CN214771298U - Working platform device for polishing and dust removing equipment - Google Patents

Abstract

The utility model discloses a work platform device for dust collecting equipment polishes, dust collecting equipment polishes includes dust extraction and water circle device, the work platform device connect in dust extraction, the work platform device includes water tank set spare and workstation subassembly. The workbench component is used for placing polishing workpieces, the workbench component is provided with chip guide holes communicated with the water tank component, and the chip guide holes are distributed at intervals along the extending direction of the workbench component. The water tank assembly is used for precipitating and filtering the chips conveyed by the workbench assembly and the water circulating device, and the filtered liquid circulates along the water circulating device. The working platform device can be directly used as a basic platform for bearing a workpiece machining platform and is provided with a water tank assembly, and the space utilization rate is improved. Operating personnel can directly sweep the piece into the water tank subassembly along leading the bits hole to deposit and concentrate the clearance after separating, improve the convenience of workstation subassembly clearance.

Description

Working platform device for polishing and dust removing equipment

Technical Field

The utility model belongs to the technical field of the environmental protection equipment technique and specifically relates to a work platform device for polishing dust collecting equipment is related to.

Background

In the process of processing metal products, a polishing procedure is needed, in particular to metal products such as castings, welding parts and the like. The grinding device removes rusty spots, burrs, sharp edges and other bad structures of the metal product so that the metal product meets the requirements of the next procedure. Metal product can produce the metal piece that splashes at the in-process of polishing, and this metal piece seriously influences workman's operational environment to, pile up behind the metal piece falls into work plane, easily produce the phenomenon of skidding among the object handling, influence production safety.

Current work platform and dust collecting equipment separation, both independent settings lead to operating personnel independently to clear up the peripheral piece of work platform after the process of polishing, and the clearance degree of difficulty is big and influence work platform's use, consequently needs to improve.

Disclosure of Invention

The utility model aims at providing a work platform device for dust collecting equipment polishes.

The utility model discloses the technical scheme who adopts: the utility model provides a work platform device for dust collecting equipment polishes, dust collecting equipment polishes includes dust extraction and water circle device, the work platform device connect in dust extraction, the work platform device includes that water tank set spare and lid are located the workstation subassembly of water tank set spare, the workstation subassembly is used for putting the work piece of polishing, the workstation subassembly set up with the bits hole of leading of water tank set spare intercommunication, lead the bits hole edge the extending direction interval distribution of workstation subassembly, the water tank set spare is used for deposiing and filtering the workstation subassembly reaches the piece that water circle device carried to liquid after will filtering is followed the water circle device circulates.

In one embodiment, the workbench assembly comprises a support plate and a reinforcing frame, the support plate is covered on the water tank assembly, the reinforcing frame is fixedly connected to the support plate, the chip guide holes penetrate through the support plate and are distributed at intervals along the support plate, and the reinforcing frame protrudes towards one side of the water tank assembly.

In one embodiment, the reinforcing frame is at least partially immersed in the solution in the tank assembly.

In one embodiment, the workbench assembly further comprises a chip guide plate obliquely and fixedly connected to the support plate, and the chip guide plate is located in the extending direction of the chip guide hole and extends towards the inside of the water tank assembly.

In one embodiment, the work platform assembly is rotatably connected to the water tank assembly, and the work platform device further comprises a power assisting assembly connected to the work platform assembly and the water tank assembly and away from an axis of rotation of the work platform assembly relative to the water tank assembly.

In one embodiment, the power assisting assembly comprises an elastic telescopic member, a first rotating member and a second rotating member, wherein the first rotating member and the second rotating member are respectively connected to two ends of the elastic telescopic member, the first rotating member is rotatably connected to the water tank assembly, and the second rotating member is rotatably connected to the workbench assembly.

In one embodiment, the water tank assembly comprises a tank body, partition plates and filter plates, wherein the partition plates and the filter plates are distributed on the tank body at intervals, the tank body is divided by the filter plates to form a filter tank and a sedimentation tank, the partition plates are located in the sedimentation tank, and the water circulation device is communicated with the filter tank.

