CN214846237U - Photo-etching chromium plate with alignment mark - Google Patents
Photo-etching chromium plate with alignment mark Download PDFInfo
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- CN214846237U CN214846237U CN202121272894.1U CN202121272894U CN214846237U CN 214846237 U CN214846237 U CN 214846237U CN 202121272894 U CN202121272894 U CN 202121272894U CN 214846237 U CN214846237 U CN 214846237U
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- alignment
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- chrome
- alignment mark
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 65
- 238000001259 photo etching Methods 0.000 title claims abstract description 62
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 30
- 239000011651 chromium Substances 0.000 title claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 15
- 230000002265 prevention Effects 0.000 claims abstract description 11
- 238000007790 scraping Methods 0.000 claims abstract description 6
- 230000003678 scratch resistant effect Effects 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000000206 photolithography Methods 0.000 abstract description 3
- 238000001459 lithography Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001883 metal evaporation Methods 0.000 description 1
Images
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The utility model provides a photoetching chromium version with alignment mark, include: the scraping prevention mechanism is arranged at the bottom of the photo-etching chromium plate and comprises a corner pad and a connecting plate; the photoetching chromium plate is arranged on the inner side of the scratch-resistant mechanism and comprises a substrate, a chromium film, a photoresist and a photomask; and the alignment mark is arranged at the top of the photoetching chrome plate and comprises an alignment frame and an alignment bump. The utility model provides a present alignment mark adopt cross ring or elliptical ring to carve on the sample mostly, can make alignment pattern on the sample become fuzzy after the alignment many times, the relative position's of observation photolithography mask figure that can not be accurate problem with the sample figure.
Description
Technical Field
The utility model relates to a photoetching chromium version technical field, concretely relates to photoetching chromium version with alignment mark.
Background
In the microelectronic process flow of semiconductor devices, it is necessary to transfer the geometric patterns on the mask, which define various regions in the integrated circuit, such as ion implantation regions, etching regions, contact windows, wire bonding regions, etc., to the photosensitive thin-layer material coated on the surface of the semiconductor wafer by photolithography. In the manufacture of a set of semiconductor devices or integrated circuits, multiple times of photoetching are often required, and besides the first time of photoetching, the pattern of each time of photoetching and the patterns of the last times of photoetching have direct or indirect relative position relation. All lithography except the first lithography in a set of microelectronic processing flows of a sample substrate can be referred to as overlay, i.e., pattern nested photolithography. The relative position of the overlay pattern can be well observed by the photoetching alignment mark, the pattern on the photoetching mask can be remained on the sample substrate by the technological processes of etching, metal evaporation and the like, and the sample substrate is positioned by comparing the pattern on the photoetching mask with the sample pattern by the later photoetching.
Most of the existing alignment marks are engraved on a sample by adopting a cross ring or an elliptical ring, and after the alignment marks are engraved for many times, an alignment pattern on the sample can become blurred, so that the relative position of a pattern of a photomask and a pattern of the sample cannot be accurately observed.
SUMMERY OF THE UTILITY MODEL
In order to overcome the defects in the prior art, a photo-etching chrome plate with an alignment mark is provided so as to solve the problems that most of the existing alignment marks are engraved on a sample by adopting a cross ring or an elliptical ring, and the alignment pattern on the sample can become blurred after multiple times of alignment, so that the relative position of the pattern of the photo-etching plate and the pattern of the sample cannot be accurately observed.
In order to achieve the above object, there is provided a lithographic chrome plate with an alignment mark, comprising:
the scraping prevention mechanism is arranged at the bottom of the photo-etching chromium plate and comprises a corner pad and a connecting plate;
the photoetching chromium plate is arranged on the inner side of the scratch-resistant mechanism and comprises a substrate, a chromium film, a photoresist and a photomask;
and the alignment mark is arranged at the top of the photoetching chrome plate and comprises an alignment frame and an alignment bump.
Further, the bottom layer of the photo-etching chromium plate is a rectangular quartz glass substrate, the top surface of the substrate is plated with a chromium film, and the top surface of the chromium film is coated with a photoresist.
Furthermore, the four sides of the top surface of the photoresist are adhered with an alignment frame with alignment marks, the alignment frame is of a rectangular frame structure, and a photomask of a photo-etching chrome plate is coated on the top surface of the photoresist at the bottom of the rectangular groove on the inner side of the alignment frame.
Furthermore, alignment lugs are respectively arranged at the four corners of the top surface of the alignment frame and the middle points of the four sides of the alignment frame, and the alignment lugs are in a rectangular pyramid structure.
Furthermore, the corner pads of the scratch-proof mechanism are of a right-angle-shaped rubber pad structure, two horizontally adjacent corner pads are fixedly connected through a connecting plate, and two vertically adjacent corner pads are connected through a connecting plate.
