CN215712589U - A vacuum dehydroxylation furnace for semiconductor quartz glass products - Google Patents

A vacuum dehydroxylation furnace for semiconductor quartz glass products Download PDF

Info

Publication number
CN215712589U
CN215712589U CN202121990816.5U CN202121990816U CN215712589U CN 215712589 U CN215712589 U CN 215712589U CN 202121990816 U CN202121990816 U CN 202121990816U CN 215712589 U CN215712589 U CN 215712589U
Authority
CN
China
Prior art keywords
rod
furnace body
furnace
quartz glass
cover plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN202121990816.5U
Other languages
Chinese (zh)
Inventor
夏雨
陈尚华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Donghai Anhong Quartz Technology Co ltd
Original Assignee
Donghai Anhong Quartz Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Donghai Anhong Quartz Technology Co ltd filed Critical Donghai Anhong Quartz Technology Co ltd
Priority to CN202121990816.5U priority Critical patent/CN215712589U/en
Application granted granted Critical
Publication of CN215712589U publication Critical patent/CN215712589U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Furnace Charging Or Discharging (AREA)

Abstract

本实用新型涉及真空脱羟炉技术领域,且公开了一种半导体石英玻璃制品用真空脱羟炉,包括底座和炉体,所述炉体固定设置于底座的上表面,所述炉体的左侧壁两端均开设有滑槽,两个所述滑槽的内部均滑动设置有滑杆,两个所述滑杆的左端之间设置有盖板,所述盖板的两端均通过转杆与对应的滑杆转动连接,所述盖板的下端两侧均固定设置有支撑板,两个所述支撑板的表面均放置有放置架,所述炉体的上表面中部设置有固定所述盖板的限位机构。本实用新型能够同时进行卸料和加工,大大的减少了设备停机时间,提高了加工效率。

Figure 202121990816

The utility model relates to the technical field of vacuum dehydroxylation furnaces, and discloses a vacuum dehydroxylation furnace for semiconductor quartz glass products, comprising a base and a furnace body, wherein the furnace body is fixedly arranged on the upper surface of the base, and the left side of the furnace body is Both ends of the side walls are provided with sliding grooves, the interiors of the two sliding grooves are slidably provided with sliding rods, and a cover plate is arranged between the left ends of the two sliding rods, and both ends of the cover plate are rotated by rotating The rod is rotatably connected with the corresponding sliding rod, the lower end of the cover plate is fixedly provided with support plates on both sides, the surfaces of the two support plates are placed with placing racks, and the middle part of the upper surface of the furnace body is provided with a fixed place. The limit mechanism of the cover plate. The utility model can carry out unloading and processing at the same time, greatly reducing equipment downtime and improving processing efficiency.