In one embodiment, the filter plate comprises a plate body and a plurality of filter holes penetrating through the plate body, and the filter holes are communicated with the filter tank and the sedimentation tank.

In one embodiment, the water tank assembly further comprises a filter frame and a filter element mounted on the filter frame, the filter frame separates the filter tank into a primary filter tank and a secondary filter tank, the sedimentation tank is communicated with the primary filter tank, and the water circulation device is communicated with the secondary filter tank.

In one embodiment, the work platform assembly further comprises a grinding platform removably mounted to the work platform assembly.

After the structure is adopted, compared with the prior art, the utility model the advantage that has is: the working platform device can be directly used as a basic platform for bearing a workpiece machining platform and is provided with a water tank assembly, and the space utilization rate is improved. Operating personnel can directly sweep the piece into the water tank subassembly along leading the bits hole to deposit and concentrate the clearance after separating, improve the convenience of workstation subassembly clearance.

Drawings

The invention will be further described with reference to the following figures and examples:

fig. 1 is the structural schematic diagram of the water circulation adsorption type polishing and dust removing device in the working state.

Fig. 2 is the structural schematic diagram of the working platform device in the water circulation adsorption type polishing and dust removing device of the utility model in the open state.

Fig. 3 is the structure schematic diagram of the main view of the reclaimed water circulating adsorption type polishing and dust removing device of the utility model.

Fig. 4 is the schematic view of the sectional structure of the water circulation adsorption type polishing and dust removing device of the present invention.

Fig. 5 is a schematic structural diagram of the working platform device of the present invention.

Fig. 6 is a schematic sectional structure diagram of the working platform device of the present invention.

Fig. 7 is a schematic structural diagram of the water circulation device of the present invention.

In the figure: a dust suction device 10; a frame 11; a flow guide surface 111; a top frame 112; a top cross-beam 1121; a control component 1122; an illumination assembly 1123; a long lamp panel 11231; a control panel 1124; an air guide passage 1125; an upright frame 113; a baffle 1131; a clevis bracket 1132; tool box 1133; a bottom frame 114; a water receiving tank 1141; a draft tube 1142; a negative pressure assembly 12; a work platform device 20; a water tank assembly 21; a tank body 211; a partition plate 212; a filter plate 213; filter holes 2131; a settling tank 214; a filtration tank 215; a filter frame 216; a waste switch 217; a table assembly 22; a support plate 221; a reinforcing frame 222; a scrap guide plate 223; chip guide holes 23; a boost assembly 24; a water circulation device 30; a water pump assembly 31; an inlet pipe 311; a water outlet pipe 312; a filter member 313; a water source 314; a valve body assembly 32; a multi-way valve body 321; a first joint component 322; a second joint assembly 323; a third joint assembly 324; a spray assembly 33; a shower pipe 331; the first control valve 332; the second control valve 333; a self-cleaning assembly 34; a drain pipe 341; a steering assembly 35.

Detailed Description

The following description is only a preferred embodiment of the present invention, and does not limit the scope of the present invention.

The embodiment, as shown in fig. 1-4, the utility model discloses a work platform device for dust collecting equipment polishes, this work platform device is applicable to the dust collecting equipment that polishes, and wherein, the dust collecting equipment that polishes is used for absorbing the metal chips that the metal product produced, and the building materials are polished the dust granule that produces etc.. This dust collecting equipment polishes still include dust extraction 10 and install in dust extraction 10's water circle device 30, work platform device 20 is used for putting and polishes platform class processing platform, and the metalwork of treating processing can directly be put on processing platform, and operating personnel can stand or sit on the chair of putting on work platform device 20 to carry out the operation of polishing of metalwork, improve the utilization ratio in place. The scraps generated by the metal product grinding can be absorbed by the dust suction device 10 or directly fall into the working platform device 20, so that the production environment is prevented from being influenced, and the working environment is good.

