CN215947405U

CN215947405U - Particle coating device

Info

Publication number: CN215947405U
Application number: CN202121616345.1U
Authority: CN
Inventors: 朴相俊; 李恩政; 李建锡; 金大宪; 李根成; 金起焕
Original assignee: LG Chem Ltd
Current assignee: LG Chem Ltd
Priority date: 2020-07-20
Filing date: 2021-07-15
Publication date: 2022-03-04
Anticipated expiration: 2031-07-15
Also published as: KR20220010892A

Abstract

The present invention relates to a particle coating apparatus, which can uniformly spray reaction gas into a reactor and can prevent instantaneous pressure rise along the central axis direction of the reactor.

Description

Particle coating device

Technical Field

The present invention relates to a particle coating apparatus, and more particularly, to an atomic layer deposition apparatus for powder coating, which may also be applied to various deposition methods in which deposition is performed by formation of a gas flow, for example, chemical vapor deposition, molecular layer deposition, or deposition according to a combination thereof.

Background

Atomic Layer Deposition (ALD) is widely used in various fields as a technique for forming a film on a substrate based on sequential supply of gas phase (gas phase) chemicals.

With respect to the surface of the powder particles,

the demand for Conformal Coating at the level (Conformal Coating) is increasing substantially. For example, for the coating of a protective layer of a battery active material particle or a catalyst, an ultra-thin film coating technique capable of improving durability and performance thereof without hindering the characteristics of the existing particle is required.

For conformal coating of such ultra-thin films, coating techniques using atomic layer deposition are currently applied to the surface of particles. The atomic layer deposition method can be carried out by adjusting the reaction period

Horizontal thickness adjustment and fine control, and coating is accomplished by surface reaction according to cross injection of a reaction source gas, thereby having high conformal coating characteristics, and thus being the most suitable technique for ultra-thin film coating of the powder particle surface.

Fig. 1 is a schematic view showing a conventional particle coating apparatus 10, and fig. 2 is a schematic view showing a gas supply unit 40 of fig. 1.

Referring to fig. 1 and 2, the particle coating apparatus 10 includes: a reactor 20 having a containing space 21 in which powder (particles) is charged; perforated screens 30 disposed on both sides in the central axis direction (x-axis direction) of the reactor 20; and a gas injection unit 40 having a supply pipe 50 for injecting a reaction gas or a purge gas into the accommodating space 21. The supply pipe 50 has an inflow port 51 connected to a reaction gas or purge gas supply source and a discharge port 52 for discharging gas into the housing space.

Note that F1 indicates the inflow direction of the reactant gas (or purge gas) at the inflow port 51, and F2 indicates the ejection direction of the reactant gas (or purge gas) at the ejection port 52. The particle coating apparatus 10 is an apparatus that completes coating on the surface of particles by injecting a reaction gas (or purge gas) through the supply pipe 50 while rotating the gas supply unit 40, and since the gas injected through the supply pipe 50 flows in through the porous sieve 30, it is difficult for the reactor 20 to smoothly form a gas flow in the radial direction (y-axis direction), and it is difficult to achieve uniform coating.

Further, when the gas flows in, the powder is conveyed in the gas flow forming direction due to the instantaneous increase in the gas inflow pressure at the discharge port 52, and the powder is deflected, which results in a problem of a decrease in coating uniformity.

SUMMERY OF THE UTILITY MODEL

The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a particle coating apparatus capable of uniformly spraying a reaction gas into a reactor and preventing an instantaneous pressure increase in the direction of the central axis of the reactor.

In order to solve the above problem, according to an aspect of the present invention, there is provided a particle coating apparatus including: a reactor having a receiving space for receiving particles; and a gas injection unit installed in the reactor to supply the reaction gas to the accommodating space, connected to an external gas supply source, and having a supply pipe for supplying the gas to the accommodating space.

Further, the supply pipe has: one or more inflow ports configured to allow a reaction gas to flow in a direction parallel to a central axis direction of the reactor; and one or more discharge ports arranged to discharge the reaction gas in a state of being inclined at a predetermined angle with respect to a central axis direction of the reactor.

