CN214817691U - Polishing carrier disc cleaning and storing device - Google Patents
Polishing carrier disc cleaning and storing device Download PDFInfo
- Publication number
- CN214817691U CN214817691U CN202120402414.2U CN202120402414U CN214817691U CN 214817691 U CN214817691 U CN 214817691U CN 202120402414 U CN202120402414 U CN 202120402414U CN 214817691 U CN214817691 U CN 214817691U
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- cleaning
- polishing
- dish
- bearing structure
- brush
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- 238000004140 cleaning Methods 0.000 title claims abstract description 104
- 238000005498 polishing Methods 0.000 title claims abstract description 85
- 238000003860 storage Methods 0.000 claims abstract description 16
- 239000007788 liquid Substances 0.000 claims abstract description 14
- 238000004851 dishwashing Methods 0.000 claims abstract description 5
- 239000007921 spray Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 abstract description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052710 silicon Inorganic materials 0.000 abstract description 6
- 239000010703 silicon Substances 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 230000003749 cleanliness Effects 0.000 abstract description 3
- 230000002349 favourable effect Effects 0.000 abstract description 3
- 239000008187 granular material Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000000227 grinding Methods 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Landscapes
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
An embodiment of the utility model provides a dish washing storage device is carried in polishing for wash and storage polishing and carry dish, a serial communication port, which comprises a housin, be provided with bearing structure and cleaning brush in the casing, bearing structure is used for fixed polishing to carry the dish, cleaning brush corresponds bearing structure sets up, just cleaning brush is used for the cleanness to be fixed in dish is carried in the last polishing of bearing structure, corresponds each the cleaning brush that bearing structure set up includes two sets ofly, and two sets of cleaning brush is used for the cleanness respectively to be fixed in the last both sides that dish was carried in the polishing of bearing structure. The embodiment of the utility model provides a through setting up the cleaning brush, carry the both sides of dish to the polishing that is located bearing structure and wash to get rid of the polishing and carry foreign matter such as the remaining lapping liquid in dish surface or silicon chip granule, improve the polishing and carry the cleanliness of dish, be favorable to reducing the influence that probably causes to follow-up semiconductor manufacturing process.
Description
Technical Field
The utility model relates to a semiconductor processing technology field especially relates to a dish washs storage device is carried in polishing.
Background
In the process of processing semiconductors such as silicon wafers, double-side grinding is required to improve the quality of the semiconductors, and in the process of double-side grinding, the semiconductors are usually arranged on a polishing carrier disc and then ground on double-side grinding equipment. The slurry and the ground silicon wafer fragments may remain and adhere to the surface of the carrier plate, and thus, the carrier plate may have residues thereon, which may affect the subsequent semiconductor processing.
SUMMERY OF THE UTILITY MODEL
An embodiment of the utility model provides a dish washing storage device is carried in polishing to solve the polishing and carry the dish surface and probably have the residue, cause the problem of influence to semiconductor manufacturing process.
An embodiment of the utility model provides a dish washing storage device is carried in polishing for wash and storage polishing and carry dish, which comprises a housin, be provided with bearing structure and cleaning brush in the casing, bearing structure is used for fixed polishing to carry the dish, the cleaning brush corresponds bearing structure sets up, just the cleaning brush is used for the cleanness to be fixed in bearing structure is last to be carried the dish, corresponds each bearing structure sets up the cleaning brush includes two sets ofly, and two sets of the cleaning brush is used for the cleanness respectively to be fixed in bearing structure is last to polish carries the both sides of dish.
Optionally, the cleaning brush includes a brush body and bristles arranged on the surface of the brush body, a distance sensor is further arranged on one side of the brush body, where the bristles are arranged, and the distance sensor is used for detecting the distance between the brush body and the polishing carrier disc.
Optionally, the brush body is cylindrical, and the bristles are arranged around the brush body, wherein the diameter of the brush body is 4 to 7 centimeters, and the length of the bristles is 0.5 to 1 centimeter.
Optionally, the cleaning device further comprises a driving assembly, the cleaning brush is connected with the driving assembly, and the driving assembly is used for driving the cleaning brush to rotate and move.