The work platform assembly 20 is configured in two parts, wherein the water tank assembly 21 is configured to receive the liquid mixed with metal debris and oil dirt flowing into the work platform assembly 20 along the guiding surface 111, to settle and filter the debris conveyed by the work platform assembly 22 and the water circulation device 30, and to circulate the filtered liquid along the water circulation device 30. The liquid mixed with the metal debris flows into the water tank assembly 21, so that the metal debris is precipitated in the water tank assembly 21, solid-liquid separation is formed, and the utilization rate of water resources is improved. Wherein, the workstation subassembly 22 sets up the chip guide hole 23 that communicates with the water tank subassembly 21, chip guide hole 23 distributes along the extending direction interval of workstation subassembly 22. An operator can directly sweep the chips into the water tank assembly 21 along the chip guide holes 23, so that the chips are settled and separated and then are cleaned in a centralized manner, and the convenience of cleaning the workbench assembly 22 is improved.

Water tank set spare 21 is located to workstation subassembly 22 lid to make water tank set spare 21's top can put the processing platform and supply operating personnel to walk about and stack work piece etc, the part piece that the back formed of polishing can directly or indirectly fall into water tank set spare 21, thereby avoids the ground around the processing platform to pile up metal piece etc. in a large number, improves operational environment's travelling comfort. The metal chips falling on the surface of the worktable assembly 22 can directly enter the water tank assembly 21 along the chip guide hole 23 during the cleaning process, and the operation is convenient. The working platform device 20 can be directly used as a basic platform for bearing a workpiece processing platform, and is provided with the water tank assembly 21, so that the space utilization rate is improved. Optionally, the work platform assembly further comprises a grinding platform removably mounted to the table assembly 22. The working table assembly 22 is configured on a structural member connected with the polishing platform, so that the assembly convenience and stability of the polishing platform are improved, and the use convenience is improved.

The dust collector 10 includes a frame 11 and a negative pressure component 12 mounted on the frame 11, the frame 11 is provided with a flow guide surface 111, the negative pressure component 12 guides air flowing in a region corresponding to the flow guide surface 111, and liquid output by the water circulation device 30 flows into the working platform device 20 along the flow guide surface 111. The negative pressure assembly 12 is mounted to the frame 11 to accelerate the flow of gas near the flow guide surface 111. Alternatively, the negative pressure assembly 12 is configured as an air extractor assembly that extracts the flow guide surface 111 and the surrounding exhaust air, thereby flowing air into the air extractor assembly. Optionally, the negative pressure assembly 12 is located above the frame 11 to draw the air flow from bottom to top and the liquid flow from top to bottom along the flow guide surface 111 to increase the probability of air contact with the flow guide surface 111.

The area corresponding to the guiding surface 111 is the air flow in front of the guiding surface 111 and towards one side of the working platform device 20, and the flowing area is close to the guiding surface 111, so that the air between the working platform device 20 and the guiding surface 111 is absorbed to move towards the guiding surface 111, and dust and particles contained in the air are adsorbed by the liquid flowing along the guiding surface 111 and then flow along with the liquid. Further, the flow guide surface 111 is curved, so that the contact probability between the gas and the flow guide surface 111 is further improved, and particles in the air are prevented from being pumped away by the air pump. For example, the guiding surface 111 is a convex curved surface, and the protruding direction of the guiding surface faces the working platform device 20. Alternatively, the guiding surface 111 is a concave surface, and the concave direction thereof is away from the working platform device 20. The water circulation device 30 outputs liquid to the guiding surface 111 of the dust suction device 10, so that a flowing water curtain is formed at the guiding surface 111, and the water curtain receives and mixes the metal debris output by the working platform device 20.

Work platform device 20 certainly frame 11 is to keeping away from the 111 directions of water conservancy diversion face extend, work platform device 20 includes water tank set spare 21 and lid and locates water tank set spare 21's workstation subassembly 22, water circle device 30 with water tank set spare 21 intercommunication. The working platform device 20 is connected with the frame 11, and the working platform device and the frame are assembled in a combined mode, so that debugging and transportation are facilitated.

