CN215542737U - Light impurity treatment device for polycrystalline silicon granules - Google Patents
Light impurity treatment device for polycrystalline silicon granules Download PDFInfo
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- CN215542737U CN215542737U CN202121958354.9U CN202121958354U CN215542737U CN 215542737 U CN215542737 U CN 215542737U CN 202121958354 U CN202121958354 U CN 202121958354U CN 215542737 U CN215542737 U CN 215542737U
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Abstract
The utility model discloses a device for treating light impurities in polycrystalline silicon granules, relates to the technical field of polycrystalline silicon production, and mainly aims to improve the efficiency of removing the light high-molecular impurities in the polycrystalline silicon granules. The main technical scheme of the utility model is as follows: polycrystalline silicon granule light impurity processing apparatus, the device includes: the sorting part, the first conveying belt mechanism and the second conveying belt mechanism; the sorting part comprises an air suction mechanism and a nozzle; the first conveying belt mechanism and the second conveying belt mechanism are arranged in a front-back mode, the position of the first conveying belt mechanism is higher than that of the second conveying belt mechanism, the nozzle is located between the first conveying belt mechanism and the second conveying belt mechanism, the air injection direction of the nozzle and the transmission direction of the second conveying belt mechanism form an acute angle, and the air exhaust mechanism corresponds to the nozzle up and down and is used for receiving air flow sprayed by the nozzle.
Description
Technical Field
The utility model relates to the technical field of polycrystalline silicon production, in particular to a polycrystalline silicon granule light impurity processing device.
Background
At present, electronic grade and solar grade silicon wafer production all adopts a multiple feeding technology, so that the demand on small particles is increasingly large, the production of small polysilicon particles needs to be subjected to multiple crushing and particle size separation, the small polysilicon particles can be contacted with a light high polymer material in the crushing and separation processes, more small light high polymer fragments and particles can be generated due to mutual friction, the quality of products can be seriously influenced when the organic matters enter a single crystal furnace to be drawn, most of the treatment methods for treating the high polymer foreign matters contained in the small polysilicon particles adopt manual separation, the labor intensity is high, the efficiency is low, industrial batch production cannot be realized, and the small particle materials cannot meet the quality standard of monocrystalline silicon raw materials.
With the maturity and large-area popularization of the continuous crystal pulling process of the single crystal, the market demands for small polysilicon granules are more and more, and meanwhile, the quality demand of the single crystal determines that the content of impurity foreign matters in the small granules needs to be controlled at an extremely low level, so that the treatment efficiency and the treatment quality of the small foreign matters in the small granules are the problems which need to be faced and urgently solved by polysilicon enterprises.
SUMMERY OF THE UTILITY MODEL
In view of this, the utility model provides a device for treating light impurities in polysilicon granules, and mainly aims to improve the efficiency of removing light high molecular impurities in polysilicon granules.
In order to achieve the purpose, the utility model mainly provides the following technical scheme:
the utility model provides a device for treating light impurities in polycrystalline silicon granules, which comprises: the sorting part, the first conveying belt mechanism and the second conveying belt mechanism;
the sorting part comprises an air suction mechanism and a nozzle;
the first conveying belt mechanism and the second conveying belt mechanism are arranged in a front-back mode, the position of the first conveying belt mechanism is higher than that of the second conveying belt mechanism, the nozzle is located between the first conveying belt mechanism and the second conveying belt mechanism, the air injection direction of the nozzle and the transmission direction of the second conveying belt mechanism form an acute angle, and the air exhaust mechanism corresponds to the nozzle up and down and is used for receiving air flow sprayed by the nozzle.
The object of the present invention and the technical problems solved thereby can be further achieved by the following technical measures.
Optionally, the acute angle is 75 ° to 85 °.
Optionally, the number of the nozzles is multiple, and the multiple nozzle arrays are arranged between the first conveying belt mechanism and the second conveying belt mechanism.
Optionally, the array arrangement of the plurality of nozzles is three rows and ten columns.
Optionally, the first conveyor belt mechanism has an elevation angle from a beginning of the first conveyor belt mechanism to an end of the first conveyor belt mechanism.
Optionally, the elevation angle is less than 15 °.
