CN215713474U - Silane film electrochemical deposition device - Google Patents
Silane film electrochemical deposition device Download PDFInfo
- Publication number
- CN215713474U CN215713474U CN202122247156.8U CN202122247156U CN215713474U CN 215713474 U CN215713474 U CN 215713474U CN 202122247156 U CN202122247156 U CN 202122247156U CN 215713474 U CN215713474 U CN 215713474U
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- CN
- China
- Prior art keywords
- electrochemical deposition
- silane
- liquid
- pipe
- inlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 47
- 238000004070 electrodeposition Methods 0.000 title claims abstract description 44
- 239000007788 liquid Substances 0.000 claims abstract description 62
- 239000002699 waste material Substances 0.000 claims abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000706 filtrate Substances 0.000 claims abstract description 14
- 238000001914 filtration Methods 0.000 claims abstract description 12
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 11
- 239000012528 membrane Substances 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 2
- 230000005518 electrochemistry Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005254 chromizing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000002444 silanisation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Abstract
The utility model discloses a silane membrane electrochemical deposition device, which comprises a rack, wherein a silane liquid storage tank, an electrochemical deposition tank and a filtering device are arranged on the rack, the filtering device comprises a water pump and a filter, the inlet of the water pump is respectively communicated with a liquid supply pipe and a liquid return pipe through a tee pipe, control valves are respectively arranged on the liquid supply pipe and the liquid return pipe, the inlet of the liquid supply pipe is communicated with the silane liquid storage tank, and the inlet of the liquid return pipe is communicated with the electrochemical deposition tank; the outlet of the water pump is communicated with the inlet of the filter through a filtrate inlet pipe, and the outlet of the filter is communicated with the electrochemical deposition groove through a filtrate outlet pipe. The method can circularly filter the electrochemically deposited silane liquid to obtain pure silane liquid, realizes repeated utilization of the silane liquid, saves cost, reduces waste, and simultaneously improves the stability of the silane liquid and the performance of the electrochemically deposited silane film.
Description
Technical Field
The utility model relates to the field of electrochemical deposition, in particular to a silane film electrochemical deposition device.
Background
The silane electrochemical treatment is a novel metal surface protection pretreatment technology, the metal or nonmetal surface is treated by utilizing the special molecular structure of the silane coupling agent, the process has the advantages of low cost, simple operation, environmental protection, no pollution and the like, and is expected to completely replace the chromizing and phosphorizing treatment processes.
The traditional silanization treatment process generally adopts a dip coating method, namely, a pretreated metal workpiece is soaked in silane liquid hydrolyzed in advance, and the metal workpiece is taken out and dried after a period of time. The method has simple process, but has poor film forming effect, thin surface film layer, low coverage rate to the matrix and poor long-term protection effect.
In the prior art, the silane film prepared by an electrochemical deposition method can effectively improve the film quality, increase the film thickness and improve the coverage rate of the film to a substrate. The electrochemical deposition method is generally characterized in that a metal to be treated is connected with a negative electrode of a direct current power supply, a platinum sheet is connected with a positive electrode of the power supply, and the pH value of a solution in a micro-area near the surface to be treated is increased under a certain cathode potential, so that the silane polycondensation reaction is facilitated, the deposition of a silane film is promoted, the thickness of the film is increased, and the quality of the film is improved.
However, after the silane film is prepared by the electrochemical deposition method, the silane solution is prone to generate a precipitation phenomenon, which affects the stability of the silane solution and deteriorates the performance of the silane film.
SUMMERY OF THE UTILITY MODEL
Based on the above problems, the present invention aims to provide a silane membrane electrochemical deposition apparatus with a filtering function, and the present invention adopts the following technical scheme:
the utility model provides a silane film electrochemical deposition device which comprises a rack, wherein a silane liquid storage tank, an electrochemical deposition tank and a filtering device are arranged on the rack, a mechanical arm is arranged on one side of the electrochemical deposition tank, and a mechanical arm for clamping a sample piece is arranged on the mechanical arm;
the filtering device comprises a water pump and a filter, an inlet of the water pump is respectively communicated with a liquid supply pipe and a liquid return pipe through a tee pipe, control valves are arranged on the liquid supply pipe and the liquid return pipe, an inlet of the liquid supply pipe is communicated with the silane liquid storage tank, and an inlet of the liquid return pipe is communicated with the electrochemical deposition tank; and the outlet of the water pump is communicated with the inlet of the filter through a filtrate inlet pipe, and the outlet of the filter is communicated with the electrochemical deposition tank through a filtrate outlet pipe.
Further, a waste liquid storage tank is arranged below the rack, a waste discharge pipe is arranged at the bottom of the electrochemical deposition tank, and the lower end of the waste discharge pipe extends into the waste liquid storage tank.
Further, a heating element is arranged at the bottom of the electrochemical deposition groove.
Furthermore, one side of the mechanical arm is provided with a loading tray.
Furthermore, an electric appliance console is arranged on one side of the rack.
Compared with the prior art, the utility model has the beneficial technical effects that:
the method can circularly filter the electrochemically deposited silane liquid to obtain pure silane liquid, realizes repeated utilization of the silane liquid, saves cost, reduces waste, and simultaneously improves the stability of the silane liquid and the performance of the electrochemically deposited silane film.
Drawings
The utility model is further illustrated in the following description with reference to the drawings.
FIG. 1 is a schematic structural view of an electrochemical deposition apparatus for silane film according to the present invention;
description of reference numerals: 1. a rack; 2. a silane liquid storage tank; 3. an electrochemical deposition cell; 4. a filtration device; 401. a water pump; 402. a filter; 403. a liquid supply tube; 404. a liquid return pipe; 405. a control valve; 406. Introducing the filtrate into a pipe; 407. a filtrate outlet pipe; 5. a mechanical arm; 501. a manipulator; 6. a waste liquid storage tank; 7. A waste discharge pipe; 8. a carrying tray; 9. an electrical appliance console.
Detailed Description
In order to make the technical solutions of the present invention better understood by those skilled in the art, the present invention will be further described in detail with reference to the accompanying drawings and the detailed description.
As shown in FIG. 1, the embodiment discloses a silane film electrochemical deposition device, which comprises a rack 1, wherein a silane liquid storage tank 2, an electrochemical deposition tank 3 and a filtering device 4 are arranged on the rack 1.
The filtering device 4 comprises a water pump 401 and a filter 402, the inlet of the water pump 401 is respectively communicated with a liquid supply pipe 403 and a liquid return pipe 404 through a tee pipe, the liquid supply pipe 403 and the liquid return pipe 404 are respectively provided with a control valve 405, the inlet of the liquid supply pipe 403 is communicated with the silane liquid storage tank 2, and the inlet of the liquid return pipe 404 is communicated with the electrochemical deposition tank 3; an outlet of the water pump 401 is communicated with an inlet of the filter 402 through a filtrate inlet pipe 406, and an outlet of the filter 402 is communicated with the electrochemical deposition bath 3 through a filtrate outlet pipe 407.
The silane liquid storage tank 2 replenishes the silane liquid to the electrochemical deposition tank 3 through a liquid supply pipe 403, a water pump 401, a filtrate inlet pipe 406, a filter 402, and a filtrate outlet pipe 407. When the silane liquid in the electrochemical deposition tank 3 is deposited, the circulating filtration of the silane liquid in the electrochemical deposition tank 3 is realized through a liquid return pipe 404, a water pump 401, a filtrate inlet pipe 406, a filter 402 and a filtrate outlet pipe 407.
