CN214704307U

CN214704307U - Novel nanoimprint lithography machine

Info

Publication number: CN214704307U
Application number: CN202120900674.2U
Authority: CN
Inventors: 孙立; 胡金鑫; 刘晖
Original assignee: Qingdao Yingchuang Information Technology Co ltd
Current assignee: Qingdao Yingchuang Information Technology Co ltd
Priority date: 2021-04-28
Filing date: 2021-04-28
Publication date: 2021-11-12
Anticipated expiration: 2031-04-28

Abstract

The utility model discloses a novel nanoimprint lithography machine, comprises an operation bench, the bottom electric connection of operation panel has the lithography machine, coupling mechanism is installed respectively to the left and right sides of operation panel, coupling mechanism includes shell, first threaded rod, the first in command, lagging and magnetic path, the inner wall of shell is laminated mutually with the outside of operation panel. Thereby make the lagging drive magnetic path downstream, and then make the magnetic path insert inside operation panel top magnetic groove, realized dismantling the maintenance of being convenient for, the operation degree of difficulty has been reduced, work efficiency is improved, and then the cooperation plectane makes the riser rotate to the inboard, pivoted riser cooperation frid is fixed the article, position deviation has been prevented, guarantee to aim at with equipment, ensure normal use, the practicality is improved, let the montant slide around the spout inner wall afterwards, it can to make the riser insert corresponding recess after that, position control has been realized, user's demand is satisfied, use comfort has been improved, and easy popularization.

Description

Novel nanoimprint lithography machine

Technical Field

The utility model relates to a novel nanometer impression lithography machine technical field specifically is a novel nanometer impression lithography machine.

Background

The commonly used photoetching machine is a process of mask alignment photoetching, glue is homogenized on the surface of a silicon wafer, and then a device or a circuit structure is temporarily copied to the silicon wafer in the process of transferring a pattern on a mask plate onto the photoresist.

The current nanoimprint lithography machine is when using, and the unable dismantlement of slip shell, other equipment cause easily and shelter from during the maintenance, have increased the operation degree of difficulty, have reduced work efficiency to the processing article directly is put in the backup pad, takes place the skew easily and can't aim at with equipment, influences normal use, has reduced the practicality, and the unable regulation of display device position, can't adjust according to user's needs, influences use comfort, is not conform to modern's user demand.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a novel nanoimprint lithography machine to propose current nanoimprint lithography machine when using in solving above-mentioned background art, the unable dismantlement of slip shell, other equipment cause easily and shelter from during the maintenance, increased the operation degree of difficulty, reduced work efficiency's problem.

In order to achieve the above object, the utility model provides a following technical scheme: a novel nanoimprint lithography machine comprises an operating platform, wherein the bottom of the operating platform is electrically connected with a lithography machine, and the left side and the right side of the operating platform are respectively provided with a connecting mechanism;

the connecting mechanism comprises a shell, a first threaded rod, a first handle, a sleeve plate and a magnetic block;

the inner wall of the shell is attached to the outer side of the operating table, the top of the shell is rotatably connected with the upper portion of the outer wall of the first threaded rod, the top of the first threaded rod is fixedly connected with the bottom of the first handle, the outer wall of the first threaded rod is in threaded connection with the inner wall of the sleeve plate, and the inner side of the bottom of the sleeve plate is fixedly connected with the top of the magnetic block. And the disassembly and maintenance are realized.

Preferably, the outer sides of the two sleeve plates are respectively in sliding clamping connection with the inner long grooves of the shell, and the outer walls of the two magnetic blocks are respectively movably connected with the left and right long grooves on the top of the operating platform. The magnetic block can slide left and right on the inner wall of the long groove.

Preferably, four corners of the bottom of the photoetching machine are respectively and fixedly connected with a base. The base supports the whole device to work stably.

Preferably, the tops of the inner sides of the two shells are respectively fixedly connected with a short plate, and the inner sides of the two short plates are respectively provided with a fixing mechanism;

the fixing mechanism comprises a transverse plate, a vertical plate, a groove plate, a circular plate, a straight plate, a second threaded rod and a second handle;

the outside of diaphragm is rigid coupling with the inboard bottom of short slab respectively, diaphragm front both sides notch rotates with the inner wall of riser respectively and links to each other, two the inboard top of riser respectively with the outside looks rigid coupling of frid, two the below of riser respectively with the outer wall slip joint of plectane, two the rear end face of plectane respectively with the positive left and right sides looks rigid coupling of straight board, the inner wall of straight board and the outer wall threaded connection of second threaded rod, the top of second threaded rod rotates with the bottom of diaphragm and links to each other, the bottom of second threaded rod and the top looks rigid coupling of second handle. The position of the processed object is fixed.

