CN215103495U - Crystal oscillator control coating machine - Google Patents
Crystal oscillator control coating machine Download PDFInfo
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- CN215103495U CN215103495U CN202023015603.9U CN202023015603U CN215103495U CN 215103495 U CN215103495 U CN 215103495U CN 202023015603 U CN202023015603 U CN 202023015603U CN 215103495 U CN215103495 U CN 215103495U
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- evaporation sources
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- 239000013078 crystal Substances 0.000 title claims abstract description 60
- 238000000576 coating method Methods 0.000 title claims abstract description 33
- 239000011248 coating agent Substances 0.000 title claims abstract description 30
- 238000001704 evaporation Methods 0.000 claims abstract description 58
- 230000008020 evaporation Effects 0.000 claims abstract description 53
- 239000000523 sample Substances 0.000 claims abstract description 35
- 238000012937 correction Methods 0.000 claims abstract description 27
- 239000000463 material Substances 0.000 claims abstract description 8
- 230000005611 electricity Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 21
- 238000009501 film coating Methods 0.000 description 11
- 239000007888 film coating Substances 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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Abstract
The utility model provides a crystal control coating machine, it includes: the device comprises a crystal control instrument, a vacuum chamber, a probe crystal control sensor, at least two groups of evaporation sources, a workpiece disc, a correction plate, a computer and a high-voltage power supply; the device comprises a workpiece disc, a correction plate, at least two groups of evaporation sources, a vacuum chamber and a control system, wherein the workpiece disc is arranged at the center of the top of the vacuum chamber and comprises a first driving motor, a probe crystal control sensor is arranged at the position of the same height of the workpiece disc, the correction plate is arranged right below the workpiece disc, the at least two groups of evaporation sources are arranged at the bottom of the vacuum chamber, and the at least two groups of evaporation sources are used for evaporating different evaporation materials; and wherein, the work piece dish is connected with first driving motor electricity, and the brilliant accuse sensor of crystal accuse appearance and probe, high voltage power supply and computer are signal connection respectively, and high voltage power supply is used for providing operating voltage for at least two sets of evaporation sources, and the computer is connected with first driving motor signal. The utility model discloses a crystal oscillator control coating machine has realized the automatic accurate control of multilayer coating film.
Description
Technical Field
The utility model relates to an optical film coating technology field especially relates to a crystal oscillator control coating machine.
Background
Various optical mirror surfaces such as lenses, reflectors, spectroscopes and prisms used in modern optical engineering are subjected to optical coating according to different technical requirements in use, so that the technical requirements of an optical system are met. The optical coating is a special technological process of optical processing, which is to heat and evaporate a solid coating material under the condition of high vacuum to form a film. The different thicknesses of the film meet different use requirements; the growth thickness of the film must be controlled to meet the application requirements of the optical technology.
The precise control technology for controlling the film growth thickness in the film coating process in real time based on quartz crystal oscillation (crystal vibration) is widely applied to the technical field of high-precision film coating at present.
The multilayer optical film is generally generated by alternately evaporating high-refractive index and low-refractive index film materials of the film by a film material evaporation system of a film coating machine, a sensor probe for controlling the film thickness is arranged at the central position of the upper part of a vacuum chamber of the film coating machine, and the distances between the probe and an evaporation source of the film coating machine are equal; the probe is arranged at the center of the upper part of the film coating machine, and the distance between the probe and the evaporation source is equal, so that the change of the film thickness can be correctly detected and the accurate thickness of the film growth can be strictly controlled. Therefore, the coating machine for coating the high-reflection film cannot coat the workpiece with a central imperforate structure, the caliber of which is larger than the radius of the coating machine, due to the installation position of the probe of the film thickness control instrument.
Therefore, how to realize the automatic and accurate control of the multilayer film coating of the center nonporous aperture of the workpiece to be coated, which is larger than the radius of the coating machine, becomes a technical problem to be solved urgently.
SUMMERY OF THE UTILITY MODEL
In order to solve the technical problem, the utility model discloses a crystal oscillator control coating machine, a serial communication port, include: the device comprises a crystal control instrument, a vacuum chamber, a probe crystal control sensor, at least two groups of evaporation sources, a workpiece disc, a correction plate, a computer and a high-voltage power supply; the workpiece disc is arranged at the center of the top of the vacuum chamber and comprises a first driving motor, the probe crystal control sensor is arranged at the position with the same height of the workpiece disc, the correction plate is arranged right below the workpiece disc, the at least two groups of evaporation sources are arranged at the bottom of the vacuum chamber, and the at least two groups of evaporation sources are used for evaporating different evaporation materials; and the workpiece disc is electrically connected with the first driving motor, the crystal control instrument is in signal connection with the probe crystal control sensor, the high-voltage power supply and the computer respectively, the high-voltage power supply is used for providing working voltage for the at least two groups of evaporation sources, and the computer is in signal connection with the first driving motor.
