CN215142753U - Cleaning device - Google Patents
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- CN215142753U CN215142753U CN202120518030.7U CN202120518030U CN215142753U CN 215142753 U CN215142753 U CN 215142753U CN 202120518030 U CN202120518030 U CN 202120518030U CN 215142753 U CN215142753 U CN 215142753U
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Abstract
The utility model relates to the technical field of display panel manufacturing, and discloses a cleaning device which comprises a cleaning tank, a power supply and a temperature control mechanism, wherein the cleaning tank is filled with cleaning liquid, and the part to be cleaned of a piece to be cleaned is immersed in the cleaning liquid; the cathode of the power supply is electrically connected with the part to be cleaned, at least part of the anode of the power supply is immersed in the cleaning liquid, the power supply is switched on, and the cleaning liquid can be ionized to generate a large amount of gas, so that pollutants attached to the part to be cleaned are carried away; the temperature control mechanism is used for controlling the temperature of the cleaning liquid in the cleaning tank. The cleaning device can control the temperature in the cleaning process, so that the workpiece to be cleaned is protected, and the damage to the workpiece to be cleaned caused by the temperature accumulation and the rise in the cleaning process is avoided.
Description
Technical Field
The utility model relates to a display panel makes technical field, especially relates to a belt cleaning device.
Background
An OLED (Organic Light-Emitting Diode) is a display technology developed in recent years, and uses a multi-layer Organic thin film structure to emit Light. The OLED panel has the advantages of being light and thin, high in brightness, low in power consumption, fast in response, high in definition, good in flexibility and high in luminous efficiency, and has wide application prospects. The AMOLED (Active-Matrix Organic Light-Emitting Diode) has pixels arranged in an array, has high Light-Emitting efficiency, and is commonly used in a large-sized display device with high definition.
The mainstream method for mass production of the conventional AMOLED display panel is vacuum evaporation, wherein a mask plate is used for evaporation to form the organic light emitting layer. With the increase of the use time and the number of times of evaporation, pollutants such as organic materials, dust and the like can be accumulated and attached to the surface of the mask and the evaporation holes of the mask, so that the formation of an organic light emitting layer is influenced, and the production yield and the cost of the display panel are further influenced. Therefore, in production, the mask needs to be cleaned after several times of vapor deposition. The common mask plate cleaning method is that a large amount of gas is generated by electrolyzing cleaning liquid, and the gas brings away pollutants on the mask plate, so that the purpose of cleaning the mask plate is achieved. However, heat is generated in the process of cleaning the mask, and the temperature of the cleaning solution is increased due to heat accumulation, so that the mask is damaged, and further the processing quality and the processing cost of the AMOLED display panel are affected.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a belt cleaning device, its temperature that can control among the cleaning process to the piece is treated in the protection, and the cleaning performance is good.
Therefore, the utility model adopts the following technical scheme:
a cleaning device, comprising:
the cleaning device comprises a cleaning tank, a cleaning device and a control device, wherein cleaning liquid is contained in the cleaning tank, and a part to be cleaned of a piece to be cleaned is immersed in the cleaning liquid;
the cathode of the power supply is electrically connected with the part to be cleaned, at least part of the anode of the power supply is immersed in the cleaning liquid, the power supply is switched on, and the cleaning liquid can be ionized to generate a large amount of gas so as to carry away pollutants attached to the part to be cleaned;
and the temperature control mechanism is used for controlling the temperature of the cleaning liquid in the cleaning tank.
As a preferable aspect of the cleaning apparatus, the temperature control mechanism includes:
a refrigeration assembly;
and the heat exchanger is immersed in the cleaning liquid, and two ends of the heat exchanger are respectively communicated with the water inlet and the water outlet of the refrigeration assembly.
As a preferred scheme of the cleaning device, the temperature control mechanism further comprises a temperature switch, the temperature switch is immersed in the cleaning solution of the cleaning tank, and the temperature switch is electrically connected with the refrigeration assembly to control the refrigeration assembly to start or stop.
As a preferable mode of the cleaning device, the cleaning device further comprises a circulating filter mechanism, and two ends of the circulating filter mechanism are respectively communicated with the upper part of the cleaning tank and the bottom part of the cleaning tank, so that the cleaning liquid in the cleaning tank can flow into the circulating filter mechanism from the upper part of the cleaning tank and flow into the cleaning tank from the bottom part of the cleaning tank.
