CN214624966U - Ion source and objective platform mounting structure and vacuum equipment - Google Patents
Ion source and objective platform mounting structure and vacuum equipment Download PDFInfo
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- CN214624966U CN214624966U CN202120067818.0U CN202120067818U CN214624966U CN 214624966 U CN214624966 U CN 214624966U CN 202120067818 U CN202120067818 U CN 202120067818U CN 214624966 U CN214624966 U CN 214624966U
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Abstract
The application relates to an ion source and carrying platform mounting structure and vacuum equipment; the ion source and carrier platform mounting structure includes: the device comprises an ion source fixing plate, a loading platform fixing plate and a fixing connecting piece for connecting the ion source fixing plate and the loading platform fixing plate; the ion source fixing plate is used for mounting an ion source body, and the loading platform fixing plate is used for mounting a loading platform; the ion source fixing plate and the loading platform fixing plate form an integral assembly through the fixing connecting piece; the ion source fixing plate is connected in the vacuum chamber through non-rigid connection; this technical scheme in the use, can keep the straightness that hangs down each other unchangeably, and the ion source fixed plate passes through non-rigid connection in the vacuum chamber moreover, even under vacuum state, the cavity sealed wall of vacuum chamber takes place to warp, can not influence the straightness that hangs down between ion source and the objective platform yet.
Description
Technical Field
The application relates to the technical field of vacuum equipment, in particular to an ion source and carrying platform mounting structure and vacuum equipment.
Background
In vacuum equipment such as vacuum etching, vacuum coating and the like, important technical index requirements are provided for the angle of an ion beam; taking a vacuum etching machine as an example, the angle between the ion beam and the etched product needs to meet the requirement of higher verticality, and if the angle is not vertical, the etched product also has a certain angle, which directly affects the quality of the etched product.
In the traditional vacuum equipment, an ion source is generally fixed above a vacuum cavity, an XY moving object carrying platform is fixed at the bottom of the vacuum cavity, the structure of the object carrying platform is shown in figure 1, and the object carrying platform can be controlled to move according to the track in the figure by mainly utilizing two groups of lead screw guide rails; the following problems mainly exist in the mounting mode: on the one hand, the verticality of the ion source and the carrying platform can only be adjusted in the atmospheric environment, the real using environment is in a vacuum state, and the sealing wall of the cavity in the vacuum state can generate certain deformation, so that the relative angle between the originally adjusted ion source and the carrying platform can be changed, and the verticality of the ion source and the carrying platform is influenced.
SUMMERY OF THE UTILITY MODEL
Accordingly, it is desirable to provide an ion source and stage mounting structure and a vacuum apparatus for solving the above-mentioned technical problem of affecting the perpendicularity of the ion source and stage.
An ion source and stage mounting arrangement comprising: the device comprises an ion source fixing plate, a loading platform fixing plate and a fixing connecting piece for connecting the ion source fixing plate and the loading platform fixing plate;
the ion source fixing plate is used for mounting an ion source body, and the loading platform fixing plate is used for mounting a loading platform; the ion source fixing plate and the loading platform fixing plate form an integral assembly through the fixing connecting piece;
the ion source fixing plate is connected in the vacuum chamber through non-rigid connection.
In one embodiment, the fixed connection comprises a plurality of connecting rods; one end of the connecting rod is fixedly connected with the ion source fixing plate, and the other end of the connecting rod is connected with the loading platform fixing plate.
In one embodiment, the connecting rod is vertically and fixedly mounted on the ion source fixing plate, so that the ion source fixing plate and the loading platform fixing plate are kept parallel.
In one embodiment, the loading platform fixing plate is provided with a through hole, and is movably sleeved on the other end of the connecting rod through the through hole;
still be equipped with the adjusting nut of fixed cargo platform fixed plate on the connecting rod, adjusting nut still is used for adjusting the relative distance of cargo platform fixed plate and ion source fixed plate.
In one embodiment, the number of the connecting rods is four, and the connecting rods are respectively arranged at four top corners of the ion source fixing plate and the loading platform fixing plate.
In one embodiment, the ion source and stage mounting structure further comprises a hanging structure disposed on the upper plate of the vacuum chamber;
the ion source fixing plate is hung in the vacuum chamber through the hanging structure and is in non-rigid connection with the vacuum chamber upper plate.
In one embodiment, the hanging structure comprises two L-shaped clamping grooves;
the edge of the ion source fixing plate is inserted into the L-shaped clamping groove and hung in the vacuum chamber through the L-shaped clamping groove.
A vacuum apparatus comprising: the ion source comprises a vacuum chamber, an object carrying platform, an ion source body and the ion source and object carrying platform mounting structure.
In one embodiment, the vacuum apparatus further comprises an ion source sealing chamber installed outside the vacuum chamber upper plate for sealing the installation site of the ion source body.