Preferably, the bottom of diaphragm is fixedly connected with the square frame, the bottom of square frame and the outer wall below activity of second threaded rod link to each other. The second threaded rod is stressed to rotate on the inner wall of the notch at the bottom of the square frame.

Preferably, the top of photoetching machine is processed with the spout, the top right side equidistance of photoetching machine is processed with the recess. The normal work of the adjusting mechanism is ensured.

Preferably, the inner wall of the chute is provided with an adjusting mechanism;

the adjusting mechanism comprises a vertical rod, display equipment, a circular ring and a vertical plate;

the bottom of the vertical rod is in sliding clamping connection with the inner wall of the sliding groove, the top of the front side of the vertical rod is fixedly connected with the rear end face of the display device, the outer wall of the vertical rod is in sliding clamping connection with the inner wall of the circular ring, and the right side of the circular ring is fixedly connected with the top of the left side of the vertical plate. The position of the display device is convenient to adjust.

Preferably, the bottom of the vertical plate is inserted into the inner wall of the groove at the rear end. Prevent the vertical rod from sliding on the inner wall of the sliding groove.

Compared with the prior art, the beneficial effects of the utility model are that: according to the novel nanoimprint lithography machine, the first handle in the connecting mechanism drives the first threaded rod to rotate, so that the sleeve plate drives the magnetic blocks to move downwards, and the magnetic blocks are inserted into the magnetic grooves in the top of the operating platform, the disassembly and the maintenance are convenient, the operation difficulty is reduced, and the working efficiency is improved;

the second handle in the fixing mechanism drives the second threaded rod to rotate, so that the straight plate moves upwards and moves, the vertical plate is matched with the circular plate to rotate inwards, the rotating vertical plate is matched with the groove plate to fix the object, the position deviation is prevented, the alignment with equipment is ensured, the normal use is ensured, and the practicability is improved;

through the upwards pulling ring in the montant outer wall among the adjustment mechanism to make the riser break away from the recess, let the montant slide around the spout inner wall afterwards, make the riser insert corresponding recess can after that, realized position control, satisfy user's demand, improved use comfort, facilitate promotion.

Drawings

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is a schematic view of the connection structure of the console, the housing and the first threaded rod in FIG. 1;

FIG. 3 is a schematic view of a connection relationship between a first threaded rod, a sleeve plate and a magnetic block in FIG. 1;

fig. 4 is a schematic view of the connection relationship between the horizontal plate, the vertical plate and the trough plate in fig. 1.

In the figure: 1. the device comprises an operating platform, 2, a connecting mechanism, 201, a shell, 202, a first threaded rod, 203, a first handle, 204, a sleeve plate, 205, a magnetic block, 3, a fixing mechanism, 301, a transverse plate, 302, a vertical plate, 303, a groove plate, 304, a circular plate, 305, a straight plate, 306, a second threaded rod, 307, a second handle, 4, an adjusting mechanism, 401, a vertical rod, 402, display equipment, 403, a circular ring, 404, a vertical plate, 5, a photoetching machine, 6, a base, 7, a short plate, 8, a square frame, 9, a sliding groove, 10 and a groove.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-4, the present invention provides a technical solution: a novel nanoimprint lithography machine comprises an operating platform 1, wherein the bottom of the operating platform 1 is electrically connected with a lithography machine 5, the left side and the right side of the operating platform 1 are respectively provided with a connecting mechanism 2, the connecting mechanisms 2 comprise a shell 201, a first threaded rod 202, a first handle 203, a sleeve plate 204 and a magnet 205, the inner wall of the shell 201 is attached to the outer side of the operating platform 1, the top of the shell 201 is rotatably connected with the upper part of the outer wall of the first threaded rod 202, the first threaded rod 202 is stressed to rotate through a bearing at the top of the shell 201, the top of the first threaded rod 202 is fixedly connected with the bottom of the first handle 203, the first handle 203 is convenient for driving the first threaded rod 202 to rotate, the outer wall of the first threaded rod 202 is in threaded connection with the inner wall of the sleeve plate 204, the inner side of the bottom of the sleeve plate 204 is fixedly connected with the top of the magnet 205, the outer sides of the two sleeve plates 204 are respectively in sliding clamping connection with the inner elongated slot of the shell 201, the sleeve plate 204 is stressed to slide up and down through the inner wall of the inner side of the shell 201, the outer walls of the two magnetic blocks 205 are movably connected with the elongated slots on the left and right sides of the top of the operating table 1 respectively.