Figure 202121990816

Description

Vacuum dehydroxylation furnace for semiconductor quartz glass product
Technical Field
The utility model relates to the technical field of vacuum dehydroxylation furnaces, in particular to a vacuum dehydroxylation furnace for semiconductor quartz glass products.
Background
After the quartz product is produced, the finished product needs to be heated to remove the hydroxyl compounds in the material, and the currently common dehydroxylation equipment is a vacuum dehydroxylation furnace, wherein the quartz product is placed inside the dehydroxylation furnace, and the hydroxyl compounds in the material are removed by heating and other chemical means.
Traditional semiconductor quartz glass is vacuum dehydroxylation furnace for goods, need lift off the rack that is equipped with the product after the dehydroxylation is ended, because just having processed, rack and product have higher temperature, unload and need consume more time, equipment needs to shut down longer time promptly, great reduction machining efficiency.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the problems that in the prior art, a vacuum dehydroxylation furnace for semiconductor quartz glass products needs to be stopped for a long time for discharging, so that time is wasted, and the processing efficiency is greatly reduced.
In order to achieve the purpose, the utility model adopts the following technical scheme:
the utility model provides a vacuum dehydroxylation furnace for semiconductor quartz glass product, includes base and furnace body, the furnace body is fixed to be set up in the upper surface of base, the spout has all been seted up at the left side wall both ends of furnace body, two the inside of spout all slides and is provided with the slide bar, two be provided with the apron between the left end of slide bar, the both ends of apron all rotate with the slide bar that corresponds through the bull stick and be connected, the lower extreme both sides of apron are all fixed and are provided with the backup pad, two the rack has all been placed on the surface of backup pad, the upper surface middle part of furnace body is provided with fixedly the stop gear of apron.
Preferably, stop gear includes threaded rod and motor, the threaded rod rotates to set up in the upside the inside of spout, the upside the slide bar cup joints with the threaded rod screw thread, the upside the cavity is seted up on the right side of spout, the right-hand member of threaded rod extends to the inside of cavity, the fixed support frame that is provided with in upper surface middle part of furnace body, the lower surface of support frame rotates and is provided with the transfer line, the lower extreme of transfer line extends to the inside of cavity, the bevel gear, two have all been fixed to cup jointed to the right-hand member of threaded rod and the lower extreme of transfer line the bevel gear meshing is connected, the motor sets up in the upper surface of support frame, the output of motor and the upper end fixed connection of transfer line.
Preferably, the limiting mechanism comprises an electric push rod and a clamping block, a fixing frame is fixedly arranged in the middle of the upper surface of the furnace body, the electric push rod is fixedly arranged in the fixing frame, the clamping block is fixedly arranged at the tail end of a piston rod of the electric push rod, the lower end of the clamping block extends to the upper side in the sliding groove, a clamping groove is formed in the upper surface of the right end of the sliding rod, and the clamping block is matched with the clamping groove.
Preferably, the motor is fixedly connected with the support frame through a mounting frame.
Preferably, the lower side is fixedly provided with a fixed rod inside the chute, and the lower side is movably sleeved with the fixed rod.
Preferably, the upper surfaces of the two support plates are provided with anti-skid grains.
Preferably, both sides of the cover plate are fixedly provided with sealing rings.
Compared with the prior art, the utility model provides a vacuum dehydroxylation furnace for semiconductor quartz glass products, which has the following beneficial effects:
1. this semiconductor is vacuum dehydroxylation furnace for quartz glass article through rotating the apron, can exchange both sides rack position, can be promptly with treating processing and the product position interchange that is processed, can unload and process simultaneously promptly, great reduction equipment down time, improved machining efficiency.
2. This vacuum dehydroxylation furnace for semiconductor quartz glass product drives two bevel gears through the motor and rotates to drive the lead screw and rotate, the lead screw drives upside slide bar and removes to the spout that corresponds in, can make apron and the stable cooperation of furnace body promptly.
3. This semiconductor is vacuum dehydroxylation stove for quartz glass product, through promoting the apron to with the furnace body cooperation, then electric putter piston rod stretches out, promotes fixture block downstream and draw-in groove joint, can carry out spacingly promptly to the apron for apron and the stable cooperation of furnace body.
The parts which are not involved in the device are the same as or can be realized by adopting the prior art, the utility model can carry out unloading and processing simultaneously, thereby greatly reducing the equipment downtime and improving the processing efficiency.
Drawings
FIG. 1 is a schematic structural view of a vacuum dehydroxylation furnace for semiconductor quartz glass products according to the present invention;
FIG. 2 is an enlarged view of a portion A of FIG. 1;
FIG. 3 is a schematic structural view of another embodiment of a vacuum dehydroxylation furnace for semiconductor quartz glass articles according to the present invention.
In the figure: the furnace comprises a base 1, a furnace body 2, a sliding rod 3, a cover plate 4, a rotating rod 5, a supporting plate 6, a placing frame 7, a threaded rod 8, a fixing rod 9, a supporting frame 10, a transmission rod 11, a motor 12, a bevel gear 13, a fixing frame 14, an electric push rod 15, a clamping block 16 and a sealing ring 17.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention.
