CN216206055U - Optical film thickness monitoring system - Google Patents
Optical film thickness monitoring system Download PDFInfo
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- CN216206055U CN216206055U CN202122390742.8U CN202122390742U CN216206055U CN 216206055 U CN216206055 U CN 216206055U CN 202122390742 U CN202122390742 U CN 202122390742U CN 216206055 U CN216206055 U CN 216206055U
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Abstract
The utility model relates to an optical film thickness monitoring system, wherein a light source emitting end and/or a light receiving end of a monitoring light path are/is provided with an angle adjusting mechanism, and the angle adjusting mechanism enables the light emitting angle of the light source emitting end and/or the light receiving angle of the light receiving end to be adjustable and forms corresponding matching of positions. The utility model has the advantages that: 1) the problem of transmission interference of a light path can be obviously improved, and the detection precision of direct detection of film forming is improved; 2) the device has strong adaptability and high monitoring precision, and is suitable for various coating umbrella frames and coating products with various surface shapes; 3) the film thickness uniformity of the film-coated product can be detected, and the film-forming process can be correspondingly adjusted according to the detection result, so that the quality of the film-coated product can be improved; 4) the structure is simple and reasonable, the use is convenient, and the monitoring light path can be quickly and accurately adjusted according to the monitoring object and the monitoring position; 5) the automation degree is high, the implementation of automatic control is convenient, and the method is suitable for popularization.
Description
Technical Field
The utility model relates to the technical field of thin film preparation, in particular to an optical film thickness monitoring system.
Background
The optical film thickness monitoring system is an optical detection method for acquiring information such as film thickness on a film-coated product by using the change of detection light before and after passing through the film-coated product. In the actual coating process, the shape of the coating umbrella stand sometimes needs to be changed according to the coating requirements, for example, the change between a plane umbrella stand and a spherical umbrella stand. At this time, the optimal configuration between the monitoring optical path and the coated product needs to be adjusted to achieve the optimal film thickness monitoring effect. However, the monitoring systems currently available have the following problems: 1) the monitoring system has poor adaptability, cannot meet the monitoring requirements of various products of different types, and is easily restricted by equipment; 2) when the detection light penetrates through the coated product, the light path of the detection light is greatly influenced by interference, and the detection precision is not high.
Disclosure of Invention
The utility model aims to provide an optical film thickness monitoring system, which is used for detecting a coated product by arranging an obliquely incident monitoring light path and realizing high-precision detection of the film thickness and the film thickness change of a workpiece in a film forming process.
The purpose of the utility model is realized by the following technical scheme:
the utility model provides a thick monitored control system of optical film, includes light source transmitting terminal and light receiving terminal, form the control light path between light source transmitting terminal and the light receiving terminal, its characterized in that: the light source emitting end and/or the light receiving end of the monitoring light path are/is provided with an angle adjusting mechanism, and the angle adjusting mechanism enables the light emitting angle of the light source emitting end and/or the light receiving angle of the light receiving end to be adjustable and form corresponding position matching.
The angle adjusting mechanism is respectively provided with an angle gauge and an angle debugging table, the angle debugging table is used for adjusting the light emitting angle and/or the light receiving angle, and the angle gauge is used for calibrating the angle value.
The angle adjusting mechanism is installed on the position debugging platform, and the position debugging platform is used for adjusting the position of the angle adjusting mechanism, so that the position of the monitoring light path detection workpiece is adjusted.
The angle debugging platform is installed on the angle instrument, the bottom surface of the angle debugging platform and the top surface of the angle instrument are cambered surfaces which are matched, and sliding fit is formed between the bottom surface of the angle debugging platform and the top surface of the angle instrument.
The angular adjustment range of the light emission angle and/or the light reception angle is less than 90 °.
The angle adjustment range of the light emission angle and/or the light receiving angle is 7-14 degrees.
The monitoring system comprises two or more than two monitoring light paths, and the monitoring light paths are arranged at intervals along the extending direction of a film covering film on a workpiece.
The optical signal of the monitoring optical path is subjected to photoelectric conversion processing and then transmitted to a phase-locked amplifier, the phase-locked amplifier performs noise reduction on the optical signal and transmits the optical signal to a data processor, and the data processor monitors the transmittance change of a workpiece in a film forming process according to the optical signal.
The utility model has the advantages that:
1) the problem of transmission interference of a light path can be obviously improved, and the detection precision of direct detection of film forming is improved;
2) the device has strong adaptability and high monitoring precision, and is suitable for various coating umbrella frames and coating products with various surface shapes;
3) the film thickness uniformity of the film-coated product can be detected, and the film-forming process can be correspondingly adjusted according to the detection result, so that the quality of the film-coated product can be improved;
4) the structure is simple and reasonable, the use is convenient, and the monitoring light path can be quickly and accurately adjusted according to the monitoring object and the monitoring position;
5) the automation degree is high, the implementation of automatic control is convenient, and the method is suitable for popularization.
Drawings
FIG. 1 is a schematic diagram of the system of the present invention;
FIG. 2 is a schematic structural diagram of an incident unit according to the present invention;
FIG. 3 is a schematic view of the position adjustment mechanism according to the present invention;
FIG. 4 is a schematic structural view of an angle adjustment mechanism according to the present invention;
fig. 5 is a schematic structural diagram of a receiving unit in the present invention.
Detailed Description
The features of the present invention and other related features are described in further detail below by way of example in conjunction with the following drawings to facilitate understanding by those skilled in the art:
as shown in fig. 1-5, the symbols 1-20 and α are represented as: the device comprises a process chamber 1, a workpiece 2, an umbrella stand mechanism 3, an ion source 4, a light source emitting end 5, a light receiving end 6, a light source 7, a lock-in amplifier 8, a data processor 9, a power meter 10, a host 11, vacuum glass 12, a support stand 13, an optical fiber 14, a position debugging table 15, a shockproof base 16, a light projecting lens 17, an angle gauge 18, an angle debugging table 19, a lens fixing seat 20 and an adjustable angle range alpha.
Example (b): the optical film thickness monitoring system in the embodiment can detect the thickness and the thickness change of the film on the film-coated workpiece. As shown in fig. 1, a process chamber 1 is a process chamber of a film forming process, and a workpiece 2 is loaded in the process chamber 1 and has a flat plate shape. The workpiece 2 in the process chamber 1 may perform a film forming process by the ion source 4 to generate a thin film on the surface of the workpiece 2. In execution, the workpiece 2 is loaded on the umbrella stand mechanism 3, and the umbrella stand mechanism 3 can rotate inside the process chamber 1 to improve the uniformity of the thin film on the workpiece 2. The rotation control of the umbrella stand mechanism 3 can be controlled by arranging an encoder.
As shown in fig. 1, the optical film thickness monitoring system in this embodiment includes a monitoring optical path, which can transmit the workpiece 2 to monitor the material evaporation and adhesion condition of the workpiece 2 during the film coating process, and can detect the film thickness and the film thickness change through the change of the light transmittance (which can be converted into an electrical signal) of the workpiece 2, and can cooperate with the control system to control the executed film forming process accordingly to improve the film forming quality.
Specifically, the monitoring optical paths each include a set of opposing light source emitting end 5 and light receiving end 6, and the light source emitting end 5 and the light receiving end 6 are opposite in position and form the monitoring optical path therebetween.
As shown in fig. 2 and 3, the light source emitting end 5 is mounted on the position adjusting table 15; in fig. 3, two light source emitting ends 5 of the monitoring light path are arranged, and each light source emitting end 5 is independently erected on a position debugging table 15. In fig. 2, the position adjusting table 15 is mounted on the support frame 13 via a vibration-proof base 16, wherein the vibration-proof base 16 is used for keeping the position of the light source emitting end 5 stable. As shown in fig. 4, the position adjusting table 15 can adjust the position of the light source emitting end 5 in the process chamber 3, so as to change the position of the monitoring light path transmitting the workpiece 2, and further detect the thickness of the thin film and the thickness variation of the thin film at different positions on the workpiece 2.
The light source emitting end 5 and the light receiving end 6 are respectively provided with an angle adjusting mechanism, and the angle adjusting mechanism enables the light emitting angle of the light source emitting end and the light receiving angle of the light receiving end to be adjustable and form corresponding matching of positions. The angle adjusting mechanism comprises an angle instrument 18 and an angle adjusting table 19, wherein the angle instrument 18 used for calibrating the angle value is arranged on the position adjusting table 15 so as to limit the adjustable angle range alpha of the light source transmitting end 5, the angle adjusting table 19 is arranged above the angle instrument 18, and the light source transmitting end 5 is fixedly arranged on the angle adjusting table 19. Wherein, the bottom surface of the angle adjusting platform 19 is a convex cambered surface, and the top surface of the angle instrument 18 is a concave cambered surface, so that the cambered surfaces between the angle adjusting platform 19 and the angle instrument 18 are attached, and the angle adjusting platform 19 and the angle instrument 18 form stable sliding fit. In the present embodiment, an angle value mark for calibrating an angle value may be provided on the angle adjusting stage 19 and the angle meter 18.