Four corners of the bottom of the photoetching machine 5 are respectively fixedly connected with a base 6, the tops of the inner sides of two shells 201 are respectively fixedly connected with a short plate 7, the inner sides of the two short plates 7 are respectively provided with a fixing mechanism 3, the fixing mechanism 3 comprises a transverse plate 301, a vertical plate 302, a groove plate 303, circular plates 304, straight plates 305, a second threaded rod 306 and a second handle 307, the outer sides of the transverse plate 301 are respectively fixedly connected with the bottom of the inner side of the short plate 7, notches on two sides of the front surface of the transverse plate 301 are respectively connected with the inner wall of the vertical plate 302 in a rotating way, the vertical plates 302 are stressed to rotate through pin shafts on the inner walls of the notches on two sides of the transverse plate 301, the tops of the inner sides of the two vertical plates 302 are respectively fixedly connected with the outer side of the groove plate 303, the lower parts of the two circular plates 302 are respectively clamped with the outer wall of the circular plate 304 in a sliding way, the vertical plates 304 are stressed to slide up and down through the notches on the lower parts of the vertical plates 302, the rear end surfaces of the two circular plates 304 are respectively fixedly connected with the left and right sides of the front surface of the straight threaded rod 305, the inner wall of the straight plate 305 is in a threaded rod connected with the outer wall of the second threaded rod 306 in a threaded rod threaded way, the top of the second threaded rod 306 is rotatably connected with the bottom of the transverse plate 301, the second threaded rod 306 is stressed to rotate through a bearing at the bottom of the transverse plate 301, the bottom of the second threaded rod 306 is fixedly connected with the top of a second handle 307, the second handle 307 is convenient for driving the second threaded rod 306 to rotate, a square frame 8 is fixedly connected with the bottom of the transverse plate 301, the bottom of the square frame 8 is movably connected with the lower part of the outer wall of the second threaded rod 306, a sliding groove 9 is processed at the top of the photoetching machine 5, the type of the photoetching machine 5 is NX-2060, grooves 10 are equidistantly processed at the right side of the top of the photoetching machine 5, an adjusting mechanism 4 is installed on the inner wall of the sliding groove 9, the adjusting mechanism 4 comprises a vertical rod 401, a display device 402, a circular ring 403 and a vertical plate 404, the bottom of the vertical rod 401 is slidably clamped with the inner wall of the sliding groove 9, the vertical rod 401 is stressed to slide back and forth through the inner wall of the sliding groove 9, the front top of the vertical rod 401 is fixedly connected with the rear end face of the display device 402, the outer wall of the vertical rod 401 is in sliding clamping connection with the inner wall of the circular ring 403, the circular ring 403 is stressed to slide up and down through the outer wall of the vertical rod 401, the right side of the circular ring 403 is fixedly connected with the top of the left side of the vertical plate 404, and the bottom of the vertical plate 404 is connected with the inner wall of the groove 10 located at the rear end in an inserting connection mode.

In this example, when using the lithography machine, the bottom of the inner wall of the two side cases 201 is now attached to the bottom of the operation table 1 and inserted, then the first handle 203 drives the first threaded rod 202 to rotate, the rotating first threaded rod 202 drives the sleeve plate 204 to move downwards, so that the magnetic blocks 205 are inserted into the long grooves on the two sides of the top of the operation table 1, then the object is placed on the top of the transverse plate 301, then the second handle 307 drives the second threaded rod 306 to rotate, the rotating second threaded rod 306 drives the straight plate 305 to move upwards, the moving straight plate 305 drives the vertical plate 302 to rotate inwards by matching with the circular plate 304, so as to drive the groove plate 303 to fix the object, then the lithography machine 5 works to drive the operation table 1 to work, and then the electromagnet in the long groove on the top of the operation table 1 drives the magnetic blocks 205 to move left and right, so as to adjust the position of the fixed object, then the object is processed by the output end above the lithography machine 5, when the display device 402 is adjusted, the ring 402 moves up and down on the outer wall of the vertical rod 401, the vertical plate 404 is separated from the groove 10, and then the vertical rod 401 slides back and forth on the inner wall of the sliding groove 9.