Example 1
Referring to fig. 1-2, a vacuum dehydroxylation furnace for semiconductor quartz glass products, including base 1 and furnace body 2, furnace body 2 is fixed to be set up in the upper surface of base 1, the spout has all been seted up at the left side wall both ends of furnace body 2, the inside of two spouts all slides and is provided with slide bar 3, be provided with apron 4 between the left end of two slide bars 3, the both ends of apron 4 all rotate with corresponding slide bar 3 through bull stick 5 and are connected, the lower extreme both sides of apron 4 all fixedly are provided with backup pad 6, rack 7 has all been placed on the surface of two backup pad 6, the upper surface middle part of furnace body 2 is provided with the stop gear of fixed apron 4.
Stop gear includes threaded rod 8 and motor 12, threaded rod 8 rotates and sets up in the inside of upside spout, upside slide bar 3 cup joints with 8 screw threads of threaded rod, the cavity is seted up on the right side of upside spout, the right-hand member of threaded rod 8 extends to the inside of cavity, the fixed support frame 10 that is provided with in upper surface middle part of furnace body 2, the lower surface rotation of support frame 10 is provided with transfer line 11, the lower extreme of transfer line 11 extends to the inside of cavity, bevel gear 13 has all been cup jointed to the right-hand member of threaded rod 8 and the lower extreme of transfer line 11, two bevel gear 13 meshing connections, motor 12 sets up in the upper surface of support frame 10, motor 12's output and transfer line 11's upper end fixed connection.
The motor 12 is fixedly connected with the support frame 10 through a mounting frame, so that the motor 12 is more stably connected with the support frame 10.
The inside of downside spout all is fixed and is provided with dead lever 9, and downside slide bar 3 cup joints with the activity of dead lever 9 for the removal that downside slide 3 can be stable.
The upper surfaces of the two supporting plates 6 are provided with anti-skid grains, so that the placing frame 7 can be stably placed on the upper surface of the supporting plate 6.
And sealing rings 17 are fixedly arranged on two sides of the cover plate 4, so that the sealing performance between the cover plate 4 and the furnace body 2 is improved.
When the automatic machining device is used, a worker rotates the cover plate 4 to interchange the positions of the placing frames 7 on the two sides, namely, the positions of products to be machined and well machined are interchanged, then a power supply of the motor 12 is switched on, the motor 12 drives the transmission rod 11 to rotate, namely, the two bevel gears 13 are driven to rotate in a meshed mode, so that the threaded rod 8 is driven to rotate, the threaded rod 8 drives the upper side sliding rod 3 to move towards the inside of the sliding groove, the cover plate 4 is tightly matched with the furnace body 2, a workpiece to be machined is pushed into the furnace body, at the moment, the workpiece can be machined while being unloaded, the equipment can be greatly shortened in downtime, and the machining efficiency is improved.
Example 2
Referring to fig. 3, a vacuum dehydroxylation furnace for semiconductor quartz glass products, including base 1 and furnace body 2, furnace body 2 is fixed to be set up in the upper surface of base 1, the spout has all been seted up at furnace body 2's left side wall both ends, the inside of two spouts all slides and is provided with slide bar 3, be provided with apron 4 between two slide bar 3's the left end, apron 4's both ends are all rotated with the slide bar 3 that corresponds through bull stick 5 and are connected, apron 4's lower extreme both sides are all fixed and are provided with backup pad 6, rack 7 has all been placed on two backup pad 6's surface, furnace body 2's upper surface middle part is provided with the stop gear of fixed apron 4.
The limiting mechanism comprises an electric push rod 15 and a clamping block 16, a fixing frame 14 is fixedly arranged in the middle of the upper surface of the furnace body 2, the electric push rod 15 is fixedly arranged in the fixing frame 14, the clamping block 16 is fixedly arranged at the tail end of a piston rod of the electric push rod 15, the lower end of the clamping block 16 extends to the inside of the upper sliding groove, a clamping groove is formed in the upper surface of the right end of the upper sliding rod 3, and the clamping block 16 is matched with the clamping groove.
The inside of downside spout all is fixed and is provided with dead lever 9, and downside slide bar 3 cup joints with the activity of dead lever 9 for the removal that downside slide 3 can be stable.
The upper surfaces of the two supporting plates 6 are provided with anti-skid grains, so that the placing frame 7 can be stably placed on the upper surface of the supporting plate 6.
And sealing rings 17 are fixedly arranged on two sides of the cover plate 4, so that the sealing performance between the cover plate 4 and the furnace body 2 is improved.
In the utility model, when the device is used, a worker rotates the cover plate 4 to interchange the positions of the placing frames 7 on the two sides, namely, the positions of products to be processed and processed are interchanged, then the cover plate 4 is pushed to be matched with the furnace body 2, namely, the products to be processed are pushed into the furnace body, at the moment, the power supply of the electric push rod 15 is switched on, the piston rod of the electric push rod 15 extends out to push the fixture block 16 to move downwards, so that the fixture block 16 is clamped with the clamping groove on the upper surface of the upper side slide bar 3, namely, the cover plate 4 is tightly matched with the furnace body 2, at the moment, the discharging and the processing can be carried out at the same time, the equipment downtime is greatly reduced, and the processing efficiency is improved.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and equivalent alternatives or modifications according to the technical solution of the present invention and the inventive concept thereof should be covered by the scope of the present invention.

