CN215517628U - PECVD (plasma enhanced chemical vapor deposition) cavity and PECVD deposition device - Google Patents
PECVD (plasma enhanced chemical vapor deposition) cavity and PECVD deposition device Download PDFInfo
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- CN215517628U CN215517628U CN202121951826.8U CN202121951826U CN215517628U CN 215517628 U CN215517628 U CN 215517628U CN 202121951826 U CN202121951826 U CN 202121951826U CN 215517628 U CN215517628 U CN 215517628U
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- 238000000151 deposition Methods 0.000 title claims abstract description 59
- 230000008021 deposition Effects 0.000 title claims abstract description 59
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 27
- 238000007789 sealing Methods 0.000 claims abstract description 11
- 239000000126 substance Substances 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 28
- 238000000034 method Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 210000003437 trachea Anatomy 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
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Abstract
The utility model discloses a PECVD deposition cavity and a PECVD deposition device, wherein one side of a main body is provided with an electric motor which is fixedly connected with a rotating rod, one end of the rotating rod is rotatably connected with one end of a first connecting rod, the other end of the first connecting rod is rotatably connected with the first deposition cavity, a bracket is arranged in the main body, one side of the main body is provided with a sealing valve which is fixedly connected with a vacuum machine, the top of the main body is provided with a gas diffuser which is fixedly connected with one end of a gas pipe, the other end of the gas pipe is fixedly connected with a chemical gas bottle, the utility model realizes the overturning of a substrate by rotating the rotating rod and connecting and linking the first deposition cavity and the second deposition cavity, so that the effect of the substrate is more uniform during deposition, and simultaneously, the interior of the deposition cavity adopts an arc-shaped groove design, so that the temperature error between the upper surface and the lower surface is not too large, and the efficiency is enhanced.
Description
Technical Field
The utility model relates to the technical field of chemistry, in particular to a PECVD (plasma enhanced chemical vapor deposition) cavity and a PECVD deposition device.
Background
When a Chemical Vapor Deposition (CVD) device is maintained, a gas distribution box needs to be remounted on a chamber body and locked on the chamber body by at least two screws, wherein the gas distribution box is used for enabling the distribution of reaction gas transmitted into a reaction cavity in the reaction cavity to be more uniform, the chamber body is used for supporting parts forming the reaction cavity, and the reaction gas reacts in the reaction cavity.
SUMMERY OF THE UTILITY MODEL
In order to solve the technical problems in the prior art, for example, the utility model discloses a PECVD deposition chamber and a PECVD deposition apparatus, comprising: the device comprises a main body, a motor, a rotating rod, a first connecting rod, a first deposition cavity, a second connecting rod, a second deposition cavity, a bracket, a sealing valve, a vacuum machine, a gas diffuser, a gas pipe, a chemical gas cylinder, an arc-shaped groove, a limiting plate, a gas cylinder frame and a controller;
the motor is arranged on one side of the main body and is fixedly connected with the rotating rod, one end of the rotating rod is rotatably connected with one end of the first connecting rod, the other end of the first connecting rod is rotationally connected with the first deposition cavity, the other end of the rotating rod is rotationally connected with one end of the second connecting rod, the other end of the second connecting rod is rotationally connected with the second deposition cavity, the rotating rod, the first deposition cavity and the second deposition cavity are rotationally connected inside the main body, the bracket is arranged in the main body, the sealing valve is arranged on one side of the main body and is fixedly connected with the vacuum machine, the top of the main body is provided with the gas diffuser, the gas diffuser is fixedly connected with one end of the gas pipe, and the other end of the gas pipe is fixedly connected with the chemical gas bottle.
Preferably, the arc-shaped groove is formed in the surface of the second deposition cavity of the first deposition cavity, and the limiting plate is arranged on the second deposition cavity of the first deposition cavity.
Preferably, the gas cylinder frame is arranged on one side of the main body.
