CN216039355U

CN216039355U - Zirconia part polishing particle with special structure

Info

Publication number: CN216039355U
Application number: CN202121817364.0U
Authority: CN
Inventors: 李海峰
Original assignee: Wenzhou Runji Precision Ceramics Co ltd
Current assignee: Wenzhou Runji Precision Ceramics Co ltd
Priority date: 2021-08-05
Filing date: 2021-08-05
Publication date: 2022-03-15
Anticipated expiration: 2031-08-05

Abstract

The utility model discloses a zirconia part polishing particle with a special structure, which comprises a polishing particle body, wherein the polishing particle body is of a porous thin-wall round table structure, and a plurality of through holes penetrate through the polishing particle body along the axial direction of the polishing particle body, the polishing particle body is designed into structural characteristics such as a round table structure, through holes and the like, because the appearance of the polishing particle body adopts a taper shape, when an inner hole is blocked, the polishing particle body in the inner hole of zirconia can be loosened by only aiming at the direction of the taper, so that the blocked polishing particle body can be easily withdrawn, the integrity of the zirconia part is effectively protected, the difficulty of cleaning the inner hole to block the polishing particle is greatly reduced, and polishing liquid or polishing powder freely passes through the small hole during vibration polishing, the specific surface area of the polishing particle body is effectively improved, so that the polishing efficiency is improved.

Description

Zirconia part polishing particle with special structure

Technical Field

The utility model relates to the technical field of polishing particles, in particular to zirconia part polishing particles with a special structure.

Background

In the processing process of the zirconia part, in order to improve the processing quality of the zirconia part, the inner hole of the zirconia part needs to be polished by using polishing particles.

The existing granular polishing particles are mostly cylindrical and triangular, once the cylindrical or triangular polishing particles form blockage in inner holes of zirconia parts, the cylindrical or triangular polishing particles are very difficult to remove, and if a hard breaking method is adopted for removing, the zirconia parts are often easily damaged, in addition, the existing granular polishing particles are made of high-frequency porcelain, the hardness of the high-frequency porcelain is low, the grinding efficiency is low, and the consumption of the polishing particles is high; therefore, an apparatus is needed to solve the above problems.

SUMMERY OF THE UTILITY MODEL

In order to overcome the defects of the prior art, the utility model provides the zirconium oxide part polishing particle with a special structure, the polishing particle body is designed into the structural characteristics of a truncated cone structure, a through hole and the like, and because the appearance of the polishing particle body is in a taper shape, when an inner hole is blocked, the polishing particle body in the inner hole of the zirconium oxide is loosened by only tapping in a direction aligned with the taper direction, so that the blocked polishing particle body can be easily withdrawn, the integrity of the zirconium oxide part is effectively protected, the difficulty of cleaning the polishing particle blocked by the inner hole is greatly reduced, and polishing liquid or polishing powder can freely pass through the small hole during vibration polishing, so that the specific surface area of the polishing particle body is effectively improved, and the polishing efficiency is improved.

In order to solve the technical problems, the utility model provides the following technical scheme: the zirconia part polishing particle with the special structure comprises a polishing particle body, wherein the polishing particle body is of a porous thin-wall circular truncated cone structure, and a plurality of through holes penetrate through the polishing particle body along the axis direction of the polishing particle body.

As a preferred embodiment of the present invention, one of the plurality of through holes is located at the center of the polishing particle body, and the rest of the plurality of through holes are uniformly distributed inside the polishing particle body.

Compared with the prior art, the utility model can achieve the following beneficial effects:

1. through being porous thin wall round platform structure with the design of polishing particle body, utilize the tapering of polishing particle body appearance, when arousing that the hole blocks up, as long as aim at the tapering direction and throw, the polishing particle body in the zirconia hole will produce not hard up to the polishing particle body that blocks up just withdraws from very easily, the effectual integrality of protecting the zirconia part, the degree of difficulty of clearance hole jam polishing particle has greatly been reduced, and can conveniently hit the bits of broken glass to the polishing particle body under the jam condition and handle.