Optionally, still including set up in the clean shower nozzle in the casing, clean shower nozzle corresponds bearing structure sets up, clean shower nozzle is used for spraying the cleaning solution and is fixed in with the cleanness dish is carried in the last polishing of bearing structure.
Optionally, an overflow trough is further arranged in the housing, the housing between the overflow trough and the bottom of the housing is a sealing structure, and the cleaning nozzle is further used for continuously injecting cleaning liquid into the housing when the polishing carrier disc is stored.
Optionally, the cleaning nozzles are respectively fixed at the top and the bottom of the housing.
Optionally, the cleaning device further comprises a rotatable turntable, the turntable is arranged in the shell, and the cleaning nozzle is fixed on the turntable and driven by the turntable to rotate along with the turntable.
Optionally, the lifting mechanism further comprises a rotatable turntable, the turntable is arranged in the shell, the supporting structure comprises a plurality of lifting hooks, and the lifting hooks are fixed on the turntable so as to be driven by the turntable to rotate along with the turntable.
The embodiment of the utility model provides a through setting up the cleaning brush, carry the both sides of dish to the polishing that is located bearing structure and wash to get rid of the polishing and carry foreign matter such as the remaining lapping liquid in dish surface or silicon chip granule, improve the polishing and carry the cleanliness of dish, be favorable to reducing the influence that probably causes to follow-up semiconductor manufacturing process.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the description of the embodiments of the present invention will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without inventive labor.
FIG. 1 is a schematic diagram of a polishing carrier disk cleaning storage device according to an embodiment of the present invention
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, not all, of the embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
An embodiment of the utility model provides a dish washing storage device is carried in polishing, and this polishing is carried a dish and is washd storage device and be used for wasing and store polishing and carry a dish.
As shown in fig. 1, in one embodiment, the polishing carrier cleaning and storing device comprises a housing 101, wherein a supporting structure, such as a bracket or a hook, is arranged in the housing 101, and the supporting structure is used for supporting and fixing the polishing carrier 200.
The polishing carrier disc cleaning and storing device further comprises cleaning brushes 102, the cleaning brushes 102 are arranged corresponding to the supporting structures, the cleaning brushes 102 are used for cleaning the polishing carrier discs 200 fixed on the supporting structures, the cleaning brushes 102 arranged corresponding to each supporting structure comprise two groups, and the two groups of cleaning brushes 102 are respectively used for cleaning two sides of the polishing carrier discs 200 fixed on the supporting structures.
In the working process, the used polishing carrier disc 200 is firstly arranged on the supporting structure, for example, the polishing carrier disc 200 can be hung on the hook, and then the cleaning brush 102 is controlled to brush the two sides of the polishing carrier disc 200 on the supporting structure, so as to remove the foreign matters such as the grinding fluid or silicon wafer particles left on the surface of the polishing carrier disc 200.
The embodiment of the utility model provides a through setting up cleaning brush 102, carry the both sides of dish 200 to the polishing that is located bearing structure and wash to get rid of the polishing and carry foreign matter such as the remaining lapping liquid in dish 200 surfaces or silicon chip granule, improve the polishing and carry the cleanliness of dish 200, be favorable to reducing the influence that probably causes to follow-up semiconductor manufacturing process.
In some of the embodiments, the cleaning brush 102 includes a brush body and bristles disposed on a surface of the brush body, and a distance sensor is disposed on a side of the brush body where the bristles are disposed, and is used for detecting a distance between the brush body and the polishing carrier plate 200.
In order to facilitate the operation and avoid damaging the polishing carrier disc 200, a large force is not generally applied to the polishing carrier disc 200 during the implementation, and therefore, the polishing carrier disc 200 is more suitably fixed by a non-fixed supporting structure such as a hook, and thus, a certain shaking of the polishing carrier disc 200 may be caused.
