CN214477325U - Scanning electron microscope sample stage - Google Patents

Scanning electron microscope sample stage Download PDF

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Publication number
CN214477325U
CN214477325U CN202120941439.XU CN202120941439U CN214477325U CN 214477325 U CN214477325 U CN 214477325U CN 202120941439 U CN202120941439 U CN 202120941439U CN 214477325 U CN214477325 U CN 214477325U
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metal layer
sample
sample stage
electron microscope
scanning electron
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杨秋
时晓露
余立架
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Ningbo New Material Testing And Evaluation Center Co Ltd
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Ningbo New Material Testing And Evaluation Center Co Ltd
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Abstract

The utility model provides a scanning electron microscope sample stage, which comprises a sample stage body and a metal layer arranged above the sample stage body, wherein the lower surface of the metal layer is contacted with the upper surface of the sample stage body; the metal layer is provided with a plurality of holes penetrating through the thickness of the metal layer, and a groove structure with one open end is formed on the upper surface of the sample table body; or, a plurality of grooves with one open end are arranged from the upper surface to the lower surface of the metal layer, the open ends of the grooves are the upper surface of the metal layer, and the depth of each groove is smaller than the thickness of the metal layer. The sample table is simple in structure and easy to manufacture, a plurality of powder samples can be prepared at one time, and the powder samples can be repeatedly used after being cleaned, so that the cost is reduced.