(effects of utility model)

As seen from the above, according to the particle coating apparatus related to at least one embodiment of the present invention, the reaction gas can be uniformly sprayed into the reactor, and the instantaneous pressure rise in the axial direction of the reactor can be prevented.

Drawings

Fig. 1 is a schematic view showing a conventional particle coating apparatus.

Fig. 2 is a schematic view illustrating the gas supply unit of fig. 1.

Fig. 3 is a schematic view showing a particle coating apparatus according to an embodiment of the present invention.

Fig. 4 is a schematic view for explaining the flow direction of the supply of the reaction gas in the particle coating apparatus shown in fig. 3.

Fig. 5 and 6 are schematic views showing the gas supply unit of fig. 3.

(description of reference numerals)

10: particle coating device

110: reactor with a reactor shell

130: porous member

140: gas injection unit

150: supply pipe

Detailed Description

Hereinafter, a particle coating apparatus according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

Note that, the same or similar components are given the same or similar reference numerals regardless of the reference numerals, and overlapping description thereof is omitted, and the size and shape of each component illustrated in the drawings may be enlarged or reduced for convenience of description.

Fig. 3 is a schematic view showing a particle coating apparatus according to an embodiment of the present invention, fig. 4 is a schematic view for explaining a supply flow of a reaction gas in the particle coating apparatus shown in fig. 3, and fig. 5 and 6 are schematic views showing a gas supply unit of fig. 3.

The particle coating apparatus 100 related to an embodiment of the present invention may be used for surface coating of particles (or also referred to as "powder").

Referring to fig. 3 and 4, the particle coating apparatus 100 includes: a reactor 110 having a receiving space 111 for receiving particles. For example, the reactor 110 may have a hollow cylindrical form. Herein, the x-axis direction represents the central axis direction of the reactor 110, and the y-axis direction represents the radial direction of the reactor 110.

Further, the particle coating apparatus 100 includes a gas injection unit 140 which is installed in the reactor 110 to supply the reaction gas (and/or the purge gas) to the accommodating space 111, is connected to an external gas supply source (the reaction gas supply source and/or the purge gas supply source), and has a supply pipe 150 for supplying the gas (the reaction gas and/or the purge gas) to the accommodating space 111. As described above, the gas injection unit 140 may be connected to the driving part and may rotate with reference to the central axis of the reactor 110. In addition, the gas injection unit 140 is coupled to the reactor to rotate together with the central axis of the reactor 110 when supplying gas (reaction gas and/or purge gas).

Further, the supply pipe 150 has: one or more inflow ports 151 configured to allow the reaction gas to flow in parallel to the central axis direction (x-axis direction) of the reactor 110; the one or more exhaust ports 152 are disposed so that the reaction gas is exhausted in a state of being inclined at a predetermined angle with respect to the central axis direction (x-axis direction) of the reactor.

Note that F1 denotes the inflow direction of the reactant gas (or purge gas) at the inflow port 151, F2 denotes the ejection direction of the reactant gas (or purge gas) at the ejection port 152, and F3 denotes the direction of the gas flow flowing into the housing space through the porous sieve 130.

Further, at least one of the ejection ports 152 may be disposed to eject the gas along a radial direction (y-axis direction) orthogonal to the central axis direction (x-axis direction) of the reactor. For example, all of the plurality of ejection ports 152 may be arranged to eject the gas along a radial direction (y-axis direction) perpendicular to a central axis direction (x-axis direction) of the reactor.

With this structure, after the gas flow F2 is formed in the radial direction of the gas injection unit 140, the gas can be flowed into the accommodating space 111 of the reactor 100 through the porous screen (or also referred to as a porous member) 130.

Further, the plurality of ejection holes 152 may be perforated in the circumferential direction (circumferential direction or rotation direction of the gas injection unit) on the outer circumferential surface of the supply pipe 150.

The inflow port 151 and the ejection port 152 may be disposed at a predetermined interval along the central axis direction of the reactor.

Further, it is preferable that the plurality of the ejection ports 152 are arranged in the circumferential direction on the outer circumferential surface of the supply pipe 150 with respect to the central axis of the reactor 110, and the plurality of the ejection ports 152 are arranged in the circumferential direction on the outer circumferential surface of the supply pipe 150 with respect to the central axis of the reactor 110 at predetermined intervals.