In one embodiment, the stage is an XY motion stage;
and the XY motion carrying platform moves on the plane of the carrying platform fixing plate according to a set track.
The technical scheme of this application has following beneficial effect:
connect ion source fixed plate and cargo platform fixed plate and constitute an integral unit through fixed connection spare, the ion source fixed plate passes through non-rigid connection in the vacuum chamber, in the use, can keep straightness unchangeable that hangs down each other, and the ion source fixed plate passes through non-rigid connection in the vacuum chamber in addition, even under vacuum state, the cavity sealed wall of vacuum chamber takes place to warp, can not influence the straightness that hangs down between ion source and the cargo platform yet.
In addition, the technical scheme of this application does not receive the influence of vacuum, no matter under what vacuum, the angle of ion source and objective table can not change, need not switch over the regulation back and forth at atmospheric pressure and vacuum state, improves regulation efficiency.
Drawings
FIG. 1 is a schematic view of an XY motion stage employed in a stage moving configuration;
FIG. 2 is a schematic view of an exemplary ion source and stage mounting arrangement;
FIG. 3 is a schematic view of an ion source and stage mounting arrangement according to another embodiment;
fig. 4 is a schematic structural view of the vacuum apparatus of the present application.
Detailed Description
In order to make the objects, technical solutions and advantages of the present application more apparent, the present application is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
The term "comprises" and any other variations of the embodiments of the present application are intended to cover non-exclusive inclusions. For example, a process, method, system, article, or apparatus that comprises a list of steps is not limited to only those steps or modules recited, but may alternatively include other steps or modules not recited, or that are inherent to such process, method, article, or apparatus.
Referring to fig. 2, fig. 2 is a schematic view of an exemplary ion source and stage mounting arrangement; the ion source and stage mounting structure 100 includes: the ion source fixing plate 10, the carrier platform fixing plate 20, and the fixing connector 30 connecting the ion source fixing plate 10 and the carrier platform fixing plate 20.
The ion source fixing plate 10 is used for mounting the ion source body 11, and the loading platform fixing plate 20 is used for mounting the loading platform 21; the ion source fixing plate 10 and the loading platform fixing plate 20 form an integral assembly through a fixing connector 30; the ion source holding plate 10 is non-rigidly attached within the vacuum chamber 200.
In the working state, because the ion source fixing plate 10 and the loading platform fixing plate 20 form an integral component, the perpendicularity between the ion source fixing plate 10 and the loading platform fixing plate can be kept unchanged, and meanwhile, the ion source fixing plate 10 is connected in the vacuum chamber 200 through non-rigidity, even if the cavity sealing wall of the vacuum chamber 200 is deformed in the vacuum state, the perpendicularity between the ion source body 11 and the loading platform 21 cannot be influenced.
In order to make the technical solutions of the present application clearer, further embodiments of the present application are explained below.
In one embodiment, referring to fig. 3, fig. 3 is a schematic view of an ion source and stage mounting structure according to another embodiment, the fixing connector 30 may include a plurality of connecting rods 310, one end of each connecting rod 310 is fixedly connected to the ion source fixing plate 10, and the other end is connected to the stage fixing plate 20. For the connecting rod 310, it can be vertically and fixedly installed on the ion source fixing plate 10, so that the ion source fixing plate 10 and the stage fixing plate 20 are kept parallel.
Further, the loading platform fixing plate 20 is provided with a through hole, and movably sleeved on the other end of the connecting rod 310 through the through hole; the connecting rod 310 is further provided with an adjusting nut 311 for fixing the loading platform fixing plate 20, and the adjusting nut 311 is further used for adjusting the relative distance and angle between the loading platform fixing plate 20 and the ion source fixing plate 10; in addition, the adjustment nut 311 can be used for adjustment, and the motor can be used for driving adjustment, so that an automatic control and adjustment function is realized.
Preferably, the number of the connecting rods 310 may be four, and the connecting rods are respectively arranged at four corners of the ion source fixing plate 10 and the stage fixing plate 20. In practical applications, more or less than four connecting rods 310 may be provided, depending on the needs of the user.
In one embodiment, the ion source and stage mounting structure 100 of the present application may further include a hanging structure 50 disposed on the vacuum chamber upper plate 210; the ion source fixing plate 10 is suspended in the vacuum chamber 200 by the suspending structure 50, and is not rigidly connected to the vacuum chamber upper plate 210.
In this embodiment, the hanging structure 50 can connect the whole ion source and the mounting structure 100 of the object stage in a non-rigid manner, so as to ensure that the change of the ion source and the mounting structure 100 of the object stage is not affected even when the vacuum chamber 200 is deformed.
