CN215187528U - Vacuum chamber static elimination structure - Google Patents

Abstract

The utility model discloses a vacuum chamber static elimination structure relates to semiconductor display panel production technical field. The vacuum chamber static elimination structure comprises a vacuum chamber and an ultraviolet light source, wherein a shading device and a shading strip are arranged on a light path of the ultraviolet light source. The vacuum chamber static elimination structure adopts the ultraviolet light source to ionize the rarefied gas in the vacuum chamber, and avoids the ionization mode that the energy is high, the penetrating power is strong, the product is possibly damaged, the requirement on equipment is high, and the equipment is dangerous by adopting a radioactive source; the shading strip which is parallel to the material plane and has the same height is arranged on the light path of the ultraviolet light source, so that the irradiation of the ultraviolet light source to the material can be effectively reduced, and the effect of removing static electricity can be ensured.

Description

Vacuum chamber static elimination structure

Technical Field

The utility model relates to a semiconductor display panel produces technical field, specifically is a vacuum chamber electrostatic elimination structure.

Background

Currently, in the semiconductor and display panel production process, the chip or substrate transfer and processing process is generally involved. For example, the surface of the substrate may accumulate charge during its transfer out, resulting in electrical polarization of the substrate, which may increase the risk of substrate damage. Therefore, it is necessary to protect the substrate from damage that may be caused by electrostatic discharge.

The existing various methods for eliminating (neutralizing) static electricity cannot well match the existing production requirements: the vacuum environment, no contact with the product, cleanness and no dust particle pollution.

1. Contact induction type static eliminator: contact with the product is necessary;

2. high voltage ionic static eliminator: air flow is necessary to be used in cooperation;

3. radiation type static eliminator: high energy and strong penetrating power, and may cause damage to the product. The safety requirements of management and use are high, and the risks of ionizing radiation leakage and radioactive environmental pollution are existed.

In addition to the above problems, in the process of removing static electricity by radiation, the semiconductor and the display panel are exposed to radiation (electromagnetic radiation or ionizing radiation), which tends to degrade the quality of the semiconductor and the display panel.

SUMMERY OF THE UTILITY MODEL

Technical problem to be solved

Not enough to prior art, the utility model provides a vacuum chamber electrostatic elimination structure has solved the electrostatic elimination of traditional ionizing radiation formula and has harmd product and unsafe problem.

(II) technical scheme

In order to achieve the above purpose, the utility model discloses a following technical scheme realizes: a vacuum chamber static elimination structure comprises a vacuum chamber and an ultraviolet light source, wherein a shading device and a shading strip are arranged on a light path of the ultraviolet light source.

Preferably, the vacuum chamber is provided with a perspective window, the ultraviolet light source is arranged outside the perspective window, and a light path of the ultraviolet light source can irradiate into the vacuum chamber through the perspective window.

Preferably, the ultraviolet light source and the shading device are both arranged in the vacuum chamber.

Preferably, the light shielding device is disposed at one position between the vacuum chamber and the ultraviolet light source and in the vacuum chamber.

Preferably, the shading strip is arranged on one position of a lampshade of the ultraviolet light source and the vacuum chamber.

Preferably, the shading strip is arranged on one of the ultraviolet light source, the perspective window and the vacuum chamber.

Preferably, the shading device is one of a translation shading device and an aperture.

Preferably, the ultraviolet-curing coating comprises a material, the shading strip is arranged between the material and an ultraviolet light source, the setting height of the shading strip is the same as that of the material, and the shading strip is parallel to a plane where the material is located.

Preferably, the material of the shading strip is one of a full shading material and a partial shading material.

(III) advantageous effects

The utility model provides a vacuum chamber static elimination structure. The method has the following beneficial effects:

(1) the vacuum chamber static elimination structure adopts the ultraviolet light source to ionize the rarefied gas in the vacuum chamber, and avoids the ionization mode that the energy is high and the penetrating power is strong, so that the product is possibly damaged, the requirement on equipment is high, and the equipment is dangerous.

(2) The vacuum chamber static elimination structure is provided with the shading strip which is parallel to the material plane and has the same height with the material plane on the light path of the ultraviolet light source, so that the irradiation of the ultraviolet light source to the material can be effectively reduced, and the static elimination effect can be ensured.

Compared with the traditional static electricity removing mode, the following advantages are achieved:

1. compared with a radioactive source radiation ionization mode, the radiation ionization device does not need a complex cooling and protection structure.

