CN113406860B - Stamp substrate and preparation method thereof - Google Patents
Stamp substrate and preparation method thereof Download PDFInfo
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- CN113406860B CN113406860B CN202110874233.4A CN202110874233A CN113406860B CN 113406860 B CN113406860 B CN 113406860B CN 202110874233 A CN202110874233 A CN 202110874233A CN 113406860 B CN113406860 B CN 113406860B
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- glass layer
- pet film
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- layer
- stamp substrate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- Manufacturing Optical Record Carriers (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
The invention provides a stamp substrate and a preparation method thereof, comprising a PET film; a first glass layer is arranged on one side surface of the PET film, and the PET film and the first glass layer are connected through a first photoresist layer to form a first surface stamp substrate; and a second glass layer is arranged on the surface of the other side of the PET film, and the PET film and the second glass layer are connected through a second photoresist layer to form a second face stamp substrate. Through with stamp base by the PET membrane, transfer to the glass base on, connect the glass layer through the photoresist layer in the both sides of PET membrane, can guarantee like this to pull the PET membrane after the impression drawing of patterns in-process, glass can not produce obvious deformation, therefore stamp glue can not produce deformation, and then the product impression can not exist deformation and guarantee to put in place, can guarantee the stability that the whole face of nanoimprint was put in place, can satisfy the whole face of nanoimprint and put in place + -5 microns's requirement.
Description
Technical Field
The invention belongs to the field of nano-imprinting stamp substrates, and particularly relates to a stamp substrate and a preparation method thereof.
Background
The nanoimprint technology is a novel micro-nano processing technology. And transferring the micro-nano structure on the template to the material to be processed by the aid of photoresist. The technology achieves ultra-high resolution through a mechanical transfer means, and is an important processing means in the fields of microelectronics and materials.
The nano-imprinting stamp substrate in the prior art is a PET substrate film with the thickness of 0.25mm, deformation in X and Y directions exists in PET during imprinting and demolding, the deformation in X direction is about 5 mu m, the deformation in Y direction is about 10 mu m, the alignment between sheets is unstable during the imprinting of products, the nano-imprinting requires stable alignment, and the deformation exists in the PET material of the prior stamp substrate, so that the requirements of production and manufacture cannot be met. The PET substrate stamp is deformed (shrinkage exists in the X direction, tensile deformation exists in the Y direction) during the imprinting and demolding processes as shown in FIGS. 1 to 3.
Disclosure of Invention
In order to solve the problems in the prior art, the invention provides a stamp substrate and a preparation method, which can ensure the alignment stability of the whole nano-imprint surface and can meet the requirements of + -5 microns of the whole nano-imprint surface.
In order to achieve the above purpose, the present invention provides the following technical solutions:
a stamp substrate comprising a PET film;
a first glass layer is arranged on one side surface of the PET film, and the PET film and the first glass layer are connected through a first photoresist layer to form a first surface stamp substrate;
and a second glass layer is arranged on the surface of the other side of the PET film, and the PET film and the second glass layer are connected through a second photoresist layer to form a second face stamp substrate.
Preferably, the thickness of the first glass layer and the second glass layer is in the range of 70-100 μm.
Preferably, the thickness of the first photoresist layer and the second photoresist layer is 5-10 μm.
Preferably, the first photoresist layer and the second photoresist layer bond the PET film and the glass layer by UV curing.
Preferably, the thickness of the PET film ranges from 0.25 to 0.5mm.
A preparation method of a stamp substrate comprises the following steps,
step 1, placing a first glass layer on a workbench, and coating a first photoresist layer on the first glass layer;
step 2, imprinting the PET film and the glued first glass layer by adopting a stamp imprinting manufacturing process on the glued first glass layer; solidifying the integral structure after imprinting to form a first surface stamp substrate;
step 3, placing a second glass layer on the workbench, and coating a second photoresist layer on the second glass layer;
and 4, imprinting the first surface stamp substrate in the step 2 and the glued second glass layer by adopting a stamp imprinting manufacturing process on the glued second glass layer, and solidifying the imprinted second surface stamp substrate to form the second surface stamp substrate.
Preferably, in step 1, a spin-coating process is used to coat a first photoresist layer on the first glass layer.
Preferably, in step 3, a spin-coating process is used to coat a second photoresist layer on the second glass layer.
