CN215508057U

CN215508057U - Single-chip cleaning equipment

Info

Publication number: CN215508057U
Application number: CN202122288781.7U
Authority: CN
Inventors: 阙进林; 成林; 李永祥
Original assignee: Suzhou Yaxinhua Electronic Technology Co ltd
Current assignee: Suzhou Yaxinhua Electronic Technology Co ltd
Priority date: 2021-09-22
Filing date: 2021-09-22
Publication date: 2022-01-14
Anticipated expiration: 2031-09-22

Abstract

The utility model discloses single-chip cleaning equipment which comprises a box body; the workpiece adsorption component is arranged in the box body and comprises a processing cavity, an adsorption disc, a negative pressure pump, an air suction pipe, an air outlet pipe and an annular rubber block, the processing cavity is formed in the box body, the adsorption disc is arranged in the processing cavity through the movable lifting component, the negative pressure pump is arranged at the upper end of the box body and is communicated with the adsorption disc through the air suction pipe, the air outlet pipe is arranged on the negative pressure pump, and the annular rubber block is arranged at the bottom of the adsorption disc; the cleaning assembly and the wiping assembly are symmetrically arranged in the box body, the adsorption disc provided by the utility model adsorbs one surface of the single sheet, the front surface of the single sheet is protected in the process of limiting the single sheet, the single sheet is prevented from being polluted by cleaning liquid in the cleaning process, and the single sheet is convenient to clean.

Description

Single-chip cleaning equipment

Technical Field

The present invention relates to cleaning apparatus, and more particularly to single wafer cleaning apparatus.

Background

The wafer refers to a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because the wafer is circular in shape; various circuit device structures can be fabricated on a silicon wafer to form an IC product with specific electrical functions. In the process of cleaning the wafer single chip, the back surface of the wafer single chip is cleaned by using cleaning liquid, but in the cleaning process, some cleaning liquid can leak to the front surface to cause pollution, so that the wafer single chip is damaged.

The information disclosed in this background section is only for enhancement of understanding of the general background of the utility model and should not be taken as an acknowledgement or any form of suggestion that this information forms the prior art already known to a person skilled in the art.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide single chip cleaning equipment, which is characterized in that one surface of a single chip is adsorbed by an adsorption disc, the front surface of the single chip is protected in the process of limiting the single chip, the single chip is prevented from being polluted by cleaning liquid in the cleaning process, and the single chip is convenient to clean.

To achieve the above object, the present invention provides a single-wafer cleaning apparatus comprising: a box body; the workpiece adsorption component is arranged in the box body and comprises a processing cavity, an adsorption disc, a negative pressure pump, an air suction pipe, an air outlet pipe and an annular rubber block, the processing cavity is formed in the box body, the adsorption disc is arranged in the processing cavity through the movable lifting component, the negative pressure pump is arranged at the upper end of the box body and is communicated with the adsorption disc through the air suction pipe, the air outlet pipe is arranged on the negative pressure pump, and the annular rubber block is arranged at the bottom of the adsorption disc; the cleaning assembly and the wiping assembly are symmetrically arranged in the box body.

In one or more embodiments, a tapered groove is formed in one end, away from the adsorption disc, of the annular rubber block, and the inner diameter of one end, close to the adsorption disc, of the tapered groove is smaller than that of the end, away from the adsorption disc.

In one or more embodiments, remove lifting unit includes electronic slide rail, mounting panel, electric slide bar, cylinder and piston rod, the horizontal fixed mounting of electronic slide rail is inside the process chamber, the mounting panel is installed in electronic slide rail below, two electric slide bar symmetry sliding connection is in electronic slide rail and lower extreme and mounting panel fixed connection, the vertical fixed mounting of cylinder is on the mounting panel, and piston rod fixed mounting is on the output of cylinder, the lower extreme of piston rod run through the mounting panel and with adsorption disc top fixed connection.

In one or more embodiments, wash the subassembly and include wash bowl, ring channel, aqua storage tank, water pump, absorb water pipe, raceway, shower nozzle and installation piece, the vertical fixed mounting of wash bowl is on the downside inner wall of process chamber, and the ring channel is seted up in the upper end inner wall of wash bowl, the aqua storage tank is seted up in the bottom half and is communicated with the wash bowl, and the water pump mounting is in the aqua storage tank, absorb water pipe and water pump intercommunication, the shower nozzle is through installation piece fixed mounting in the aqua storage tank and just to the setting of wash bowl, and the shower nozzle passes through raceway and water pump intercommunication.