The frame 11 is a vertical frame structure, and the vertical direction of the frame 11 intersects with the extending direction of the working platform device 20. Wherein the frame 11 comprises a bottom frame 114, a top frame 112, and an upright frame 113 connecting the top frame 112 and the bottom frame 114, and the flow guide surface 111 extends from the top frame 112 to intersect with the bottom frame 114 and protrudes toward the work platform device 20. The negative pressure assembly 12 is mounted on the top frame 112 and communicates with the space of the baffle surface 111 extending into the bottom frame 114, and the bottom frame 114 is connected to the work platform device 20 and communicates with the water tank assembly 21.

The bottom frame 114, the upright frame 113 and the top frame 112 form a frame structure similar to a "U" shape, wherein the bottom frame 114 is located on a base plane such as the ground and is connected to the work platform device 20 so that the liquid can flow into and be accumulated in the water tank assembly 21. The bottom frame 114 is provided with a water receiving tank 1141 and a flow guide pipe 1142 communicated with the water receiving tank 1141, the flow guide pipe 1142 is located at the bottom of the water receiving tank 1141 and communicated with the water tank assembly 21, the negative pressure assembly 12 is communicated with the water receiving tank 1141, and the flow guide surface 111 extends to the water receiving tank 1141. The water receiving tank 1141 is a long trough structure and is used for collecting the liquid guided by the flow guide surface 111. Optionally, the bottom of the water receiving tank 1141 is an inclined plane structure, so that the solution in the water receiving tank 1141 is gathered towards the lowest position. The flow guide tube 1142 is a tubular structure for guiding the flow of liquid. Wherein, the entrance of the draft tube 1142 is located at the lowest position of the water receiving tank 1141, and the exit of the draft tube 1142 is located in the water tank assembly 21. The flow guide surface 111 extends into the groove space of the water receiving tank 1141 and is distributed at intervals with the wall of the water receiving tank 1141. The negative pressure assembly 12 is connected to the space of the water receiving tank 1141, so as to form a negative pressure space in the water receiving tank 1141, wherein the negative pressure space extends along the diversion surface 111 to guide the airflow around the diversion surface 111 to flow.

The upright frame 113 is vertical or slightly inclined with respect to the ground or the like to support and adjust the height and range of the water curtain formed by the deflector surface 111. The upright frame 113 includes a thin-walled baffle 1131, and the baffle surface 111 is located on the surface of the baffle 1131. Optionally, the baffles 1131 are made of stainless steel material. Optionally, a wind guide channel 1125 is formed between the wind guide plate 1131 and the upright frame 113, that is, the wind guide surface 111 and the wind guide channel 1125 are oppositely disposed on the wind guide plate 1131.

As shown in fig. 2 and 3, the upright frame 113 includes a first side wall, a second side wall, a tool box 1133 connecting the first side wall and the second side wall, and a hanger 1132, the tool box 1133 is provided with at least one receiving space for receiving parts, and the scraper holder is provided with at least one hook portion for hanging a grinding tool such as a grinder. Optionally, the hanging part is configured as a groove or a protruding hook.

As shown in fig. 3 and 4, the top frame 112 is positioned on top of the upright frame 113 and protrudes toward the side of the work platform apparatus 20. The top frame 112 includes a top beam 1121, a lighting assembly 1123 mounted on the top beam 1121, and a control assembly 1122. The top beam 1121 has a channel-shaped wind guide channel 1125, the wind guide channel 1125 extends from the top beam 1121 to the bottom frame 114, the negative pressure component 12 is communicated with the wind guide channel 1125, and the lighting component 1123, the negative pressure component 12 and the water circulation device 30 are all electrically connected to the control component 1122.