Description

Scanning electron microscope sample stage
Technical Field
The utility model relates to a scanning electron microscope especially relates to a scanning electron microscope sample platform.
Background
The scanning electron microscope, namely a scanning electron microscope, is an important instrument in the current new material analysis technology, has the characteristics of wide adjustable range of magnification, high imaging resolution, large depth of field and the like, is widely applied to the fields of metallurgy, materials science, biology, medicine and the like, and greatly promotes the development of scientific research in various related fields.
The sample stage is one of the key parts of the scanning electron microscope, is used for bearing a sample and represents the local characteristics of the sample through electronic system imaging. Due to the structural characteristics of the scanning electron microscope, when the scanning electron microscope is used for observing a sample, the sample needs to be stabilized on the upper surface of the sample table.
When a scanning electron microscope is used for observing a powder sample, particularly, powder particles with the particle sizes of micron, submicron and nanometer are directly fixed on a sample table for observation by using a conductive adhesive, the powder is seriously agglomerated, and the appearance of the sample cannot be clearly observed. Therefore, generally, the powder and absolute ethyl alcohol are mixed to form a mixed solution, the mixed solution is placed in a small sealed test tube, the mixed solution is dripped onto a small silicon wafer by using a dropper after being uniformly mixed by ultrasonic oscillation, and the surface of the dried silicon wafer is provided with a powder sample and is not agglomerated; then, adhering a conductive adhesive tape on a sample table, moving the silicon wafer with the powder sample onto the conductive adhesive tape by using a forceps, and tightly pressing the edge of the silicon wafer by using the forceps; and then placing the sample stage in a bracket configured by a scanning electron microscope, and observing the sample by using the scanning electron microscope. The method has the following problems:
(1) problems with the use of silicon wafers: the size of the required silicon wafer is small, a large silicon wafer (a commercial silicon wafer is a wafer with the diameter of 60mm generally) needs to be cut into small pieces, and the small pieces are soaked in absolute ethyl alcohol for standby after being cleaned; the silicon wafer is very easy to fall off when moving after being clamped by the forceps; when the silicon chip is placed on the sample table, the arrangement is not ensured to be orderly, and the problem of wrong position and number recording is easy to occur; an operator directly contacts the silicon wafer to scratch fingers easily; the silicon chip is not easy to collect after being used; the silicon chip is difficult to be reused, which causes the waste of the silicon chip.
(2) The sample preparation process is complicated: the procedure used for each sample was: a. dripping the mixed liquid on a silicon wafer; b. marking the silicon chip number corresponding to the sample; c. drying the solvent in an oven; d. sequentially sticking the silicon wafers on a sample table one by one; c. and (4) removing all the silicon wafers and the conductive adhesive after the detection is finished, and cleaning the sample table. Therefore, the sample preparation process is complicated, and especially when the number of samples is large, the sample preparation efficiency is low.
(3) Sample platform rate of utilization is low, influences efficiency: the area of the sample table is fixed, and if the silicon chip is used for loading the sample and then pasting, the number of the samples to be placed is small, for example, the area of the conventional sample table is about 78.5cm2At most, about 15-20 samples can be placed, and the efficiency is low when the large-batch detection is carried out.
(4) The consumable cost is high: every sample all needs to use electrically conductive silicon chip and conducting resin, and the consumptive material can not used repeatedly, leads to with high costs, causes very big waste especially when the sample detected volume is great.
Therefore, the method has the problems of complicated flow, time and labor consumption and low working efficiency when the powder sample is observed. Therefore, the science and technology worker transforms the sample platform to improve the sample preparation efficiency and the detection function. For example, patent document CN209298059U discloses a sample stage for a scanning electron microscope for observing powder, which comprises a barrel-shaped stage body and a silicon plate with a protrusion, wherein the silicon plate is mounted on the inner wall of the upper part of the stage body through the protrusion in a plug-in interference fit manner, the silicon plate is provided with a groove, a liquid seepage hole is arranged in the groove, and a liquid loss hole is arranged at the bottom of the side surface of the stage body. The sample stage can be used for observing a plurality of samples simultaneously without using a conductive adhesive tape. However, the silicon plate is provided with the protrusions, the grooves and the liquid seepage holes, so that the silicon plate is complex in structure and high in manufacturing difficulty, and the manufacturing cost is increased; moreover, the liquid seepage hole is arranged in the groove, when the mixed liquid is dripped into the groove, if the mixed liquid is dripped at the position of the liquid seepage hole, the liquid flows out through the liquid seepage hole and cannot form a powder sample at the bottom of the groove; meanwhile, the seepage part is easy to generate pollution.
SUMMERY OF THE UTILITY MODEL
To the technical current situation, the utility model provides a scanning electron microscope sample platform has simple structure, easy preparation, is applicable to the powder sample and measures.
The utility model provides a technical scheme is:
the utility model provides a scanning electron microscope sample platform, includes sample platform body 1 as shown in fig. 1, 2, characterized by:
the sample table further comprises a metal layer 2 arranged above the sample table body 1, and the lower surface of the metal layer 2 is in contact with the upper surface of the sample table body 1;
the metal layer 2 is provided with a plurality of holes 3, the holes 3 penetrate through the thickness of the metal layer 2 and form a groove structure with one open end with the upper surface of the sample table body 1, the open end of the groove structure is the upper surface of the metal layer 2, and the bottom of the groove structure is the upper surface of the sample table body 1;
or, a plurality of grooves 4 with one open end are arranged from the upper surface to the lower surface of the metal layer 2, the open ends of the grooves 4 are the upper surface of the metal layer 2, and the depth of the grooves 4 is smaller than the thickness of the metal layer 2.
The metal layer can be integrated with the sample stage body, and can also be a structure which can be separated from the sample stage body.
The structure of the sample stage body is not limited, preferably a cylindrical structure, the cross section of the sample stage body is not limited, and the sample stage body can be rectangular, circular, oval, other polygons and the like.
Preferably, the holes 3 are arranged regularly.
Preferably, the holes 3 have the same shape and the same size.
Preferably, the grooves 4 are regularly arranged.
Preferably, the grooves 4 have the same shape and the same size.
Preferably, the diameter of the holes is 3-5 mm.
Preferably, the depth of the groove is 2 to 3 mm.
The metal layer material is not limited and includes copper, nickel, iron, aluminum, alloy and the like.
The utility model discloses a preparation method of scanning electron microscope sample platform is not limited, as an implementation, including following step:
(1) manufacturing a metal layer;
(2) as shown in fig. 3, coating a photoresist on the upper surface of the metal layer, removing a part of the photoresist by ultraviolet irradiation using a template method, then removing a part of the metal by acid etching to obtain the holes, and then stripping the photoresist; or, the holes are made on the surface of the metal layer by a mechanical method;
as shown in fig. 4, coating a photoresist on the upper surface of the metal layer, removing a part of the photoresist by ultraviolet irradiation using a template method, then removing a part of the metal by acid etching, controlling the etching thickness to be smaller than the thickness of the metal layer to obtain the groove, and then stripping the photoresist; or, the groove is made on the surface of the metal layer by a mechanical method.
