CN214751321U

CN214751321U - Back alignment device

Info

Publication number: CN214751321U
Application number: CN202120508808.6U
Authority: CN
Inventors: 刘栋; 李伟成; 张雷
Original assignee: Yuanneng Zhichuang Jiangsu Semiconductor Co ltd
Current assignee: Yuanneng Zhichuang Jiangsu Semiconductor Co ltd
Priority date: 2021-03-10
Filing date: 2021-03-10
Publication date: 2021-11-16
Anticipated expiration: 2031-03-10

Abstract

A back alignment device for determining the accurate position of a substrate by a direct-writing photoetching device comprises a loading part and a multi-axis motion table arranged below the loading part, wherein a gap is reserved between the loading part and the multi-axis motion table; the substrate is placed on the loading part, the back side of the substrate is provided with a back side alignment mark, and the loading part is provided with a light hole corresponding to the back side alignment mark of the substrate; the back alignment device specifically comprises an imaging part, an illuminating part, a light path turning part and a lens barrel, wherein the imaging part, the illuminating part and the light path turning part are connected through the lens barrel; the light path turning part is positioned below the light hole, and the lens cone part is positioned in the gap. The back surface aligning device part is arranged in the gap between the loading part and the multi-axis motion platform by using the lens barrel, so that the installation and the disassembly are convenient.

Description

Back alignment device

Technical Field

The utility model relates to a direct-write lithography technology field specifically is a back aligning device.

Background

With the rapid development of electronic information technology, the use of digital products such as mobile phones, tablets, computers, televisions, etc. is everywhere visible, and important components of these digital products may include integrated chips, circuit boards, display panels, semiconductor devices, etc. The increasing demand for these components has increased, making shorter and shorter processing cycles required. Photolithography processing is used to print a pattern having features on the surface of the various substrates described above and is an important part of the processing cycle. The photoetching processing is divided into mask photoetching and direct writing photoetching, and although the mask photoetching has high precision, the mask plate has high manufacturing requirement and long period, and the requirement of large batch is difficult to meet. The direct-write lithography based on the digital micromirror device can flexibly realize the transfer printing of different patterns, has relatively simple process and lower cost, and is widely applied to the pattern manufacture of circuit boards, semiconductor devices and displays.

In direct-write lithographic processing, the precise location of the substrate is usually confirmed by alignment marks on the substrate in order to achieve precise positioning of the pattern on the substrate. In general, when a surface to be processed of a substrate is subjected to direct-write optical writing, an alignment mark is formed on the surface to be processed for confirmation of position. However, in some special application scenarios, it is not desirable to have any other feature on the surface to be processed of the substrate, that is, the surface to be processed cannot be provided with the alignment mark for positioning the substrate, so that the alignment mark can only be provided on the back surface opposite to the surface to be processed, and therefore, the precise positioning of the substrate needs to be realized through the back alignment mark.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a back aligning device is in order to solve the problem among the above-mentioned prior art.

In order to achieve the above object, the utility model adopts the following technical scheme:

a back alignment device is used for a direct-write type photoetching device to determine the accurate position of a substrate placed on a loading part, a back alignment mark is arranged on the back of the substrate, a multi-axis motion table is arranged below the loading part, and a gap is reserved between the loading part and the multi-axis motion table; the loading part is provided with a light hole corresponding to the back alignment mark of the substrate; the backside alignment device includes: the imaging part, the illuminating part and the light path turning part are connected through the lens barrel; the light path turning part is positioned below the light hole, and the lens cone part is positioned in the gap.

In one embodiment, the lens barrel is removably attached to the multi-axis motion stage.

In one embodiment, a lens group for shaping and transmitting the illumination light beam generated by the illumination portion is provided in the lens barrel.

In one embodiment, the lens barrel is in a short "T" shape, the imaging part and the optical path turning part are connected to both horizontal ends of the lens barrel, the illumination part is disposed inside a vertical end of the lens barrel, and the vertical end of the lens barrel is connected to the multi-axis motion stage.

In one embodiment, the imaging section is located at a side of the loading section.

In one embodiment, the loading portion is provided with a single accommodating groove for accommodating a single piece of the substrate, and the single accommodating groove is provided with a plurality of the light holes.

In one embodiment, the loading portion is provided with a plurality of accommodating grooves for accommodating a plurality of substrates, and each accommodating groove is provided with a plurality of light holes.

In one embodiment, the loading portion is detachably attached to the multi-axis motion stage.

Compared with the prior art, the utility model discloses following technological effect has: the imaging part, the lighting part and the light path turning part are connected through the short T-shaped lens cone, so that the light path turning part with smaller size is arranged below the back alignment mark, and the imaging part is arranged on the side edge of the loading part, thereby facilitating the assembly, disassembly and replacement of all parts. Correspondingly, the light holes corresponding to the back alignment marks on the substrate are formed in the loading part, so that the back alignment marks can be captured by the back alignment marks to determine the position of the substrate, and meanwhile, the loading part can be detachably replaced into a single-chip form or a multi-chip form, and the requirements of different sizes and different production capacities can be met.