The wind guide channel 1125 is a tubular channel extending from the top beam 1121 to the water receiving slot 1141 of the bottom frame 114. One end of the flow guide surface 111 is located in the water receiving tank 1141, so that the negative pressure formed in the air guide channel 1125 and the water receiving tank 1141 is transmitted along the flow guide surface 111. The top beam 1121 includes a control panel 1124 disposed at an angle, wherein the lighting assembly 1123 and the control assembly 1122 are mounted on the control panel 1124. The control panel 1124 is inclined toward the diversion surface 111 and is located on the downward side of the top beam 1121 to prevent dust from being adsorbed. An illumination assembly 1123 is mounted on control panel 1124 and illuminates toward work platform assembly 20 to facilitate the illumination of the metal work by the operator. Optionally, the lighting assemblies 1123 include at least one strip lamp panel 11231, and the lighting assemblies 1123 are distributed along the extending direction of the top beam 1121. The illumination scope of rectangular lamp plate 11231 is big to, the light of rectangular lamp plate 11231 output is soft, improves the travelling comfort that the operation workman used. Further, the illumination intensity of the illumination assembly 1123 is adjustable, and the control assembly 1122 includes an illumination switch for adjusting the illumination intensity and turning on/off the illumination assembly 1123.

As shown in fig. 4, 5 and 6, the work platform assembly is connected to the bottom frame 114 to form a base platform structure for supporting the operator and the processing platform. Optionally, the worktable assembly 22 includes a supporting plate 221 covering the water tank assembly 21 and a reinforcing frame 222 fixedly connected to the supporting plate 221, the chip guiding holes 23 penetrate through the supporting plate 221 and are distributed at intervals along the supporting plate 221, and the reinforcing frame 222 protrudes toward one side of the water tank assembly 21. The support plate 221 is a plate-shaped structural member, and optionally, the support plate 221 is configured as a metal plate, such as a stainless steel plate, an aluminum plate, or the like. The chip guide holes 23 extend through the support plate 221 so that chips on the surface of the support plate 221 can pass through the support plate 221 and enter the water tank assembly 21.

The reinforcing frame 222 is fixedly connected to the supporting plate 221 so as to enhance the bending strength of the supporting plate 221. Optionally, the reinforcing cage 222 is configured as a bent sheet or tube structure. Optionally, the reinforcing frame 222 is at least partially immersed in the solution in the tank assembly 21 to partition the tank assembly 21, thereby improving the settling effect of the tank assembly 21 and also increasing the strength of the reinforcing frame 222.

As shown in fig. 1 and 2, the table assembly 22 is covered on the water tank assembly 21, wherein the two can be separated relatively to perform the dredging function of the water tank assembly 21. Optionally, the table assembly 22 is pivotally connected to the tank assembly 21 to facilitate lifting or folding of the table assembly 22. Wherein the work platform assembly 20 further comprises a booster assembly 24, the booster assembly 24 connecting the work platform assembly 22 and the water tank assembly 21 and being remote from an axis of rotation of the work platform assembly 22 relative to the water tank assembly 21.

The assisting assembly 24 provides support for the rotation of the workbench assembly 22, so that the workbench assembly 22 is prevented from being automatically folded to the water tank assembly 21 under the action of gravity when the workbench assembly 22 is opened, and the use convenience and safety are improved. Optionally, the booster assembly 24 is a rigid rod-like strut carrier that rigidly supports the table assembly 22. Optionally, the boosting assembly 24 includes an elastic expansion member, a first rotating member and a second rotating member respectively connected to two ends of the elastic expansion member, the first rotating member is rotatably connected to the water tank assembly 21, and the second rotating member is rotatably connected to the worktable assembly 22. The elastic expansion piece can output elastic supporting force, so that the workbench assembly 22 keeps an unfolding posture under the action of the elastic force of the elastic expansion piece, assistance is provided in the opening process of the workbench assembly 22, and the opening difficulty is reduced. Optionally, the resilient bellows is configured as a gas spring.

As shown in fig. 4, 5 and 6, the water tank assembly 21 includes a tank body 211, a partition plate 212 and a filter plate 213, the partition plate 212 is spaced from the tank body 211, the filter plate 213 partitions the tank body 211 into a filter tank 215 and a sedimentation tank 214, the partition plate 212 is located in the sedimentation tank 214, and the water circulation device 30 is communicated with the filter tank 215. The tank body 211 is a container structure formed of a thin-walled structural member, and a storage space for storing the liquid mixed with the metal chips is formed inside the tank body. The filter plates 213 and the partition plates 212 partition the receiving space to form different settling zones. Optionally, the flow conduit 1142 is located in the middle region of the sedimentation tank 214 near the vacuum cleaner 10 to allow liquid to enter the middle region of the sedimentation tank 214 and extend the sedimentation path and sedimentation range.

The filtering tank 215 is located at one side of the settling tank 214 to filter the settled solution, thereby improving the cleanliness of the liquid at one side of the filtering tank 215. The water circulation device 30 is communicated with the filtering tank 215 to draw out the liquid in the filtering tank 215 and flow along the diversion surface 111, and the circulation is repeated in sequence. To avoid debris on the support plate 221 from falling directly into the filter tank 215. Optionally, the worktable assembly 22 further comprises a chip guide plate 223 obliquely and fixedly connected to the supporting plate 221, and the chip guide plate 223 is located in the extending direction of the chip guide hole 23 and extends towards the inside of the water tank assembly 21. The dust guide plate 223 is positioned above the filtering tank 215 and guides the dust falling on the supporting plate 221 into the settling tank 214 to improve the tidiness of the filtering tank 215.

The filtering plate 213 separates the filtering tank 215 from the settling tank 214, wherein the filtering plate 213 comprises a plate body and a plurality of filtering holes 2131 penetrating through the plate body, the filtering holes 2131 communicate with the filtering tank 215 and the settling tank 214, and the filtering holes 2131 are distributed on the plate body at intervals. Optionally, the filter holes 2131 are arranged in an array on the plate body. If the filtering holes 2131 are arranged in three rows, each row is provided with a plurality of filtering holes 2131. Optionally, filter holes 2131 are near the top of the plate to reduce the ingress of precipitated metal debris through filter holes 2131 into filter tank 215.

Further, the water tank assembly 21 further comprises a filter frame 216 and a filter element 313 installed on the filter frame 216, the filter frame 216 separates the filter tank 215 into a primary filter tank and a secondary filter tank, the sedimentation tank 214 is communicated with the primary filter tank, and the water circulation device 30 is communicated with the secondary filter tank. The filtering tank 215 is a strip-shaped groove structure, wherein the filtering rack 216 divides the filtering tank 215 into different areas to form multiple filtering effects. The filter member 313 is configured as a filter structure such as a filter net to further enhance the filtering effect.

The water circulation device 30 is used to transport the liquid to the guide surface 111 and to circulate the liquid. The water circulation device 30 comprises a water pump assembly 31, a valve body assembly 32 connected to the water pump assembly 31, a spray assembly 33 and a self-cleaning assembly 34 connected to the valve body assembly 32, and a control assembly 35 electrically connected to the water pump assembly 31, the valve body assembly 32 and the spray assembly 33 respectively, wherein the water pump assembly 31 is connected to the water tank assembly 21. The control assembly 35 controls the operation of one of the spray assembly 33 and the self-cleaning assembly 34, and the spray assembly 33 is mounted on the frame 11 and outputs liquid toward the diversion surface 111.