Preferably, the motor and the vacuum machine are electrically connected to the controller.
According to the utility model, the rotating rod is rotated to be connected with and linked with the first deposition cavity and the second deposition cavity, so that the substrate is turned over, the effect of the substrate is more uniform during deposition, meanwhile, the arc-shaped groove design is adopted in the deposition cavity, so that the temperature error between the upper surface and the lower surface is not too large, and the efficiency is enhanced.
Drawings
FIG. 1 is a schematic view of a PECVD deposition chamber and a PECVD deposition apparatus according to the present invention;
FIG. 2 is a schematic structural view of a deposition chamber according to the present invention during inversion;
FIG. 3 is a schematic diagram of a deposition chamber according to the present invention.
The attached drawings are as follows:
1. a main body; 2. an electric motor; 3. rotating the rod; 4. a first connecting rod; 5. a first deposition chamber; 6. a second connecting rod; 7. a second deposition chamber; 8. a support; 9. sealing the valve; 10. a vacuum machine; 11. a gas diffuser; 12. an air tube; 13. a chemical gas cylinder; 14. an arc-shaped slot; 15. a limiting plate; 16. a gas cylinder holder; 17. and a controller.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example (b):
embodiments of the present invention, as illustrated in fig. 1-3, provide a PECVD deposition chamber and a PECVD deposition apparatus, comprising: the device comprises a main body 1, a motor 2, a rotating rod 3, a first connecting rod 4, a first deposition cavity 5, a second connecting rod 6, a second deposition cavity 7, a support 8, a sealing valve 9, a vacuum machine 10, a gas diffuser 11, a gas pipe 12, a chemical gas bottle 13, an arc-shaped groove 14, a limiting plate 15, a gas bottle frame 16 and a controller 17;
the main part 1 one side is equipped with the motor 2, motor 2 fixed connection the rotary rod 3, the one end of rotary rod 3 is rotated and is connected the one end of head rod 4, the other end of head rod 4 is rotated and is connected first deposit cavity 5, the other end of rotary rod 3 is rotated and is connected the one end of second connecting rod 6, the other end of second connecting rod 6 is rotated and is connected second deposit cavity 7, the rotary rod 3, first deposit cavity 5, second deposit cavity 7 are rotated and are connected inside the main part 1, the main part 1 is inside to be equipped with the support 8, main part 1 one side is equipped with the sealing valve 9, sealing valve 9 fixed connection the vacuum machine 10, the main part 1 top is equipped with the gas diffuser 11, gas diffuser 11 fixed connection the one end of trachea 12, the other end of the air pipe 12 is fixedly connected with the chemical gas bottle 13.
As a preferable scheme, further, the arc-shaped groove 14 is formed on the surface of the first deposition chamber 5 and the second deposition chamber 7, and the limiting plate 15 is arranged on the first deposition chamber 5 and the second deposition chamber 7.
Preferably, the gas cylinder holder 16 is disposed on one side of the main body 1.
Preferably, the motor 2 and the vacuum machine 10 are electrically connected to the controller 17.
According to the above technical solution, in the PECVD deposition chamber and the PECVD deposition apparatus provided in the embodiments of the present invention, the sealing valve is first opened, the pressure inside the main body is relieved, then the substrate is placed on the arc-shaped groove inside the first deposition chamber, then the vacuum machine is opened, the gas inside the main body is evacuated, then the chemical gas cylinder is started, the chemical gas enters the main body through the gas pipe via the gas diffuser, then the motor is started, the motor drives the rotating rod to rotate, and the rotating rod drives the first connecting rod and the second connecting rod to drive the first deposition chamber and the second deposition chamber to move periodically, so as to automatically turn over the substrate.
It should be noted that, in this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation. The use of the phrase "comprising one of the elements does not exclude the presence of other like elements in the process, method, article, or apparatus that comprises the element.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.