Optionally, the air exhaust mechanism comprises a drainage cover, an exhaust pipe and a draught fan, the drainage cover is located right above the nozzle, the lower end of the exhaust pipe is connected with the drainage cover, and the upper end of the exhaust pipe is connected with the draught fan.
By the technical scheme, the utility model at least has the following advantages:
firstly, pouring the mixture of the polycrystalline silicon particles and the light high molecular impurities onto a conveying belt of a first conveying belt mechanism to enable the moving speed of the mixture to be consistent with the conveying speed of the first conveying belt mechanism. When the mixture is thrown out from the tail end of the first conveying belt mechanism, the mixture passes through the space above the nozzles, the mixture is blown by the airflow sprayed by the nozzles, the density of light high-molecular impurities in the mixture is low, the light high-molecular impurities float upwards along with the airflow, and the light high-molecular impurities are captured while the air exhaust mechanism receives the airflow.
The polycrystalline silicon granules have higher density, the movement track of the polycrystalline silicon granules is not easy to change along with the airflow, and the polycrystalline silicon granules keep horizontal throwing movement and finally fall onto the conveying belt of the second conveying belt mechanism to be conveyed to the next procedure.
The device can automatically remove the high-molecular foreign matters, completely replace manual operation, greatly improve the production efficiency and improve the product quality.
Drawings
Fig. 1 is a schematic structural diagram of a device for treating light impurities in polysilicon granules according to an embodiment of the present invention.
Reference numerals in the drawings of the specification include: the device comprises an air exhaust mechanism 1, a nozzle 2, a first conveying belt mechanism 3, a second conveying belt mechanism 4, a flow guide cover 101, an air exhaust pipe 102 and an induced draft fan 103.
Detailed Description
To further explain the technical means and effects of the present invention for achieving the intended purpose of the utility model, the following detailed description of the embodiments, structures, features and effects according to the present application will be given with reference to the accompanying drawings and preferred embodiments. In the following description, different "one embodiment" or "an embodiment" refers to not necessarily the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.
The present invention will be described in further detail with reference to the accompanying drawings and examples.
As shown in fig. 1, an embodiment of the present invention provides a device for treating light impurities in polysilicon granules, which comprises: a sorting part, a first conveyor belt mechanism 3 and a second conveyor belt mechanism 4;
the sorting part comprises an air exhaust mechanism 1 and a nozzle 2;
wherein, first conveyer belt mechanism 3 with second conveyer belt mechanism 4 tandem arrangement, first conveyer belt mechanism 3's position is higher than second conveyer belt mechanism 4's position, nozzle 2 is located first conveyer belt mechanism 3 with between the second conveyer belt mechanism 4, the jet-propelled direction of nozzle 2 with the transmission direction of second conveyer belt mechanism 4 is the acute angle, air exhaust mechanism 1 with nozzle 2 corresponds from top to bottom for receive 2 spun air currents of nozzle.
The working process of the polycrystalline silicon granular material light impurity treatment device is as follows:
first, the mixture of the polysilicon granules and the light polymer impurities is poured onto the conveyor belt of the first conveyor belt mechanism 3, so that the moving speed of the mixture gradually coincides with the conveying speed of the first conveyor belt mechanism 3. When the mixture is thrown out from the tail end of the first conveying belt mechanism 3, the mixture passes through the space above the nozzle 2, the mixture is blown by the airflow sprayed by the nozzle 2, the density of light high molecular impurities in the mixture is low, the light high molecular impurities float upwards along with the airflow, and the light high molecular impurities are captured while the air exhaust mechanism 1 receives the airflow.
The polycrystalline silicon granules have high density, the movement track of the polycrystalline silicon granules is not easy to change along with the airflow, and the polycrystalline silicon granules continue to keep horizontal throwing movement and finally fall onto the conveying belt of the second conveying belt mechanism 4 to be conveyed to the next procedure.
Light polymer impurities are automatically removed through the device, manual operation is completely replaced, production efficiency is improved, and product quality is improved.
