CN214458303U - Diamond coating pretreatment device and diamond coating system - Google Patents
Diamond coating pretreatment device and diamond coating system Download PDFInfo
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- CN214458303U CN214458303U CN202022533543.3U CN202022533543U CN214458303U CN 214458303 U CN214458303 U CN 214458303U CN 202022533543 U CN202022533543 U CN 202022533543U CN 214458303 U CN214458303 U CN 214458303U
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Abstract
The utility model relates to the technical field of diamond coatings, in particular to a diamond coating pretreatment device and a diamond coating system, wherein the diamond coating pretreatment device comprises an air supply component; the plasma emitter comprises an anode plate and a cathode plate, a pole plate cavity channel is formed between the cathode plate and the anode plate, an inlet of the pole plate cavity channel is communicated with an air outlet of the air feeding assembly, and the plasma emitter is used for ionizing the source gas of the ions in the pole plate cavity channel to form plasma; the first communicating channel is communicated with an outlet of the polar plate cavity channel; and the outlet of the diamond injection assembly is selectively communicated with or disconnected from the first communication channel through a first switch valve. The utility model discloses utilize plasma to wash and take off the cobalt to the substrate to through setting up diamond injection subassembly, plant the brilliant to the substrate, greatly saved the time of preliminary treatment to a great extent, and improved the cohesion that the diamond coating grows.
Description
Technical Field
The utility model relates to a diamond coating technical field especially relates to a diamond coating preprocessing device and diamond coating system.
Background
The CVD diamond nano coating film has the hardness close to that of natural diamond, and has excellent performances such as higher elastic modulus, extremely high thermal conductivity, good self-lubricating property, chemical stability and the like, so the CVD diamond nano coating film is widely applied to base materials such as tungsten steel cutters and the like. However, researches show that under the action of high temperature, cobalt in the base material can catalyze diamond, promote the graphitization of the diamond, inhibit the growth of the diamond, cause the surface or internal structure of the diamond coating film to be loose and porous, and further cause the base material and the coating film to have poor base binding force.
Therefore, when the diamond coating is carried out on the substrate, cobalt removal pretreatment and ultrasonic crystal implantation are required, the substrate is corroded by strong acid and strong base corrosive solution firstly, so that cobalt element is separated out and holes are generated, then the substrate after cobalt removal treatment is placed into ultrasonic dispersion diamond ethanol solution, trace diamond crystals are implanted into the holes on the surface of the substrate through ultrasonic vibration, crystal nuclei are formed through physical adsorption or chemical bonding, and directional growth of diamond is realized.
In the whole process of preparing the diamond coating, the operation of corroding the base material by strong acid and strong alkali is complex, irritant gas and waste water are easily generated, the operation time is as long as several hours, the cobalt removal proportion and the cobalt removal depth are difficult to accurately control, and meanwhile, other steps of cleaning and drying are introduced into the pretreatment, so that the loss of diamond-implanted crystals is also brought.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a diamond coating preprocessing device and diamond coating integrated form device has greatly saved the time of preliminary treatment, has improved the cohesion that diamond coating grows.
To achieve the purpose, the utility model adopts the following technical proposal:
a diamond coating pretreatment device, comprising:
an air supply assembly;
the plasma emitter comprises an anode plate and a cathode plate, wherein a pole plate cavity channel is formed between the cathode plate and the anode plate, an inlet of the pole plate cavity channel is communicated with an air outlet of the air supply assembly, the air supply assembly is used for supplying different ion source gases into the pole plate cavity channel, and the plasma emitter is used for ionizing the ion source gases in the pole plate cavity channel to form plasma so as to clean and decobalt a substrate;
the first communication channel is communicated with the outlet of the polar plate cavity channel;
a diamond injection assembly, an outlet of which is selectively communicated with or disconnected from the first communication channel through a first switch valve; the diamond spraying assembly is used for spraying diamond powder into the first communicating channel so that the diamond powder is sprayed to the surface of the base material at the outlet of the first communicating channel to plant the crystal on the base material.
Preferably, a cooling channel is arranged on one side of the anode plate, which is opposite to the cathode plate, and is used for circulating cooling liquid.
Preferably, the number of the anode plates is two, the cathode plate is arranged between the two anode plates, and the electrode plate cavity channel is formed between the cathode plate and each anode plate.
Preferably, the diamond coating pretreatment device further comprises a biasing assembly formed with a biasing passage, an inlet of the biasing passage communicating with an outlet of the first communication passage. Preferably, the diamond coating pretreatment device further comprises a mixing cylinder, the gas outlet of the gas supply assembly is communicated with the inlet of the polar plate cavity channel through the mixing cylinder, and the mixing cylinder is used for mixing different ion source gases.