In this embodiment, the brush body is cylindrical, and the brush bristles are arranged around the brush body, wherein the diameter of the brush body is 4 to 7 cm, and the length of the brush bristles is 0.5 to 1 cm, so that the overall diameter of the cleaning brush 102 is controlled to be about 5 to 8 cm, and the cleaning effect on the polishing carrier disc 200 can be improved. In this embodiment, the distance between the axis of the cleaning brush 102 and the polishing carrier plate 200 can be controlled to be about 2.2 to 3.5 mm, and in the implementation, the distance between the cleaning brush 102 and the polishing carrier plate 200 is detected by the distance sensor, and the position of the cleaning brush 102 is finely adjusted according to the detected result, so as to improve the cleaning effect on the polishing carrier plate 200.
In some embodiments, the polishing carrier plate further comprises a driving assembly, the cleaning brush 102 is connected with the driving assembly, the driving assembly is used for driving the cleaning brush 102 to rotate so as to clean the polishing carrier plate 200, and the driving assembly is also used for driving the cleaning brush 102 to move so as to clean different positions of the polishing carrier plate 200.
In one embodiment, the spin speed of the cleaning brush 102 is controlled to be less than or equal to 15 revolutions per minute, thereby reducing the likelihood of damage to the polishing blade 200 during the cleaning process.
In some embodiments, the polishing apparatus further comprises a cleaning head 103 disposed in the housing 101, the cleaning head 103 is disposed corresponding to the supporting structure, and the cleaning head 103 is used for spraying a cleaning liquid to clean the polishing carrier plate 200 fixed on the supporting structure.
In this embodiment, the cleaning liquid includes, but is not limited to, deionized water, and the cleaning liquid is continuously sprayed through the cleaning nozzle 103 during the cleaning process of the polishing carrier plate 200, which is helpful to improve the cleaning effect of the polishing carrier plate 200.
In some embodiments, an overflow trough 104 is further disposed in the housing 101, the housing 101 is sealed between the overflow trough 104 and the bottom of the housing 101, and the cleaning nozzle 103 is further used for continuously injecting cleaning liquid into the housing 101 when the polishing carrier plate 200 is stored.
After the cleaning process is completed, the polishing carrier plate 200 is still stored in the housing 101, and during the storage of the polishing carrier plate 200, the cleaning head 103 continuously injects a cleaning liquid, such as deionized water, into the housing 101, so as to reduce the possibility of the polishing carrier plate 200 contacting other objects and reduce the possibility of contamination of the polishing carrier plate 200.
In some embodiments, the cleaning nozzles 103 are respectively fixed on the top and bottom of the housing 101 to respectively clean the polishing carrier plate 200 from different directions, which helps to improve the cleaning effect.
In some embodiments, the cleaning device further includes a rotatable turntable, the turntable is disposed in the housing 101, and the cleaning nozzle 103 is fixed on the turntable to rotate with the turntable under the driving of the turntable.
In some embodiments, the device further includes a rotatable turntable, the turntable is disposed in the housing 101, and the supporting structure includes a plurality of hooks, and the hooks are fixed on the turntable to rotate with the turntable under the driving of the turntable.
In this embodiment, the turntable is used to control the polishing carrier disc 200 and the cleaning head 103 to rotate relatively, thereby improving the cleaning effect on the polishing carrier disc 200. In some embodiments, the turntable can be used to rotate the support assembly and the polishing carrier 200 supported thereby, i.e., the position of the cleaning head 103 is fixed relative to the housing 101; in other embodiments, the turntable is used to rotate the cleaning head 103, that is, the supporting component and the polishing carrier 200 supported by the supporting component are fixed relative to the housing 101, which also enables to control the polishing carrier 200 to rotate relative to the cleaning head 103, which helps to improve the cleaning effect.
In the cleaning process of the polishing carrier plate 200, the flow rate of the cleaning liquid is relatively large, for example, the flow rate of each cleaning nozzle 103 is 3-10 liters per minute, and after the cleaning of the polishing carrier plate 200 is completed, the flow rate of the cleaning liquid of the cleaning nozzles 103 is reduced, in this embodiment, the flow rate can be reduced to 0.5-2 liters per minute, so as to save the use of the cleaning liquid. The cleaning solution filled in the housing 101 may overflow from the overflow tank 104, and the overflowing cleaning solution may be directly discharged, or may be recycled after further performing recovery operations such as filtration and distillation.