On the other hand, the at least two ejection ports may be formed so that the ejection areas (cross-sectional areas) are all the same, and the at least two ejection ports may be formed so that the ejection areas (cross-sectional areas) are different from each other.

Further, at least two ejection ports may be arranged at a predetermined interval along the central axis direction of the reactor. In contrast, at least two ejection ports may be arranged at the same interval from the inflow port along the central axis direction of the reactor.

The inflow cross-sectional area of the inflow port 151 may be formed to be larger than the discharge cross-sectional area of the discharge portion 152.

Further, the reactor 110 may be provided with porous members 130, each of which has at least a partial region capable of allowing the reaction gas to pass therethrough, on both sides along the central axis direction. For example, the reactor 110 may have a hollow cylindrical shape, and porous members 130, at least a part of which is capable of allowing the reaction gas to pass therethrough, may be disposed on both sides of the cylinder along the central axis direction.

Further, the gas injection unit 140 has a groove portion 142 recessed toward a direction away from the porous member at a surface facing the porous member 130. Accordingly, a flow space 141 is formed between the gas injection unit 140 and the porous member through the groove portion 142.

In the flow space 141 formed by the groove portion 142, the discharge port 152 may be disposed to discharge the reaction gas (and/or the purge gas) in a radial direction (y-axis direction) orthogonal to the central axis direction of the reactor 110.

Herein, for example, TMA and source gases of H2O, etc. may be used as the reaction gas, and besides, various combinations of oxides, nitrides, sulfides, single elements, etc. may be performed as the source gases.

The preferred embodiments of the present invention described above are disclosed for illustrative purposes, and those skilled in the art to which the present invention pertains may make various modifications, alterations, and additions within the spirit and scope of the utility model, and such modifications, alterations, and additions should be construed as falling within the appended claims.

Claims

1. A particle coating apparatus, wherein the particle coating apparatus comprises:

a reactor having a receiving space for receiving particles; and

a gas injection unit mounted to the reactor to supply a reaction gas to the accommodating space, connected to an external gas supply source, and having a supply pipe for supplying a gas to the accommodating space,

the supply tube includes: one or more inflow ports configured to allow a reaction gas to flow in a direction parallel to a central axis direction of the reactor; and one or more discharge ports arranged to discharge the reaction gas in a state of being inclined at a predetermined angle with respect to a central axis direction of the reactor.

2. The particle coating apparatus of claim 1,

at least one of the nozzles is arranged to discharge the reaction gas in a radial direction orthogonal to the central axis direction of the reactor.

3. The particle coating apparatus of claim 1,

the inlet and the outlet are arranged at a predetermined interval along the central axis direction of the reactor.

4. The particle coating apparatus of claim 2,

the plurality of the ejection ports are arranged in the circumferential direction on the outer peripheral surface of the supply pipe with respect to the central axis of the reactor.

5. The particle coating apparatus of claim 2,

the plurality of nozzles are arranged at predetermined intervals in the circumferential direction on the outer peripheral surface of the supply pipe with respect to the central axis of the reactor.

6. The particle coating apparatus of claim 5,

the ejection areas of at least two ejection ports are all the same.

7. The particle coating apparatus of claim 5,

the ejection areas of at least two ejection ports are different.

8. The particle coating apparatus of claim 5,

at least two of the ejection ports are arranged at a predetermined interval along the central axis direction of the reactor.

9. The particle coating apparatus of claim 1,

the inflow cross-sectional area of the inflow port is larger than the ejection cross-sectional area of the ejection port.

10. The particle coating apparatus of claim 2,

the reactor is provided with porous members on both sides in the central axis direction, respectively, which allow the reaction gas to pass through at least a part of the region.

11. The particle coating apparatus of claim 10,

the gas injection unit has a groove portion recessed in a direction away from the porous member on a surface facing the porous member,

the ejection holes are disposed in the recessed portion so that the reaction gas is ejected in a radial direction orthogonal to the central axis direction of the reactor.

12. The particle coating apparatus of claim 1,

the gas injection unit is connected to the driving unit so as to be rotatable about the central axis of the reactor.