Preferably, the recycling device further comprises a recycling assembly, wherein the recycling assembly comprises a recycling tank with an open top, the recycling tank is arranged at the outlet of the bias pressure channel, and the base material is located above the recycling assembly and is opposite to the open top of the recycling tank.
Preferably, the bottom outlet of the recovery tank is communicated with the inlet of the diamond spraying assembly through a second communication channel, and a second switch valve is arranged on the second communication channel.
A diamond coating system comprises a deposition assembly and a diamond coating pretreatment device; the deposition assembly comprises a vacuum chamber communicated with the outlet of the bias passage, and is arranged in the vacuum chamber:
a placing tray on which a base material is mounted;
and the heating plate is used for heating the base material.
Preferably, the position of the vacuum chamber communicating with the bias channel is sealed by a magnetic fluid.
Preferably, the heating plate is arranged above the base material, and the deposition assembly further comprises a lifting unit, wherein the lower end of the lifting unit is connected to the heating plate and used for driving the heating plate to lift.
The utility model has the advantages that: the utility model discloses utilize plasma to wash and take off the cobalt to the substrate to through setting up diamond injection subassembly, plant the brilliant to the substrate, compare with traditional preliminary treatment mode, greatly saved the time of preliminary treatment to a great extent, and improved the cohesion that the diamond coating grows.
Drawings
FIG. 1 is a diamond coating pretreatment device according to an embodiment of the present invention;
fig. 2 is a diamond coating system according to a second embodiment of the present invention.
In the figure:
1. an air supply assembly;
2. a plasma emitter; 21. an anode plate; 22. a cathode plate;
3. a first communicating passage; 4. a cooling channel; 5. a mixing cylinder;
6. a diamond jetting assembly; 61. a storage tank; 62. a first on-off valve;
7. biasing the substrate;
8. a substrate;
9. a recovery assembly; 91. a recovery tank; 92. a second communicating passage; 93. a second on-off valve;
10. a deposition assembly; 101. placing a tray; 102. heating the plate; 103. a lifting unit.
Detailed Description
The technical solution of the present invention will be further explained with reference to the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some but not all of the elements related to the present invention are shown in the drawings.
The first embodiment is as follows:
as shown in fig. 1, the present embodiment provides a diamond coating pretreatment device, which includes a gas supply assembly 1, a plasma emitter 2, a first communication channel 3 and a diamond injection assembly 6, wherein the plasma emitter 2 includes an anode plate 21 and a cathode plate 22, a plate channel is formed between the cathode plate 22 and the anode plate 21, an inlet of the plate channel is communicated with a gas outlet of the gas supply assembly 1, the gas supply assembly 1 is used for supplying different ion source gases into the plate channel, and the plasma emitter 2 is used for ionizing the ion source gases in the plate channel to form plasma, so as to clean and activate a substrate 8; the first communicating channel 3 is communicated with the outlet of the polar plate cavity channel; the outlet of the diamond ejection assembly 6 is selectively communicated with or disconnected from the first communication channel 3 through a first on-off valve 62; the diamond spraying assembly 6 is used for spraying diamond powder into the first communication channel 3 so that the diamond powder is sprayed to the surface of the substrate 8 to carry out crystal planting on the substrate 8. In this embodiment, the ion source gases fed into the electrode plate channel by the gas feeding assembly 1 are hydrogen and argon.
In the embodiment, different ion source gases are introduced into the plasma emitter 2 through the gas supply assembly 1, the ion source gases are ionized in the electrode plate cavity channel to form plasma, the substrate 8 is cleaned and decobalted by the plasma, the diamond injection assembly 6 is arranged, different functions are realized by opening and closing the first switch valve 62, and when the first switch valve 62 is closed, the first communication channel 3 only contains the plasma, so that the substrate 8 is cleaned and decobalted; when the first switch valve 62 is opened, the diamond powder is sucked into the first communication channel 3 through negative pressure generated by rapid gas flow, and the diamond powder is sprayed to the surface of the substrate 8 along with plasma, so that the crystal planting function is completed, and further pretreatment is realized. Compared with the traditional pretreatment mode, the pretreatment device for the diamond coating provided by the embodiment is used for pretreating the base material 8, so that the pretreatment time is greatly saved, and the bonding force for the growth of the diamond coating is improved.
Further, the diamond coating pretreatment device that this embodiment provided still includes and mixes cylinder 5, and hydrogen and helium get into through the gas outlet of sending gas subassembly 1 and mix cylinder 5, and then send into the polar plate chamber way, have improved the control accuracy and the homogeneity of gas proportion.
Further, two anode plates 21 are provided, a cathode plate 22 is provided between the two anode plates 21, and a plate channel is formed between the cathode plate 22 and each anode plate 21. In this embodiment, the gas mixing cylinder 5 is provided with two ion source gas outlets, and the ion source gas outlets correspond to the substrate channels one to one and are communicated with the corresponding substrate channels.
Further, the side of the anode plate 21 facing away from the cathode plate 22 is provided with cooling channels 4 for circulating a cooling liquid, which in this embodiment is water. The plasma flowing through the cavity of the plate is ionized under high voltage to generate dense Ar +, H + and electrons, and the heat generated by the electron part bombarding the anode plate 21 is carried away by cooling water.
Further, the diamond coating pretreatment device provided by the present embodiment further includes a biasing assembly formed with a biasing passage, an inlet of which communicates with an outlet of the first communication passage 3. When the first switch valve 62 is closed, the plasma passing through the bias channel obtains high energy, and the spraying direction, spraying range and spraying distance of the plasma are adjusted by adjusting the intensity of the magnetic field and the intensity of the electric field in the bias channel, so that the cleaning and the cobalt removal of different depths of different base materials 8 (drill points, milling cutters and the like) are realized; when the first switch valve 62 is opened, the plasma and the diamond powder passing through the bias passage both obtain high energy, and the crystal planting for different substrates 8 (drill pins, milling cutters, etc.) is realized by adjusting the spraying ranges of the plasma and the diamond powder.
Specifically, the bias assembly comprises a bias substrate 7 and a power supply, wherein the positive pole of the bias substrate 7 is connected with the cathode plate 22 in the plasma emitter 2, the negative pole of the bias substrate 7 is connected with the negative pole of the power supply, the plasma and the diamond powder obtain higher energy after passing through a bias channel, and are focused under the action of a magnetic field provided by the power supply to form a particle beam of the plasma and the diamond powder with high energy density. Specifically, the power supply may be a dc power supply, a pulse power supply, or a hybrid power supply, which is not limited herein. Preferably, a biasing assembly is used in conjunction with the magnetic scanning unit to control the strength of the magnetic field in the biasing channel.
Further, the diamond preprocessing device that this embodiment provided still includes recovery unit 9, and recovery unit 9 includes the open-topped recovery tank 91, and the export of bias voltage passageway is located to recovery tank 91, and substrate 8 is located the top of recovering unit 9 and just is just to the uncovered of recovery tank 91 top, can retrieve remaining diamond powder behind the plant crystal, avoids polluting and extravagant.
Further, the bottom outlet of the recovery tank 91 is communicated with the inlet of the diamond injection assembly through a second communication channel 92, and a second switch valve 93 is arranged on the second communication channel 92. Specifically, the diamond spraying assembly comprises a storage tank 61 and a diamond powder floating and dispersing power unit, wherein the diamond powder floating and dispersing power unit enables diamond powder in the storage tank 61 to float, so that the diamond powder is conveniently sucked into the first communication channel 3 through negative pressure generated by rapid gas flow, and the concentration of the diamond powder can be adjusted as required, so that the content of diamond crystals in the particle beam is controlled. Meanwhile, the second switch valve 93 on the second communication channel 92 is opened only when the diamond powder in the recovery tank 91 needs to be sent into the storage tank 61, so that the diamond spraying assembly is prevented from being communicated with the external atmospheric pressure through the recovery tank 91 when working, and the normal work of the diamond spraying assembly is influenced. Preferably, the purity of the diamond powder is more than 99.95%, and the particle size is 2-10 μm.
Example two:
the present embodiment provides a diamond coating system, which includes a diamond coating pretreatment device, and it should be noted that the diamond coating pretreatment device in the present embodiment is not provided with a recovery unit 9, and other structures are the same as those of the diamond coating pretreatment device in the first embodiment, and will not be described herein.
The diamond coating system further comprises a deposition assembly 10, wherein the deposition assembly 10 comprises a vacuum cavity communicated with the outlet of the bias channel, a placing disc 101 and a heating disc 102 which are arranged in the vacuum cavity, and the base material 8 is arranged on the placing disc 101; heating disk 102 is placed above substrate 8 and is used to heat substrate 8 and to increase the energy for cracking the reaction gases.
The diamond coating system that this embodiment provided can realize the washing of diamond coating, take off cobalt, plant the brilliant and sedimentary integrated synthesis, shortens diamond coating's time, and automatic operation can reduce the manpower, promotes production efficiency and productivity.
Further, the placing disc 101 in the embodiment can automatically rotate, so that the uniformity of the implanted crystal is ensured. Specifically, the diamond coating system further comprises a driving motor, wherein the driving motor is located below the placing disc 101 and is used for driving the placing disc 101 to rotate.
In this embodiment, heating plate 102 is an array-shaped hot wire arrangement plate, and in other embodiments, other forms of heating plate 102 may be used.
Furthermore, the communication position of the vacuum cavity and the bias channel is sealed through magnetic fluid, so that the vacuum cavity is always in a vacuum state.
Further, the deposition assembly 10 further includes a lifting unit 103, and a lower end of the lifting unit 103 is connected to the heating plate 102 for driving the heating plate 102 to lift. Specifically, the lifting unit 103 comprises an automatic lifting rod and a fixing frame, the automatic lifting rod can move up and down along the vertical direction of the fixing frame, and compared with a traditional lifting table, the auxiliary fittings of the fixing frame are simpler, and the automatic lifting rod is provided with scale marks, so that the height of the heating plate 102 is automatically controlled, the distance between the base material 8 and the heating plate 102 is accurately controlled, and a high-quality and high-performance diamond coating is obtained.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection or a removable connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In the present disclosure, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise direct contact between the first and second features, or may comprise contact between the first and second features not directly. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
It is obvious that the above embodiments of the present invention are only examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. A diamond coating pretreatment device, comprising:
an air supply assembly (1);
the plasma emitter (2) comprises an anode plate (21) and a cathode plate (22), a plate cavity channel is formed between the cathode plate (22) and the anode plate (21), an inlet of the plate cavity channel is communicated with an air outlet of the air supply assembly (1), the air supply assembly (1) is used for supplying different ion source gases into the plate cavity channel, and the plasma emitter (2) is used for ionizing the ion source gases in the plate cavity channel to form plasma so as to clean and decobalt the substrate (8);
a first communicating channel (3) which is communicated with the outlet of the polar plate cavity channel;
a diamond ejection assembly (6), wherein an outlet of the diamond ejection assembly (6) is selectively communicated with or disconnected from the first communication channel (3) through a first switch valve (62); the diamond spraying assembly (6) is used for spraying diamond powder into the first communication channel (3) so that the diamond powder is sprayed to the surface of the base material (8) at the outlet of the first communication channel (3) to plant crystals on the base material (8).
2. Diamond coating pretreatment device according to claim 1, characterized in that the side of the anode plate (21) facing away from the cathode plate (22) is provided with cooling channels (4) for circulating a cooling liquid.
3. The diamond coating pretreatment device according to claim 1, wherein two anode plates (21) are provided, the cathode plate (22) is provided between the two anode plates (21), and the plate channel is formed between the cathode plate (22) and each of the anode plates (21).
4. The diamond coating pretreatment device according to claim 1, further comprising a mixing cylinder (5), wherein the gas outlet of the gas supply assembly (1) is communicated with the inlet of the electrode plate cavity channel through the mixing cylinder (5), and the mixing cylinder (5) is used for mixing different ion source gases.
5. The diamond coating pretreatment device according to any one of claims 1 to 4, further comprising a biasing assembly formed with a biasing channel, an inlet of the biasing channel communicating with an outlet of the first communication channel (3).
6. The diamond coating pretreatment device of claim 5, further comprising a recovery assembly (9), said recovery assembly comprising a recovery tank (91) with an open top, said recovery tank (91) being disposed at an outlet of said biasing channel, said substrate (8) being positioned above said recovery assembly (9) and facing said open top of said recovery tank (91).
7. The diamond coating pretreatment device according to claim 6, wherein a bottom outlet of the recovery tank (91) is communicated with an inlet of the diamond spraying assembly through a second communication channel (92), and a second on-off valve (93) is provided on the second communication channel (92).
8. A diamond coating system comprising a deposition assembly (10) and a diamond coating pre-treatment apparatus according to claim 5; the deposition assembly (10) comprises a vacuum chamber in communication with the outlet of the bias channel, and disposed within the vacuum chamber:
a placement tray (101) on which the base material (8) is mounted;
a heating plate (102) for heating the substrate (8).
9. The diamond coating system according to claim 8, wherein the vacuum chamber is sealed from communication with the biasing channel by a magnetic fluid.
10. The diamond coating system according to claim 8, wherein said heating plate (102) is disposed above said substrate (8), and said deposition assembly (10) further comprises a lifting unit (103), a lower end of said lifting unit (103) being connected to said heating plate (102) for driving said heating plate (102) to lift and lower.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022533543.3U CN214458303U (en) | 2020-11-05 | 2020-11-05 | Diamond coating pretreatment device and diamond coating system |
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| CN202022533543.3U CN214458303U (en) | 2020-11-05 | 2020-11-05 | Diamond coating pretreatment device and diamond coating system |
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| CN214458303U true CN214458303U (en) | 2021-10-22 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114453345A (en) * | 2021-12-30 | 2022-05-10 | 广东鼎泰高科技术股份有限公司 | Plasma cleaning system |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114453345A (en) * | 2021-12-30 | 2022-05-10 | 广东鼎泰高科技术股份有限公司 | Plasma cleaning system |
| CN114453345B (en) * | 2021-12-30 | 2023-04-11 | 广东鼎泰高科技术股份有限公司 | Plasma cleaning system |
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