CN114748779A - Microneedle and manufacturing process thereof - Google Patents
Microneedle and manufacturing process thereof Download PDFInfo
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- CN114748779A CN114748779A CN202210348221.2A CN202210348221A CN114748779A CN 114748779 A CN114748779 A CN 114748779A CN 202210348221 A CN202210348221 A CN 202210348221A CN 114748779 A CN114748779 A CN 114748779A
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- sunken
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 60
- 238000005530 etching Methods 0.000 claims abstract description 43
- 239000007787 solid Substances 0.000 claims abstract description 24
- 238000005516 engineering process Methods 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 19
- 229920002120 photoresistant polymer Polymers 0.000 claims description 11
- 238000004544 sputter deposition Methods 0.000 claims description 10
- 238000007747 plating Methods 0.000 claims description 8
- 238000009713 electroplating Methods 0.000 claims description 7
- 238000009501 film coating Methods 0.000 claims description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 7
- 239000010931 gold Substances 0.000 claims description 7
- 229910052737 gold Inorganic materials 0.000 claims description 7
- 238000003486 chemical etching Methods 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 239000010937 tungsten Substances 0.000 claims description 6
- 239000007888 film coating Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 238000005229 chemical vapour deposition Methods 0.000 claims description 2
- 238000012805 post-processing Methods 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 238000000227 grinding Methods 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 6
- 238000005498 polishing Methods 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 38
- 239000003814 drug Substances 0.000 description 7
- 238000010329 laser etching Methods 0.000 description 5
- 238000001311 chemical methods and process Methods 0.000 description 3
- 229940079593 drug Drugs 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 210000004207 dermis Anatomy 0.000 description 2
- 210000002615 epidermis Anatomy 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 206010033675 panniculitis Diseases 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000000144 pharmacologic effect Effects 0.000 description 2
- 230000036647 reaction Effects 0.000 description 2
- 210000004304 subcutaneous tissue Anatomy 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 238000012377 drug delivery Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000000017 hydrogel Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000004089 microcirculation Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 210000003491 skin Anatomy 0.000 description 1
- 210000000434 stratum corneum Anatomy 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 210000001519 tissue Anatomy 0.000 description 1
Images
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
- A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
- A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
- A61M2037/0023—Drug applicators using microneedles
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
- A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
- A61M2037/0053—Methods for producing microneedles
Abstract
The invention discloses a microneedle and a manufacturing process thereof, wherein the manufacturing process of the microneedle comprises the following steps: a) opening: etching a plurality of concave parts on the top surface of the substrate; b) film forming: generating a needle body film layer on the top surface of the substrate, and simultaneously sinking part of the needle body film layer into each concave part to form a hollow sinking structure or a solid sinking structure respectively; c) opening holes: when the hollow sunken structures are formed, polishing the bottom surfaces of the substrates until the bottom of each hollow sunken structure is upwardly worn through and a hollow channel is formed; when the solid sunken structures are formed, etching is respectively carried out on the top surfaces of the solid sunken structures until the top surfaces penetrate through the bottom surface of the substrate and hollow channels are formed; d) removing the lining: the substrate is removed. The invention can prepare a single micro-needle or micro-needle array with a mechanical channel with micron-sized dimension, and has simple, mature and stable integral preparation process and low preparation cost.
Description
[ technical field ] A
The invention relates to the technical field of medical equipment, in particular to a microneedle and a manufacturing process thereof.
[ background ] A method for producing a semiconductor device
The Micro Needles (MN) are a novel physical penetration promoting technology, are formed by connecting a plurality of micron-sized fine needle points on a base in an array mode, can directionally penetrate through a horny layer to generate a mechanical channel with a micron size, directly place a medicament in an epidermis or an upper dermis layer, can participate in microcirculation without passing through the horny layer to play pharmacological reaction, are different from the traditional needle for administration, do not generate pain, are convenient to administer, and can effectively improve the compliance of a patient.
According to the characteristics of the microneedles, the microneedles may be specifically classified into solid microneedles, hollow microneedles, coated microneedles, soluble microneedles and hydrogel microneedles. Among them, Hollow microneedles (Hollow micro needles), which are substantially microsyringes of micrometer scale. The drug can be pre-loaded in the needle cavity of the hollow micro-needle, and then automatically enters the body under the driving of the pressure of the tissue fluid concentration gradient after the needle point of the hollow micro-needle penetrates into the skin, so as to realize delivery.