As a preferable aspect of the cleaning apparatus, the circulation filter mechanism includes:
the buffer tank is communicated with the upper part of the cleaning tank;
the two ends of the circulating pipeline are respectively communicated with the bottom parts of the cache tank and the cleaning tank;
the circulation driving assembly is arranged on the circulation pipeline and is used for driving the cleaning liquid in the circulation pipeline to flow;
and the circulating filtering assembly is arranged on the circulating pipeline and is used for filtering the cleaning liquid in the circulating pipeline.
As a preferable mode of the cleaning apparatus, the cleaning apparatus further includes an air exhaust mechanism which is communicated with an upper portion of the cleaning tank to exhaust the gas in the cleaning tank.
As a preferable scheme of the cleaning device, the cleaning device further comprises an overflow protection mechanism, one end of the overflow protection mechanism is communicated with the upper part of the cleaning tank, and the cleaning liquid in the cleaning tank can flow out from the overflow protection mechanism.
As a preferred scheme of the cleaning device, the cleaning device further comprises a liquid inlet mechanism, wherein the liquid inlet mechanism is communicated with the cleaning tank and is used for introducing the cleaning liquid into the cleaning tank.
As a preferable scheme of the cleaning device, the cleaning device further comprises a liquid discharging mechanism, and the liquid discharging mechanism is communicated with the cleaning tank and used for discharging the cleaning liquid in the cleaning tank.
As a preferable aspect of the cleaning apparatus, the liquid discharge mechanism includes:
one end of the liquid discharge pipeline is communicated with the bottom of the cleaning tank, and the other end of the liquid discharge pipeline is communicated with an external recovery processing device;
the bearing disc is arranged below the joint of the drainage pipeline and the external recovery processing device;
and the leakage sensor is used for detecting leakage at the joint of the drainage pipeline and the recovery processing device.
The utility model has the advantages that:
the utility model provides a belt cleaning device can be through the temperature of washing liquid in the temperature control mechanism control washing tank, and the heat accumulation of avoiding producing in the cleaning process arouses washing liquid temperature rise damage mask version to treat that the washing piece protects, the cleaning performance is good.
Drawings
Fig. 1 is a schematic view of a cleaning device provided in an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a cleaning tank according to an embodiment of the present invention;
FIG. 3 is a schematic structural view of a member to be cleaned and an anode mesh plate according to an embodiment of the present invention;
fig. 4 is a schematic structural diagram of a support assembly according to an embodiment of the present invention.
In the figure:
1-a cleaning tank; 11-a circulation port;
21-a cathode; 22-anode mesh plate;
23-a support assembly; 231-side support structure; 232-a bottom support structure;
3-temperature control mechanism; 31-a refrigeration component; 32-a heat exchanger;
4-a circulating filtration mechanism;
41-cache slot; 411-first slot; 412-a second slot;
42-a cyclical drive assembly; 43-a circulating flow sensor;
5-an air exhaust mechanism; 51-an exhaust valve; 52-differential pressure gauge;
6-an overflow protection mechanism;
7-a liquid inlet mechanism; 71-a feed liquor filtration module;
8-a liquid discharge mechanism;
91-manual valve; 92-pneumatic valves;
100-the piece to be cleaned.
Detailed Description
In order to make the technical problems, technical solutions and technical effects achieved by the present invention more clear, the embodiments of the present invention will be described in further detail with reference to the accompanying drawings, and obviously, the described embodiments are only some embodiments, not all embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by those skilled in the art without creative efforts belong to the protection scope of the present invention.
As shown in fig. 1-4, the present embodiment provides a cleaning apparatus, which includes a cleaning tank 1, a power supply and a temperature control mechanism 3, wherein the cleaning tank 1 contains a cleaning solution, and a part to be cleaned of a member to be cleaned 100 is immersed in the cleaning solution; the cathode 21 of the power supply is electrically connected with the part 100 to be cleaned, at least part of the anode of the power supply is immersed in the cleaning liquid, and the power supply is switched on, so that the cleaning liquid can be ionized and generate a large amount of gas, and pollutants attached to the part to be cleaned are carried away; the temperature control mechanism 3 is used for controlling the temperature of the cleaning liquid. Cleaning solution ionization constantly produces the heat in the cleaning process, and the heat of accumulation arouses the temperature rise of cleaning solution, and temperature control mechanism 3 can control the temperature of cleaning solution in cleaning tank 1, avoids cleaning solution high temperature to cause the damage of treating cleaning piece 100 to treat cleaning piece 100 and protect, guarantee to treat the cleaning performance of cleaning piece 100.
In this embodiment, the member to be cleaned 100 is specifically referred to as a mask. Of course, the cleaning device can also be used for cleaning other kinds of electroplated parts, and the embodiment does not limit the cleaning device.
Preferably, the cleaning solution is an alkaline conductive solution.
Illustratively, the cleaning solution is a KOH solution. Of course, the type of the cleaning solution is not limited to this, and in other embodiments, the cleaning solution may also be a NaOH solution, or a mixed solution of multiple solutions, and may be set according to actual needs, which is not limited in this embodiment.
The cleaning principle will be described by taking a KOH solution as an example. In the cleaning process, the anode reaction generates oxygen, the oxygen can oxidize and dissolve the pollutants attached to the piece 100 to be cleaned, and the reaction principle is as follows:
4OH-→2H2O+O2↑+4e-
the cathode 21 reacts to generate a large amount of hydrogen and to carry away contaminants adhering to the member 100 to be cleaned, according to the following reaction principle:
4H2O+4e-→2H2↑+4OH-
the alkaline cleaning solution also serves to dissolve contaminants on the object 100 to be cleaned.
It can be understood that the to-be-cleaned object 100 is electrically connected to the cathode 21 of the power supply, so as to perform the function of cathode protection, and the to-be-cleaned object 100 is not damaged due to corrosion of the to-be-cleaned object 100 when the pollutants attached to the surface of the to-be-cleaned object 100 are removed, so that the cleaning effect is good.
Optionally, as shown in fig. 2-4, the cleaning device further comprises an anode mesh plate 22 electrically connected to the anode of the power supply, and the anode mesh plate 22 is opposite to and spaced apart from the member to be cleaned 100. Further, the distance between the member to be cleaned 100 and the anode mesh plate 22 is a preset distance, so that bubbles generated near the anode mesh plate 22 during the cleaning process can move to the member to be cleaned 100 and carry away contaminants attached to the member to be cleaned 100. Preferably, the number of the anode mesh plates 22 is two, and the two anode mesh plates 22 are arranged at two sides of the to-be-cleaned member 100 at intervals, so that bubbles generated near the anode mesh plates 22 can move to two sides of the to-be-cleaned member 100, thereby improving the cleaning effect of the cleaning device. Of course, the arrangement of the power source and the member to be cleaned 100 is not limited to this, and may be set according to actual needs, which is not limited in this embodiment.
In order to enable the piece to be cleaned 100 to be fixed in the cleaning tank 1, the cleaning apparatus further comprises a support assembly 23 provided in the cleaning tank 1. In particular, the support assembly 23 comprises a bottom support structure 232 and a side support structure 231 to support the item to be cleaned 100 from a vertical direction and a horizontal direction, respectively. Illustratively, the lateral supporting structure 231 includes two lateral supporting members, the two lateral supporting members are disposed at intervals on two sides of the piece 100 to be cleaned along a direction perpendicular to the thickness of the piece 100 to be cleaned, and each lateral supporting member is provided with a receiving groove, and the lateral side of the piece 100 to be cleaned can be received in the corresponding receiving groove, so that the exposed area of the piece 100 to be cleaned is increased while the reliability of the piece 100 to be cleaned in fixation is ensured, thereby improving the cleaning effect of the piece 100 to be cleaned.
Furthermore, each accommodating groove is provided with a limiting piece, and the limiting piece can abut against the piece 100 to be cleaned so as to limit the position of the piece 100 to be cleaned in the horizontal direction, so that the piece 100 to be cleaned is prevented from shaking and damaging the piece 100 to be cleaned; and the positions of the pieces 100 to be cleaned in each cleaning are consistent, so that the consistency of the cleaning effect is ensured.
Optionally, as shown in fig. 1, the temperature control mechanism 3 includes a refrigeration assembly 31 and a heat exchanger 32, the heat exchanger 32 is immersed in the cleaning solution, and two ends of the heat exchanger 32 are respectively communicated with the water inlet and the water outlet of the refrigeration assembly 31. When the cleaning liquid contained in the cleaning tank 1 needs to be cooled, the refrigerant flows into the heat exchanger 32 from the water outlet of the refrigeration assembly 31 and flows back to the refrigeration assembly 31 through the water inlet of the refrigeration assembly 31, so that the cleaning liquid in the cleaning tank 1 is cooled through the heat conduction effect, the cooling effect is good, and the cost is low.