2. Through having seted up a plurality of through-holes inside the polishing particle body for polishing solution or polishing powder can freely pass in the aperture when carrying out vibration polishing to the zirconia part, the effectual specific surface who improves the polishing particle body, thereby has improved polishing efficiency.

3. The polishing particle body material is 95 alumina ceramic, so that the grinding efficiency of the zirconia part is improved, and the consumption of the polishing particles is reduced.

Drawings

FIG. 1 is a schematic perspective view of the present invention;

FIG. 2 is a schematic top view of the present invention;

FIG. 3 is a schematic cross-sectional front view of the present invention;

wherein: 1. polishing the particle body; 2. and a through hole.

Detailed Description

The present invention will be further described with reference to specific embodiments for the purpose of facilitating an understanding of technical means, characteristics of creation, objectives and functions realized by the present invention, but the following embodiments are only preferred embodiments of the present invention, and are not intended to be exhaustive. Based on the embodiments in the implementation, other embodiments obtained by those skilled in the art without any creative efforts belong to the protection scope of the present invention. The experimental methods in the following examples are conventional methods unless otherwise specified, and materials, reagents and the like used in the following examples are commercially available unless otherwise specified.

Example (b):

as shown in fig. 1-3, the present invention provides a zirconia part polishing particle with a special structure, which comprises a polishing particle body 1, wherein the polishing particle body 1 is a porous thin-wall truncated cone structure, and a plurality of through holes 2 penetrate through the polishing particle body 1 along the axial direction of the polishing particle body 1; when the polishing particle body 1 is used, the polishing particle body 1 is poured into a zirconium oxide inner hole, then polishing solution or polishing powder is added into the zirconium oxide inner hole, and then the zirconium oxide is subjected to vibration polishing; in the structure, the polishing particle body 1 is designed into a porous thin-wall structure, so that the polishing particle body is very easy to break, and under the condition that blind holes of some parts are blocked by the polishing particle body 1, the blocked polishing particle body 1 is cleaned by adopting a method of breaking the polishing particle body 1; in addition, because there are a lot of apertures that link up in polishing particle body 1 inside, make polishing solution or polishing powder can freely pass in the aperture in the vibration polishing, the effectual specific surface area who improves polishing particle body 1, thereby polishing efficiency has been improved, because polishing particle body 1 appearance is the round platform body, certain tapering has, when arousing that the zirconia hole blocks up, as long as aim at the direction of tapering and tap, polishing particle body 1 in the zirconia hole will produce and become flexible, thereby the polishing particle body 1 who blocks up just withdraws from very easily, thereby the effectual integrality of protecting the zirconia part, the degree of difficulty of clearing up the hole jam polishing particle body 1 has greatly been reduced.

In other embodiments, the polishing particle body 1 is made of 95 alumina ceramic material; when the ceramic is used, the hardness of 95 alumina ceramic is much higher than that of high-frequency ceramic, so that the grinding efficiency of zirconia parts is improved under the condition of the same amplitude and material ratio, and the consumption of polishing particles is reduced.

In other embodiments, among the plurality of through holes 2, one through hole 2 is located at the center of the polishing particle body 1, and the rest of through holes 2 are uniformly distributed inside the polishing particle body 1; when the polishing device is used, the through holes 2 are uniformly distributed in the polishing particle body 1, so that the stability of the mechanical property of the polishing particle body 1 can be improved, and the polishing efficiency is improved.

In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.

The foregoing shows and describes the general principles, essential features, and advantages of the utility model. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, and the preferred embodiments of the present invention are described in the above embodiments and the description, and are not intended to limit the present invention. The scope of the utility model is defined by the appended claims and equivalents thereof.

Claims

1. A zirconia part polishing particle of a special structure, comprising a polishing particle body (1), characterized in that: the polishing particle body (1) is of a porous thin-wall circular truncated cone structure, and a plurality of through holes (2) penetrate through the polishing particle body (1) along the axis direction of the polishing particle body (1).

2. A zirconia part polishing particle of special structure as set forth in claim 1, wherein: among the through holes (2), one through hole (2) is positioned at the central position of the polishing particle body (1), and the rest through holes (2) are uniformly distributed in the polishing particle body (1).