In one or more embodiments, an annular waterproof pad is mounted in the annular groove.

In one or more embodiments, the wiping component comprises an installation cylinder, an installation groove, a motor, a rotating shaft and a rotary disc, the installation cylinder and the cleaning cylinder are symmetrically arranged, the installation cylinder is vertically and fixedly installed at the bottom of the processing cavity, the installation groove is formed in the installation cylinder, the motor is fixedly installed in the installation groove, the rotating shaft is fixedly installed at the output end of the motor, the rotary disc is fixedly installed at the top end of the rotating shaft, and wiping cloth is installed on the side wall of the upper side of the rotary disc.

In one or more embodiments, the drying cloth is detachably connected with the rotating disc through a magic tape.

In one or more embodiments, a transparent box door is installed at the opening of the processing chamber, the transparent box door is rotatably connected with the box body, and a handle is fixedly installed on the side wall of the transparent box door.

In one or more embodiments, the height of the disk coincides with the height of the bottom of the annular groove.

In one or more embodiments, a partition layer is arranged in the inner wall of the box body, and soundproof cotton is filled in the partition layer.

In one or more embodiments, compared to the prior art:

1. the adsorption disc adsorbs one surface of the single sheet, and the front surface of the single sheet is protected in the process of limiting the single sheet, so that the single sheet is prevented from being polluted by cleaning liquid in the cleaning process, and the single sheet is convenient to clean;

2. according to the utility model, by arranging the cleaning component, when the adsorption disc adsorbs the single piece and moves to the inside of the annular groove of the cleaning cylinder, the annular rubber block is abutted against the inner wall of the annular groove, the water pump absorbs the cleaning liquid stored in the water storage tank through the water suction pipe, the cleaning liquid is conveyed to the spray head through the water conveying pipe, the back surface of the single piece positioned in the cleaning cylinder is washed, the cleaned cleaning liquid still flows back to the water storage tank, and the cleaning liquid can be repeatedly utilized for multiple times;

3. according to the utility model, the wiping component is arranged, after the single sheets adsorbed by the adsorption disc are cleaned, the single sheets are moved to the upper part of the rotary disc through the movable lifting component and are contacted with the wiping cloth, and the motor arranged in the installation cylinder controls the rotary disc connected with the rotating shaft to rotate, so that the wiping cloth can rapidly rotate to wipe the back surfaces of the single sheets after being washed;

4. the wiping cloth is detachably connected with the rotary disc through the magic tape, so that the wiping cloth is convenient to mount and dismount and is convenient to replace and clean.

Drawings

FIG. 1 is a schematic structural diagram of a preferred embodiment of the single-wafer cleaning apparatus provided in the present invention.

FIG. 2 is a schematic structural diagram of a cleaning assembly in the single-wafer cleaning apparatus provided by the present invention.

FIG. 3 is a schematic structural diagram of a movable lifting assembly in the single-wafer cleaning device provided by the utility model.

FIG. 4 is a schematic structural diagram of a cleaning drum in the single-chip cleaning device provided by the utility model.

FIG. 5 is a schematic structural diagram of an annular rubber block in the single-chip cleaning device provided by the utility model.

FIG. 6 is a schematic diagram of the configuration of the wiping module in the single-wafer cleaning apparatus provided by the present invention.

Description of the main reference numerals:

1-box body, 2-workpiece adsorption component, 21-processing cavity, 22-adsorption disk, 23-negative pressure pump, 24-air suction pipe, 25-air outlet pipe, 26-annular rubber block, 261-conical groove, 3-movable lifting component, 31-electric slide rail, 32-mounting plate, 33-electric slide bar, 34-air cylinder, 35-piston rod, 4-cleaning component, 41-cleaning cylinder, 42-annular groove, 421-annular waterproof pad, 43-water storage tank, 44-water pump, 45-water suction pipe, 46-water delivery pipe, 47-spray head, 48-mounting block, 5-wiping component, 51-mounting cylinder, 52-mounting groove, 53-motor, 54-rotating shaft, 55-rotating disk, 6-transparent box door, 7-handle.