The above embodiments are only specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily think of changes or substitutions within the technical scope of the present invention, and all should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (9)
1. The utility model provides a dish washing storage device is carried in polishing for wash and storage polishing and carry dish, its characterized in that, which comprises a housin, be provided with bearing structure and cleaning brush in the casing, bearing structure is used for fixed polishing to carry the dish, the cleaning brush corresponds bearing structure sets up, just the cleaning brush is used for the cleanness to be fixed in dish is carried in last polishing of bearing structure, corresponds each the cleaning brush that bearing structure set up includes two sets ofly, and two sets of the cleaning brush is used for the cleanness respectively to be fixed in the both sides that dish is carried in last polishing of bearing structure.
2. The polishing carrier disc cleaning and storing device according to claim 1, wherein the cleaning brush comprises a brush body and bristles arranged on the surface of the brush body, and a distance sensor is arranged on one side of the brush body, on which the bristles are arranged, and used for detecting the distance between the brush body and the polishing carrier disc.
3. The polishing carrier disk cleaning and storage device of claim 2, wherein the brush body is cylindrical and the bristles are arranged around the brush body, wherein the diameter of the brush body is 4 to 7 cm and the length of the bristles is 0.5 to 1 cm.
4. The polishing carrier disk cleaning and storage device of claim 2, further comprising a drive assembly, wherein the cleaning brush is coupled to the drive assembly, and wherein the drive assembly is configured to rotate and move the cleaning brush.
5. A polishing carrier disk cleaning and storage device according to claim 1, further comprising a cleaning head disposed in the housing, the cleaning head being disposed in correspondence with the support structure, the cleaning head being adapted to spray a cleaning liquid to clean the polishing carrier disk fixed to the support structure.
6. A polishing carrier disc cleaning and storing apparatus according to claim 5, wherein an overflow trough is further provided in the housing, the housing between the overflow trough and the bottom of the housing is a sealed structure, and the cleaning head is further configured to continuously inject a cleaning liquid into the housing while the polishing carrier disc is being stored.
7. The polishing platen wash storage device of claim 5, wherein the cleaning jets are affixed to the top and bottom of the housing, respectively.
8. The polishing carrier disk cleaning and storing device according to any one of claims 5 to 7, further comprising a rotatable turntable disposed in the housing, wherein the cleaning nozzle is fixed to the turntable so as to rotate with the turntable by being driven by the turntable.
9. The polishing carrier disk cleaning and storing apparatus of claim 1, further comprising a rotatable turntable disposed within the housing, wherein the support structure includes a plurality of hooks, the hooks being fixed to the turntable for rotation therewith under the drive of the turntable.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120402414.2U CN214817691U (en) | 2021-02-23 | 2021-02-23 | Polishing carrier disc cleaning and storing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120402414.2U CN214817691U (en) | 2021-02-23 | 2021-02-23 | Polishing carrier disc cleaning and storing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214817691U true CN214817691U (en) | 2021-11-23 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120402414.2U Active CN214817691U (en) | 2021-02-23 | 2021-02-23 | Polishing carrier disc cleaning and storing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214817691U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114274041A (en) * | 2021-12-24 | 2022-04-05 | 西安奕斯伟材料科技有限公司 | Double-side polishing apparatus and double-side polishing method |
-
2021
- 2021-02-23 CN CN202120402414.2U patent/CN214817691U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114274041A (en) * | 2021-12-24 | 2022-04-05 | 西安奕斯伟材料科技有限公司 | Double-side polishing apparatus and double-side polishing method |
| CN114274041B (en) * | 2021-12-24 | 2023-03-14 | 西安奕斯伟材料科技有限公司 | Double-side polishing apparatus and double-side polishing method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20220701 Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Patentee after: Xi'an yisiwei Material Technology Co.,Ltd. Patentee after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: Room 1323, block a, city gate, No.1 Jinye Road, high tech Zone, Xi'an, Shaanxi 710065 Patentee before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Patentee before: Xi'an yisiwei Material Technology Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Patentee after: Xi'an Yisiwei Material Technology Co.,Ltd. Patentee after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Patentee before: Xi'an yisiwei Material Technology Co.,Ltd. Patentee before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder |