CN215916209U

CN215916209U - Spiral flow guide microneedle device

Info

Publication number: CN215916209U
Application number: CN202121423076.7U
Authority: CN
Inventors: 周成刚; 周典法; 王秀霞; 孙剑
Original assignee: University of Science and Technology of China USTC
Current assignee: University of Science and Technology of China USTC
Priority date: 2021-06-25
Filing date: 2021-06-25
Publication date: 2022-03-01
Anticipated expiration: 2031-06-25

Abstract

The utility model discloses a spiral flow guide micro-needle device, which comprises a silicon-based substrate (1), micro-needles (2) and a spiral micro-channel (3); the micro-needle (2) and the spiral micro-channel (3) are distributed on the silicon-based substrate (1); the micro-needle (2) is provided with a spiral micro-channel (3) at the periphery. The micro-channel is added to promote the absorption of nutrient substances, the plurality of diversion grooves with the width of dozens of microns are added in the tangential direction around the micro-needle (2), the nutrient substances slowly permeate into micropores pricked by the micro-needle along the diversion grooves, the channel is not bent at a large angle, the nutrient solution substances cannot flow normally due to the blockage of the bent part of the channel, the absorption efficiency of the nutrient substances is greatly promoted, and the problem of flowing absorption of the nutrient substances can be well solved.

Description

Spiral flow guide microneedle device

Technical Field

The utility model relates to the technical field of transdermal drug delivery and micro-machining, in particular to a spiral diversion microneedle device.

Background

The traditional administration modes comprise oral administration and intravenous injection administration, and the oral administration needs to pass through digestive tracts such as stomach and intestine, and the drug effect of a plurality of liquid medicines, especially protein liquid medicines, is reduced through the metabolism; intravenous injection is given and is not only required professional to operate, can cause painful sense for patient moreover, is not suitable for long-term continuous administration, in order to solve above-mentioned unfavorable factor, has developed a new micropin transdermal delivery technique, not only can be used to macromolecule protein class liquid medicine and has given medicine, has satisfied painless, wicresoft, the demand of continuous administration moreover, the micropin pierces the skin, has formed real physical channel, is fit for macromolecule liquid medicine and passes through. Most of the micro-needles which are reported at present are of common columnar structures, and after the micro-needles penetrate into skin, the permeability of nutrient substances is poor, and the effect is not obvious. For example, a microneedle array patch applied to facial skin beauty needs to be repeatedly pressed on the skin many times to absorb part of nutrients, so that the nutrient absorption efficiency is low, the nutrients cannot be sufficiently absorbed, and the user experience is reduced. The micro-needle is a novel transdermal drug delivery device which is developed by using a nano porous silicon material with biocompatibility through an advanced micro-nano manufacturing technology. The preparation combines the advantages of injection and transdermal drug delivery, and is a great technical breakthrough in the field of sustained and controlled release of drugs. The needle point of the micro needle is less than 20 microns, only penetrates the stratum corneum which has a barrier effect on the medicine, so that the medicine is safely and percutaneously released, and a brand-new solution can be provided for treating major diseases such as skin refractory diseases, diabetes and the like.

SUMMERY OF THE UTILITY MODEL

The utility model adopts the mode that the spiral diversion microgrooves are additionally arranged at the bottoms of the microneedles, widens the absorption mode of nutrient solution substances, and improves the absorption efficiency of the nutrient solution substances.

The utility model solves the problems: the spiral diversion microneedle device overcomes the defects of the prior art, can well promote nutrient absorption, is convenient to use, obvious in effect, simple to manufacture and easy for large-area popularization of product commercialization.

The utility model relates to a spiral diversion microneedle device which utilizes a spiral diversion trench at the periphery of a microneedle to enhance nutrient solution absorption and comprises a silicon-based substrate 1, a microneedle 2 and a spiral micro-channel 3, wherein the spiral micro-channel is a unique distinguishing characteristic of the utility model; on the silicon material, a cone is manufactured by using photoetching and etching modes, and a spiral flow guide groove is manufactured at the bottom of the cone by using an etching mode.

The utility model adopts the following technical scheme:

a spiral diversion microneedle device comprises a silicon-based substrate 1, microneedles 2 and a spiral micro-channel 3; the micro-needle 2 and the spiral micro-channel 3 are distributed on the silicon-based substrate 1; the microneedle has a spiral microchannel 3 around its perimeter.

Further, the spiral micro flow channel 3 is a spiral flow guide groove.

Furthermore, the width of the spiral micro-channel is 1-30 microns, the depth of the spiral micro-channel is 1-100 microns, and the spiral guide groove is tangent to and intersected with the adjacent micro-needle and is connected with the peripheral guide groove in the arc tangential direction.

Further, the microneedles 2 are of a conical structure; the microneedles 2 form a rectangular or annular periodic array with a spacing of 100-1000 microns.

Further, the microneedles 2 have a tapered structure. The microneedles 2 form a conical or truncated cone-shaped microneedle array having a top diameter of less than 100 micrometers.

Further, the height of each microneedle 2 is 100-500, and each microneedle 2 has a bottom width of about 50-500 micrometers and a top width of 0-100 micrometers.

Further, the microneedles 2 are arranged at equal intervals of 100-1000 microns from the center of each microneedle cylinder.

The advantages and positive effects are as follows:

the existing microneedle array device is single, only has one conical microneedle, only extrudes and punctures a small hole, and has no device for promoting nutrient absorption. The spiral diversion microneedle device provided by the utility model can better solve the problems. The micro-channel is added according to the principle of hydrodynamics to promote the absorption of nutrient substances, the plurality of guide grooves with the width of dozens of micrometers are added in the tangential direction around the micro-needle, the nutrient substances slowly permeate into the micro-holes pricked by the micro-needle along the guide grooves, the flow channel is not bent at a large angle, the nutrient solution substances cannot flow normally due to the blockage of the bent part of the flow channel, the absorption efficiency of the nutrient substances is greatly promoted, and the problem of flowing absorption of the nutrient substances can be well solved.

Drawings

FIG. 1 is a schematic perspective view of the present invention;

FIG. 2 is a schematic plan view of the present invention;

FIG. 3 is a photograph of a real object taken by an electron microscope according to the present invention.

In the figure: 1-a silicon-based substrate; 2-microneedles; 3-spiral micro flow channel.

Detailed Description

The utility model is described in detail below with reference to the figures and examples.

A preparation method of the spiral diversion microneedle device comprises the following basic scheme:

(1) taking an N-type 100 crystal orientation single-side polished silicon wafer with the thickness of 625 microns and the thickness of 6 inches;

(2) introducing mixed gas of dichlorosilane and ammonia (the flow ratio of dichlorosilane gas to ammonia gas is 4:1) by using low-pressure chemical vapor deposition equipment RCH5460, and growing a 300-nanometer silicon nitride film on the surface of the silicon wafer;

(3) spin-coating AZ4620 photoresist with the thickness of 7 microns, and drying the heat release plate at 100 ℃ for 5 minutes;

(4) exposing for 45 seconds in a 1000-watt hard contact mode on an ultraviolet photoetching machine equipment of Sus MA/BA6 by adopting a pre-prepared photoetching mask plate;

(5) developing for 300 seconds by using AZ300MIF developing solution, taking out, putting into a clear water tank, rinsing for 60 seconds, taking out, drying the surface of the silicon wafer by using a 5Bar nitrogen gun, and then putting into a hot plate, drying for 5 minutes at 100 ℃ and hardening;

(6) taking the photoresist after photoetching development as a mask, etching a 300-nanometer silicon nitride film on the surface of a silicon wafer without photoresist protection by using a reactive ion etching machine Oxford 80 of an Oxford instrument, and then etching exposed silicon to a depth of 120 micrometers by using a low-temperature etching machine Oxford Estrelas of the Oxford instrument and taking the residual photoresist and the silicon nitride film as the mask;