As shown in fig. 4 and 7, the water pump assembly 31 is connected to the filtering tank 215 of the water tank assembly 21 to recycle the liquid filtered by the water tank assembly 21, thereby improving the resource utilization rate. The spray assembly 33 is mounted to the top beam 1121 to circulate the output liquid along the flow guide surface 111 to form a water curtain, and accordingly, the spray assembly 33 extends along the top beam 1121. The valve body assembly 32 controls the output pressure, the output flow rate and the like of the spraying assembly 33 through the control assembly 35 so as to adjust the spraying effect. Further, the manipulating component 35 controls the switching self-cleaning component 34 to clean the spray component 33 so as to keep the liquid output from the spray component 33 stable. Specifically, the liquid that water pump assembly 31 exported to spray assembly 33 includes a small amount of piece, and spray assembly 33's spraying hole is easily blockked up to this piece, and self-cleaning subassembly 34 directly washes spray assembly 33's pipeline to avoid the piece to block up spraying hole, improve the stability of water circle device 30 operation. Optionally, the operating assembly 35 includes a reversing button mounted to the frame 11 for controlling the valve body assembly 32 to operate to switch the output path, thereby operating one of the shower assembly 33 or the self-cleaning assembly 34. Wherein the valve body assembly 32 is a multi-output reversing valve. Optionally, the water tank assembly 21 is further provided with a drain switch 217 for directly draining the sewage in the sedimentation tank 214.

The spray assembly 33 comprises a spray pipe 331, and a first control valve 332 and a second control valve 333 which are respectively installed at two ends of the spray pipe 331, the valve body assembly 32 is connected to the spray pipe 331, the self-cleaning assembly 34 is connected to the first control valve 332, the second control valve 333 is communicated with the water tank assembly 21, and the first control valve 332 and the second control valve 333 are in a closed state when the spray pipe 331 outputs liquid.

The first control valve 332 and the second control valve 333 respectively control the on-off of two ends of the shower pipe 331, wherein when the first control valve 332 and the second control valve 333 are closed, the water pump assembly 31 delivers liquid into the shower pipe 331 through the valve body assembly 32, so that the liquid is output towards the direction of the flow guide surface 111. Optionally, the spraying pipe 331 is provided with a plurality of spraying holes distributed at intervals, and the water pump assembly 31 is connected to the middle of the spraying pipe 331. The shower holes are directly formed in the shower pipe 331 to reduce the installation space required for the shower assembly 33, reduce the total size of the top beam 1121, and reduce the cost. The spray holes extend along the length direction of the spray pipe 331, and the water pump assembly 31 is connected to the middle of the spray pipe 331 through the valve body assembly 32, so that the liquid output by the spray pipe 331 is balanced, and the balance of the water curtain is improved. Optionally, the spraying assembly 33 further includes a nozzle detachably mounted on the spraying pipe 331, the nozzle conveys liquid to the direction of the flow guide surface 111, the conveying direction is controllable, the pressure is controllable, and the operation is convenient.

When the first control valve 332 and the second control valve 333 are opened, the valve body assembly 32 is switched to be connected to the self-cleaning assembly 34, the water pump assembly 31 conveys liquid into the self-cleaning assembly 34 through the valve body assembly 32, and then the self-cleaning assembly 34 enters and washes the shower pipe 331 through the opened first control valve 332, so that the debris adsorbed by the shower pipe 331 is output along the path opened from the second control valve 333. Optionally, the self-cleaning assembly 34 includes a tubular guide tube connected to the first control valve 332. Optionally, the self-cleaning assembly 34 includes a tubular drain 341, the drain 341 being connected to the second control valve 333 and communicating with the tank assembly 21. The drain pipe 341 drains the flushed liquid into the water tank assembly 21 for further recycling, thereby improving the utilization rate of the liquid.

The water pump assembly 31 is used for providing driving force for the water circulation device 30, wherein the water pump assembly 31 comprises a pump body, a water outlet pipe 312 connected to the pump body, and a water inlet pipe 311, the water outlet pipe 312 is connected to the valve body assembly 32, and the water inlet pipe 311 is connected to the water source 314 and the water tank assembly 21.

The water source 314 and the water tank assembly 21 are connected to the water inlet pipe 311, wherein a switch is disposed between the water source 314 and the water inlet pipe 311, so that the water source 314 is disconnected from the water pump assembly 31 when the water circulation device 30 does not need to replenish water, and the water tank assembly 21 provides liquid for dust removal. Further, the water pump assembly 31 further includes a filter 313 detachably mounted on the water inlet pipe 311, and the filter 313 is located in the water tank assembly 21. The filter 313 is connected to the water inlet pipe 311 to further reduce the debris content of the liquid in the water circulation device 30 and improve the stability of use.