2. The penetration force is very weak in the atmospheric environment, and the air is easy to attenuate so as not to cause accidents due to leakage.

3. Compared with radioactive sources, the energy is low, the penetrating power is weak, and the product cannot be damaged.

4. The ultraviolet bulb is used for electrifying to generate ultraviolet rays, and the radiation source is easy to control.

5. Since the system is ionized by ultraviolet radiation, no electromagnetic interference is generated.

6 is suitable for vacuum environment, does not need to be in direct contact with products, has no pollution, and is simple and convenient to control, use and maintain.

Drawings

FIG. 1 is a schematic structural view of the present invention (the ultraviolet light source and the light shielding device are both outside the vacuum chamber);

FIG. 2 is a schematic structural view of the present invention (the ultraviolet light source and the light shielding device are both in the vacuum chamber);

FIG. 3 is a schematic structural view of the present invention (the ultraviolet light source is outside the vacuum chamber, and the light shielding device is inside the vacuum chamber);

FIG. 4 is a schematic view of a UV light source;

FIG. 5 is a right side view of the UV light source configuration;

FIG. 6 is a schematic view of a perspective window;

FIG. 7 is a right side view of the see-through window arrangement;

FIG. 8 is a diagram of the UV light source (without masking bars);

FIG. 9 shows the UV light source (with a light shield).

In the figure: 1. a vacuum chamber; 2. an ultraviolet light source; 3. a perspective window; 4. a lamp shade; 5. a light shielding device; 6. a shading strip; 7. and (3) feeding.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Example 1: the utility model provides a simplest technical scheme: a vacuum chamber static elimination structure comprises a vacuum chamber 1 and an ultraviolet light source 2, wherein a shading device 5 and a shading strip 6 are arranged on a light path of the ultraviolet light source 2.

Example 2: the ultraviolet light source 1 and the shading device 5 are both arranged outside the vacuum chamber

The vacuum chamber 1 is provided with a perspective window 3, the ultraviolet light source 2 is arranged outside the perspective window 3, and the light path of the ultraviolet light source 2 can irradiate into the vacuum chamber 1 through the perspective window 3.

Example 3: the ultraviolet light source 1 and the shading device 5 are arranged in the vacuum chamber

The ultraviolet light source 2 and the light shielding device 5 are both disposed within the vacuum chamber 1.

Example 4: selection of the position at which the shade 5 is disposed

The light shielding device 5 is provided at one position in the vacuum chamber 1 between the vacuum chamber 1 and the ultraviolet light source 2.

Example 5: selection of setting position of shade strip 6

The shading strip 6 is arranged on one position of the lampshade of the ultraviolet light source 2, the perspective window 3 and the vacuum chamber 1, and if the ultraviolet light source 1 and the shading device 5 are both arranged in the vacuum chamber, the shading strip cannot be arranged on the perspective window 3.

Example 6: selection of the type of shade 5

The shading device 5 is one of a translation shading device and a diaphragm.

Example 7: determination of the position of the light-shading strip 6

Including material 7, light-shielding strip 6 sets up between material 7 and ultraviolet source 2, and light-shielding strip 6 sets up highly the same with material 7, and light-shielding strip 6 is parallel with the plane at material 7 place. The light-shielding strip 6 is preferably arranged in a position which is just capable of shielding the material 7, but not shielding the rest of the ultraviolet light.

Example 8: selection of material for the light-shielding strips 6

The material of the shading strip 6 is one of a full shading material and a partial shading material. The material 7 can be completely blocked from being irradiated by ultraviolet light by selecting a full shading material, and the ultraviolet light can be partially blocked by selecting a part of shading material, so that the ionization effect in the vacuum chamber 1 can be enhanced.

When the device works, the ultraviolet light source 2 is not easy to be switched on or switched off, so that the device is in an open state when running, ultraviolet light is emitted, and if the ultraviolet light is not needed, the ultraviolet light is shielded by the shading device 5; the light path of the ultraviolet light is also provided with a light shielding strip 6, when the ultraviolet light irradiates on the light shielding strip 6, a certain shielding effect is provided for the material 7 behind (as shown in fig. 9), and the ultraviolet light is prevented from directly irradiating on the material 7 (as shown in fig. 8).

