CN214598218U - Exhaust separation and treatment system for semiconductor manufacturing process - Google Patents
Exhaust separation and treatment system for semiconductor manufacturing process Download PDFInfo
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- CN214598218U CN214598218U CN202120406801.3U CN202120406801U CN214598218U CN 214598218 U CN214598218 U CN 214598218U CN 202120406801 U CN202120406801 U CN 202120406801U CN 214598218 U CN214598218 U CN 214598218U
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Abstract
The utility model discloses a semiconductor processing procedure exhaust separation and processing system, which comprises a control system, ammonia processing equipment, a sulfuric acid tank and an air valve, wherein the lower air inlet of the ammonia processing equipment is connected with an ammonia exhaust pipeline through the air valve, the top exhaust port of the ammonia processing equipment is connected with an acid exhaust pipeline through the air valve, a bypass pipeline is also directly connected with the air inlet and the exhaust port of the ammonia processing equipment, the ammonia processing equipment is also provided with a spray inlet, the port of the ammonia processing equipment is respectively connected with a tap water pipeline and a sulfuric acid conveying pipeline, a spray device is arranged in the ammonia processing equipment, a water outlet is arranged at the bottom of the ammonia processing equipment and is connected with the acid exhaust pipeline, the other end of the sulfuric acid conveying pipeline is connected with the sulfuric acid tank through a sulfuric acid pump, the sulfuric acid tank is also respectively connected with a sulfuric acid supply pipeline and the acid exhaust pipeline, the utility model solves the mixing problem of ammonia exhaust and acid exhaust, the whole process control does not need personnel operation, so that the labor cost is saved, and the reliability of the equipment is improved.
Description
Technical Field
The utility model belongs to the technical field of industrial waste gas treatment, specifically relate to a semiconductor processing procedure exhaust separation and processing system.
Background
During the semiconductor manufacturing process, various chemical exhaust gases are generated, and the chemical exhaust gases can be classified into: acid exhaust gas, organic exhaust gas, ammonia-containing exhaust gas, general exhaust gas, and the like. And the exhaust gas treatment is based on the mode that exhaust gas of each property is collected respectively, is processed at a terminal and is discharged up to the standard. However, depending on the semiconductor process, it is sometimes necessary to use a variety of chemicals for the fabrication process, including: sulfuric acid, hydrochloric acid, hydrofluoric acid, ammonia water, hydrogen peroxide and the like. The exhaust gases produced by these chemicals contain not only acid gases but also ammonia gases. The acid gas and the ammonia-containing gas have different chemical properties, and are mixed in the main acidic exhaust pipe and are subjected to centralized treatment through the terminal acidic exhaust washing device, but the acidic exhaust treatment device cannot remove ammonia in the exhaust gas, so that the exhaust outlet can generate blue smoke, the pollution is generated to the surrounding environment, the environmental protection pressure of enterprises is increased, and the environmental protection image of the enterprises is also influenced.
SUMMERY OF THE UTILITY MODEL
For overcoming the not enough of above-mentioned prior art, the utility model provides a semiconductor processing procedure exhaust separation and processing system according to the principle that does not change production technology and production facility, has carried out the effective separation processing of ammonia and acid gas in the exhaust in equipment exhaust outlet, and in separation and the processing procedure, the ammonia composition clearance is greater than 95% to this avoids the ammonia to sneak into in the acid exhaust system.
In order to realize the purpose, the utility model discloses a technical scheme is:
a semiconductor manufacture procedure exhaust separation and treatment system comprises a control system, ammonia gas treatment equipment, a sulfuric acid tank and an air valve, wherein a lower air inlet of the ammonia gas treatment equipment is connected with an ammonia exhaust pipeline through the air valve, an exhaust outlet at the top of the ammonia gas treatment equipment is connected with an acid exhaust pipeline through the air valve, a bypass pipeline is further directly connected with an air inlet and an exhaust outlet of the ammonia gas treatment equipment, a bypass valve is arranged on the bypass pipeline, a spraying inlet is further arranged on the ammonia gas treatment equipment, a water mixer is arranged on one side of the spraying inlet, a port at the other side of the spraying inlet is respectively connected with a tap water pipeline and a sulfuric acid conveying pipeline, a spraying device is arranged inside the ammonia gas treatment equipment, the spraying device is communicated with the spraying inlet, a water outlet is arranged at the bottom of the ammonia gas treatment equipment and is connected with the acid exhaust pipeline, and the other end of the sulfuric acid conveying pipeline is connected with the sulfuric acid tank through a sulfuric acid pump, the device comprises a sulfuric acid tank, a sulfuric acid supply pipeline, a sulfuric acid drainage pipeline, a tap water pipeline, a manual valve and a control system, wherein the sulfuric acid tank is provided with a liquid level meter, the sulfuric acid tank is connected with the sulfuric acid supply pipeline and the acidic drainage pipeline respectively, a branch is further arranged on the sulfuric acid supply pipeline and connected with the acidic drainage pipeline, the tap water pipeline is provided with a first electric valve and a first manual valve, the sulfuric acid supply pipeline and the branch are respectively provided with a valve set, taking one of the valve sets as an example, the valve set comprises a second manual valve, a second electric valve, a third manual valve and a fourth manual valve, the second electric valve and the third manual valve are sequentially connected, the fourth manual valve is connected to two ends of the second manual valve and the third manual valve in parallel, and the control system controls the opening and closing of ammonia gas treatment equipment, the first electric valve and the second electric valve and the flow of the sulfuric acid pump through a PLC.
Preferably, a sampling port is further arranged beside the water mixer.
The utility model has the advantages that:
1. the utility model provides an contain the mixing of ammonia exhaust and acid exhaust, avoid the unsafe hidden danger that two kinds of different chemical property exhaust mixes and bring, solved simultaneously because of sneaking into ammoniac gas in the acid exhaust, blue smog problem appears in the exhaust outlet.
2. The utility model discloses utilize the operation of control system control ammonia treatment facility and the valve on each pipeline to open and close, process control realizes full-automatic, need not personnel's operation among the equipment operation process, saves the cost of labor, improve equipment reliability.
3. The utility model provides a make used waste sulfuric acid and through acid drainage pipeline recycle, save the chemical reagent cost in the processing procedure, greatly reduced the running cost that ammonia was handled.
4. The utility model discloses a sample connection carries out PH value sample detection to the mixed acidizing fluid of handling the ammoniacal gas, keeps accurate PH value for the ammonia is handled more accurately high-efficiently.
Drawings
FIG. 1 is a schematic view of the present invention;
FIG. 2 is a schematic view of a device for treating ammonia gas according to the present invention;
the reference symbols shown in the figures are: 1-a control system, 2-ammonia gas treatment equipment, 3-a sulfuric acid tank, 4-an air valve, 5-an ammonia exhaust pipeline, 6-an acidic exhaust pipeline, 7-a tap water pipeline, 8-a sulfuric acid conveying pipeline, 9-an acidic exhaust pipeline, 10-a sulfuric acid pump, 11-a liquid level meter, 12-a sulfuric acid supply pipeline, 13-an electric valve I, 14-a manual valve I, 15-a manual valve II, 16-an electric valve II, 17-a manual valve III, 18-a manual valve IV, 201-an air inlet, 202-an exhaust port, 203-a bypass pipeline, 204-a bypass valve, 205 spray inlets, 206-a water mixer, 207-a spray device, 208-a water outlet and 209-a sampling port.
Detailed Description
The following describes the present design in detail with reference to the accompanying drawings.