The valve body assembly 32 comprises a multi-way valve body 321, a first connector assembly 322 connected to the multi-way valve body 321, a second connector assembly 323 and a third connector assembly 324, wherein the first connector assembly 322 is connected with the water outlet pipe 312 and the multi-way valve body 321. The second connector assembly 323 is connected with the multi-way valve body 321 and the spray pipe 331, and the third connector assembly 324 is connected with the multi-way valve body 321 and the self-cleaning assembly 34. The multi-channel valve body 321 switches the channel according to the control of the control assembly 35, so that the liquid is delivered to the spray pipe 331 or the self-cleaning assembly 34, and the control is convenient.

It is worth mentioning that water circulation adsorption type dust collecting equipment of polishing can set up side by side, and two adjacent water circulation adsorption type dust collecting equipment of polishing can realize fast assembly through the quick-operation joint connection to can avoid every equipment to insert pipeline such as water, electricity gas alone, improve the convenience and the rationality of overall arrangement.

The present application is intended to cover any variations, uses, or adaptations of the invention using its general principles and with the scope of the claims that follow. Other structures and principles are the same as those of the prior art, and are not described in detail herein.

Claims (10)

1. The utility model provides a work platform device for dust collecting equipment polishes, the dust collecting equipment that polishes includes dust extraction and water circle device, the work platform device connect in dust extraction, a serial communication port, the work platform device includes that water tank set spare and lid are located the workstation subassembly of water tank set spare, the workstation subassembly is used for putting the work piece of polishing, the workstation subassembly set up with the chip guide hole of water tank set spare intercommunication, lead the chip hole edge the extending direction interval distribution of workstation subassembly, the water tank set spare is used for deposiing and filtering the workstation subassembly reaches the piece that water circle device carried to follow the liquid after filtering the water circle device circulation.

2. The work platform device according to claim 1, wherein the work platform assembly comprises a support plate covering the water tank assembly and a reinforcing frame fixedly connected to the support plate, the chip guide holes penetrate through the support plate and are distributed at intervals along the support plate, and the reinforcing frame protrudes towards one side of the water tank assembly.

3. The work platform device of claim 2, wherein the reinforcing frame is at least partially immersed in the solution in the tank assembly.

4. The work platform assembly of claim 2, wherein the work table assembly further comprises a chip guide plate attached to the support plate at an angle, the chip guide plate being located in the direction of extension of the chip guide hole and extending toward the inside of the water tank assembly.

5. The work platform apparatus of claim 1, wherein the table assembly is rotatably coupled to the tank assembly, the work platform apparatus further comprising a booster assembly coupled to the table assembly and the tank assembly and remote from an axis of rotation of the table assembly relative to the tank assembly.

6. A work platform arrangement according to claim 5, wherein the booster assembly comprises a resilient telescopic member, a first rotatable member and a second rotatable member connected to respective ends of the resilient telescopic member, the first rotatable member being rotatably connected to the tank assembly and the second rotatable member being rotatably connected to the table assembly.

7. The work platform device of claim 1, wherein the water tank assembly comprises a tank body, partition plates and filter plates, the partition plates and the filter plates are distributed in the tank body at intervals, the tank body is divided by the filter plates to form a filter tank and a sedimentation tank, the partition plates are located in the sedimentation tank, and the water circulation device is communicated with the filter tank.

8. The work platform device according to claim 7, wherein said filter plate comprises a plate body and a plurality of filter holes extending through said plate body, said filter holes communicating said filter basin and settling basin.

9. The work platform apparatus according to claim 7, wherein the water tank assembly further comprises a filter frame and a filter member mounted to the filter frame, the filter frame dividing the filter tank into a primary filter tank and a secondary filter tank, the sedimentation tank communicating with the primary filter tank, and the water circulation device communicating with the secondary filter tank.

10. The work platform device of claim 1, further comprising a grinding platform removably mounted to the work platform assembly.

Images