As shown in fig. 5, in order to correspond to the light source emitting end 5 and the light emitting angle, the light receiving end 6 is also mounted on another position adjusting table 15, and the light receiving end 6 can adjust its position in the process chamber 3 and further adjust the light receiving angle through the position adjusting table 15, so that the position of the light receiving end 6 and the position of the light source emitting end 5 are correspondingly matched and form a monitoring light path.
In the present embodiment, the adjustable light emission angle means that the light emitting end surface of the light source emitting end 5 or the included angle between the emitted light and a fixed reference is adjustable, and the fixed reference is preferably the surface of the workpiece to be tested; similarly, the light receiving angle is adjustable, which means that the light receiving surface of the light receiving end 6 or the included angle between the emitted light and the fixed reference is adjustable, and the fixed reference is also preferably the surface to be tested of the workpiece. When the light emitting angle of the light source emitting end 5 and/or the light receiving angle of the light receiving end 6 are adjusted, it is required to ensure that the light emitted from the light source emitting end 5 can be received by the light receiving end 6, so as to form a monitoring light path for monitoring the workpiece 2.
As shown in fig. 1, the light source emitting end 5 can emit a monitoring light source to the light receiving end 6 and the monitoring light path can transmit the workpiece 2. The monitoring light path formed between the light source emitting end 5 and the light receiving end 6 is obliquely transmitted through the workpiece 2 at an angle. The monitoring light path is designed to be obliquely incident, so that the problem of transmission interference of the light path can be remarkably solved, and the detection precision of direct monitoring of film forming is improved; meanwhile, the applicability of the monitoring system is improved.
The monitoring system in the embodiment includes the following working processes during detection:
as shown in fig. 1 and 2, the light source 7 is used as an emitting source of the monitoring optical path, and a laser light source may be used. The light source 7 is connected to the light source emitting end 5 through an optical fiber 14. The laser emitted by the light source emitting end 5 is focused by the light projecting lens 17, then transmits through the workpiece 2 and transmits to the light receiving end 6, and the light projecting lens 17 is fixedly installed in a monitoring light path formed between the light source emitting end 5 and the light receiving end 6 through the lens fixing seat 20. The optical signal of the laser received by the optical receiving terminal 6 is subjected to internal photoelectric conversion processing, and then transmitted to the lock-in amplifier 8 for noise filtering processing. Finally, the laser optical signal processed by the lock-in amplifier 8 is transmitted to the data processor 9, and the data processor 9 detects the transmittance change of the workpiece 2 in the film forming process through the laser optical signal, so as to detect the film thickness of a certain position of the workpiece 2 and the film thickness change of the position.
In practical use, software is configured in the data processor 9 to monitor the evaporation and adhesion of the material and the change of the light transmittance (which can be converted into an electrical signal) of the substrate in the coating process, so as to realize the precise control of the film thickness. A power meter 10 for measuring the power of the light receiving end 6 and the lock-in amplifier 8 is arranged between the two ends.
In the embodiment, in specific implementation: the angle meter 18 of the monitoring beam path is designed to use an angle range of less than 90 °, i.e. an angle adjustment range of the light emission angle and/or the light reception angle of less than 90 °, so that the angle of inclination of the monitoring beam path with respect to the surface of the workpiece 2 is in the range of less than 90 °, preferably 7 ° to 14 °. When the inclination angle range of the monitoring light path relative to the surface of the workpiece 2 is less than 90 degrees, the problem of transmission interference of the light path can be obviously improved; when the inclination angle of the monitoring light path relative to the surface of the workpiece 2 is in the range of 7-14 degrees, the detection precision can be effectively improved while the problem of light path transmission interference is solved; meanwhile, the optical axis is guaranteed not to be interfered, and spectrum distortion is avoided. The specific angle of the monitoring system is selected during film forming, mainly according to the style of the umbrella stand mechanism 3 used for film forming, the actually measured light stability and the film forming uniformity.