(7) placing the sample on a Delong UD-P laser etching device, aligning the mask mark, and etching a spiral groove with the width of 30 microns around the silicon column;

(8) putting a sample into a HNA mixed solution prepared by mixing hydrofluoric acid, nitric acid and acetic acid according to a volume ratio of 25:50:80, performing wet etching for 2 hours, taking out, rinsing for 5 minutes by using clean water, and drying the surface by using a 5Bar nitrogen gun;

(9) placing the sample into a pure phosphoric acid tank at 160 ℃ for etching for 2 hours to remove the silicon nitride mask on the top, taking out the sample, placing the sample in air for cooling to room temperature, then placing the sample into a clear water tank for rinsing for 5 minutes, taking out the sample, and drying the sample by using a 5Bar nitrogen gun;

(10) the method comprises the steps of adhering a sample on the bottom surface of a silicon wafer by adopting ultraviolet curing glue, scribing according to a distance of 4 mm multiplied by 4 mm in a wafer scribing machine, taking out, washing the surface by using a 5Bar water gun, drying the sample by using 5Bar compressed air, and taking out for use after the ultraviolet curing glue irradiating the bottom surface of the sample by using ultraviolet light for 1000W for 60 seconds is debonded. And (5) preparing the spiral diversion microneedle device.

As shown in fig. 1 to 3, the spiral diversion microneedle device prepared by the utility model comprises a silicon-based substrate 1, about 64 microneedles 2 with a conical structure and 4 spiral micro channels 3. These microneedles 2 form a rectangular microneedle array. The micro-needle 2 and the spiral micro-channel are distributed on the silicon substrate. The spiral micro-channel 3 is a spiral diversion trench. The microneedle 2 has a spiral diversion trench around its periphery. The width of the spiral micro-channel 3 is 30 microns and the depth is 10 microns, the spiral guide groove is tangent and intersected with the adjacent micro-needle, and the spiral guide groove is connected with the guide groove at the periphery of the adjacent micro-needle in the arc tangential direction. Each microneedle had a height of 150 microns, and each microneedle had a base width of about 250 microns and a tip width of about 20 microns. Microneedles having tips less than 20 microns in diameter are easier to penetrate the skin surface. There is an equal spacing of the microneedle cylinder centers about 450 microns between each microneedle.

The utility model has not been described in detail and is part of the common general knowledge of a person skilled in the art. The above-described embodiments are merely illustrative of the preferred embodiments of the present invention, and the preferred embodiments are not exhaustive of all of the details, nor are they intended to limit the utility model to the precise embodiments described. Various modifications and improvements of the technical solution of the present invention may be made by those skilled in the art without departing from the spirit of the present invention, and the technical solution of the present invention is to be covered by the protection scope defined by the claims.

Claims

1. The spiral flow-guiding micro-needle device is characterized by comprising a silicon-based substrate (1), micro-needles (2) and a spiral micro-channel (3); the micro-needle (2) and the spiral micro-channel (3) are distributed on the silicon-based substrate (1); the micro-needle (2) is provided with a spiral micro-channel (3) at the periphery.

2. The device according to claim 1, characterized in that the spiral microchannel (3) is a spiral flow guide channel.

3. The device according to claim 2, wherein the width of the spiral micro flow channel (3) is 1-30 microns, the depth is 1-100 microns, the spiral guide groove is tangentially intersected with the adjacent micro needle, and the spiral guide groove is connected with the peripheral guide groove in the direction of a circular arc tangent.

4. The device according to claim 1, characterized in that the microneedles (2) are of a tapered configuration; the microneedles (2) form a rectangular or annular periodic array, and the distance between the microneedles is 100-1000 microns.

5. The device according to claim 4, wherein the height of each microneedle (2) is 100-500 microns, and each microneedle (2) has a base width of 50-500 microns and a tip width of 0-100 microns.

6. The device according to claim 1, wherein there is an equal spacing of 100-1000 microns of the center-to-center of the microneedle cylinder between each microneedle (2).