According to the technical scheme, after the device is put into use, the small granules can be formally subjected to industrial batch production, the content of high-molecular impurity foreign matters is further reduced to below 0.2% from about 1% originally, and the production of the silicon single crystal rod is completely met. Meanwhile, the device is put into use, so that the labor intensity is greatly relieved, the production efficiency is improved by 7-10 times, the small particle treatment capacity generated in the production process is basically met, and the high-quality product rate is improved.
Specifically, the moisture content of the polysilicon granule sample is about 1-5%, so the device is arranged in a microwave drying unit and runs in a microwave drying closed chamber.
Specifically, first conveyer belt mechanism 3 and the equal level setting of second conveyer belt mechanism 4, first conveyer belt mechanism 3's position is higher than the position of second conveyer belt mechanism 4 to make the mixture of polycrystalline silicon granule material and light macromolecular impurity flat throw to the top space of nozzle 2, finally, the polycrystalline silicon granule material descends in second conveyer belt mechanism 4, reaches the purpose of rejecting light macromolecular impurity.
Specifically, the air injection direction of the nozzle 2 and the transmission direction of the second conveyor belt mechanism 4 form an acute angle, the vertical component force of the air flow drives the light polymer impurities to float upwards, and the horizontal component force of the air flow has a certain forward pushing effect on the polycrystalline silicon granules, so that the polycrystalline silicon granules are finally thrown onto the conveyor belt of the second conveyor belt mechanism 4.
Specifically, the second conveyor belt mechanism 4 is horizontally arranged to stably receive the thrown-down polysilicon granules.
Specifically, the transmission speed of the first conveyor belt mechanism 3 is set to be 6-10 m/min.
In a specific embodiment, the acute angle is 75 ° to 85 °.
In the present embodiment, specifically, the acute angle α between the direction of the air flow ejected from the nozzle 2 and the transport direction of the second conveyor belt mechanism 4 is 75 ° to 85 ° so that the magnitude of the vertical component force of the air flow is several times the magnitude of the horizontal component force of the air flow, and thus the light polymer impurities in the mixture are lifted upward by a sufficient driving force, so that the air extraction mechanism 1 can quickly receive the light polymer impurities.
In a specific embodiment, the number of the nozzles 2 is plural, and a plurality of the nozzles 2 are arrayed between the first conveyor belt mechanism 3 and the second conveyor belt mechanism 4.
In the present embodiment, specifically, the width of the array arrangement of the plurality of nozzles 2 is equal to the width of the first conveyor belt mechanism 3 and also equal to the width of the second conveyor belt mechanism 4; the length of the array arrangement of the plurality of nozzles 2 is equal to the horizontal distance between the first conveyor belt mechanism 3 and the second conveyor belt mechanism 4.
The nozzles 2 form an array arrangement, the nozzles 2 synchronously eject airflow to form an air driving surface with upward acting force, and under the action of the air driving surface, the light high molecular impurities at different positions in the mixture synchronously receive buoyancy lifting driving force, so that the light high molecular impurities at different positions can synchronously ascend to the air exhaust mechanism 1.
In the embodiment, the array of the plurality of nozzles 2 is arranged in three rows and ten columns.
In the present embodiment, specifically, the number of the nozzles 2 is thirty, and the array arrangement of the thirty nozzles 2 is three rows and ten columns, so that the thirty nozzle 2 air source points constitute the air driving surface.
In a specific embodiment, the first conveyor belt mechanism 3 has an elevation angle from the beginning of the first conveyor belt mechanism 3 to the end of the first conveyor belt mechanism 3.
In the present embodiment, the second conveyor belt mechanism 4 is horizontally disposed, the first conveyor belt mechanism 3 has an elevation angle, and when the mixture is thrown from the end of the first conveyor belt mechanism 3, the movement locus of the mixture is a movement locus of being thrown obliquely upward, and the mixture falls after rising after being thrown. Compared with the mixture in horizontal projectile motion, the mixture in the embodiment has longer gliding time in the space above the nozzle 2, and light high molecular impurities in the mixture are removed more thoroughly.
In a particular embodiment, the elevation angle is less than 15 °.
