CN215526345U - Stamp substrate - Google Patents

Stamp substrate Download PDF

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Publication number
CN215526345U
CN215526345U CN202121776371.0U CN202121776371U CN215526345U CN 215526345 U CN215526345 U CN 215526345U CN 202121776371 U CN202121776371 U CN 202121776371U CN 215526345 U CN215526345 U CN 215526345U
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China
Prior art keywords
glass layer
pet film
stamp
layer
photoresist layer
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Active
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CN202121776371.0U
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Chinese (zh)
Inventor
刘守航
杜政
党康康
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Huatian Huichuang Technology Xi'an Co ltd
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Huatian Huichuang Technology Xi'an Co ltd
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Abstract

The utility model provides a stamp substrate, comprising a PET film; a first glass layer is arranged on one side surface of the PET film, and the PET film and the first glass layer are connected through a first photoresist layer to form a first-side stamp substrate; and a second glass layer is arranged on the other side surface of the PET film, and the PET film and the second glass layer are connected through a second photoresist layer to form a second side stamp substrate. Through being the PET membrane with stamp basement, shift to the glass basement on, pass through photoresist layer connection glass layer in the both sides of PET membrane, can guarantee like this at impression back drawing of patterns in-process, pull the PET membrane, glass can not produce obvious deformation, consequently stamp glues and can not produce deformation, and then the product impression can not exist deformation and guarantee to counterpoint, can guarantee the stability that the whole face of nanometer impression was counterpointed, can satisfy the whole face of nanometer impression requirement of counterpointing 5 microns.

Description

Stamp substrate
Technical Field
The utility model belongs to the field of nanoimprint stamp substrates, and particularly belongs to a stamp substrate.
Background
The nano-imprinting technology is a novel micro-nano processing technology. And transferring the micro-nano structure on the template to a material to be processed by the assistance of the photoresist. The technology achieves ultrahigh resolution by means of mechanical transfer, and is an important processing means in the fields of microelectronics and materials.
The nanoimprint stamp substrate in the prior art is a PET substrate film with the thickness of 0.25mm, deformation amounts in X and Y directions of PET exist in the imprinting and demolding processes, the deformation amount in the X direction is about 5 micrometers, and the deformation amount in the Y direction is about 10 micrometers, so that the sheet-to-sheet alignment is unstable in the product imprinting process, the entire surface alignment is stable, and the existing stamp substrate PET material has deformation and cannot meet the requirements of production and manufacturing. The deformation of the PET substrate stamp during embossing and demolding (shrinkage in the X direction and stretching deformation in the Y direction) is shown in FIGS. 1 to 3.
SUMMERY OF THE UTILITY MODEL
In order to solve the problems in the prior art, the utility model provides a stamp substrate which can ensure the stability of the alignment of the whole nano-imprinting surface and can meet the requirement of the alignment of the whole nano-imprinting surface of +/-5 microns.
In order to achieve the purpose, the utility model provides the following technical scheme:
a stamp substrate comprising a PET film;
a first glass layer is arranged on one side surface of the PET film, and the PET film and the first glass layer are connected through a first photoresist layer to form a first-side stamp substrate;
and a second glass layer is arranged on the other side surface of the PET film, and the PET film and the second glass layer are connected through a second photoresist layer to form a second side stamp substrate.
Preferably, the thickness ranges of the first glass layer and the second glass layer are both 70-100 μm.
Preferably, the first glass layer and the second glass layer have the same thickness.
Preferably, the thickness ranges of the first photoresist layer and the second photoresist layer are both 5-10 μm.
Preferably, the first photoresist layer and the second photoresist layer have the same thickness.
Preferably, the first photoresist layer and the second photoresist layer bond the PET film and the glass layer by a UV curing method.
Preferably, the thickness range of the PET film is 0.25-0.5 mm.
Preferably, the first glass layer is coated with a first photoresist layer by adopting a spin-coating processing mode.
Preferably, a second photoresist layer is coated on the second glass layer by adopting a spin-coating processing mode.
Compared with the prior art, the utility model has the following beneficial technical effects:
the utility model provides a stamp substrate, which is characterized in that a PET (polyethylene terephthalate) film is transferred to a glass substrate, and glass layers are connected to two sides of the PET film through photoresist layers, so that the PET film is pulled and the glass cannot deform obviously in the demolding process after imprinting, the stamp film cannot deform to ensure alignment, and the first glass layer can ensure that the pressure surface of the PET film is changed into the glass in the rolling process, so that the deformation of the stamp substrate in the rolling process is reduced; the second glass layer can reduce the deformation that stamp basement produced in impression and the drawing of patterns process simultaneously, and both combined actions reduce stamp basement deformation, guarantee the stability of impression and drawing of patterns process pattern, guarantee the stability between piece and the piece, guarantee the counterpoint effect.
Drawings
FIG. 1 is a schematic illustration of a stamp substrate product embossing process;
FIG. 2 is a schematic illustration of a stamp substrate product demolding process;
FIG. 3 is a schematic diagram of deformation of stamp substrate in X and Y directions;
FIG. 4 is a schematic structural diagram of a stamp substrate according to the present invention;
in the drawings: 1 is a PET film; 2 is a first photoresist layer; 3 is a first glass layer; 4 is a second photoresist layer; and 5 is a second glass layer.
Detailed Description
The present invention will now be described in further detail with reference to specific examples, which are intended to be illustrative, but not limiting, of the utility model.
As shown in fig. 4, the stamp substrate of the present invention includes a PET film 1, a first photoresist layer 2, a first glass layer 3, a second photoresist layer 4 and a second glass layer 5, wherein the first glass layer 3 is disposed on one side surface of the PET film 1, and the PET film 1 and the first glass layer 3 are connected through the first photoresist layer 2 to form a first stamp substrate; the other side surface of the PET film 1 is provided with a second glass layer 5, and the PET film 1 and the second glass layer 5 are connected through a second photoresist layer 4 to form a second face stamp substrate.
The first glass layer 3 ensures that a pressure surface of a PET film is changed into glass in the rolling and printing process, so that the deformation of the stamp substrate in the rolling process is reduced; the second glass layer 5 can reduce the deformation of the stamp substrate in the processes of stamping and demolding; the two act together to reduce stamp substrate deformation, ensure the stability of patterns in the imprinting and demolding process, ensure the stability between sheets and ensure the alignment effect.
The thickness ranges of the first glass layer 3 and the second glass layer 5 are both 70-100 mu m, and the thickness of the first glass layer 3 is the same as that of the second glass layer 5.
The thickness ranges of the first photoresist layer 2 and the second photoresist layer 4 are both 5-10 mu m. The first photoresist layer 2 and the second photoresist layer 4 have the same thickness; the first photoresist layer 2 is used for bonding the PET film 1 and the first glass layer 3 in a UV curing manner; the second photoresist layer 4 is used to bond the PET film 1 and the second glass layer 5 by a UV curing method. The thickness of the PET film 1 is about 0.25 to 0.5 mm.
According to the stamp substrate, a first glass layer 3 is placed on a workbench, a first photoresist layer 2 is coated on the first glass layer 3, and the first photoresist layer 2 is coated in a spin-coating processing mode. And stamping the PET film 1 and the glued first glass layer 3 by adopting a stamp stamping manufacturing process on the glued first glass layer 3. After embossing, the overall structure is UV cured to form a first side stamp substrate. And placing the second glass layer 5 on a workbench, coating the second photoresist layer 4 on the second glass layer 5, and coating the second photoresist layer 4 by adopting a spin-coating processing mode. And stamping the first-side stamp substrate and the second glass layer 5 after the gluing by adopting a stamp stamping manufacturing process on the second glass layer 5 after the gluing is finished, and carrying out UV curing after stamping to form a second-side stamp substrate. The completion of the above operation produces OKstm substrate for stamp fabrication.