Compared with the prior art, the utility model discloses following beneficial effect has:
(1) the sample table body is provided with the metal layer, when the metal layer is provided with the hole, the metal layer and the upper surface of the sample table body form a groove structure, when a powder sample is measured, powder and a solvent are mixed to form a mixed liquid which is slightly dripped into the groove structure, the powder sample is obtained after the solvent is volatilized, the structure is simple, the manufacturing is simple, the cost is low, a plurality of powder samples can be obtained at one time, when the metal layer and the sample table body can be separated, the metal layer can be replaced, the sample table body can be repeatedly used after being cleaned, and the cost is reduced;
(2) the sample table body is provided with the metal layer, when the direction from the upper surface to the lower surface of the metal layer is provided with the groove, the opening end of the groove is the upper surface of the metal layer, the depth of the groove is smaller than the thickness of the metal layer, when a powder sample is measured, powder and a solvent are mixed to form a mixed liquid which is dripped into the groove structure in a small amount, and the solvent is volatilized to obtain the powder sample; and when the metal layer and the sample platform body are separable, the metal layer can be replaced, and the sample platform body can be directly reused because the sample platform body is not contacted with the powder, so that the operation is further simplified, and the cost is reduced.
Drawings
Fig. 1 is a schematic structural diagram of a local middle scanning electron microscope sample stage of the present invention.
Fig. 2 is another schematic structural diagram of the local middle scanning electron microscope sample stage of the present invention.
Fig. 3 is a schematic view of a preparation process of a scanning electron microscope sample stage in embodiment 1 of the present invention.
Fig. 4 is a schematic view of a preparation process of a scanning electron microscope sample stage in embodiment 2 of the present invention.
Fig. 5 is a top view of the sample stage of the scanning electron microscope in example 1 and example 2.
The reference numerals in fig. 1-3 are: the sample platform comprises a sample platform body 1, a metal layer 2, a hole 3 and a groove 4.
Detailed Description
The present invention will be described in further detail with reference to the following embodiments and the accompanying drawings, wherein the following embodiments are provided to facilitate understanding of the present invention and do not limit the present invention.
Example 1:
in this embodiment, scanning electron microscope sample platform includes sample platform body 1 and sets up the metal level 2 in sample platform body top, and the lower surface of metal level 2 contacts with the upper surface of sample platform body 1. The metal layer 2 is provided with a plurality of holes 3, as shown in fig. 1, each hole 3 penetrates through the thickness of the metal layer 2, and forms a groove structure with an open end with the upper surface of the sample stage body 1, the open end is the upper surface of the metal layer 2, and the bottom of the groove structure is the upper surface of the sample stage body 1.
In this embodiment, the sample stage body is a cylindrical structure, the metal layer is separable from the sample stage body, the holes are arranged in a regular array as shown in fig. 5, each hole has the same structure and the same size, and is a cylindrical structure with a diameter of 5mm, and the thickness of the metal layer is 2 mm.
In this embodiment, the preparation method of the sample stage is as follows:
(1) placing a metal layer above the sample stage body, wherein the lower surface of the metal layer is in contact with the upper surface of the sample stage body 1;
(2) as shown in fig. 3, a photoresist is coated on the upper surface of the metal layer, a portion of the photoresist is removed by ultraviolet light irradiation using a stencil method, then a portion of the metal is removed by acid etching to obtain a hole 3, and then the photoresist is stripped.
When the scanning electron microscope sample stage is used for measuring a powder sample, powder and a solvent are mixed to form a mixed solution, a small amount of the mixed solution is dripped into a groove structure formed by a hole and the upper surface of the sample stage body, and the powder sample is obtained after the solvent is volatilized to measure. After measurement, the metal layer is removed, the sample table body can be repeatedly used after being cleaned, and the sample table body can be repeatedly used after being cleaned.
Example 2:
in this embodiment, scanning electron microscope sample platform includes sample platform body 1 and sets up the metal level 2 in sample platform body 1 top, and the lower surface of metal level 2 contacts with the upper surface of sample platform body 1. As shown in fig. 2, a plurality of grooves 4 with one open end are arranged from the upper surface to the lower surface of the metal layer 2, the open end is the upper surface of the metal layer 2, and the depth of the groove 4 is smaller than the thickness of the metal layer 2.
In this embodiment, the sample stage body 1 is a cylindrical structure, the metal layer 2 is separable from the sample stage body 1, the grooves 4 are arranged in a regular array as shown in fig. 5, each groove has the same structure and the same size, and is a cylindrical structure with a diameter of 5mm, the thickness of the metal layer is 5mm, and the depth of the groove is 2.5 mm.
In this embodiment, the preparation method of the sample stage is as follows:
(1) placing the metal layer above the sample stage body, wherein the lower surface of the metal layer is in contact with the upper surface of the sample stage body;
(2) as shown in fig. 4, a photoresist is coated on the upper surface of the metal layer, a portion of the photoresist is removed by ultraviolet light irradiation using a template method, then a portion of the metal is removed by acid etching, the etching depth is controlled to obtain the groove, and then the photoresist is stripped.
When the scanning electron microscope sample stage is used for measuring a powder sample, the powder and a solvent are mixed to form a mixed solution, a small amount of the mixed solution is dropped into a tank, and the solvent is volatilized to obtain the powder sample for measurement. After measurement, the metal layer can be repeatedly used after being cleaned, and the sample table body can be directly repeatedly used.
Example 3:
in this embodiment, the structure of the sample stage of the scanning electron microscope is basically the same as that in embodiment 1, except that the metal layer is integrated with the sample stage body.
In this embodiment, the preparation method of the sample stage is as follows:
(1) preparing a metal layer above the sample table body through magnetic control detection;
(2) and manufacturing the holes on the surface of the metal layer by using a mechanical method.
When the scanning electron microscope sample stage is used for measuring a powder sample, powder and a solvent are mixed to form a mixed solution, a small amount of the mixed solution is dripped into a groove structure formed by a hole and the upper surface of the sample stage body, and the powder sample is obtained after the solvent is volatilized to measure. After measurement, the sample table is cleaned and can be reused.
Example 4:
in this embodiment, the structure of the sample stage of the scanning electron microscope is basically the same as that in embodiment 2, except that the metal layer is integrated with the sample stage body.
In this embodiment, the preparation method of the sample stage is as follows:
(1) preparing a metal layer above the sample table body through magnetic control detection;
(2) and manufacturing the groove on the surface of the metal layer by using a mechanical method.
When the scanning electron microscope sample stage is used for measuring a powder sample, powder and a solvent are mixed to form a mixed solution, a small amount of the mixed solution is dripped into a groove structure formed by a hole and the upper surface of the sample stage body, and the powder sample is obtained after the solvent is volatilized to measure. After measurement, the sample table is cleaned and can be reused.
The above-mentioned embodiment is to the technical solution of the present invention has been described in detail, it should be understood that the above is only the specific embodiment of the present invention, not used for limiting the present invention, any modification, supplement or similar mode replacement etc. that the principle scope of the present invention is in should be included in the protection scope of the present invention.