The hollow microneedle has the advantage of large drug loading capacity due to the hollow structure, however, the hollow microneedle is generally processed and prepared by adopting a digital control micro-electro-mechanical system, the whole preparation process is precise and complex, the preparation cost is high, the time consumption is long, the large-scale popularization and use are difficult, and a solution is urgently needed.
[ summary of the invention ]
The invention aims to solve the problems in the prior art, and provides a microneedle and a manufacturing process thereof, which can be used for preparing a single microneedle or microneedle array with a mechanical channel with a micron-sized size, and have the advantages of simple, mature and stable integral preparation process and low preparation cost.
In order to achieve the above object, the present invention provides a process for manufacturing microneedles, comprising the steps of:
a) opening: etching a plurality of concave parts on the top surface of the substrate, wherein the concave parts can penetrate through the bottom surface or do not penetrate through the bottom surface;
b) film forming: generating a needle body film layer on the top surface of the substrate, and simultaneously sinking part of the needle body film layer into each concave part to form a hollow sinking structure or a solid sinking structure respectively;
c) opening a hole: when the hollow sunken structures are formed, the bottom surfaces of the substrates are ground until the bottoms of the hollow sunken structures are ground upwards to form hollow channels; when the solid sunken structures are formed, etching is respectively carried out on the top surfaces of the solid sunken structures until the top surfaces penetrate through the bottom surface of the substrate and hollow channels are formed;
d) removing the lining: and removing the substrate.
Preferably, in step a), the substrate is a glass substrate.
Preferably, in step a), each of the concave portions is in an inverted cone shape, and each of the concave portions is etched by using a photoresist etching technique or a maskless etching technique.
Preferably, in step b), the needle body film layer is formed by plating a pure metal film or an alloy film.
Preferably, the needle body film layer is a pure metal film formed by chemical vapor deposition, such as a tungsten film or a titanium film.
Preferably, in step c), when forming the solid sunken structure, each of the hollow channels is etched by using a photoresist etching technique or a maskless etching technique.
Preferably, in step c), the length of each hollow channel is 100 to 1500 μm, and the diameter is 1 to 200 μm.
Preferably, in step d), the substrate is washed away by chemical etching.
Preferably, the method also comprises the step e) of post-processing: and generating the nano-scale gold film coating outside the hollow sunken structure or the solid sunken structure through physical sputtering or electroplating.
A microneedle manufactured by the above manufacturing process.
The invention has the beneficial effects that:
1. according to the invention, the plurality of concave parts are etched on the top surface of the substrate, the needle body film layer is generated on the top surface of the substrate, meanwhile, part of the needle body film layer is sunk into each concave part and forms a hollow sinking structure or a solid sinking structure respectively, then a hollow channel is formed in the hollow sinking structure or the solid sinking structure in a polishing or etching mode, finally, after the substrate is removed, a single microneedle or microneedle array with a mechanical channel with micron-sized dimensions is obtained, the microneedle or microneedle array can effectively penetrate through the stratum corneum during use, a medicament is directly placed on the epidermis or the upper dermis, and the medicament is slowly released into the body by utilizing the driving force formed by the concentration gradient between the medicament and subcutaneous tissue fluid to exert pharmacological reaction;
2. according to the invention, the concave part is designed to be inverted cone-shaped, so that on one hand, a cone-shaped hollow microneedle is conveniently formed finally, the effective penetrating power is ensured, on the other hand, the volume can be increased, the drug loading capacity is improved, and the release speed is adjusted to realize accurate drug delivery;
3. by adopting the photoresist etching technology or the maskless etching technology to etch a plurality of concave parts which do not penetrate through the bottom surface on the top surface of the substrate, the length and the shape of a single microneedle and the quantity of the microneedles in unit area in the microneedle array can be individually and accurately controlled by adjusting the etching area, the etching duration and the etching quantity according to treatment requirements;
4. the needle body film layer is formed by plating a pure metal film or an alloy film, so that the long-time stable percutaneous administration can be realized by utilizing the biocompatibility and the mechanical property of the metal material;
5. the needle body film layer is generated on the top surface of the substrate in a plating mode, and the thickness of the needle body film layer can be controlled according to actual requirements;
6. the length of the microneedle is controlled to be 100-1500 mu m, and the diameter is controlled to be 1-200 mu m, so that the needle body can be smoothly inserted into the subcutaneous tissue, and the over-strong pain can be avoided;
7. the nano-scale gold film coating is generated outside the hollow sinking structure or the solid sinking structure by a physical sputtering or electroplating mode, so that the electric conductivity and the chemical and biological stability can be effectively improved.