Detailed Description

The following detailed description of the present invention is provided in conjunction with the accompanying drawings, but it should be understood that the scope of the present invention is not limited to the specific embodiments.

Throughout the specification and claims, unless explicitly stated otherwise, the word "comprise", or variations such as "comprises" or "comprising", will be understood to imply the inclusion of a stated element or component but not the exclusion of any other element or component.

As shown in fig. 1 to 6, a case 1; the workpiece adsorption component 2 is arranged in the box body 1, the workpiece adsorption component 2 comprises a processing cavity 21, an adsorption disc 22, a negative pressure pump 23, an air suction pipe 24, an air outlet pipe 25 and an annular rubber block 26, the processing cavity 21 is arranged in the box body 1, the adsorption disc 22 is arranged in the processing cavity 21 through the movable lifting component 3, the negative pressure pump 23 is arranged at the upper end of the box body 1 and communicated with the adsorption disc 22 through the air suction pipe 24, the air outlet pipe 25 is arranged on the negative pressure pump 23, and the annular rubber block 26 is arranged at the bottom of the adsorption disc 22; the cleaning component 4 and the wiping component 5 are symmetrically arranged in the box body 1;

it should be noted that: in the use process of the device, a single sheet is placed at the end part of an adsorption disc 22 provided with an annular rubber block 26 and is propped against the end part, air in the adsorption disc 22 is absorbed through an air suction pipe 24 by a negative pressure pump 23, the air is exhausted through an air outlet pipe 25, negative pressure is formed in the adsorption disc 22, the single sheet is adsorbed, the adsorption disc 22 is controlled to move and lift through a movable lifting component 3, the adsorption disc 22 is moved to a cleaning component 4 to be subjected to single-side washing and then moved to a wiping component 5 to be subjected to cleaning liquid wiping operation, the adsorption disc 22 adsorbs one side of the single sheet, the front side of the single sheet is protected in the process of limiting the single sheet, the single sheet is prevented from being polluted by cleaning liquid in the cleaning process, and the cleaning of the single sheet is facilitated.

Referring to fig. 5, a tapered groove 261 is formed in one end, away from the adsorption disc 22, of the annular rubber block 26, the inner diameter of the end, close to the adsorption disc 22, of the tapered groove 261 is smaller than that of the end, away from the adsorption disc 22, the tapered groove 261 is formed in the end of the annular rubber block 26, the front face of a single piece needs to be clamped into the tapered groove 261, and the adsorption disc 22 is convenient to conduct adsorption operation on the single piece.

Referring to fig. 1 and 3, the movable lifting assembly 3 includes an electric slide rail 31, a mounting plate 32, electric slide bars 33, a cylinder 34 and a piston rod 35, the electric slide rail 31 is transversely and fixedly mounted inside the processing cavity 21, the mounting plate 32 is mounted below the electric slide rail 31, the two electric slide bars 33 are symmetrically and slidably connected in the electric slide rail 31, the lower ends of the two electric slide bars are fixedly connected with the mounting plate 32, the cylinder 34 is vertically and fixedly mounted on the mounting plate 32, the piston rod 35 is fixedly mounted on the output end of the cylinder 34, and the lower end of the piston rod 35 penetrates through the mounting plate 32 and is fixedly connected with the top end of the adsorption disc 22;

it should be noted that: the electric slide bar 33 can slide in the electric slide rail 31, so that the adsorption disc 22 can move transversely, and the cylinder 34 on the mounting plate 32 can control the expansion and contraction of the piston rod 35, so as to control the lifting operation of the adsorption disc 22, so that the adsorption disc 22 can be moved to the cleaning assembly 4 and the wiping assembly 5 for washing and wiping.