Compared with the prior art, the invention has the following beneficial technical effects:
the invention provides a stamp substrate, which is characterized in that a stamp substrate is transferred onto a glass substrate from a PET film, and glass layers are connected on two sides of the PET film through photoresist layers, so that the PET film is pulled in the demolding process after stamping, the glass cannot generate obvious deformation, so that the stamp adhesive cannot deform, deformation of a product is avoided during stamping, alignment is guaranteed, the PET film is changed into the glass on a pressure surface in the rolling stamping process, and deformation of the stamp substrate in the rolling process is reduced; the second glass layer can simultaneously reduce the deformation of stamp substrate in the stamping and demolding processes, and the stamp substrate and the second glass layer act together to reduce the deformation of stamp substrate, ensure the stability of patterns in the stamping and demolding processes, ensure the stability between sheets and ensure the alignment effect.
The invention provides a preparation method of a stamp substrate, which has simple process flow, a first surface stamp substrate is formed by imprinting a first photoresist layer of a first photoresist layer on a first glass layer, a second photoresist layer is coated on a second glass layer, the first surface stamp substrate and the second photoresist layer after being glued are imprinted, and the second surface stamp substrate is formed by solidification after imprinting. An OKstamp substrate is generated and can be used for stamp manufacture; low processing cost and high economic benefit.
Drawings
FIG. 1 is a schematic illustration of a stamp substrate product stamping process;
FIG. 2 is a schematic diagram of a stamp substrate product demolding process;
FIG. 3 is a schematic diagram showing deformation of a stamp substrate in X and Y directions;
FIG. 4 is a schematic view of a stamp substrate according to the present invention;
in the accompanying drawings: 1 is PET film; 2 is a first photoresist layer; 3 is a first glass layer; 4 is a second photoresist layer; and 5 is a second glass layer.
Detailed Description
The invention will now be described in further detail with reference to specific examples, which are intended to illustrate, but not to limit, the invention.
As shown in fig. 4, the stamp substrate of the present invention includes a PET film 1, a first photoresist layer 2, a first glass layer 3, a second photoresist layer 4, and a second glass layer 5, wherein a first glass layer 3 is disposed on one surface of the PET film 1, and the PET film 1 and the first glass layer 3 are connected through the first photoresist layer 2 to form a first stamp substrate; the other side surface of the PET film 1 is provided with a second glass layer 5, and the PET film 1 and the second glass layer 5 are connected through a second photoresist layer 4 to form a second face stamp substrate.
The first glass layer 3 ensures that the PET film on the pressure surface is changed into glass in the rolling printing process, so that deformation of a stamp substrate in the rolling process is reduced; the second glass layer 5 can simultaneously reduce deformation of the stamp substrate in the imprinting and demolding processes; the two combined actions reduce the deformation of the stamp substrate, ensure the stability of patterns in the imprinting and demolding processes, ensure the stability between sheets and ensure the alignment effect.
In the present invention, the thickness of the first glass layer 3 and the second glass layer 5 is in the range of 70 to 100 μm, and the thicknesses of the first glass layer 3 and the second glass layer 5 are the same.
The thickness of the first photoresist layer 2 and the second photoresist layer 4 in the present invention is in the range of 5 to 10 μm. The thickness of the first photoresist layer 2 and the second photoresist layer 4 are the same; the first photoresist layer 2 is used for bonding the PET film 1 and the first glass layer 3 in a UV curing mode; the second photoresist layer 4 is used to bond the PET film 1 and the second glass layer 5 by UV curing. The thickness of the PET film 1 is about 0.25 to 0.5mm.
The invention relates to a preparation method of a stamp substrate, which comprises the following steps,
step 1, placing a first glass layer 3 on a workbench, coating a first photoresist layer 2 on the first glass layer 3, and coating the first photoresist layer 2 by adopting a spin-coating processing mode.
And 2, imprinting the PET film 1 and the glued first glass layer 3 by adopting a stamp imprinting manufacturing process on the glued first glass layer 3.
And 3, carrying out UV curing on the integral structure after imprinting to form a first surface stamp substrate.
And 4, placing the second glass layer 5 on a workbench, coating the second photoresist layer 4 on the second glass layer 5, and coating the second photoresist layer 4 by adopting a spin-coating processing mode.
And 5, imprinting the first surface stamp substrate and the glued second glass layer 5 on the glued second glass layer 5 by adopting a stamp imprinting manufacturing process, and performing UV (ultraviolet) curing after imprinting to form the second surface stamp substrate.
Step 6, completing the above operations to generate an OKstamp substrate, which can be used for stamp manufacturing.
Claims (6)
1. A stamp substrate characterized by comprising a PET film (1);
a first glass layer (3) is arranged on one side surface of the PET film (1), and the PET film (1) and the first glass layer (3) are connected through a first photoresist layer (2) to form a first surface stamp substrate;
a second glass layer (5) is arranged on the other side surface of the PET film (1), and the PET film (1) and the second glass layer (5) are connected through a second photoresist layer (4) to form a second surface stamp substrate;
the thickness range of the first glass layer (3) and the second glass layer (5) is 70-100 mu m;
the thickness range of the first photoresist layer (2) and the second photoresist layer (4) is 5-10 mu m.