The features and advantages of the present invention will be described in detail by embodiments in conjunction with the accompanying drawings.
[ description of the drawings ]
FIG. 1 is a flow chart of a first embodiment;
FIG. 2 is a flowchart of the second embodiment;
FIG. 3 is a flowchart of a third embodiment;
FIG. 4 is a flowchart of a fourth embodiment.
In the figure: 1-substrate, 11-concave part, 2-needle body film layer, 21-hollow sinking structure, 22-solid sinking structure, 23-hollow channel, 3-optical cement layer and 31-through hole.
[ detailed description ] embodiments
The first embodiment is as follows:
referring to fig. 1, the process for manufacturing a microneedle of the present invention comprises the following steps:
a) opening: selecting a substrate 1 with proper thickness according to the requirement, etching a plurality of concave parts 11 which do not penetrate through the bottom surface on the top surface of the substrate 1, wherein the substrate 1 is a glass substrate, each concave part 11 is in an inverted cone shape, and each concave part 11 is obtained by etching by adopting a maskless etching technology;
the maskless etching technology can be a laser etching technology, and can irradiate the top surface of the substrate 1 by using laser with high energy density, so that the surface material of an irradiated area is subjected to a series of complicated physical and even chemical processes such as heating, melting, vaporization, plasma formation, volatilization, sputtering and the like, and finally an inner concave part 11 is formed;
b) film forming: generating a needle body film layer 2 on the top surface of the substrate 1, simultaneously sinking part of the needle body film layer 2 into each concave part 11 and respectively forming a hollow sinking structure 21, wherein the needle body film layer 2 is formed by plating a tungsten film.
c) Opening a hole: polishing the bottom surface of the substrate 1 until the bottom of each hollow sinking structure 21 is upwardly worn through and a hollow channel 23 is formed, wherein the length of each hollow channel 23 is 100-1500 mu m, and the diameter of each hollow channel 23 is 1-200 mu m;
d) removing the lining: the substrate 1 is washed away by chemical etching;
e) and (3) post-treatment: and generating a nano-scale gold film coating outside the hollow sunken structure 21 through physical sputtering or electroplating.
A microneedle manufactured by the above manufacturing process.
Example two:
referring to fig. 2, a process for manufacturing a microneedle according to the present invention comprises the steps of:
a) opening: selecting a substrate 1 with a proper thickness according to the requirement, etching a plurality of concave parts 11 which do not penetrate through the bottom surface on the top surface of the substrate 1, wherein the substrate 1 is a glass substrate, each concave part 11 is in an inverted cone shape, and each concave part 11 is obtained by etching by adopting a photoresist etching technology;
the photoresist etching technology is specifically that photoresist is coated on the top surface of a substrate 1 to form a photoresist layer 3, after drying, a mask is used for shielding, so that light irradiates partial areas of the photoresist layer 3, a developing solution is used for dissolving the exposed or unexposed areas of the photoresist layer 3 to form a through hole 31, and finally plasma generated under the action of an electric field penetrates through the through hole 31 and bombards the top surface of the substrate 1 until an inner concave part 11 is generated;
b) film forming: generating a needle body film layer 2 on the top surface of a substrate 1, simultaneously sinking part of the needle body film layer 2 into each concave part 11 and respectively forming a hollow sinking structure 21, wherein the needle body film layer 2 is formed by plating a tungsten film;
c) opening a hole: polishing the bottom surface of the substrate 1 until the bottom of each hollow sinking structure 21 is upwardly worn through and a hollow channel 23 is formed, wherein the length of each hollow channel 23 is 100-1500 mu m, and the diameter of each hollow channel 23 is 1-200 mu m;
d) removing the lining: the substrate 1 is washed away by chemical etching;
e) and (3) post-treatment: and generating a nano-scale gold film coating outside the hollow sunken structure 21 through physical sputtering or electroplating.
A microneedle manufactured by the above manufacturing process.