Illustratively, the refrigeration assembly 31 includes a chiller and the refrigerant includes water. The water chiller is a prior art, and redundant description thereof is not provided in this embodiment. Of course, the type of the cooling module 31 is not limited to this, and the type of the cooling medium is not limited to this, and may be set according to actual needs.
Specifically, the temperature control mechanism 3 further includes a cooling pipeline, and the heat exchanger 32 is connected to the refrigeration assembly 31 through the cooling pipeline. Furthermore, a cooling flow sensor is arranged on the cooling pipeline to detect the flow of the refrigerant in the cooling pipeline.
Preferably, temperature control mechanism 3 further comprises a temperature switch, the temperature switch is immersed in the cleaning liquid in cleaning tank 1, and the temperature switch is electrically connected to refrigeration assembly 31 to control refrigeration assembly 31 to start or stop. Specifically, when the temperature of the cleaning solution in the cleaning tank 1 reaches a preset temperature, the temperature switch controls the refrigeration assembly 31 to operate, so as to cool the cleaning solution in the cleaning tank 1; when the temperature of the cleaning liquid is lower than the preset temperature, the temperature switch controls the refrigeration assembly 31 to stop working. Of course, the control manner of the refrigeration assembly 31 is not limited to this, and may be set according to actual needs, which is not limited in this embodiment.
Optionally, the temperature control mechanism 3 further comprises a temperature sensor, which is immersed in the cleaning solution in the cleaning tank 1 to detect the temperature of the cleaning solution.
Since hydrogen and oxygen are generated during the cleaning process, it is preferable that the temperature sensor is an explosion-proof temperature sensor in order to protect the operator and the cleaning apparatus.
Preferably, the cleaning apparatus further comprises an air exhaust mechanism 5, and the air exhaust mechanism 5 is communicated with the upper part of the cleaning tank 1 to exhaust the air in the cleaning tank 1. Specifically, the cleaning device further comprises a tank cover, the tank cover can be plugged at the upper part of the cleaning tank 1, a vent hole is formed in the tank cover, and the exhaust mechanism 5 is communicated with the inside of the cleaning tank 1 through the vent hole, so that gas generated in the cleaning process is exhausted, and an operator and the cleaning device are protected.
Illustratively, the exhaust mechanism 5 includes an exhaust duct, one end of which is connected to the vent hole of the tank cover.
Optionally, the exhaust mechanism 5 further includes an exhaust valve 51, and the exhaust valve 51 is disposed on the exhaust pipeline to control on/off of the exhaust pipeline. It can be understood that the exhaust valve 51 may be controlled manually or automatically, and may be set according to actual needs, which is not limited in this embodiment.
Optionally, the exhaust mechanism 5 further includes a differential pressure gauge 52, and the differential pressure gauge 52 is disposed on the exhaust pipeline and is used for measuring a differential pressure between the inside and the outside of the cleaning tank 1.
Preferably, the cleaning apparatus further comprises a circulating filter mechanism 4, and both ends of the circulating filter mechanism 4 are respectively communicated with the upper portion of the cleaning tank 1 and the bottom portion of the cleaning tank 1, so that the cleaning solution in the cleaning tank 1 can flow into the circulating filter mechanism 4 from the upper portion of the cleaning tank 1 and flow into the cleaning tank 1 from the bottom portion of the cleaning tank 1. When the cleaning solution of cleaning tank 1 overflows from the upper part of cleaning tank 1 due to a large amount of gas generated in the reaction process, the suspended pollutants in the cleaning solution of cleaning tank 1 can be removed, the cleaning degree of the cleaning solution in cleaning tank 1 is improved, and the cleaning effect of piece 100 to be cleaned is further improved. In addition, the cleaning liquid in the circulating filter mechanism 4 flows back to the cleaning tank 1 from the bottom of the cleaning tank 1, and the pollutants suspended in the cleaning liquid in the cleaning tank 1 can also float up, so that the cleaning liquid overflowing along with the pollutants enters the circulating filter mechanism 4.