As shown in fig. 1-2, a semiconductor process exhaust separation and treatment system comprises a control system 1, an ammonia gas treatment device 2, a sulfuric acid tank 3, and an air valve 4, wherein a lower air inlet 201 of the ammonia gas treatment device 2 is connected with an ammonia exhaust pipeline 5 through the air valve 4, a top exhaust outlet 202 thereof is connected with an acidic exhaust pipeline 6 through the air valve 4, a bypass pipeline 203 is further directly connected between the air inlet 201 and the exhaust outlet 202 of the ammonia gas treatment device 2, a bypass valve 204 is arranged on the bypass pipeline 203, wherein the ammonia gas treatment device 2 is further provided with a spray inlet 205, one side of the spray inlet 205 is provided with a water mixer 206, the other side port thereof is respectively connected with a tap water pipeline 7 and a sulfuric acid conveying pipeline 8, a spray device 207 is arranged inside the ammonia gas treatment device 2, the spray device 207 is communicated with the spray inlet 205, and a water outlet 208 is arranged at the bottom of the ammonia gas treatment device 2, the water outlet 208 is connected with the acid drainage pipeline 9, the other end of the sulfuric acid conveying pipeline 8 is connected with the sulfuric acid tank 3 through the sulfuric acid pump 10, the sulfuric acid tank 3 is provided with the liquid level meter 11, the sulfuric acid tank 3 is also respectively connected with the sulfuric acid supply pipeline 12 and the acid drainage pipeline 6, the sulfuric acid supply pipeline 12 is also provided with a branch connected with the acid drainage pipeline 9, the tap water pipeline 7 is provided with an electric valve I13 and a manual valve I14, the sulfuric acid supply pipeline 12 and the branch thereof are respectively provided with a valve group, taking one valve group as an example, the valve group comprises a manual valve II 15, an electric valve II 16, a manual valve III 17 and a manual valve IV 18, wherein the manual valve II 16, the electric valve II 17 and the manual valve III 18 are sequentially connected, the manual valve IV 18 is connected with the manual valve II 16 and the manual valve III 17 in parallel, and the control system 1 controls the ammonia gas treatment equipment 2 through a PLC, And opening and closing the first electric valve 13 and the second electric valve 16.
Wherein, a sampling port 209 is further disposed beside the water mixer 206 for sampling and detecting the PH value of the mixed acid solution.
The valve group is used for manually controlling the operation of the second electric valve 16 during maintenance and replacement.
The bypass line 203 is used for manual control operation when the ammonia gas treatment device 2 is maintained and replaced.
Wherein, the input signal of the control system 1 is a start-stop signal when ammonia water is used in the semiconductor process and a liquid level signal in the sulfuric acid tank 3, and the output signal is used for controlling the start-stop of the ammonia gas treatment equipment 2, the electric valve I13 and the electric valve II 16 and the flow of the sulfuric acid pump 10.