2. A stamp substrate according to claim 1, characterized in that the first photoresist layer (2) and the second photoresist layer (4) are bonded to the PET film (1) and the glass layer (3) by UV curing.
3. A stamp substrate according to claim 1, characterized in that the thickness of the PET film (1) is in the range of 0.25-0.5 mm.
4. A preparation method of a stamp substrate is characterized by comprising the following steps,
step 1, placing a first glass layer (3) on a workbench, and coating a first photoresist layer (2) on the first glass layer (3);
step 2, imprinting the PET film (1) and the glued first glass layer (3) by adopting a stamp imprinting manufacturing process on the glued first glass layer (3); solidifying the integral structure after imprinting to form a first surface stamp substrate;
step 3, placing the second glass layer (5) on a workbench, and coating a second photoresist layer (4) on the second glass layer (5);
and 4, imprinting the first surface stamp substrate in the step 2 and the glued second glass layer (5) by adopting a stamp imprinting manufacturing process on the glued second glass layer (5), and solidifying the imprinted second surface stamp substrate.
5. The method of claim 4, wherein in step 1, spin-coating is used to coat the first photoresist layer (2) on the first glass layer (3).
6. The method of manufacturing a stamp substrate according to claim 4, wherein in step 3, a spin-coating process is used to coat the second glass layer (5) with the second photoresist layer (4).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110874233.4A CN113406860B (en) | 2021-07-30 | 2021-07-30 | Stamp substrate and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110874233.4A CN113406860B (en) | 2021-07-30 | 2021-07-30 | Stamp substrate and preparation method thereof |
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| Publication Number | Publication Date |
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| CN113406860A CN113406860A (en) | 2021-09-17 |
| CN113406860B true CN113406860B (en) | 2023-09-12 |
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| CN202110874233.4A Active CN113406860B (en) | 2021-07-30 | 2021-07-30 | Stamp substrate and preparation method thereof |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102279517A (en) * | 2010-06-14 | 2011-12-14 | 清华大学 | Nano-imprinting method |
| CN102544264A (en) * | 2012-01-19 | 2012-07-04 | 苏州锦元纳米科技有限公司 | Method for preparing nano pattern on sapphire substrate |
| CN102854741A (en) * | 2012-09-29 | 2013-01-02 | 青岛理工大学 | Compound soft die for wafer-grade nano imprinting of uneven substrate and manufacturing method |
| CN107643652A (en) * | 2017-10-31 | 2018-01-30 | 武汉华星光电技术有限公司 | Nano-imprint stamp and preparation method thereof and application |
| CN109313386A (en) * | 2016-04-06 | 2019-02-05 | 皇家飞利浦有限公司 | The making and use method of imprint lithography stamp |
| CN110244510A (en) * | 2019-07-31 | 2019-09-17 | 京东方科技集团股份有限公司 | A kind of nano-imprint stamp and preparation method thereof |
| CN110361930A (en) * | 2019-07-16 | 2019-10-22 | 京东方科技集团股份有限公司 | A kind of nano-imprint stamp and preparation method thereof |
| CN215526345U (en) * | 2021-07-30 | 2022-01-14 | 华天慧创科技（西安）有限公司 | Stamp substrate |
-
2021
- 2021-07-30 CN CN202110874233.4A patent/CN113406860B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102279517A (en) * | 2010-06-14 | 2011-12-14 | 清华大学 | Nano-imprinting method |
| CN102544264A (en) * | 2012-01-19 | 2012-07-04 | 苏州锦元纳米科技有限公司 | Method for preparing nano pattern on sapphire substrate |
| CN102854741A (en) * | 2012-09-29 | 2013-01-02 | 青岛理工大学 | Compound soft die for wafer-grade nano imprinting of uneven substrate and manufacturing method |
| CN109313386A (en) * | 2016-04-06 | 2019-02-05 | 皇家飞利浦有限公司 | The making and use method of imprint lithography stamp |
| CN107643652A (en) * | 2017-10-31 | 2018-01-30 | 武汉华星光电技术有限公司 | Nano-imprint stamp and preparation method thereof and application |
| CN110361930A (en) * | 2019-07-16 | 2019-10-22 | 京东方科技集团股份有限公司 | A kind of nano-imprint stamp and preparation method thereof |
| CN110244510A (en) * | 2019-07-31 | 2019-09-17 | 京东方科技集团股份有限公司 | A kind of nano-imprint stamp and preparation method thereof |
| CN215526345U (en) * | 2021-07-30 | 2022-01-14 | 华天慧创科技（西安）有限公司 | Stamp substrate |
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| CN113406860A (en) | 2021-09-17 |
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