Drawings

FIG. 1 is a schematic diagram of an exemplary prior art direct write lithographic apparatus.

FIG. 2 is a schematic diagram of an exemplary backside alignment device.

Fig. 3 is a schematic configuration diagram of the loading section and the back surface alignment device of the first example.

Fig. 4 is a schematic configuration diagram of a loading section and a back surface alignment device of a second example.

Detailed Description

In order to make the technical solution of the present invention more clear, the following describes an embodiment of the present invention with reference to the accompanying drawings. It should be understood that the detailed description of the embodiments is intended only to teach one skilled in the art how to practice the invention, and is not intended to be exhaustive of all possible aspects of the invention, nor is it intended to limit the scope of the invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts shall fall within the protection scope of the present invention.

It should be noted that the terms "center," "above," "below," "top," "bottom," "front," "back," "left," "right," "horizontal," "inner," "outer," "vertical," "horizontal," and the like are used in the orientation or positional relationship indicated in the drawings for the purpose of convenience or simplicity of description, but do not indicate or imply that the referenced device or element must have a particular orientation, be constructed in a particular orientation, be installed and operated, and therefore should not be construed as limiting the present invention. In the description of the present invention, "a plurality" means two or more unless specifically limited otherwise.

Fig. 1 shows a simplified diagram of a direct-write lithographic apparatus of a type commonly used in the art, comprising at least an exposure device 1, a motion stage device 2, and a control device (not shown in the figure). The exposure device 1 at least comprises a plurality of groups of laser light sources (not shown in the figure) and a plurality of exposure lenses, the motion stage device 2 at least comprises a loading part 21 and a multi-axis motion table 22, the multi-axis motion table 22 is arranged below the loading part 21, the loading part 21 is used for bearing a substrate 3 to be processed, the multi-axis motion table 22 can drive the loading part 21 to realize motion with at least three degrees of freedom, the control device can control the multi-axis motion table 22 to independently and/or simultaneously realize the movement in at least one direction and obtain the real-time position of the loading part 21, and can also perform graphic data processing, control the opening and closing of the laser light sources and adjust graphic beams projected to the plurality of exposure lenses. The above-described configuration of the lithographic apparatus is merely exemplary and is not intended to limit the specific form of the lithographic apparatus. For the back alignment that realizes the basement, the utility model provides a set up back aligning device on lithography apparatus, controlling means can confirm the accurate position of basement according to back aligning device to with the accurate projection of figure light beam the treating machined surface of basement.

The back alignment device of the present invention is shown in fig. 2. The back alignment device at least comprises an imaging part 41, an illuminating part 42 and a lens barrel 43, wherein the imaging part 41 is connected with the lens barrel 43, and the illuminating part 42 is arranged inside the lens barrel 43. Further, the illuminating section 42 is configured to generate an illuminating beam for illuminating the back alignment mark of the substrate, and the illuminating beam is irradiated to the back alignment mark to generate a reflected beam to the imaging section 41, so that the back alignment mark is captured by the imaging section 41, and the control device calculates the precise position of the back alignment mark. Specifically, the imaging section 41 may be a CCD (Charge Coupled Device) camera, and the illuminating section 42 may be a coaxial light source. In practical application, the narrow space between the top of the loading part and the top of the multi-axis motion platform or even the close contact between the top of the loading part and the top of the multi-axis motion platform is found, the lens barrel, the imaging part and the illumination part cannot be directly and integrally installed below the loading part, the installation groove needs to be formed in the top of the multi-axis motion platform frequently, and the installation, the disassembly and the replacement of parts are inconvenient due to the design. Therefore, the utility model discloses with loading portion design for detachable installs on the multiaxis motion platform to leave certain clearance between the two, can hold partial or whole back aligning device. Further, the alignment device is further designed to include a light path turning part 44, and the light path turning part 44 is located below the alignment mark. Correspondingly, the lens barrel 43 is designed to be short "T" shaped, the horizontal ends of the lens barrel 43 are respectively connected with the imaging part 41 and the optical path turning part 44, and the illumination part 42 is arranged inside the vertical end of the lens barrel. The optical path turning part 44 is small in size and can be placed below the loading part, and the imaging part 41 extends to the side of the loading part through the horizontal end of the lens barrel 43, i.e. the lens barrel is partially located between the gaps. Preferably, a lens assembly (not shown) is disposed in the lens barrel 43 for shaping and transmitting the illumination beam, when the illumination portion is turned on, the illumination beam reaches the optical path turning portion 44 through the lens assembly, and then is deflected to irradiate the alignment mark, the reflected beam generated by the alignment mark is incident to the imaging portion 41 through the optical path turning portion and the lens assembly, and the imaging portion 41 captures the alignment mark to determine the position thereof, i.e., the precise position of the substrate. The optical path turning part 44 can be any optical prism capable of performing the beam path deflection, such as a prism whose optical deflection surface is arranged at 45 ° to the horizontal axis of the lens barrel.

