CN216262456U

CN216262456U - Cleaning device of wafer storage bin

Info

Publication number: CN216262456U
Application number: CN202122383915.3U
Authority: CN
Inventors: 黄海荣; 谢柏弘
Original assignee: Shenzhen Yuanrong Semiconductor Equipment Co ltd
Current assignee: Shenzhen Yuanrong Semiconductor Equipment Co ltd
Priority date: 2021-09-29
Filing date: 2021-09-29
Publication date: 2022-04-12
Anticipated expiration: 2031-09-29

Abstract

The utility model relates to the field of wafer processing, in particular to a cleaning device for a wafer storage bin. It includes storage box, wafer rack, door shrouding, air knife, storage bottom of the case portion is equipped with platform, suction opening, the inside hollow convulsions cavity that is of platform, the outer wall of platform and the inner wall of storage box constitute clean cavity, the wafer rack sets up on the platform, the platform surface is equipped with the platform through-hole, convulsions cavity and clean cavity pass through the platform through-hole intercommunication, suction opening and convulsions cavity intercommunication, the door shrouding is connected and is covered the side at storage box, the air knife is connected the framework of storage box and is located the junction of AND gate shrouding. This device is through drawing air to the internal ground of hutch, and the cooperation air knife lets in clean inert gas to the formation air barrier of door shrouding junction, has kept the internal gaseous cleanness of hutch, avoids the wafer secondary to be polluted.

Description

Cleaning device of wafer storage bin

Technical Field

The utility model relates to the field of wafer processing, in particular to a cleaning device for a wafer storage bin.

Background

The wafer storage link can be involved in the wafer process manufacturing process, and the use performance of the wafer can be influenced after the surface of the wafer is polluted, so the requirement on the environmental cleanliness degree in the wafer processing process is high, but the problem of environmental pollution is easily ignored in the link of storing the processed wafer. The conventional wafer storage only considers the function of convenient storage and does not consider the problem of clean environment during the storage process, so that the wafers may be secondarily polluted.

SUMMERY OF THE UTILITY MODEL

The utility model provides a cleaning device for a wafer storage bin, and aims to solve the problem that a wafer is easily subjected to secondary pollution in the storage process.

The utility model provides a cleaning device of a wafer storage bin, which comprises a storage box body, a wafer placing frame, a door sealing plate and an air knife, wherein a platform and an air suction opening are arranged at the bottom of the storage box body, a hollow air suction cavity is arranged inside the platform, the outer wall of the platform and the inner wall of the storage box body form a clean cavity, the wafer placing frame is arranged on the platform, a platform through hole is formed in the surface of the platform, the air suction cavity and the clean cavity are communicated through the platform through hole, the air suction opening is communicated with the air suction cavity, the door sealing plate is connected with and covers one side face of the storage box body, and the air knife is connected to a frame body of the storage box body and is positioned at the joint of the door sealing plate.

As a further improvement of the utility model, the wafer placing rack comprises a plurality of placing panels, the placing panels are horizontally arranged on the wafer placing rack at equal intervals, and the side edge of each placing panel is provided with a dislocation groove which is sunken towards the center of the placing panel.

As a further improvement of the utility model, the center of each placing panel is provided with a panel through hole.

As a further improvement of the utility model, the wafer placing frame comprises a wafer supporting strip, the placing panel is connected with a plurality of wafer supporting strips, the plurality of wafer supporting strips form a plane for placing wafers, each wafer supporting strip extends from the center of the placing panel to the side edge of the placing panel, and the tail end of each wafer supporting strip is provided with a limiting lug.

As a further improvement of the utility model, the contact surface of the wafer support strip and the wafer is provided with a rib, and the wafer is contacted with the tip part of the rib.

As a further improvement of the utility model, two air knives are oppositely arranged on a frame body of the storage box body, each air knife comprises an air blowing cavity, the air blowing cavities shrink towards one side to form air blowing openings, and the air blowing openings of the two opposite air knives oppositely blow air to form an air barrier.