Referring to fig. 2 and 4, the cleaning assembly 4 includes a cleaning cylinder 41, an annular groove 42, a water storage tank 43, a water pump 44, a water suction pipe 45, a water delivery pipe 46, a nozzle 47 and a mounting block 48, the cleaning cylinder 41 is vertically and fixedly mounted on the lower inner wall of the processing cavity 21, the annular groove 42 is arranged in the upper inner wall of the cleaning cylinder 41, the water storage tank 43 is arranged at the bottom of the box 1 and is communicated with the cleaning cylinder 41, the water pump 44 is mounted in the water storage tank 43, the water suction pipe 45 is communicated with the water pump 44, the nozzle 47 is fixedly mounted in the water storage tank 43 through the mounting block 48 and is opposite to the cleaning cylinder 41, and the nozzle 47 is communicated with the water pump 44 through the water delivery pipe 46;

it should be noted that: the water storage tank 43 is used for storing cleaning liquid, when the single piece is adsorbed by the adsorption disc 22 and moved into the annular groove 42 of the cleaning barrel 41, the annular rubber block 26 abuts against the inner wall of the annular groove 42, the water pump 44 sucks the cleaning liquid stored in the water storage tank 43 through the water suction pipe 45, the cleaning liquid is conveyed to the spray head 47 through the water conveying pipe 46, the back surface of the single piece located in the cleaning barrel 41 is washed, the cleaned cleaning liquid still flows back into the water storage tank 43, and the cleaning liquid can be reused for multiple times.

Referring to fig. 4, an annular waterproof pad 421 is installed in the annular groove 42, and by installing the annular waterproof pad 421 in the annular groove 42, the sealing performance and the waterproof performance of the annular rubber block 26 when located in the annular groove 42 are improved, and the washing liquid is prevented from leaking out from the gap between the annular groove 42 and the annular rubber block 26.

Referring to fig. 1 and 6, the drying assembly 5 includes a mounting cylinder 51, a mounting groove 52, a motor 53, a rotating shaft 54 and a rotating disc 55, the mounting cylinder 51 and the cleaning cylinder 41 are symmetrically arranged, the mounting cylinder 51 is vertically and fixedly mounted at the bottom of the processing cavity 21, the mounting groove 52 is opened inside the mounting cylinder 51, the motor 53 is fixedly mounted in the mounting groove 52, the rotating shaft 54 is fixedly mounted at the output end of the motor 53, the rotating disc 55 is fixedly mounted at the top end of the rotating shaft 54, and the side wall of the upper side of the rotating disc 55 is provided with a drying cloth;

it should be noted that: after the single sheets absorbed by the absorption disc 22 are cleaned, the single sheets are moved to the upper part of the rotating disc 55 by moving the lifting component 3 to be contacted with the wiping cloth, and the rotating disc 55 connected with the rotating shaft 54 is controlled to rotate by the motor 53 arranged in the installation cylinder 51, so that the wiping cloth can rotate quickly to wipe the back surfaces of the single sheets after being cleaned.

Wherein, the wiping cloth can be dismantled with carousel 55 through the magic subsides and be connected, makes the wiping cloth installation dismantle convenient, is convenient for change it and wash.

Referring to fig. 1, a transparent box door 6 is installed at an opening of the processing chamber 21, the transparent box door 6 is rotatably connected with the box body 1, and a handle 7 is fixedly installed on a side wall of the transparent box door 6;

it should be noted that: when the device is not used, the transparent box door 6 can be rotated through the handle 7 to seal the processing cavity 21 and prevent dust from entering.

The height of the rotary disc 55 is consistent with the height of the bottom of the annular groove 42, so that the piston rod 35 can be conveniently controlled by the air cylinder 34 to extend to the same length, and the adsorption disc 22 is lowered to the height consistent with the height of the cleaning assembly 4 and the height consistent with the height of the wiping assembly 5.

Wherein, set up the interlayer in the inner wall of box 1, and it has soundproof cotton to fill in the interlayer, and accessible soundproof cotton realizes the sound insulation function of box 1, reduces the noise pollution that the device produced during operation.

The foregoing descriptions of specific exemplary embodiments of the present invention have been presented for purposes of illustration and description. It is not intended to limit the utility model to the precise form disclosed, and obviously many modifications and variations are possible in light of the above teaching. The exemplary embodiments were chosen and described in order to explain certain principles of the utility model and its practical application to enable one skilled in the art to make and use various exemplary embodiments of the utility model and various alternatives and modifications as are suited to the particular use contemplated. It is intended that the scope of the utility model be defined by the claims and their equivalents.