Claims (7)

1.一种半导体石英玻璃制品用真空脱羟炉,包括底座(1)和炉体(2),其特征在于,所述炉体(2)固定设置于底座(1)的上表面,所述炉体(2)的左侧壁两端均开设有滑槽,两个所述滑槽的内部均滑动设置有滑杆(3),两个所述滑杆(3)的左端之间设置有盖板(4),所述盖板(4)的两端均通过转杆(5)与对应的滑杆(3)转动连接,所述盖板(4)的下端两侧均固定设置有支撑板(6),两个所述支撑板(6)的表面均放置有放置架(7),所述炉体(2)的上表面中部设置有固定所述盖板(4)的限位机构。1. A vacuum dehydroxylation furnace for semiconductor quartz glass products, comprising a base (1) and a furnace body (2), wherein the furnace body (2) is fixedly arranged on the upper surface of the base (1), and the Both ends of the left side wall of the furnace body (2) are provided with sliding grooves, sliding rods (3) are slidably arranged inside the two sliding grooves, and a sliding rod (3) is provided between the left ends of the two sliding rods (3). A cover plate (4), both ends of the cover plate (4) are rotatably connected to the corresponding sliding rods (3) through a rotating rod (5), and supports are fixed on both sides of the lower end of the cover plate (4) A plate (6), a placing rack (7) is placed on the surfaces of the two support plates (6), and a limit mechanism for fixing the cover plate (4) is provided in the middle of the upper surface of the furnace body (2). . 2.根据权利要求1所述的一种半导体石英玻璃制品用真空脱羟炉,其特征在于,所述限位机构包括螺纹杆(8)和电机(12),所述螺纹杆(8)转动设置于上侧所述滑槽的内部,上侧所述滑杆(3)与螺纹杆(8)螺纹套接,上侧所述滑槽的右侧开设空腔,所述螺纹杆(8)的右端延伸至空腔的内部,所述炉体(2)的上表面中部固定设置有支撑架(10),所述支撑架(10)的下表面转动设置有传动杆(11),所述传动杆(11)的下端延伸至空腔的内部,所述螺纹杆(8)的右端和传动杆(11)的下端均固定套接有锥齿轮(13),两个所述锥齿轮(13)啮合连接,所述电机(12)设置于支撑架(10)的上表面,所述电机(12)的输出端与传动杆(11)的上端固定连接。2. The vacuum dehydroxylation furnace for semiconductor quartz glass products according to claim 1, wherein the limiting mechanism comprises a threaded rod (8) and a motor (12), and the threaded rod (8) rotates It is arranged inside the chute on the upper side, the sliding rod (3) on the upper side is threadedly sleeved with the threaded rod (8), a cavity is provided on the right side of the chute on the upper side, and the threaded rod (8) The right end of the furnace body (2) extends to the interior of the cavity, a support frame (10) is fixedly arranged in the middle of the upper surface of the furnace body (2), and a transmission rod (11) is rotatably provided on the lower surface of the support frame (10). The lower end of the transmission rod (11) extends to the interior of the cavity, the right end of the threaded rod (8) and the lower end of the transmission rod (11) are fixedly sleeved with bevel gears (13), two of the bevel gears (13) ) meshing connection, the motor (12) is arranged on the upper surface of the support frame (10), and the output end of the motor (12) is fixedly connected with the upper end of the transmission rod (11). 3.根据权利要求1所述的一种半导体石英玻璃制品用真空脱羟炉,其特征在于,所述限位机构包括电动推杆(15)和卡块(16),所述炉体(2)的上表面中部固定设置有固定架(14),所述电动推杆(15)固定设置于固定架(14)的内部,所述卡块(16)固定设置于电动推杆(15)的活塞杆末端,所述卡块(16)的下端延伸至上侧所述滑槽的内部,上侧所述滑杆(3)的右端上表面开设有卡槽,所述卡块(16)与卡槽相匹配。3. The vacuum dehydroxylation furnace for semiconductor quartz glass products according to claim 1, wherein the limiting mechanism comprises an electric push rod (15) and a clamping block (16), and the furnace body (2) ) is fixedly provided with a fixing frame (14) in the middle of the upper surface, the electric push rod (15) is fixedly arranged inside the fixing frame (14), and the clamping block (16) is fixedly arranged on the inner side of the electric push rod (15). At the end of the piston rod, the lower end of the clamping block (16) extends to the interior of the upper sliding slot, the upper surface of the right end of the upper sliding rod (3) is provided with a clamping slot, and the clamping block (16) is connected with the clamping slot (16). slot to match. 4.根据权利要求2所述的一种半导体石英玻璃制品用真空脱羟炉,其特征在于,所述电机(12)通过安装架与支撑架(10)固定连接。4 . The vacuum dehydroxylation furnace for semiconductor quartz glass products according to claim 2 , wherein the motor ( 12 ) is fixedly connected to the support frame ( 10 ) through a mounting frame. 5 . 5.根据权利要求1所述的一种半导体石英玻璃制品用真空脱羟炉,其特征在于,下侧所述滑槽的内部均固定设置有固定杆(9),下侧所述滑杆(3)与固定杆(9)活动套接。5. The vacuum dehydroxylation furnace for semiconductor quartz glass products according to claim 1, characterized in that, a fixed rod (9) is fixedly arranged in the inside of the chute on the lower side, and the sliding rod (9) on the lower side is fixed. 3) It is movably socketed with the fixed rod (9). 6.根据权利要求1所述的一种半导体石英玻璃制品用真空脱羟炉,其特征在于,两个所述支撑板(6)的上表面均设置有防滑纹路。6 . The vacuum dehydroxylation furnace for semiconductor quartz glass products according to claim 1 , wherein the upper surfaces of the two support plates ( 6 ) are provided with anti-skid lines. 7 . 7.根据权利要求1所述的一种半导体石英玻璃制品用真空脱羟炉,其特征在于,所述盖板(4)的两侧均固定设置有密封环(17)。7 . The vacuum dehydroxylation furnace for semiconductor quartz glass products according to claim 1 , wherein sealing rings ( 17 ) are fixed on both sides of the cover plate ( 4 ). 8 .
CN202121990816.5U 2021-08-24 2021-08-24 A vacuum dehydroxylation furnace for semiconductor quartz glass products Expired - Fee Related CN215712589U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202121990816.5U CN215712589U (en) 2021-08-24 2021-08-24 A vacuum dehydroxylation furnace for semiconductor quartz glass products