As a further improvement of the utility model, the gas blown out by the air knife is inert gas.

As a further improvement of the present invention, the door sealing plate is detachably attached to a side surface of the storage case.

The utility model has the beneficial effects that: this device is through drawing air to the internal ground of hutch, and the cooperation air knife lets in clean inert gas to the formation air barrier of door shrouding junction, has kept the internal gaseous cleanness of hutch, avoids the wafer secondary to be polluted.

Drawings

FIG. 1 is a perspective view of a cleaning apparatus for a wafer storage bin according to the present invention;

FIG. 2 is a top view of the cleaning apparatus for a wafer storage bin according to the present invention;

FIG. 3 is a perspective view of the wafer holder of the present invention;

FIG. 4 is a front view of a portion of the wafer holder of the present invention;

FIG. 5 is a top view of the wafer stage of the present invention;

FIG. 6 is a partial structure view of the air knife of the present invention.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments.

The device is used for the wafer process manufacturing process and can be used for the wafer storage link. As shown in fig. 1 to 6, the cleaning device for a wafer storage bin of the present invention comprises a storage box 1, a wafer placing frame 2, a door sealing plate 3, and an air knife 4, wherein a platform 5 and an air suction opening 6 are arranged at the bottom of the storage box 1, a hollow air suction cavity is arranged inside the platform 5, the outer wall of the platform 5 and the inner wall of the storage box 1 form a clean cavity, the wafer placing frame 2 is arranged on the platform 5, a platform through hole 51 is arranged on the surface of the platform 5, the air suction cavity and the clean cavity are communicated through the platform through hole 51, the air suction opening 6 is communicated with the air suction cavity, the door sealing plate 3 is connected to and covers one side surface of the storage box 1, the air knife 4 is connected to the frame of the storage box 1 and is located at the connection position of the door sealing plate 3, and the door sealing plate 3 is detachably connected to the side surface of the storage box 1.

The wafer placing frame 2 is a bracket directly used for placing wafers, the storage box body 1 is a structure for constructing a clean environment, when the door sealing plate 3 covers the side face of the storage box body, the air knife 4 always blows clean air outwards to fill the inner cavity of the whole storage box body 1, so that the wafers are in a clean environment, and the air suction opening 6 continuously discharges the air in the storage box body 1 outwards to form a gas flow process. The plurality of platform through holes 51 on the surface of the platform 5 also enable clean gas to flow through the clean cavity and the air exhaust cavity and then be exhausted.

As shown in fig. 3 to 5, the wafer placing rack 2 includes a plurality of placing panels 7, the placing panels 7 are horizontally disposed on the wafer placing rack 2 at equal intervals, and a dislocation groove 71 recessed toward the center of the placing panel is disposed on a side of each placing panel 7. Each of the centers of the placement panels 7 is provided with a panel through-hole 72. Each placing panel 7 can be used for placing a wafer, and the wafer placing frame 2 can be used for placing a plurality of wafers at one time through the multi-layer placing panel 7 structure. The design of placing panel 7 dislocation groove can reserve the space for the transport of wafer, conveniently gets and puts, has also reduced the area that blocks of placing panel 7 wafer when placing, makes the wafer have abundant area contact clean gas.

Wafer rack 2 includes wafer support bar 8, places and is connected with many wafer support bars 8 on the panel, and a plurality of wafer support bars 8 constitute the plane of placing the wafer, and every wafer support bar 8 is extended to the side of placing panel 7 by the center of placing panel 7, and the end of every wafer support bar 8 is equipped with spacing lug 81. As shown in fig. 4, the contact surface of the wafer support strip 8 and the wafer is provided with ribs 82, and the wafer contacts with the tips of the ribs 82. Wafer support bar 8 is used for the direct contact wafer, erects the wafer and avoids its surface direct contact to place panel 7, has reduced area of contact, and limiting lug 81's the locating position of wafer avoids the wafer to take place to slide when placing and drops, and arris strip 82 reduces the area of contact with the wafer again on wafer support bar 8 basis, reduces the pollution to the wafer surface.