In the description of the present invention, it is to be understood that the terms "coaxial", "bottom", "one end", "top", "middle", "other end", "upper", "one side", "top", "inner", "front", "center", "both ends", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.

In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "disposed," "connected," "fixed," "screwed" and the like are to be construed broadly, e.g., as meaning fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through an intermediate medium, and may be connected through the inside of two elements or in an interaction relationship between two elements, unless otherwise specifically defined, and the specific meaning of the above terms in the present invention will be understood by those skilled in the art according to specific situations.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. A novel nano-imprint lithography machine comprises an operation table (1), and is characterized in that: the bottom of the operating platform (1) is electrically connected with a photoetching machine (5), and the left side and the right side of the operating platform (1) are respectively provided with a connecting mechanism (2);

the connecting mechanism (2) comprises a shell (201), a first threaded rod (202), a first handle (203), a sleeve plate (204) and a magnetic block (205);

the inner wall of the shell (201) is attached to the outer side of the operating table (1), the top of the shell (201) is rotatably connected with the upper portion of the outer wall of the first threaded rod (202), the top of the first threaded rod (202) is fixedly connected with the bottom of the first handle (203), the outer wall of the first threaded rod (202) is in threaded connection with the inner wall of the sleeve plate (204), and the inner side of the bottom of the sleeve plate (204) is fixedly connected with the top of the magnetic block (205).

2. The novel nanoimprint lithography machine of claim 1, characterized in that: the outer sides of the two sleeve plates (204) are respectively in sliding clamping connection with the inner side long grooves of the shell (201), and the outer walls of the two magnetic blocks (205) are respectively movably connected with the left and right long grooves on the top of the operating table (1).

3. The novel nanoimprint lithography machine of claim 1, characterized in that: and four corners of the bottom of the photoetching machine (5) are respectively and fixedly connected with a base (6).

4. The novel nanoimprint lithography machine of claim 1, characterized in that: short plates (7) are fixedly connected to the tops of the inner sides of the two shells (201) respectively, and fixing mechanisms (3) are mounted on the inner sides of the two short plates (7);

the fixing mechanism (3) comprises a transverse plate (301), a vertical plate (302), a groove plate (303), a circular plate (304), a straight plate (305), a second threaded rod (306) and a second handle (307);

the outside of diaphragm (301) is the inboard bottom rigid coupling with short slab (7) respectively, diaphragm (301) openly both sides notch rotates with the inner wall of riser (302) respectively and links to each other, two the inboard top of riser (302) respectively with the outside looks rigid coupling of frid (303), two the below of riser (302) respectively with the outer wall slip joint of plectane (304), two the rear end face of plectane (304) respectively with the positive left and right sides looks rigid coupling of straight board (305), the inner wall of straight board (305) and the outer wall threaded connection of second threaded rod (306), the top of second threaded rod (306) rotates with the bottom of diaphragm (301) and links to each other, the bottom of second threaded rod (306) and the top looks rigid coupling of second handle (307).

5. The novel nanoimprint lithography machine of claim 4, characterized in that: the bottom rigid coupling of diaphragm (301) has square frame (8), the bottom of square frame (8) and the outer wall below activity of second threaded rod (306) link to each other.

6. The novel nanoimprint lithography machine of claim 1, characterized in that: the top of photoetching machine (5) is processed with spout (9), the top right side equidistance of photoetching machine (5) is processed with recess (10).

7. The novel nanoimprint lithography machine of claim 6, characterized in that: the inner wall of the sliding chute (9) is provided with an adjusting mechanism (4);

the adjusting mechanism (4) comprises a vertical rod (401), a display device (402), a circular ring (403) and a vertical plate (404);

the bottom of the vertical rod (401) is in sliding clamping connection with the inner wall of the sliding groove (9), the front top of the vertical rod (401) is fixedly connected with the rear end face of the display device (402), the outer wall of the vertical rod (401) is in sliding clamping connection with the inner wall of the circular ring (403), and the right side of the circular ring (403) is fixedly connected with the top of the left side of the vertical plate (404).

8. The novel nanoimprint lithography machine of claim 7, characterized in that: the bottom of the vertical plate (404) is inserted into the inner wall of the groove (10) at the rear end.