furnace according to claim 1, wherein: and a gas absorption device is arranged at the rear end of the pressure stabilizing valve.
3. The system for adjusting the internal gas environment of the electric resistance furnace according to claim 2, wherein: the gas absorption device can be a gas inlet pipe, a gas outlet pipe and a liquid storage bottle, the gas inlet pipe is connected with a pressure stabilizing valve, and gas from the pressure stabilizing valve is directly introduced into the gas absorption device; the air inlet pipe extends to the position below the liquid level of the liquid storage bottle, and the air outlet pipe is arranged above the liquid level.
4. The system for adjusting the internal gas environment of the electric resistance furnace according to claim 3, wherein: the gas storage bottle is an argon bottle, and the internal storage gas is argon.
5. The system for adjusting the internal gas environment of the electric resistance furnace according to claim 4, wherein: the air inlet pipeline and the air outlet pipeline are respectively symmetrical.
6. The system for adjusting the internal gas environment of the electric resistance furnace according to claim 5, wherein: and a collecting bottle is arranged behind the gas absorption device.
7. The system for adjusting the internal gas environment of the electric resistance furnace according to claim 6, wherein: a gas disturbance device can be further arranged in the hearth and is an electric fan.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122533538.7U CN216378482U (en) | 2021-10-20 | 2021-10-20 | Resistance furnace internal gas environment adjusting system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122533538.7U CN216378482U (en) | 2021-10-20 | 2021-10-20 | Resistance furnace internal gas environment adjusting system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216378482U true CN216378482U (en) | 2022-04-26 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122533538.7U Active CN216378482U (en) | 2021-10-20 | 2021-10-20 | Resistance furnace internal gas environment adjusting system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216378482U (en) |
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2021
- 2021-10-20 CN CN202122533538.7U patent/CN216378482U/en active Active
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| TR01 | Transfer of patent right |
Effective date of registration: 20221026 Address after: 610207 No. 627, floor 6, building 1, No. 1388, middle section of Tianfu Avenue, high tech Zone, Chengdu, Sichuan Patentee after: YAGCRYSTAL Inc. Patentee after: Chengdu Jingradium Optoelectronics Co.,Ltd. Address before: 610207 No. 627, floor 6, building 1, No. 1388, middle section of Tianfu Avenue, high tech Zone, Chengdu, Sichuan Patentee before: YAGCRYSTAL Inc. |