In the present embodiment, since the first conveyor belt mechanism 3 has an elevation angle from the start end of the first conveyor belt mechanism 3 to the end of the first conveyor belt mechanism 3, the conveyor belt of the first conveyor belt mechanism 3 has an inclined surface having an inclination direction opposite to the material conveying direction of the first conveyor belt mechanism 3, and the elevation angle of the first conveyor belt mechanism 3 is set to a small angle smaller than 15 ° in order to prevent the polycrystalline silicon granular materials from sliding down the inclined surface of the first conveyor belt mechanism 3.
In a specific embodiment, the air exhaust mechanism 1 comprises a flow guide cover 101, an air exhaust pipe 102 and an induced draft fan 103, the flow guide cover 101 is located right above the nozzle 2, the lower end of the air exhaust pipe 102 is connected to the flow guide cover 101, and the upper end of the air exhaust pipe 102 is connected to the induced draft fan 103.
In this embodiment, specifically, the drainage cover 101 is trapezoidal, and the width of the drainage cover 101 is greater than the width of the first conveyor belt mechanism 3 and is also greater than the width of the second conveyor belt mechanism 4; the length of the drainage cover 101 is larger than the distance between the first conveying belt mechanism 3 and the second conveying belt mechanism 4. Through the arrangement, the coverage range of the drainage cover 101 is larger than the range of the array arrangement of the plurality of nozzles 2, and the range of the array arrangement of the plurality of nozzles 2 is larger than the range of spreading when the mixture particles are horizontally thrown. In the process that the light high molecular impurities float with the air flow, the light high molecular impurities are collected at the lower end of the air extraction pipe 102 along the inner surface of the flow guide cover 101 and enter the air extraction pipe 102, so that all the light high molecular impurities floating upwards can be collected with the air flow generated by the induced draft fan 103 in a flow guide manner.
The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present invention, and all the changes or substitutions should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.
Claims (7)
1. A light impurity processing device of polycrystalline silicon granules is characterized by comprising:
a sorting section including an air suction mechanism and a nozzle;
a first conveyor belt mechanism;
a second conveyor belt mechanism;
the first conveying belt mechanism and the second conveying belt mechanism are arranged in a front-back mode, the position of the first conveying belt mechanism is higher than that of the second conveying belt mechanism, the nozzle is located between the first conveying belt mechanism and the second conveying belt mechanism, the air injection direction of the nozzle and the transmission direction of the second conveying belt mechanism form an acute angle, and the air exhaust mechanism corresponds to the nozzle up and down and is used for receiving air flow sprayed by the nozzle.
2. The device for treating light impurities in polysilicon granules according to claim 1,
the acute angle is 75 ° to 85 °.
3. The device for treating light impurities in polysilicon granules according to claim 1,
the number of the nozzles is multiple, and the multiple nozzle arrays are arranged between the first conveying belt mechanism and the second conveying belt mechanism.
4. The device for treating light impurities in polysilicon granules according to claim 3,
the array arrangement form of a plurality of the nozzles is three rows and ten columns.
5. The apparatus for treating light impurities in polysilicon granules according to any one of claims 1 to 4,
the first conveyor belt mechanism has an elevation angle from a beginning of the first conveyor belt mechanism to an end of the first conveyor belt mechanism.
6. The device for treating light impurities in polysilicon granules according to claim 5,
the elevation angle is less than 15 °.
7. The apparatus for treating light impurities in polysilicon granules according to any one of claims 1 to 4,
air exhaust mechanism includes drainage cover, exhaust tube and draught fan, the drainage cover is located directly over the nozzle, the lower extreme of exhaust tube connect in the drainage cover, the upper end of exhaust tube is connected in the draught fan.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121958354.9U CN215542737U (en) | 2021-08-18 | 2021-08-18 | Light impurity treatment device for polycrystalline silicon granules |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121958354.9U CN215542737U (en) | 2021-08-18 | 2021-08-18 | Light impurity treatment device for polycrystalline silicon granules |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215542737U true CN215542737U (en) | 2022-01-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202121958354.9U Active CN215542737U (en) | 2021-08-18 | 2021-08-18 | Light impurity treatment device for polycrystalline silicon granules |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215542737U (en) |
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2021
- 2021-08-18 CN CN202121958354.9U patent/CN215542737U/en active Active
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