Claims (10)

1. The utility model provides a scanning electron microscope sample platform, includes sample platform body (1), characterized by: the sample table further comprises a metal layer (2) arranged above the sample table body (1), and the lower surface of the metal layer (2) is in contact with the upper surface of the sample table body (1);
the metal layer (2) is provided with a plurality of holes (3), the holes (3) penetrate through the thickness of the metal layer (2) and form a groove structure with one open end with the upper surface of the sample table body (1), the open end of the groove structure is the upper surface of the metal layer (2), and the bottom of the groove structure is the upper surface of the sample table body (1);
or a plurality of grooves (4) with one open ends are arranged from the upper surface to the lower surface of the metal layer (2), the open ends of the grooves are the upper surface of the metal layer (2), and the depth of each groove (4) is smaller than the thickness of the metal layer (2).
2. The scanning electron microscope sample stage according to claim 1, characterized in that: the metal layer is integrated with the sample stage body or can be separated from the sample stage body.
3. The scanning electron microscope sample stage according to claim 1, characterized in that: the sample table body (1) is of a cylinder structure.
4. The scanning electron microscope sample stage according to claim 3, wherein: the cross section of the sample table body (1) is rectangular, circular or elliptical.
5. The scanning electron microscope sample stage according to claim 1, characterized in that: the holes (3) are regularly arranged.
6. The scanning electron microscope sample stage according to claim 1, characterized in that: the holes (3) have the same shape and the same size.
7. The scanning electron microscope sample stage according to claim 1, characterized in that: the grooves (4) are regularly arranged.
8. The scanning electron microscope sample stage according to claim 1, characterized in that: the grooves (4) have the same shape and the same size.
9. The scanning electron microscope sample stage according to claim 1, characterized in that: the diameter of the hole (3) is 3-5 mm.
10. The scanning electron microscope sample stage according to claim 1, characterized in that: the depth of the groove (4) is 2-3 mm.
CN202120941439.XU 2021-05-06 2021-05-06 Scanning electron microscope sample stage Active CN214477325U (en)

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Application Number Priority Date Filing Date Title
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Publications (1)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114429894A (en) * 2021-12-15 2022-05-03 南京师范大学 Fixing device and method for obtaining scanning imaging by utilizing E-T type secondary electron detector

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114429894A (en) * 2021-12-15 2022-05-03 南京师范大学 Fixing device and method for obtaining scanning imaging by utilizing E-T type secondary electron detector
CN114429894B (en) * 2021-12-15 2023-09-29 南京师范大学 Scanning imaging fixing device and method using E-T secondary electron detector

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