The utility model discloses an among the crystal oscillator control coating machine, through as above set up corresponding evaporation source, work piece dish, probe and correction board to through the signal connection relation between probe, crystal control appearance, computer, high voltage power supply, the work piece dish, realized being greater than the thick automatic accurate control of the multilayer coating film of coating machine radial by the central sclausura bore of plated work piece.
In a further technical scheme, the crystal control instrument is provided with an expansion groove for inserting the probe crystal control sensor and a control board, and the control board is used for controlling the evaporation source by controlling the high-voltage power supply.
In a further technical scheme, the correction plate is a rotatable correction plate, the rotatable correction plate comprises a second driving motor, and the second driving motor is in signal connection with the computer.
In a further technical scheme, the at least two groups of evaporation sources are symmetrically distributed relative to the correction plate.
In a further technical scheme, the number of the probe crystal control sensors is at least two groups.
In a further technical scheme, two groups of evaporation sources are arranged at the bottom of the vacuum chamber, and two groups of the probe crystal control sensors are arranged on the same side of the two groups of evaporation sources at equal distance from the two groups of evaporation sources.
In a further technical scheme, the two groups of evaporation sources are electron guns or evaporation resistance sources.
Drawings
FIG. 1 is a schematic structural view of a crystal oscillator controlled coating machine according to the present invention;
FIG. 2 is a schematic diagram of the signal connection of the crystal oscillator controlled coating machine of the present invention.
Detailed Description
The technical solution of the present invention will be further described with reference to the following specific examples, but the present invention is not limited to these examples.
It should be understood that the structures, ratios, sizes, etc. shown in the drawings of the present application are only used for matching with the contents disclosed in the specification, so as to be known and read by those skilled in the art, and are not used for limiting the limit conditions that the present invention can be implemented, so that the present invention has no technical essential meaning, and any modification of the structures, change of the ratio relationship or adjustment of the sizes should still fall within the scope of the present invention without affecting the functions and the achievable purposes of the present invention. Meanwhile, the terms such as "upper", "lower", "left", "right", "top", "bottom", "middle" and "one" used in the present specification are used for clarity of description only, and are not used to limit the scope of the present invention, and changes or adjustments of the relative relationship thereof are also considered as the scope of the present invention without substantial changes in the technical content.
Referring to fig. 1 and 2, the present invention provides a crystal oscillator control coating machine, which includes: the device comprises a crystal control instrument, a vacuum chamber, a probe crystal control sensor, at least two groups of evaporation sources, a workpiece disc, a correction plate, a computer and a high-voltage power supply; the workpiece disc is arranged at the center of the top of the vacuum chamber and comprises a first driving motor, the probe crystal control sensor is arranged at the position with the same height of the workpiece disc, the correction plate is arranged right below the workpiece disc, the at least two groups of evaporation sources are arranged at the bottom of the vacuum chamber, and the at least two groups of evaporation sources are used for evaporating different evaporation materials; and the workpiece disc is electrically connected with the first driving motor, the crystal control instrument is in signal connection with the probe crystal control sensor, the high-voltage power supply and the computer respectively, the high-voltage power supply is used for providing working voltage for the at least two groups of evaporation sources, and the computer is in signal connection with the first driving motor.
By providing the evaporation source, the probe, the workpiece tray, the correction plate, and the like as described above, and by signal-connecting the crystal controller with the probe crystal control sensor, the high voltage power supply, and the computer, respectively, and signal-connecting the computer with the first driving motor, it is possible to realize automatic and accurate control of the multilayer coating by monitoring the coating film thickness in real time.
As for the crystal control instrument, a quartz crystal film thickness meter having an internal expanding function may be adopted, and in this case, the crystal control instrument may be provided with a sufficient expanding groove to enable insertion of a probe and a control board for controlling the evaporation source, which control board realizes control of the evaporation source by controlling the high-voltage power supply. Therefore, in a further technical scheme, the crystal control instrument can be provided with an expansion groove used for inserting the probe crystal control sensor and the control board.
Further, in order to obtain a thin film with uniform thickness in the coating process, the correction plate can adopt a rotatable correction plate which can be driven by a second driving motor, and the second driving motor is in signal connection with a computer, so that the automatic adjustment of the correction plate is further realized through the real-time monitoring of the thickness of the coated film, and the more accurate control of the thickness of the coated film is realized.