Example three:
referring to fig. 3, the process for manufacturing a microneedle of the present invention includes the steps of:
a) opening: selecting a substrate 1 with proper thickness according to the requirement, etching a plurality of concave parts 11 which do not penetrate through the bottom surface on the top surface of the substrate 1, wherein the substrate 1 is a glass substrate, each concave part 11 is in an inverted cone shape, and each concave part 11 is obtained by etching by adopting a maskless etching technology;
the maskless etching technology can be a laser etching technology, and can irradiate the top surface of the substrate 1 by using laser with high energy density, so that the surface material of an irradiated area is subjected to a series of complicated physical and even chemical processes such as heating, melting, vaporization, plasma formation, volatilization, sputtering and the like, and finally an inner concave part 11 is formed;
b) film forming: generating a needle body film layer 2 on the top surface of a substrate 1, simultaneously sinking part of the needle body film layer 2 into each concave part 11 and respectively forming a solid sinking structure 22, wherein the needle body film layer 2 is formed by plating a tungsten film;
c) opening a hole: etching the top surface of each solid sunken structure 22 until the top surface penetrates through the bottom surface of the substrate 1 and forms a hollow channel 23, wherein each hollow channel 23 is obtained by etching by using a maskless etching technology (laser etching technology, the same as above), the length of each hollow channel 23 is 100-1500 micrometers, and the diameter of each hollow channel 23 is 1-200 micrometers;
d) removing the lining: the substrate 1 is washed away by chemical etching;
e) and (3) post-treatment: a nano-scale gold thin film coating is created by physical sputtering or electroplating outside of the solid sinker structure 22.
A microneedle produced by the above production process.
Example four:
referring to fig. 4, the process for manufacturing a microneedle of the present invention includes the following steps:
a) opening: selecting a substrate 1 with proper thickness according to the requirement, etching a plurality of concave parts 11 penetrating through the bottom surface on the top surface of the substrate 1, wherein the substrate 1 is a glass substrate, each concave part 11 is in an inverted cone shape, and each concave part 11 is obtained by etching by a maskless etching technology;
the maskless etching technology may be a laser etching technology, and can irradiate the top surface of the substrate 1 with high-energy-density laser, so that the surface material of the irradiated area undergoes a series of complicated physical or even chemical processes such as heating, melting, vaporizing, forming plasma, volatilizing, sputtering and the like, and finally the concave portion 11 is formed;
b) film forming: generating a needle body film layer 2 on the top surface of a substrate 1, simultaneously sinking part of the needle body film layer 2 into each concave part 11 and respectively forming a solid sinking structure 22, wherein the needle body film layer 2 is formed by plating a tungsten film;
c) opening a hole: etching the top surface of each solid sunken structure 22 until the top surface penetrates through the bottom surface of the substrate 1 and forms a hollow channel 23, wherein each hollow channel 23 is obtained by etching by using a maskless etching technology (laser etching technology, the same as above), the length of each hollow channel 23 is 100-1500 micrometers, and the diameter of each hollow channel 23 is 1-200 micrometers;
d) liner removal: the substrate 1 is washed away by chemical etching;
e) and (3) post-treatment: a nano-scale gold thin film coating is created by physical sputtering or electroplating outside of the solid sinker structure 22.
A microneedle manufactured by the above manufacturing process.
The above embodiments are illustrative of the present invention, and are not intended to limit the present invention, and any simple modifications of the present invention are within the scope of the present invention.
Claims (10)
1. A process for manufacturing microneedles, comprising the steps of:
a) opening: etching a plurality of concave parts (11) on the top surface of the substrate (1);
b) film forming: generating a needle body film layer (2) on the top surface of a substrate (1), and simultaneously sinking a part of the needle body film layer (2) into each concave part (11) to form a hollow sinking structure (21) or a solid sinking structure (22) respectively;
c) opening a hole: when the hollow sunken structures (21) are formed, grinding the bottom surface of the substrate (1) until the bottom of each hollow sunken structure (21) is upwards ground and a hollow channel (23) is formed; when the solid sunken structures (22) are formed, etching is respectively carried out on the top surface of each solid sunken structure (22) until the top surface penetrates through the bottom surface of the substrate (1) and a hollow channel (23) is formed;
d) removing the lining: the substrate (1) is removed.