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202121990816.5U CN215712589U (en) 2021-08-24 2021-08-24 A vacuum dehydroxylation furnace for semiconductor quartz glass products

Publications (1)

Publication Number Publication Date
CN215712589U true CN215712589U (en) 2022-02-01

Family

ID=80005953

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202121990816.5U Expired - Fee Related CN215712589U (en) 2021-08-24 2021-08-24 A vacuum dehydroxylation furnace for semiconductor quartz glass products

Country Status (1)

Country Link
CN (1) CN215712589U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116903233A (en) * 2023-09-13 2023-10-20 江苏圣达石英制品有限公司 High-temperature vacuum dehydroxylation furnace for quartz furnace tube

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116903233A (en) * 2023-09-13 2023-10-20 江苏圣达石英制品有限公司 High-temperature vacuum dehydroxylation furnace for quartz furnace tube
CN116903233B (en) * 2023-09-13 2023-11-24 江苏圣达石英制品有限公司 High-temperature vacuum dehydroxylation furnace for quartz furnace tube

Similar Documents

Publication Publication Date Title
CN213350677U (en) A firm clamping device for metal forging processing
CN215712589U (en) A vacuum dehydroxylation furnace for semiconductor quartz glass products
CN116727890A (en) Multi-station efficient rotary cutting device for aluminum material processing
CN211806226U (en) Clamping mechanism for glassware discharging manipulator
CN216585078U (en) Tungsten-nickel alloy heat treatment quenching and annealing integrated equipment
CN216067898U (en) Positioning device for processing container bottom plate
CN220882254U (en) Full-automatic hydraulic clamping device of robot
CN210450098U (en) A special wash rack for phosphorus copper alloy
CN113334188B (en) Three laminar quartz crucible surface trimmer systems of standing vertically
CN210756664U (en) A loading and unloading manipulator of a parallel double-spindle machine tool
CN215665842U (en) Unloader is used in mould processing
CN213859160U (en) Turnover mechanism for hardware processing
CN204606900U (en) Mobile Yun Fen mechanism and move the automatic die casting production line of Yun Fen mechanism containing this
CN219234377U (en) Product mounting fixture convenient to dismouting
CN211639963U (en) Mechanical gripper for machining robot
CN211333519U (en) Full-automatic slicer unloading manipulator
CN215527690U (en) Semiconductor tube charging and discharging packaging device
CN209736347U (en) Precision copper piece capillary tube drawing cooling device
CN215139049U (en) Starch sugar casting machine based on manipulator
CN219212239U (en) Turning and polishing integrated machine for machining
CN221620614U (en) A double-point multi-station punch press
CN222881679U (en) A fixed structure oxidation furnace tooling
CN223382725U (en) High-efficient degreasing furnace that brazes
CN217169378U (en) Quick cooling device of plastics cake cup processing usefulness
CN220051982U (en) Cutting device for production of fresh-keeping card

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20220201

CF01 Termination of patent right due to non-payment of annual fee