Claims

1. A single wafer cleaning apparatus, comprising:

a box body (1);

the workpiece adsorption component (2) is installed in the box body (1), the workpiece adsorption component (2) comprises a processing cavity (21), an adsorption disc (22), a negative pressure pump (23), an air suction pipe (24), an air outlet pipe (25) and an annular rubber block (26), the processing cavity (21) is formed in the box body (1), the adsorption disc (22) is installed inside the processing cavity (21) through the movable lifting component (3), the negative pressure pump (23) is installed at the upper end of the box body (1) and communicated with the adsorption disc (22) through the air suction pipe (24), the air outlet pipe (25) is installed on the negative pressure pump (23), and the annular rubber block (26) is installed at the bottom of the adsorption disc (22);

the cleaning device comprises a cleaning component (4) and a drying component (5), wherein the cleaning component (4) and the drying component (5) are symmetrically arranged in the box body (1).

2. The single chip cleaning device according to claim 1, wherein a tapered groove (261) is formed in one end of the annular rubber block (26) far away from the adsorption disc (22), and the inner diameter of one end, close to the adsorption disc (22), of the tapered groove (261) is smaller than that of the end far away from the adsorption disc (22).

3. The single-chip cleaning device according to claim 1, wherein the movable lifting assembly (3) comprises electric slide rails (31), a mounting plate (32), electric slide bars (33), an air cylinder (34) and a piston rod (35), the electric slide rails (31) are transversely and fixedly mounted inside the processing cavity (21), the mounting plate (32) is mounted below the electric slide rails (31), the two electric slide bars (33) are symmetrically and slidably connected in the electric slide rails (31) and fixedly connected with the mounting plate (32) at the lower ends, the air cylinder (34) is vertically and fixedly mounted on the mounting plate (32), the piston rod (35) is fixedly mounted on the output end of the air cylinder (34), and the lower end of the piston rod (35) penetrates through the mounting plate (32) and is fixedly connected with the top end of the adsorption disc (22).

4. A single-chip cleaning device according to claim 1, wherein the cleaning assembly (4) comprises a cleaning cylinder (41), an annular groove (42), a water storage tank (43), a water pump (44), a suction pipe (45), a water pipe (46), a spray head (47) and a mounting block (48), the cleaning cylinder (41) is vertically and fixedly arranged on the inner wall of the lower side of the processing cavity (21), the annular groove (42) is arranged in the inner wall of the upper end of the cleaning cylinder (41), the water storage tank (43) is arranged at the bottom of the box body (1) and communicated with the cleaning cylinder (41), and the water pump (44) is arranged in the water storage tank (43), the water suction pipe (45) is communicated with the water pump (44), the spray head (47) is fixedly arranged in the water storage tank (43) through a mounting block (48) and is arranged opposite to the cleaning cylinder (41), and the spray head (47) is communicated with the water pump (44) through a water delivery pipe (46).

5. A single piece washing device according to claim 4, wherein an annular waterproof pad (421) is mounted in said annular groove (42).

6. A single-chip cleaning device according to claim 4, wherein the drying component (5) comprises a mounting cylinder (51), a mounting groove (52), a motor (53), a rotating shaft (54) and a rotating disc (55), the mounting cylinder (51) and the cleaning cylinder (41) are symmetrically arranged, the mounting cylinder (51) is vertically and fixedly mounted at the bottom of the processing cavity (21), the mounting groove (52) is arranged in the mounting cylinder (51), the motor (53) is fixedly mounted in the mounting groove (52), the rotating shaft (54) is fixedly mounted on the output end of the motor (53), the rotating disc (55) is fixedly mounted at the top end of the rotating shaft (54), and a drying cloth is mounted on the side wall of the upper side of the rotating disc (55).

7. A single-piece washing device according to claim 6, characterised in that said wiping cloth is removably connected to the turntable (55) by means of hook and loop fasteners.

8. The single-chip cleaning device according to claim 1, wherein a transparent box door (6) is installed at the opening of the processing chamber (21), the transparent box door (6) is rotatably connected with the box body (1), and a handle (7) is fixedly installed on the side wall of the transparent box door (6).

9. A single wafer cleaning apparatus according to claim 6, wherein the height of the turntable (55) corresponds to the height of the bottom of the annular groove (42).

10. A single-wafer cleaning device according to claim 1, characterized in that the inner wall of the tank (1) is provided with a partition filled with soundproof cotton.