For example, in an embodiment, the rotatable correction plate may include a correction plate, a support rod, a driving motor, a cable, a controller, control software, a mounting assembly, and the like, and the rotatable correction plate may be mounted at a position eccentric to the coater base plate and equidistant from the evaporation sources (two or more evaporation sources), i.e., at least two evaporation sources may be symmetrically distributed with respect to the rotatable correction plate to simplify the mounting and control process.
Furthermore, at least two groups of probe crystal control sensors can be arranged, wherein at least one group of probe crystal control sensors can be used as a spare sensor, thereby preventing the situation that the quartz wafer participating in the film coating control does not finish the film coating control of the multilayer film and can not normally finish the film coating due to failure.
In a further embodiment, for example, two sets of evaporation sources may be provided at the bottom of the vacuum chamber, and two sets of the probe crystal control sensors are arranged at the same distance from the two sets of evaporation sources on the same side of the two sets of evaporation sources.
In addition, as for the evaporation source, it may employ an electron gun as shown in fig. 1 or may employ resistance evaporation.
Referring to fig. 2, the coating control process of the crystal oscillator control coating machine of the present invention is as follows:
in the coating process, firstly, coating thickness information is obtained through a probe; then transmitting the control signal to a film thickness meter, and processing the signal by the film thickness meter to obtain a corresponding control signal; the film thickness gauge can send control signals to a high-voltage power supply to control the switch of the evaporation source of the electron gun, and can also send control signals to a computer to control the correction plate and the workpiece disc.
In the coating process, the electron gun influences the evaporation speed of a coating material, the evaporation speed influences the deposition speed on the surface of the probe, and the probe transmits a deposition speed signal to the crystal control instrument.
In addition, data signal transmission is carried out between the high-voltage power supply and the crystal control instrument so as to stabilize voltage and prevent overshoot.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, many modifications and improvements can be made without departing from the inventive concept, and all of them belong to the protection scope of the present invention.
Claims (7)
1. A crystal control coating machine is characterized by comprising: the device comprises a crystal control instrument, a vacuum chamber, a probe crystal control sensor, at least two groups of evaporation sources, a workpiece disc, a correction plate, a computer and a high-voltage power supply; wherein,
the workpiece disc is arranged at the center of the top of the vacuum chamber and comprises a first driving motor, the probe crystal control sensor is arranged at the position with the same height of the workpiece disc, the correction plate is arranged right below the workpiece disc, the at least two groups of evaporation sources are arranged at the bottom of the vacuum chamber, and the at least two groups of evaporation sources are used for evaporating different evaporation materials; and wherein the one or more of the one or more,
the workpiece disc is electrically connected with the first driving motor, the crystal control instrument is in signal connection with the probe crystal control sensor, the high-voltage power supply and the computer respectively, the high-voltage power supply is used for providing working voltage for the at least two groups of evaporation sources, and the computer is in signal connection with the first driving motor.
2. The crystal oscillator controlled coating machine of claim 1, wherein the crystal control instrument is provided with an expansion slot for inserting the probe crystal control sensor and a control board, and the control board is used for controlling the evaporation source by controlling the high-voltage power supply.
3. The crystal oscillator controlled coating machine of claim 2, wherein the correction plate is a rotatable correction plate, the rotatable correction plate comprises a second drive motor, and the second drive motor is in signal connection with the computer.
4. The crystal oscillator controlled coater of claim 3, wherein the at least two groups of evaporation sources are distributed symmetrically with respect to the correction plate.
5. The crystal oscillator control coater of claim 4, wherein the number of the probe crystal control sensors is at least two.
6. The crystal oscillator controlled coater according to claim 4, wherein two sets of evaporation sources are provided at the bottom of the vacuum chamber, and two sets of the probe crystal control sensors are arranged on the same side of the two sets of evaporation sources at equal distances from the two sets of evaporation sources.
7. The crystal oscillator controlled coating machine of any one of claims 1 to 6, wherein the two groups of evaporation sources are electron guns or resistance evaporation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023015603.9U CN215103495U (en) | 2020-12-14 | 2020-12-14 | Crystal oscillator control coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023015603.9U CN215103495U (en) | 2020-12-14 | 2020-12-14 | Crystal oscillator control coating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215103495U true CN215103495U (en) | 2021-12-10 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202023015603.9U Active CN215103495U (en) | 2020-12-14 | 2020-12-14 | Crystal oscillator control coating machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215103495U (en) |
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2020
- 2020-12-14 CN CN202023015603.9U patent/CN215103495U/en active Active
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