Furthermore, the four corner pads form a rectangular frame structure, and are respectively arranged at the four corners of the substrate of the chrome lithography plate in a cushioning manner.
The beneficial effects of the utility model reside in that, the utility model discloses a photoetching chromium version with alignment mark utilizes the photomask restriction of alignment mark's alignment frame with photoetching chromium version in alignment frame, be provided with alignment lug respectively in the mid point position of the top surface four corners and the four sides of alignment frame, alignment lug is rectangular pyramid structure, avoid marking become fuzzy and lead to photoetching territory shape to take place the skew after a lot of alignment, thereby realize the relative position of accurate observation photoetching version figure and sample figure, the while utilizes and prevents scraping the mechanism and protect the base plate, prevent the base plate scratch, it carves on the sample to have solved current alignment mark and adopt cross ring or elliptical ring mostly, alignment figure that can make on the sample after many times of alignment can become fuzzy, the relative position's of observation photoetching version figure and sample figure that can not be accurate problem.
Drawings
Fig. 1 is a schematic top view of an embodiment of the present invention;
fig. 2 is a schematic cross-sectional structure diagram of an embodiment of the present invention;
fig. 3 is a schematic view of the top view structure of the scratch-proof mechanism according to the embodiment of the present invention.
1. A scratch-resistant mechanism; 11. a corner pad; 12. a connecting plate; 2. photoetching a chromium plate; 21. a substrate; 22. a chromium film; 23. photoresist; 24. a photomask; 3. aligning the mark; 31. an alignment frame; 32. and aligning the bump.
Detailed Description
The following description of the embodiments of the present invention is provided for illustrative purposes, and other advantages and effects of the present invention will be readily apparent to those skilled in the art from the disclosure herein. The present invention can also be implemented or applied through other different specific embodiments, and various details in the present specification can be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.
Referring to fig. 1 to 3, the present invention provides a photo-etching chrome plate with alignment marks, including: the device comprises a scratch prevention mechanism 1, a photo-etching chrome plate 2 and an alignment mark 3.
Specifically, the scratch prevention mechanism 1 is arranged at the bottom of the photo-etching chromium plate 2, and the scratch prevention mechanism 1 comprises a corner pad 11 and a connecting plate 12.
The photo-etching chromium plate 2 is arranged on the inner side of the scratch-proof mechanism 1, and the photo-etching chromium plate 2 comprises a substrate 21, a chromium film 22, a photoresist 23 and a photomask 24.
An alignment mark 3 is disposed on top of the chrome plate 2, and the alignment mark 3 includes an alignment frame 31 and an alignment bump 32.
Most of the existing alignment marks are engraved on a sample by adopting a cross ring or an elliptical ring, and after the alignment marks are engraved for many times, an alignment pattern on the sample can become blurred, so that the relative position of a pattern of a photomask and a pattern of the sample cannot be accurately observed. Therefore, the utility model discloses a photoetching chromium version utilizes alignment mark 3's alignment frame 31 to restrict the photomask 24 of photoetching chromium version 2 in alignment frame 31, be provided with alignment lug 32 respectively in the top surface four corners of alignment frame 31 and the mid point position of four sides, alignment lug 32 is rectangular pyramid structure, avoid marking become obscure and lead to photoetching territory shape to take place the skew after alignment many times, thereby realize the relative position of accurate observation photoetching version figure and sample figure, utilize simultaneously and prevent scraping mechanism 1 and protect base plate 21, prevent base plate 21 scratch, it adopts cross ring or oval ring to carve on the sample mostly to have solved current alignment mark, alignment figure that can make on the sample after alignment many times can become obscure, the problem of the relative position of observation photoetching version figure and sample figure that can not be accurate.
In this embodiment, the photo-etching chrome plate 2 is arranged inside the scratch prevention mechanism 1, the photo-etching chrome plate 2 comprises a substrate 21, a chrome film 22, a photoresist 23 and a photomask 24, the alignment mark 3 is arranged on the top of the photo-etching chrome plate 2, and the alignment mark 3 comprises an alignment frame 31 and an alignment bump 32.
As a preferred embodiment, the bottom layer of the photo-etching chrome plate 2 is a rectangular quartz glass substrate 21, the top surface of the substrate 21 is plated with a chrome film 22, the top surface of the chrome film 22 is coated with a photoresist 23, four edges of the top surface of the photoresist 23 are adhered with alignment frames 31 of alignment marks 3, the alignment frames 31 are in a rectangular frame structure, a photo-mask 24 of the photo-etching chrome plate 2 is coated on the top surface of the photoresist 23 at the bottom of a rectangular groove inside the alignment frame 31, alignment bumps 32 are respectively arranged at four corners of the top surface of the alignment frame 31 and at midpoints of the four edges, the alignment bumps 32 are in a rectangular pyramid structure, the photo-mask 24 is limited in the alignment frame 31 by using the alignment frame 31, then the photo-etching chrome plate 2 after the first photo-etching is used as a sample, then a second photo-etching chrome plate 2 to be photo-etched is placed on the alignment bumps 32 at the top of the photo-etching chrome plate 2 after the first photo-etching for reference, the alignment bumps 32 on the two photo-etching chrome plates 2 correspond to each other, and the conical structures of the alignment bumps 32 can avoid the inconvenience of observing the relative positions of the patterns on the photo-etching plates and the patterns on the sample due to the fact that the alignment bumps 32 are rubbed and blurred after multiple times of alignment.
In the embodiment, the scratch prevention mechanism 1 is arranged at the bottom of the photo-etching chrome plate 2, and the scratch prevention mechanism 1 comprises a corner pad 11 and a connecting plate 12.
As a preferred embodiment, the corner pads 11 of the scratch prevention mechanism 1 are rectangular rubber pad structures, two horizontally adjacent corner pads 11 are fixedly connected by a connecting plate 12, two vertically adjacent corner pads 11 are connected by a connecting plate 12, the four corner pads 11 form a rectangular frame structure, the four corner pads 11 are respectively arranged at four corners of the substrate 21 of the chrome lithography plate 2, and the substrate 21 is protected by the corner pads 11 to prevent the substrate 21 from being scratched.
The utility model discloses a photoetching chromium version with alignment mark can effectively solve current alignment mark and adopt cross ring or elliptical ring to carve on the sample mostly, can make the alignment figure on the sample can become fuzzy after the alignment many times, and the relative position's of observation photoetching version figure that can not be accurate problem is applicable to the processing of photoetching chromium version.
Claims (6)
1. A photo-etching chrome plate with an alignment mark is characterized by comprising:
the scraping prevention mechanism (1) is arranged at the bottom of the photo-etching chromium plate (2), and the scraping prevention mechanism (1) comprises a corner pad (11) and a connecting plate (12);
the photo-etching chromium plate (2) is arranged on the inner side of the scratch-resistant mechanism (1), and the photo-etching chromium plate (2) comprises a substrate (21), a chromium film (22), a photoresist (23) and a photomask (24);
and the alignment mark (3) is arranged on the top of the photoetching chrome plate (2), and the alignment mark (3) comprises an alignment frame (31) and an alignment bump (32).
2. The chrome mask with the alignment mark as claimed in claim 1, wherein the bottom layer of the chrome mask (2) is a rectangular quartz glass substrate (21), the top surface of the substrate (21) is plated with a chrome film (22), and the top surface of the chrome film (22) is coated with a photoresist (23).
3. The chrome photo-etching plate with the alignment mark as claimed in claim 2, wherein the alignment frame (31) of the alignment mark (3) is adhered to four sides of the top surface of the photoresist (23), the alignment frame (31) is in a rectangular frame structure, and the photo-mask (24) of the chrome photo-etching plate (2) is coated on the top surface of the photoresist (23) at the bottom of the rectangular groove inside the alignment frame (31).
4. The chrome mask plate as claimed in claim 3, wherein the alignment bumps (32) are disposed at four corners of the top surface of the alignment frame (31) and at the middle points of the four sides, respectively, and the alignment bumps (32) are in the structure of a rectangular pyramid.
5. The chrome mask with the alignment mark as claimed in claim 1, wherein the corner pads (11) of the scratch-proof mechanism (1) are of a right-angle-shaped rubber pad structure, two horizontally adjacent corner pads (11) are fixedly connected with each other through a connecting plate (12), and two vertically adjacent corner pads (11) are connected with each other through a connecting plate (12).
6. The chrome mask plate with the alignment mark as claimed in claim 5, wherein the four corner pads (11) form a rectangular frame structure, and the four corner pads (11) are respectively arranged at four corners of the substrate (21) of the chrome mask plate (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121272894.1U CN214846237U (en) | 2021-06-08 | 2021-06-08 | Photo-etching chromium plate with alignment mark |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121272894.1U CN214846237U (en) | 2021-06-08 | 2021-06-08 | Photo-etching chromium plate with alignment mark |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214846237U true CN214846237U (en) | 2021-11-23 |
Family
ID=78804080
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202121272894.1U Active CN214846237U (en) | 2021-06-08 | 2021-06-08 | Photo-etching chromium plate with alignment mark |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214846237U (en) |
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2021
- 2021-06-08 CN CN202121272894.1U patent/CN214846237U/en active Active
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