The utility model discloses a 3 kinds of operational mode:

mode 1: the device directly radiates the operation mode of eliminating the static charge to the material 7: after the device is started, the shading device 5 moves upwards (if the diaphragm is closed), so as to shade the ultraviolet window; the material 7 enters the vacuum chamber 1, the shading device 5 moves downwards (if the shading device is an aperture, the shading device is opened), an ultraviolet radiation channel is opened, and the ionizing radiation is started to eliminate (neutralize) the static charges of the product and the vacuum chamber 1; when the radiation dose (radiation time) is reached, the static charge is eliminated (neutralized), the shading device 5 moves upwards (if the diaphragm is closed) to shade the ultraviolet window, and the radiation channel is closed to stop the ionizing radiation. The material 7 is removed, and the next material 7 is waited for to enter, and the shading device 5 is repeatedly opened and closed to carry out the static charge elimination (neutralization) process.

Mode 2: the device radiates the operation mode of eliminating the static charge to the environment of the material 7 in advance: after the device is started, the shading device 5 moves upwards (if the diaphragm is closed), so as to shade the ultraviolet window; before the material 7 enters the vacuum chamber 1, the shading device 5 moves downwards (if the aperture is open), an ultraviolet radiation channel is opened, ionizing radiation is started, the radiation dose (radiation time) is reached, a large number of ions and free electrons are generated in the environment of the vacuum chamber, the shading device 5 moves upwards (if the aperture is closed), an ultraviolet window is shielded, and the radiation channel is closed to stop the ionizing radiation; material 7 enters vacuum chamber 1 to complete the electrostatic charge removal (neutralization) and material 7 is removed. The electrostatic charge eliminating (neutralizing) process is performed by repeatedly turning on and off the shade 5.

Mode 3: in conjunction with the operational flow of mode 1 and mode 2, the apparatus ionizes the product environment in advance and simultaneously radiates (neutralizes) the electrostatic charge directly to the product.

In conclusion, the vacuum chamber static elimination structure adopts the ultraviolet light source to ionize the rarefied gas in the vacuum chamber, and avoids the ionization mode that the energy is high, the penetrating power is strong, the product is possibly damaged, the requirement on equipment is high, and the equipment is dangerous by adopting a radioactive source; the shading strip which is parallel to the material plane and has the same height is arranged on the light path of the ultraviolet light source, so that the irradiation of the ultraviolet light source to the material can be effectively reduced, and the effect of removing static electricity can be ensured.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (10)

1. A vacuum chamber static elimination structure comprises a vacuum chamber (1) and an ultraviolet light source (2), and is characterized in that: and a shading device (5) and a shading strip (6) are arranged on the light path of the ultraviolet light source (2).

2. The vacuum chamber static elimination structure of claim 1, wherein: be provided with perspective window (3) on vacuum chamber (1), ultraviolet source (2) set up in the perspective window (3) outside, the light path of ultraviolet source (2) can shine to vacuum chamber (1) in through perspective window (3).

3. The vacuum chamber static elimination structure of claim 1, wherein: the ultraviolet light source (2) and the shading device (5) are both arranged in the vacuum chamber (1).

4. The vacuum chamber static elimination structure of claim 1, wherein: the shading device (5) is arranged between the vacuum chamber (1) and the ultraviolet light source (2) and at one position in the vacuum chamber (1).

5. The vacuum chamber static elimination structure of any one of claims 1, 3 and 4, wherein: the shading strip (6) is arranged on one position of a lampshade of the ultraviolet light source (2) and the vacuum chamber (1).

6. The vacuum chamber static elimination structure of claim 2, wherein: the shading strip (6) is arranged on one of the ultraviolet light source (2), the perspective window (3) and the vacuum chamber (1).

7. The vacuum chamber static elimination structure of claim 5, wherein: the shading device (5) is one of a translation shading device and a diaphragm.

8. The vacuum chamber static elimination structure of claim 6, wherein: the shading device (5) is one of a translation shading device and a diaphragm.

9. The vacuum chamber static elimination structure according to any one of claims 1 to 4 and 6 to 8, comprising a material (7), wherein: the light shading strip (6) is arranged between the material (7) and the ultraviolet light source (2), the setting height of the light shading strip (6) is the same as that of the material (7), and the light shading strip (6) is parallel to the plane where the material (7) is located.

10. The vacuum chamber static elimination structure of claim 9, wherein: the material of the shading strip (6) is one of full shading material and partial shading material.

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