Claims (4)
1. A PECVD deposition chamber and a PECVD deposition device are characterized by comprising: the device comprises a main body (1), a motor (2), a rotating rod (3), a first connecting rod (4), a first deposition cavity (5), a second connecting rod (6), a second deposition cavity (7), a support (8), a sealing valve (9), a vacuum machine (10), a gas diffuser (11), a gas pipe (12), a chemical gas cylinder (13), an arc-shaped groove (14), a limiting plate (15), a gas cylinder frame (16) and a controller (17);
the main part (1) one side is equipped with the motor (2), motor (2) fixed connection rotary rod (3), the one end of rotary rod (3) is rotated and is connected the one end of head rod (4), the other end of head rod (4) is rotated and is connected first deposit cavity (5), the other end of rotary rod (3) is rotated and is connected the one end of second connecting rod (6), the other end of second connecting rod (6) is rotated and is connected second deposit cavity (7), rotary rod (3), first deposit cavity (5), second deposit cavity (7) are rotated and are connected inside main part (1), main part (1) inside is equipped with support (8), main part (1) one side is equipped with sealing valve (9), sealing valve (9) fixed connection vacuum machine (10), the top of the main body (1) is provided with the gas diffuser (11), the gas diffuser (11) is fixedly connected with one end of the gas pipe (12), and the other end of the gas pipe (12) is fixedly connected with the chemical gas bottle (13).
2. A PECVD deposition chamber and PECVD deposition apparatus according to claim 1, characterized in that the arc-shaped groove (14) is arranged on the surface of the first deposition chamber (5) and the second deposition chamber (7), and the limiting plate (15) is arranged on the surface of the first deposition chamber (5) and the second deposition chamber (7).
3. A PECVD deposition chamber and PECVD deposition apparatus according to claim 1, characterized in that the body (1) is provided with the gas cylinder holder (16) on one side.
4. A PECVD deposition chamber and PECVD deposition apparatus according to claim 1, characterized in that the motor (2), the vacuum machine (10) are electrically connected to the controller (17).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121951826.8U CN215517628U (en) | 2021-08-19 | 2021-08-19 | PECVD (plasma enhanced chemical vapor deposition) cavity and PECVD deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121951826.8U CN215517628U (en) | 2021-08-19 | 2021-08-19 | PECVD (plasma enhanced chemical vapor deposition) cavity and PECVD deposition device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215517628U true CN215517628U (en) | 2022-01-14 |
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ID=79792020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202121951826.8U Active CN215517628U (en) | 2021-08-19 | 2021-08-19 | PECVD (plasma enhanced chemical vapor deposition) cavity and PECVD deposition device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215517628U (en) |
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2021
- 2021-08-19 CN CN202121951826.8U patent/CN215517628U/en active Active
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: A PECVD deposition chamber and PECVD deposition device Effective date of registration: 20220829 Granted publication date: 20220114 Pledgee: China Construction Bank Corporation Dalian Free Trade Zone sub branch Pledgor: Dalian nuohao Lianheng Electronic Technology Co.,Ltd. Registration number: Y2022980013994 |
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| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20230911 Granted publication date: 20220114 Pledgee: China Construction Bank Corporation Dalian Free Trade Zone sub branch Pledgor: Dalian nuohao Lianheng Electronic Technology Co.,Ltd. Registration number: Y2022980013994 |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: A PECVD deposition chamber and PECVD deposition device Effective date of registration: 20230918 Granted publication date: 20220114 Pledgee: China Construction Bank Corporation Dalian Free Trade Zone sub branch Pledgor: Dalian nuohao Lianheng Electronic Technology Co.,Ltd. Registration number: Y2023980057230 |
|
| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20231113 Granted publication date: 20220114 Pledgee: China Construction Bank Corporation Dalian Free Trade Zone sub branch Pledgor: Dalian nuohao Lianheng Electronic Technology Co.,Ltd. Registration number: Y2023980057230 |