Specifically, the circulating filter mechanism 4 comprises a buffer tank 41, a circulating pipeline, a circulating drive assembly 42 and a circulating filter assembly, wherein the buffer tank 41 is communicated with the upper part of the cleaning tank 1; two ends of the circulating pipeline are respectively communicated with the buffer tank 41 and the bottom of the cleaning tank 1; the circulation driving assembly 42 is arranged on the circulation pipeline to drive the cleaning liquid in the circulation pipeline to flow; the circulating filter assembly is arranged on the circulating pipeline to filter the cleaning liquid in the circulating pipeline.
As shown in fig. 2-3, in the present embodiment, the upper portion of the cleaning tank 1 is provided with a circulation port 11, the circulation port 11 is communicated with the buffer tank 41, and the cleaning solution in the cleaning tank 1 flows into the buffer tank 41 through the circulation port 11. Further, the number of the circulation ports 11 is plural, and the plural circulation ports 11 are arranged at intervals along the outer periphery of the cleaning tank 1; the buffer tank 41 comprises a first tank 411 and a second tank 412 which are communicated, the first tank 411 is annularly arranged on the periphery of the upper part of the cleaning tank 1, and the plurality of circulation ports 11 are communicated with the first tank 411, so that the cleaning liquid in the cleaning tank 1 can flow into the first tank 411 through the plurality of circulation ports 11 and then flow into the second tank 412, and therefore the cleaning liquid in the cleaning tank 1 uniformly overflows into the circulation mechanism, pollutants suspended in the cleaning liquid are better kept away, and the cleanliness of the cleaning liquid in the cleaning tank 1 is improved. Of course, the setting of the buffer slot 41 is not limited to this, and may be set according to actual needs, which is not limited in this embodiment.
In this embodiment, the circulation line is communicated with the bottom of the buffer tank 41, which facilitates the discharge of the cleaning liquid in the buffer tank 41.
Optionally, the circulating filter assembly includes a multi-stage filter, which can improve the filtering effect of the circulating filter mechanism 4, so as to further improve the cleanliness of the cleaning liquid of the cleaning tank 1 and the cleaning effect of the cleaning device. The multistage filter is a prior art, and redundant description thereof is not provided in this embodiment.
Optionally, the circulating filter mechanism 4 further comprises a check valve disposed on the circulating line to prevent the cleaning liquid in the circulating line from flowing backwards.
Optionally, the circulation drive assembly 42 includes a circulation pump.
Optionally, the circulation filter mechanism 4 further includes a circulation flow sensor 43, and the circulation flow sensor 43 is disposed on the circulation line to detect the flow rate of the cleaning liquid in the circulation line. Illustratively, the recirculating flow sensor 43 is a flow transmitter, which is prior art and will not be redundantly described in this embodiment. Of course, the type of the circulation flow rate sensor 43 is not limited to this, and may be set according to actual needs.
Preferably, a buffer liquid level sensor is provided in the buffer tank 41 to detect the liquid level height of the cleaning liquid in the buffer tank 41. Further, the cleaning device further comprises a control mechanism, the control mechanism is respectively electrically connected with the buffer liquid level sensor and the circulation driving assembly 42, the buffer liquid level sensor transmits liquid level information of the cleaning liquid in the buffer tank 41 to the control mechanism, and when the control mechanism judges that the liquid level of the cleaning liquid in the buffer tank 41 is higher than a preset working liquid level, the control mechanism controls the circulation driving assembly 42 to work.
Optionally, the circulating filter mechanism 4 further includes a circulating liquid level alarm, the circulating liquid level alarm is electrically connected to the control mechanism, and the control mechanism controls the circulating liquid level alarm to send out a corresponding alarm according to the liquid level information detected by the buffer liquid level sensor. Illustratively, when the liquid level of the cleaning liquid in the buffer tank 41 is lower than the preset minimum liquid level, the control mechanism controls the circulating liquid level alarm to give out a first alarm to prompt an operator that the buffer tank 41 is in an emptying state; when the liquid level of the cleaning liquid in the buffer tank 41 is higher than the preset maximum liquid level, the control mechanism controls the circulating liquid level alarm to give out a second alarm to prompt an operator that the circulating filter mechanism 4 is in an overload state.
Similarly, a cleaning liquid level sensor is provided in the cleaning tank 1 to detect the liquid level height of the cleaning liquid in the cleaning tank 1. A cleaning liquid level alarm can be further arranged in the cleaning tank 1 and electrically connected with a control mechanism, and the control mechanism controls the cleaning liquid level alarm to send out corresponding alarm according to the liquid level information of the cleaning tank 1.