2. A process for manufacturing microneedles in claim 1, wherein: in step a), the substrate (1) is a glass substrate.
3. A process for manufacturing microneedles in claim 1, wherein: in the step a), each concave part (11) is in an inverted cone shape, and each concave part (11) is obtained by etching by adopting a photoresist etching technology or a maskless etching technology.
4. A process for manufacturing microneedles in claim 1, wherein: in the step b), the needle body film layer (2) is formed by plating a pure metal film or an alloy film.
5. A process for manufacturing microneedles in claim 4, wherein: the pure metal film is a tungsten film or a titanium film deposited by chemical vapor deposition.
6. A process for manufacturing microneedles in claim 1, wherein: in step c), when the solid sunken structure (22) is formed, each hollow channel (23) is etched by using a photoresist etching technology or a maskless etching technology.
7. A process for manufacturing microneedles in claim 1, wherein: in step c), the length of each hollow channel (23) is 100 to 1500 μm, and the diameter is 1 to 200 μm.
8. A process for manufacturing microneedles in claim 1, wherein: in step d), the substrate (1) is washed away by chemical etching.
9. A process for manufacturing a microneedle according to claim 1, wherein: further comprising the step e) of post-processing: and generating a nano-scale gold film coating outside the hollow sunken structure (21) or the solid sunken structure (22) through physical sputtering or electroplating.
10. A microneedle, characterized by: manufactured by the manufacturing process of any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210348221.2A CN114748779A (en) | 2022-04-01 | 2022-04-01 | Microneedle and manufacturing process thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210348221.2A CN114748779A (en) | 2022-04-01 | 2022-04-01 | Microneedle and manufacturing process thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114748779A true CN114748779A (en) | 2022-07-15 |
Family
ID=82328502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210348221.2A Pending CN114748779A (en) | 2022-04-01 | 2022-04-01 | Microneedle and manufacturing process thereof |
Country Status (1)
| Country | Link |
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| CN (1) | CN114748779A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115227957A (en) * | 2022-07-26 | 2022-10-25 | 空芯微医疗科技(上海)有限责任公司 | Method for preparing hollow microneedle and product thereof |
| CN115227956A (en) * | 2022-07-26 | 2022-10-25 | 空芯微医疗科技(上海)有限责任公司 | Preparation method of hollow microneedle |
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| US20020133129A1 (en) * | 2001-03-14 | 2002-09-19 | Francisco Arias | Method of manufacturing microneedle structures using soft lithography and photolithography |
| US6551849B1 (en) * | 1999-11-02 | 2003-04-22 | Christopher J. Kenney | Method for fabricating arrays of micro-needles |
| US20050011858A1 (en) * | 2003-07-16 | 2005-01-20 | Industrial Technology Research Institute | Method for fabricating a hollow micro-needle array |
| CN101342404A (en) * | 2008-08-28 | 2009-01-14 | 上海交通大学 | Method for manufacturing different-plane metal hollow fine needle for transdermal drug administration |
| KR20110086248A (en) * | 2010-01-22 | 2011-07-28 | 오형훈 | Fabrication method of microneedle |
| CN108096699A (en) * | 2017-12-28 | 2018-06-01 | 浙江大学台州研究院 | For empty micropin array of drug delivery and biological fluid extracting and preparation method thereof |
-
2022
- 2022-04-01 CN CN202210348221.2A patent/CN114748779A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6551849B1 (en) * | 1999-11-02 | 2003-04-22 | Christopher J. Kenney | Method for fabricating arrays of micro-needles |
| US20020133129A1 (en) * | 2001-03-14 | 2002-09-19 | Francisco Arias | Method of manufacturing microneedle structures using soft lithography and photolithography |
| US20050011858A1 (en) * | 2003-07-16 | 2005-01-20 | Industrial Technology Research Institute | Method for fabricating a hollow micro-needle array |
| CN101342404A (en) * | 2008-08-28 | 2009-01-14 | 上海交通大学 | Method for manufacturing different-plane metal hollow fine needle for transdermal drug administration |
| KR20110086248A (en) * | 2010-01-22 | 2011-07-28 | 오형훈 | Fabrication method of microneedle |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115227957A (en) * | 2022-07-26 | 2022-10-25 | 空芯微医疗科技(上海)有限责任公司 | Method for preparing hollow microneedle and product thereof |
| CN115227956A (en) * | 2022-07-26 | 2022-10-25 | 空芯微医疗科技(上海)有限责任公司 | Preparation method of hollow microneedle |
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