As an example, the hanging structure 50 may include two L-shaped retaining grooves 51; the edge of the ion source fixing plate 10 is inserted into the L-shaped retaining groove 51, and suspended in the vacuum chamber 200 through the L-shaped retaining groove 51. Referring to fig. 3, the installation and removal is facilitated by the L-shaped detent groove 51.
An example of a vacuum apparatus is set forth below.
Referring to fig. 4, fig. 4 is a schematic structural diagram of a vacuum apparatus of the present application, which includes a vacuum chamber 200, a stage 21, an ion source body 11, and the ion source and stage mounting structure 100 of the above embodiment; further, an ion source sealing chamber 110 installed outside the vacuum chamber upper plate 210 may be further included to seal the installation portion of the ion source body 11. In addition, as the stage 21, an XY motion stage may be used; the XY-motion stage moves on the plane of the stage fixing plate 20 according to a predetermined trajectory.
The vacuum equipment of the embodiment can avoid the condition that the adjustment angle is switched ceaselessly in the atmospheric pressure and vacuum states, and simplifies the adjustment operation; on the other hand, because the deflection of different vacuum degrees to vacuum cavity 200 is different, the angle requirement is different when different vacuum degrees work, and the vacuum equipment of this application can utilize adjusting nut 311 readjust angle as required, has more excellent commonality.
The technical scheme of the application can be used for vacuum equipment such as vacuum etching and vacuum coating.
The above-mentioned embodiments only express several embodiments of the present application, and the description thereof is more specific and detailed, but not construed as limiting the scope of the utility model. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the concept of the present application, which falls within the scope of protection of the present application. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. An ion source and stage mounting structure comprising: the device comprises an ion source fixing plate, a loading platform fixing plate and a fixing connecting piece for connecting the ion source fixing plate and the loading platform fixing plate;
the ion source fixing plate is used for mounting an ion source body, and the loading platform fixing plate is used for mounting a loading platform; the ion source fixing plate and the loading platform fixing plate form an integral assembly through the fixing connecting piece;
the ion source fixing plate is connected in the vacuum chamber through non-rigid connection.
2. The ion source and stage mounting arrangement of claim 1, wherein the fixed connection comprises a plurality of connecting rods; one end of the connecting rod is fixedly connected with the ion source fixing plate, and the other end of the connecting rod is connected with the loading platform fixing plate.
3. The ion source and stage mounting arrangement of claim 2, wherein the connecting rod is vertically fixedly mounted to the ion source mounting plate such that the ion source mounting plate and stage mounting plate are parallel.
4. The ion source and carrier platform mounting structure of claim 3, wherein the carrier platform fixing plate is provided with a through hole and movably sleeved on the other end of the connecting rod through the through hole;
still be equipped with the adjusting nut of fixed cargo platform fixed plate on the connecting rod, adjusting nut still is used for adjusting the relative distance of cargo platform fixed plate and ion source fixed plate.
5. The ion source and carrier platform mounting structure of claim 4, wherein the number of the connecting rods is four, and the connecting rods are respectively arranged at four corners of the ion source fixing plate and the carrier platform fixing plate.
6. The ion source and stage mounting arrangement of claim 1, further comprising a hanging structure disposed on the upper plate of the vacuum chamber;
the ion source fixing plate is hung in the vacuum chamber through the hanging structure and is in non-rigid connection with the vacuum chamber upper plate.
7. The ion source and stage mounting arrangement of claim 6, wherein the hanging structure comprises two L-shaped detent grooves;
the edge of the ion source fixing plate is inserted into the L-shaped clamping groove and hung in the vacuum chamber through the L-shaped clamping groove.
8. A vacuum apparatus, comprising: a vacuum chamber, a carrier platform, an ion source body, and the ion source and carrier platform mounting structure of any one of claims 1-7.
9. The vacuum apparatus of claim 8, further comprising an ion source sealing chamber installed outside the upper plate of the vacuum chamber for sealing a mounting portion of the ion source body.
10. The vacuum apparatus of claim 8, wherein the stage is an XY motion stage;
and the XY motion carrying platform moves on the plane of the carrying platform fixing plate according to a set track.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120067818.0U CN214624966U (en) | 2021-01-11 | 2021-01-11 | Ion source and objective platform mounting structure and vacuum equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120067818.0U CN214624966U (en) | 2021-01-11 | 2021-01-11 | Ion source and objective platform mounting structure and vacuum equipment |
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| Publication Number | Publication Date |
|---|---|
| CN214624966U true CN214624966U (en) | 2021-11-05 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202120067818.0U Active CN214624966U (en) | 2021-01-11 | 2021-01-11 | Ion source and objective platform mounting structure and vacuum equipment |
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| CN (1) | CN214624966U (en) |
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2021
- 2021-01-11 CN CN202120067818.0U patent/CN214624966U/en active Active
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