Examples
The utility model discloses when using, need use the aqueous ammonia in the semiconductor manufacturing process, when using the aqueous ammonia, can produce the ammoniacal gas, aqueous ammonia start signal input control system 1, control system 1 output signal control whole exhaust separation and processing system operation, open ammonia treatment facility 2, water pipeline 7 carries the running water, sulphuric acid conveying pipeline 8 carries sulphuric acid under sulphuric acid pump 10's effect, mixed acidizing fluid is through spraying entry 205, and the misce bene under the effect of muddy hydrophone 206, spout by spray set 207 top-down, sample through sample connection 209 during this period, survey acidizing fluid PH, flow regulation PH value 3-4 through control sulphuric acid pump 10, the ammoniacal gas is from ammoniacal exhaust duct 5, air inlet 201 gets into ammonia treatment facility 2, gaseous from bottom to top mixes with the acidizing fluid that spouts down, deamination is carried out, gas after handling is discharged from gas vent 202 to acidic exhaust pipeline 6, the treated waste sulfuric acid liquid enters the acid drainage pipeline 9 through the bottom water outlet 208, the liquid level in the sulfuric acid tank 3 is measured by the liquid level meter 11 and transmits a liquid level signal to the control system 1, the control system 1 controls the switch of the second electric valve 16 on the sulfuric acid supply pipeline 12 and the branch thereof, when the liquid level in the sulfuric acid tank 3 is low, the second electric valve 16 on the sulfuric acid supply pipeline 12 is opened, the second electric valve 16 on the branch thereof is closed to supplement sulfuric acid in the sulfuric acid tank 3, gas in the sulfuric acid tank 3 is discharged to the acid exhaust pipeline 6 to maintain the pressure balance in the sulfuric acid tank 3, when the liquid level in the sulfuric acid tank 3 is high, the second electric valve 16 on the sulfuric acid supply pipeline 12 is closed, the second electric valve 16 on the branch thereof is opened, the sulfuric acid enters the acid drainage pipeline 9 for recycling, and the recycling of the sulfuric acid is realized through the switching between the sulfuric acid supply pipeline 12 and the valves on the branch thereof, when the ammonia water is stopped in the semiconductor process, the control system 1 outputs signals to control the whole exhaust separation and treatment system to stop running, so that the idle running of the system is reduced, and the cost is saved.
Claims (2)
1. A semiconductor manufacturing procedure exhaust separation and treatment system is characterized by comprising a control system, ammonia gas treatment equipment, a sulfuric acid tank and an air valve, wherein a lower air inlet of the ammonia gas treatment equipment is connected with an ammonia exhaust pipeline through the air valve, a top exhaust port of the ammonia gas treatment equipment is connected with an acid exhaust pipeline through the air valve, a bypass pipeline is further directly connected between the air inlet and the exhaust port of the ammonia gas treatment equipment, a bypass valve is arranged on the bypass pipeline, a spraying inlet is further arranged on the ammonia gas treatment equipment, a water mixer is arranged on one side of the spraying inlet, a port on the other side of the spraying inlet is respectively connected with a tap water pipeline and a sulfuric acid conveying pipeline, a spraying device is arranged inside the ammonia gas treatment equipment and is communicated with the spraying inlet, a water outlet is arranged at the bottom of the ammonia gas treatment equipment and is connected with the acid exhaust pipeline, the other end of the sulfuric acid conveying pipeline is connected with a sulfuric acid tank through a sulfuric acid pump, a liquid level meter is arranged on the sulfuric acid tank, the sulfuric acid tank is also respectively connected with a sulfuric acid supply pipeline and an acid drainage pipeline, a branch is also arranged on the sulfuric acid supply pipeline and is connected with the acid drainage pipeline, an electric valve I and a manual valve I are arranged on the tap water pipeline, a valve group is respectively arranged on the sulfuric acid supply pipeline and the branch thereof, taking one valve group as an example, the valve group comprises a second manual valve, a second electric valve, a third manual valve and a fourth manual valve, the manual valve II, the electric valve II and the manual valve III are sequentially connected, the manual valve IV is connected with two ends of the manual valve II and the manual valve III in parallel, the control system controls the opening and closing of the ammonia gas treatment equipment, the electric valve I and the electric valve II and the flow of the sulfuric acid pump through the PLC.
2. The system of claim 1, wherein a sampling port is further disposed beside the water mixer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120406801.3U CN214598218U (en) | 2021-02-24 | 2021-02-24 | Exhaust separation and treatment system for semiconductor manufacturing process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120406801.3U CN214598218U (en) | 2021-02-24 | 2021-02-24 | Exhaust separation and treatment system for semiconductor manufacturing process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214598218U true CN214598218U (en) | 2021-11-05 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120406801.3U Active CN214598218U (en) | 2021-02-24 | 2021-02-24 | Exhaust separation and treatment system for semiconductor manufacturing process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214598218U (en) |
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2021
- 2021-02-24 CN CN202120406801.3U patent/CN214598218U/en active Active
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