Be provided with waste liquid holding tank 6 in the below of rack 1, the bottom of electrochemistry deposit tank 3 is provided with row waste pipe 7, and waste liquid flows to waste liquid holding tank 6 through row waste pipe 7 in the electrochemistry deposit tank 3, installs control valve on row waste pipe 7.
The bottom of the electrochemical deposition tank 3 is provided with a heating element which is electrically connected with a temperature controller, the heating element can heat the electrodeposition liquid and keep a proper reaction temperature, the temperature of the silane liquid is controlled by the temperature controller in the electrochemical deposition process, and the quality of the electrochemical deposition silane film is ensured by regulating and controlling different temperature conditions.
One side of the electrochemical deposition groove 3 is provided with a mechanical arm 5, a mechanical arm 501 is arranged on the mechanical arm 5, and one side of the mechanical arm 5 is provided with a loading tray 8. The robot 501 grips the sample and performs the transfer work by the robot arm 5.
One side of the rack 1 is provided with an electrical appliance console 9, a control system is installed in the electrical appliance console 9, and operations such as liquid supply, filtration, temperature control, waste liquid discharge and sample piece transfer can be completed by controlling a control panel on the electrical appliance console 9.
The above-described embodiments are merely illustrative of the preferred embodiments of the present invention, and do not limit the scope of the present invention, and various modifications and improvements of the technical solutions of the present invention can be made by those skilled in the art without departing from the spirit of the present invention, and the technical solutions of the present invention are within the scope of the present invention defined by the claims.
Claims (5)
1. A silane film electrochemical deposition apparatus includes a stage (1), characterized in that: a silane liquid storage tank (2), an electrochemical deposition tank (3) and a filtering device (4) are arranged on the rack (1), a mechanical arm (5) is arranged on one side of the electrochemical deposition tank (3), and a mechanical arm (501) for clamping a sample piece is arranged on the mechanical arm (5);
the filtering device (4) comprises a water pump (401) and a filter (402), the inlet of the water pump (401) is respectively communicated with a liquid supply pipe (403) and a liquid return pipe (404) through a three-way pipe, the liquid supply pipe (403) and the liquid return pipe (404) are respectively provided with a control valve (405), the inlet of the liquid supply pipe (403) is communicated with the silane liquid storage tank (2), and the inlet of the liquid return pipe (404) is communicated with the electrochemical deposition tank (3); the outlet of the water pump (401) is communicated with the inlet of the filter (402) through a filtrate inlet pipe (406), and the outlet of the filter (402) is communicated with the electrochemical deposition tank (3) through a filtrate outlet pipe (407).
2. The silane film electrochemical deposition apparatus of claim 1, wherein: the lower part of the rack (1) is provided with a waste liquid storage tank (6), the bottom of the electrochemical deposition tank (3) is provided with a waste discharge pipe (7), and the lower end of the waste discharge pipe (7) extends into the waste liquid storage tank (6).
3. The silane film electrochemical deposition apparatus of claim 1, wherein: the bottom of the electrochemical deposition groove (3) is provided with a heating element.
4. The silane film electrochemical deposition apparatus of claim 1, wherein: and a loading tray (8) is arranged on one side of the mechanical arm (5).
5. The silane film electrochemical deposition apparatus of claim 1, wherein: an electric appliance console (9) is arranged on one side of the rack (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122247156.8U CN215713474U (en) | 2021-09-16 | 2021-09-16 | Silane film electrochemical deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122247156.8U CN215713474U (en) | 2021-09-16 | 2021-09-16 | Silane film electrochemical deposition device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215713474U true CN215713474U (en) | 2022-02-01 |
Family
ID=80021187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122247156.8U Expired - Fee Related CN215713474U (en) | 2021-09-16 | 2021-09-16 | Silane film electrochemical deposition device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215713474U (en) |
-
2021
- 2021-09-16 CN CN202122247156.8U patent/CN215713474U/en not_active Expired - Fee Related
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20220201 |
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| CF01 | Termination of patent right due to non-payment of annual fee |