Preferably, the cleaning liquid level sensor and the buffer liquid level sensor are both nitrogen liquid level meters so as to realize liquid level detection in a corrosive environment. The nitrogen level gauge is prior art and this embodiment is not redundantly described. Of course, the types of the cleaning liquid level sensor and the buffer liquid level sensor are not limited to the above types, and the cleaning liquid level sensor and the buffer liquid level sensor can be different liquid level sensors and can be set according to actual needs, and the embodiment does not limit the above types.
Preferably, the cleaning device further comprises an overflow protection mechanism 6, wherein one end of the overflow protection mechanism 6 is communicated with the upper part of the cleaning tank 1, so that the cleaning liquid of the cleaning tank 1 can flow out from the overflow protection mechanism 6 to protect the cleaning device, and the damage to the cleaning device caused by the abnormal flow of the cleaning liquid of the cleaning tank 1 is avoided.
In this embodiment, one end of the overflow protection mechanism 6 is communicated with the upper portion of the buffer tank 41, the cleaning solution overflowing from the cleaning tank 1 first enters the circulation tank, so that the liquid level in the circulation tank continuously rises, and when the liquid level in the circulation tank rises to the connection between the overflow protection mechanism 6 and the buffer tank 41, the excessive cleaning solution flows into the overflow protection mechanism 6 from the circulation tank and is discharged. Of course, the arrangement of the overflow protection mechanism 6 is not limited to this, and may be set according to actual needs, which is not limited by this embodiment.
In order to further improve the cleaning effect of the cleaning device, the bottom of the cleaning tank 1 is provided with a bubbler for stirring the cleaning liquid in the cleaning tank 1, which is beneficial to promoting the pollutants attached to the surface of the piece to be cleaned 100 to be separated from the piece to be cleaned 100. In addition, the arrangement of the bubbler can also improve the cleaning effect of the cleaning tank 1, so that the cleanliness of the cleaning liquid of the cleaning tank 1 is improved.
Optionally, be equipped with ultrasonic cleaning mechanism in washing tank 1 to further treat that washing piece 100 washs, impact the pollutant repeatedly through ultrasonic cavitation, can destroy the pollutant and treat the adsorption between washing piece 100, make the pollutant break away from and treat washing piece 100, thereby further improve belt cleaning device's cleaning performance.
In addition, during the process of cleaning the member to be cleaned 100, the member to be cleaned 100 may be vibrated by ultrasonic waves of a preset frequency to improve the cleaning effect of the cleaning apparatus.
Optionally, a magnetic member is further disposed in the cleaning tank 1 and/or the buffer tank 41 to adsorb magnetic contaminants suspended in the cleaning solution, so as to further improve the cleanliness of the cleaning solution. Illustratively, the magnetic member is a magnetic bar.
Optionally, the cleaning device further comprises a liquid inlet mechanism 7, and the liquid inlet mechanism 7 is communicated with the cleaning tank 1 and is used for introducing cleaning liquid into the cleaning tank 1.
Specifically, liquid inlet mechanism 7 includes liquid inlet pipeline and feed liquor drive assembly, and liquid inlet pipeline's one end is linked together with washing tank 1, and feed liquor drive assembly sets up on the liquid inlet pipeline to the washing liquid of drive in the liquid inlet pipeline flows.
Further, the liquid inlet mechanism 7 further comprises a liquid inlet filtering component 71, and the liquid inlet filtering component 71 is arranged on the liquid inlet pipeline to filter the cleaning liquid in the liquid inlet pipeline, so that the cleanliness and the cleaning effect of the cleaning liquid are ensured. The feed filter assembly 71 is arranged similarly to the recirculation filter assembly and will not be described in any greater detail in this embodiment.
Preferably, the liquid inlet mechanism 7 further comprises a liquid inlet flow sensor, and the liquid inlet flow sensor is arranged on the liquid inlet pipeline to detect the flow of the cleaning liquid in the liquid inlet pipeline. Illustratively, the inlet flow sensor is a flow transmitter.
Further, the liquid inlet flow sensor is electrically connected with the control mechanism to transmit flow information of the cleaning liquid in the liquid inlet pipeline to the control mechanism, the cleaning device further comprises a flow alarm, the flow alarm is electrically connected with the control mechanism, and when the flow of the cleaning liquid in the liquid inlet pipeline is abnormal, the control mechanism controls the flow alarm to give an alarm, so that an operator is prompted to perform corresponding operation.