Two or more monitoring optical paths can be configured in the process chamber 2 to detect a plurality of positions of the workpiece 2, and each monitoring optical path is generally arranged at intervals along the extending direction of the film covering film on the workpiece 2. The area of a qualified area meeting the film thickness design requirement on the workpiece 2 can be determined through the film thickness information detected and fed back by the multi-path monitoring light path on the workpiece 2; meanwhile, the executed film forming process can be corrected through the film thickness information fed back by the detection, as shown in fig. 1, a host 11 is configured in the monitoring system, the host 11 can control specific parameters of the film forming process during execution, the host 11 can perform data interaction with the data processor 9, when the data processor 9 detects the film thickness information, the film thickness information is transmitted to the host 11, and the host 11 can correct the film forming process according to the film thickness information; for example: when detecting that a certain error exists between the current film thickness value and the design theoretical value at the position of the workpiece 2 in the film forming process, the host 11 can correspondingly adjust the film forming process parameters so as to directly correct the film thickness in the film forming process and improve the uniformity of the film thickness.
As shown in fig. 1, the light source emitting end 5 and the light receiving end 6 forming the monitoring optical path are disposed outside the process chamber 1, and therefore a vacuum glass 12 is provided at the arrangement position of the light source emitting end 5 and the light receiving end 6, the vacuum glass 12 being used to ensure the monitoring optical path to be transmissive.
The structure of the position adjusting table 15 can be designed according to the actual situation, for example, a rotatable screw pushing mechanism is adopted, so that the positions of the light source emitting end 5 and the light receiving end 6 in the process chamber 3 can be adjusted.
Although the conception and the embodiments of the present invention have been described in detail with reference to the drawings, those skilled in the art will recognize that various changes and modifications can be made therein without departing from the scope of the appended claims, and therefore, they are not to be considered repeated herein.
Claims (8)
1. The utility model provides a thick monitored control system of optical film, includes light source transmitting terminal and light receiving terminal, form the control light path between light source transmitting terminal and the light receiving terminal, its characterized in that: the light source emitting end and/or the light receiving end of the monitoring light path are/is provided with an angle adjusting mechanism, and the angle adjusting mechanism enables the light emitting angle of the light source emitting end and/or the light receiving angle of the light receiving end to be adjustable and form corresponding position matching.
2. The optical film thickness monitoring system according to claim 1, wherein: the angle adjusting mechanism is respectively provided with an angle gauge and an angle debugging table, the angle debugging table is used for adjusting the light emitting angle and/or the light receiving angle, and the angle gauge is used for calibrating the angle value.
3. The optical film thickness monitoring system according to claim 2, wherein: the angle adjusting mechanism is installed on the position debugging platform, and the position debugging platform is used for adjusting the position of the angle adjusting mechanism, so that the position of the monitoring light path detection workpiece is adjusted.
4. The optical film thickness monitoring system according to claim 3, wherein: the angle debugging platform is installed on the angle instrument, the bottom surface of the angle debugging platform and the top surface of the angle instrument are cambered surfaces which are matched, and sliding fit is formed between the bottom surface of the angle debugging platform and the top surface of the angle instrument.
5. The optical film thickness monitoring system according to claim 1, wherein: the angular adjustment range of the light emission angle and/or the light reception angle is less than 90 °.
6. The optical film thickness monitoring system according to claim 5, wherein: the angle adjustment range of the light emission angle and/or the light receiving angle is 7-14 degrees.
7. The optical film thickness monitoring system according to claim 1, wherein: the monitoring system comprises two or more than two monitoring light paths, and the monitoring light paths are arranged at intervals along the extending direction of a film covering film on a workpiece.
8. The optical film thickness monitoring system according to claim 1, wherein: the optical signal of the monitoring optical path is subjected to photoelectric conversion processing and then transmitted to a phase-locked amplifier, the phase-locked amplifier performs noise reduction on the optical signal and transmits the optical signal to a data processor, and the data processor monitors the transmittance change of a workpiece in a film forming process according to the optical signal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122390742.8U CN216206055U (en) | 2021-09-30 | 2021-09-30 | Optical film thickness monitoring system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122390742.8U CN216206055U (en) | 2021-09-30 | 2021-09-30 | Optical film thickness monitoring system |
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| Publication Number | Publication Date |
|---|---|
| CN216206055U true CN216206055U (en) | 2022-04-05 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202122390742.8U Active CN216206055U (en) | 2021-09-30 | 2021-09-30 | Optical film thickness monitoring system |
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| CN (1) | CN216206055U (en) |
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2021
- 2021-09-30 CN CN202122390742.8U patent/CN216206055U/en active Active
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