Claims (9)

1. A stamp substrate, characterized by comprising a PET film (1);
a first glass layer (3) is arranged on one side surface of the PET film (1), and the PET film (1) and the first glass layer (3) are connected through a first photoresist layer (2) to form a first-side stamp substrate;
and a second glass layer (5) is arranged on the other side surface of the PET film (1), and the PET film (1) and the second glass layer (5) are connected through a second photoresist layer (4) to form a second-side stamp substrate.
2. A stamp substrate according to claim 1, wherein the first glass layer (3) and the second glass layer (5) each have a thickness in the range of 70 to 100 μm.
3. A stamp substrate according to claim 1, wherein the first glass layer (3) and the second glass layer (5) have the same thickness.
4. A stamp substrate according to claim 1, wherein the first photoresist layer (2) and the second photoresist layer (4) each have a thickness in the range of 5 to 10 μm.
5. A stamp substrate according to claim 1, wherein the first photoresist layer (2) and the second photoresist layer (4) have the same thickness.
6. A stamp substrate according to claim 1, wherein the first photoresist layer (2) and the second photoresist layer (4) are used to bond the PET film (1) and the glass layer (3) by means of UV curing.
7. A stamp substrate according to claim 1, wherein the PET film (1) has a thickness in the range of 0.25-0.5 mm.
8. A stamp substrate according to claim 1, wherein the first glass layer (3) is coated with a first photoresist layer (2) by a spin-coating process.
9. A stamp substrate according to claim 1, wherein the second glass layer (5) is coated with a second photoresist layer (4) by spin-coating.
CN202121776371.0U 2021-07-30 2021-07-30 Stamp substrate Active CN215526345U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202121776371.0U CN215526345U (en) 2021-07-30 2021-07-30 Stamp substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202121776371.0U CN215526345U (en) 2021-07-30 2021-07-30 Stamp substrate

Publications (1)

Publication Number Publication Date
CN215526345U true CN215526345U (en) 2022-01-14

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202121776371.0U Active CN215526345U (en) 2021-07-30 2021-07-30 Stamp substrate

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Country Link
CN (1) CN215526345U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113406860A (en) * 2021-07-30 2021-09-17 华天慧创科技(西安)有限公司 Stamp substrate and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113406860A (en) * 2021-07-30 2021-09-17 华天慧创科技(西安)有限公司 Stamp substrate and preparation method thereof
CN113406860B (en) * 2021-07-30 2023-09-12 华天慧创科技(西安)有限公司 Stamp substrate and preparation method thereof

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