As shown in fig. 1 and 6, two air knives 4 are oppositely arranged on the frame of the storage box 1, each air knife 4 comprises an air blowing cavity 41, the air blowing cavities 41 shrink to one side to form air blowing openings 42, and the air blowing openings 42 of the two opposite air knives 4 oppositely blow air to form an air barrier. The air blown by the air knife 4 is inert gas. The air barriers formed by oppositely blowing the air blowing openings 42 of the two air knives 4 can prevent the space outside the door sealing plate 3 after being opened from entering the storage box body to pollute the wafer, meanwhile, the inert gas can be prevented from reacting with the wafer, and can also be isolated from contacting with other air molecules, so that the effective protection effect is achieved.

The operation action of the device is as follows: before the wafer is placed into the wafer placing frame 2, the door sealing plate 3 of the wafer storage box body 1 is not opened, the air suction opening 6 does not suck air, the inert gas air knife is opened, and the wafer is kept under the protection of inert gas; when wafers are to be stored, the door sealing plate 3 of the storage box body 1 is opened, the wafer placing frame 2 is placed, then the door sealing plate 3 of the storage box body 1 is closed, and finally the air suction opening 6 is opened to suck air for a certain time to keep the air in the storage box body 1 flowing.

The foregoing is a more detailed description of the utility model in connection with specific preferred embodiments and it is not intended that the utility model be limited to these specific details. For those skilled in the art to which the utility model pertains, several simple deductions or substitutions can be made without departing from the spirit of the utility model, and all shall be considered as belonging to the protection scope of the utility model.

Claims

1. The utility model provides a clean device of wafer storage silo, its characterized in that, including storage box, wafer rack, door shrouding, air knife, storage bottom half is equipped with platform, suction opening, the inside hollow convulsions cavity that is of platform, the outer wall of platform and the inner wall of storage box constitute clean cavity, the wafer rack sets up on the platform, the platform surface is equipped with the platform through-hole, convulsions cavity and clean cavity pass through the platform through-hole intercommunication, suction opening and convulsions cavity intercommunication, the door shrouding is connected and is covered in a side of storage box, the air knife is connected the framework of storage box and is located the junction of AND gate shrouding.

2. The cleaning device for the wafer storage bin as claimed in claim 1, wherein the wafer placing frame comprises a plurality of placing panels, the placing panels are horizontally arranged on the wafer placing frame at equal intervals, and the side edge of each placing panel is provided with a dislocation groove which is concave towards the center of the placing panel.

3. The cleaning device for the wafer storage bin as claimed in claim 2, wherein a panel through hole is formed in the center of each placing panel.

4. The cleaning device for the wafer storage bin as claimed in claim 2, wherein the wafer placing frame comprises a plurality of wafer supporting strips, the placing panel is connected with a plurality of wafer supporting strips, the plurality of wafer supporting strips form a plane for placing the wafer, each wafer supporting strip extends from the center of the placing panel to the side edge of the placing panel, and the tail end of each wafer supporting strip is provided with a limiting bump.

5. The cleaning device for the wafer storage bin as claimed in claim 4, wherein the contact surface of the wafer supporting strip and the wafer is provided with a rib, and the wafer is in contact with the tip of the rib.

6. The cleaning device for the wafer storage bin as claimed in claim 1, wherein two air knives are oppositely arranged on the frame body of the storage box body, each air knife comprises an air blowing cavity, the air blowing cavities shrink towards one side to form air blowing openings, and the air blowing openings of the two opposite air knives oppositely blow air to form an air barrier.

7. The cleaning device for the wafer storage bin as claimed in claim 6, wherein the air blown by the air knife is inert gas.

8. The cleaning apparatus for a wafer storage silo as defined in claim 1, wherein the door closing plate is detachably attached to a side surface of the storage box.