Of course, the control mechanism is not limited to this to the control mode of the flow of the cleaning solution in the liquid inlet pipeline, and can also be that the control mechanism is electrically connected with the liquid inlet driving assembly, and when the flow of the cleaning solution in the liquid inlet pipeline is abnormal, the control mechanism controls the liquid inlet driving assembly to stop working, and can be set according to actual needs, and this embodiment does not limit this.
Optionally, the feed liquor structure still includes pressure switch, and pressure switch sets up on the feed liquor pipeline to the pressure of the washing liquid in the control feed liquor pipeline avoids feed liquor pressure too big to cause belt cleaning device's damage. Illustratively, the pressure switch is electrically connected with the liquid inlet driving assembly, and when the pressure of the cleaning liquid in the liquid inlet pipeline is greater than the preset pressure, the pressure switch controls the liquid inlet driving assembly to stop working.
Optionally, the cleaning apparatus further comprises a water inlet mechanism connected to the cleaning tank 1 for introducing water into the cleaning tank 1 to clean the cleaning tank 1.
Further, the water inlet mechanism is also connected with the refrigeration assembly 31 so as to feed water into the refrigeration assembly 31, so that the cleaning device is compact in structure.
Optionally, the cleaning device further comprises a liquid discharge mechanism 8, wherein the liquid discharge mechanism 8 is communicated with the cleaning tank 1 and is used for discharging the cleaning liquid in the cleaning tank 1. When the cleaning liquid in cleaning tank 1 or cleaning tank 1 needs to be replaced, the waste cleaning liquid can be discharged through liquid discharge mechanism 8.
Illustratively, the liquid discharge mechanism 8 includes a liquid discharge line having one end communicating with the bottom of the cleaning tank 1 and the other end communicating with an external recovery processing device. Specifically, the drain line is connected to the cleaning tank 1 via a flange.
Further, the liquid discharge mechanism 8 further comprises a receiving disc and a liquid leakage sensor, the receiving disc is arranged below the joint of the liquid discharge pipeline and the external recovery processing device, and the liquid leakage sensor is used for detecting liquid leakage at the joint of the liquid discharge pipeline and the recovery processing device.
Optionally, the overflow protection mechanism 6 and the circulating filter mechanism 4 are both in communication with an external recovery processing device. Further, the joint of the overflow protection mechanism 6 and the external recovery processing device is positioned above the receiving tray, so that the liquid leakage sensor can detect whether liquid leakage occurs at the joint of the overflow protection mechanism 6 and the external recovery processing device. Similarly, the connection point of the circulating filter mechanism 4 and the external recovery processing device is also positioned above the receiving tray, so that the leakage sensor can detect whether leakage occurs at the connection point of the circulating filter mechanism 4 and the external recovery processing device.
Of course, the arrangement of the catch tray and the leakage sensor is not limited thereto. In other embodiments, the cleaning device may further include a plurality of receiving trays, each connection portion corresponds to one receiving tray, each receiving tray corresponds to one leakage sensor, and the leakage sensors may be set according to actual detection needs, which is not limited in this embodiment.
Optionally, valve components are arranged on the liquid inlet pipeline, the circulating pipeline, the liquid discharge pipeline and the cooling pipeline to control the on-off of the corresponding pipelines and facilitate the maintenance of the corresponding pipelines. Illustratively, the valve assembly includes a manual valve 91 and/or a pneumatic valve 92. It is understood that, when the manual valve 91 and the pneumatic valve 92 are provided in the pipeline, the manual valve 91 and the pneumatic valve 92 may be provided in series to control the on/off of the corresponding pipeline at the same time, and the manual valve 91 and the pneumatic valve 92 may also be provided in parallel to enable an operator to selectively control the on/off of the corresponding pipeline through the manual valve 91 or the pneumatic valve 92.
In the description of the present specification, it is to be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of describing the present embodiment and simplifying the description, but do not indicate or imply that the device or structure referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. Wherein the terms "first position" and "second position" are two different positions.
In the description herein, references to the description of "an embodiment," "an example" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example.
Unless expressly stated or limited otherwise, the terms "mounted," "connected," and "secured" are to be construed broadly and encompass, for example, both fixed and removable connections; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.
Unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may include the first feature being in direct contact with the second feature, or may include the first feature being in direct contact with the second feature but being in contact with the second feature by another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
In addition, the foregoing is only the preferred embodiment of the present invention and the technical principles applied thereto. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail with reference to the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the scope of the present invention.
Claims (10)
1. A cleaning device, comprising:
the cleaning device comprises a cleaning tank (1), wherein cleaning liquid is contained in the cleaning tank (1), and a part to be cleaned of a piece to be cleaned (100) is immersed in the cleaning liquid;
a power supply, wherein a cathode (21) of the power supply is electrically connected with the to-be-cleaned part (100), at least part of an anode of the power supply is immersed in the cleaning liquid, the power supply is switched on, and the cleaning liquid can be ionized to generate a large amount of gas so as to carry away pollutants attached to the to-be-cleaned part;
and the temperature control mechanism (3) is used for controlling the temperature of the cleaning solution in the cleaning tank (1).
2. The cleaning device according to claim 1, wherein the temperature control mechanism (3) comprises:
a refrigeration assembly (31);
and the heat exchanger (32) is immersed in the cleaning liquid, and two ends of the heat exchanger (32) are respectively communicated with the water inlet and the water outlet of the refrigeration assembly (31).
3. The cleaning device according to claim 2, wherein the temperature control mechanism (3) further comprises a temperature switch, the temperature switch is immersed in the cleaning liquid of the cleaning tank (1), and the temperature switch is electrically connected with the refrigeration component (31) to control the refrigeration component (31) to start or stop.
4. The cleaning apparatus according to claim 1, further comprising a circulating filter mechanism (4), wherein both ends of the circulating filter mechanism (4) are respectively communicated with the upper portion of the cleaning tank (1) and the bottom portion of the cleaning tank (1), so that the cleaning solution in the cleaning tank (1) can flow into the circulating filter mechanism (4) from the upper portion of the cleaning tank (1) and flow into the cleaning tank (1) from the bottom portion of the cleaning tank (1).
5. The washing device according to claim 4, characterized in that the circulating filtering means (4) comprise:
a buffer tank (41), wherein the buffer tank (41) is communicated with the upper part of the cleaning tank (1);
the two ends of the circulating pipeline are respectively communicated with the bottom of the buffer tank (41) and the bottom of the cleaning tank (1);
a circulation driving assembly (42) arranged on the circulation pipeline to drive the cleaning liquid in the circulation pipeline to flow;
and the circulating filtering assembly is arranged on the circulating pipeline and is used for filtering the cleaning liquid in the circulating pipeline.
6. The cleaning apparatus according to claim 1, further comprising an air exhaust mechanism (5), the air exhaust mechanism (5) communicating with an upper portion of the cleaning tank (1) to exhaust the gas inside the cleaning tank (1).
7. The cleaning apparatus according to claim 1, further comprising an overflow protection mechanism (6), wherein one end of the overflow protection mechanism (6) is communicated with an upper portion of the cleaning tank (1), and the cleaning liquid in the cleaning tank (1) can flow out from the overflow protection mechanism (6).
8. The cleaning device according to claim 1, further comprising a liquid inlet mechanism (7), wherein the liquid inlet mechanism (7) is communicated with the cleaning tank (1) and is used for introducing the cleaning liquid into the cleaning tank (1).
9. The cleaning device according to claim 1, further comprising a liquid discharge mechanism (8), wherein the liquid discharge mechanism (8) is in communication with the cleaning tank (1) for discharging the cleaning liquid in the cleaning tank (1).
10. The cleaning device according to claim 9, characterized in that the drainage mechanism (8) comprises:
one end of the liquid discharge pipeline is communicated with the bottom of the cleaning tank (1), and the other end of the liquid discharge pipeline is communicated with an external recovery processing device;
the bearing disc is arranged below the joint of the drainage pipeline and the external recovery processing device;
and the leakage sensor is used for detecting leakage at the joint of the drainage pipeline and the recovery processing device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120518030.7U CN215142753U (en) | 2021-03-11 | 2021-03-11 | Cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120518030.7U CN215142753U (en) | 2021-03-11 | 2021-03-11 | Cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215142753U true CN215142753U (en) | 2021-12-14 |
Family
ID=79415057
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120518030.7U Active CN215142753U (en) | 2021-03-11 | 2021-03-11 | Cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215142753U (en) |
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2021
- 2021-03-11 CN CN202120518030.7U patent/CN215142753U/en active Active
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