In one embodiment, the simplified layout of the loading part and the back alignment device as shown in fig. 3, the loading part is provided with a single container 5 for holding a single large-sized substrate, the container is circular, the bottom of the container is provided with a plurality of light holes 51, the light holes 51 are arranged corresponding to the back alignment marks on the substrate, and the size of the light holes depends on the size of the field of view of the illumination part and the size of the movable range of the back alignment marks. The containing groove 5 is further provided with a plurality of adsorption holes (not shown in the figure), the adsorption holes can be connected to a vacuumizing device, when the substrate is placed in the containing groove, the vacuumizing device is started to pump away air near the adsorption holes, and negative pressure is formed on the surface of the containing groove, so that the substrate is firmly adsorbed. In this example, two alignment marks are present on the substrate, so that two light holes are provided on the receiving groove shown in the figure, and in practice, the arrangement of the light holes can be adjusted according to the positions and the number of the alignment marks on the substrate. Furthermore, each light hole is correspondingly provided with a set of back alignment device 4. The lens barrel 43 has one horizontal end below the loading portion and the other end extending to the side of the loading portion, so that the optical path turning portion 44 is below the light-transmitting hole 51, the imaging portion 41 is at the side of the loading portion, i.e. not between the loading portion and the multi-axis motion stage, and the vertical end of the lens barrel 43 is fixed to the top of the multi-axis motion stage, thereby fixing the whole back alignment device.

In a modified embodiment, fig. 4 shows another configuration of the loading portion and the back alignment device, in order to adapt to the photolithography process of substrates with different sizes, the loading portion may be replaced with a configuration in which a plurality of receiving grooves 5 for carrying a plurality of small-sized substrates are disposed, each receiving groove 5 is provided with a corresponding light-transmitting hole 51 according to a back alignment mark on the substrate, and the back alignment device 4 described above is disposed according to the light-transmitting holes disposed on the receiving grooves, so as to complete the position alignment of the plurality of substrates, fully utilize the photolithography equipment, and improve the photolithography process yield.

When the back alignment is carried out, the illuminating part generates an illuminating beam, the illuminating beam irradiates the back alignment mark through the light hole after passing through the light path turning part, a reflected beam of the back alignment mark is transmitted into the imaging part through the light path turning part, the imaging part captures the back alignment mark to generate an image, the control device carries out data analysis according to the image and determines the position coordinate of the back alignment mark, so that the position parameter of the substrate can be calculated, and then the control device adjusts the photoetching pattern based on the position of the substrate, so that the pattern beam is accurately projected to the surface to be processed of the substrate.

The utility model provides a back alignment device designs T shape lens cone cooperation light path turn portion can carry out the position of basement by the back alignment mark that imaging portion caught the basement and confirm to through the lens cone with imaging portion, illumination portion, light path turn portion connect as an organic wholely, make the less light path turn portion of size arrange the back in and aim at mark below, imaging portion is located the side of loading portion, the dismantlement of each part of being convenient for is changed.

Finally, it is to be noted that the above description is intended to be illustrative and not exhaustive, and that the present invention is not limited to the disclosed embodiments, and that various modifications and changes may be made by those skilled in the art without departing from the scope and spirit of the above examples, and such modifications and changes are to be considered as within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the claims.

Claims

1. A backside alignment device for a direct write lithographic apparatus for determining the exact position of a substrate placed on a load port, the backside of the substrate being provided with backside alignment marks,

a multi-axis motion table is arranged below the loading part, and a gap is reserved between the loading part and the multi-axis motion table;

the loading part is provided with a light hole corresponding to the back alignment mark of the substrate;

the backside alignment device includes: the imaging part, the illuminating part and the light path turning part are connected through the lens barrel;

the light path turning part is positioned below the light hole, and the lens cone part is positioned in the gap.

2. The backside alignment device of claim 1, wherein: the lens barrel is detachably connected to the multi-axis motion stage.

3. The backside alignment device of claim 1, wherein: and a lens group for shaping and transmitting the illumination light beams generated by the illumination part is arranged in the lens barrel.

4. The backside alignment device of claim 1, wherein: the lens cone is short in T shape, the imaging part and the light path turning part are connected to two horizontal ends of the lens cone, the lighting part is arranged in the vertical end of the lens cone, and the vertical end of the lens cone is connected to the multi-axis motion table.

5. The backside alignment device of claim 1, wherein: the imaging portion is located at a side of the loading portion.

6. The backside alignment device of claim 1, wherein: the loading part is provided with a single containing groove for bearing the single sheet of the substrate, and the single containing groove is provided with a plurality of light holes.

7. The backside alignment device of claim 1, wherein: the loading part is provided with a plurality of accommodating grooves for bearing a plurality of substrates, and each accommodating groove is provided with a plurality of light holes.

8. The backside alignment device of claim 1, wherein: the loading part is detachably mounted on the multi-axis motion table.