CN214417947U - Device for femtosecond laser irradiation glass color patterning - Google Patents
Device for femtosecond laser irradiation glass color patterning Download PDFInfo
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- CN214417947U CN214417947U CN202022792180.5U CN202022792180U CN214417947U CN 214417947 U CN214417947 U CN 214417947U CN 202022792180 U CN202022792180 U CN 202022792180U CN 214417947 U CN214417947 U CN 214417947U
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- 239000011521 glass Substances 0.000 title claims abstract description 31
- 238000000059 patterning Methods 0.000 title claims abstract description 12
- 238000006073 displacement reaction Methods 0.000 claims abstract description 30
- 230000003287 optical effect Effects 0.000 claims description 43
- 238000000034 method Methods 0.000 description 4
- 238000004040 coloring Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000087 laser glass Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000009022 nonlinear effect Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
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Abstract
The utility model discloses a device for femtosecond laser irradiation glass color patterning. The laser comprises a femtosecond laser, a half-wave plate, an attenuation plate, a beam expander, an X-axis galvanometer, a Y-axis galvanometer, an objective lens, a three-axis precise displacement table and glass, wherein the femtosecond laser emits laser which sequentially passes through the half-wave plate, the attenuation plate, the beam expander, the X-axis galvanometer, the Y-axis galvanometer, the objective lens, the glass and the three-axis precise displacement table, the three-axis precise displacement table is positioned below the objective lens, and the glass is placed on the three-axis precise displacement table. The utility model discloses it is easy and simple to handle, extensive applicability is general, can carry out the carving of grating structure in all kinds of clear glass, can be used to the multicolour pattern and the anti-fake processing to glassware, and the parallel grating interval and the colour that the sculpture formed are controllable, can form grating structure at its inside under the prerequisite that does not influence glassware surface morphology to show the colored three-dimensional pattern of charming under the sunlight condition.
Description
Technical Field
The utility model belongs to a device of femto second laser beam machining application, concretely relates to device of femto second laser irradiation glass multicolour patterning.
Background
The laser glass inner carving artwork has the advantages of exquisite and vivid image, obvious contrast, strong stereoscopic impression, durability, wear resistance and high technological value. The colored laser three-dimensional coloring inner carving formed by utilizing the grating diffraction enables the laser inner carving glass handicraft to take a new step. Because the coloring structure has space selectivity, three-dimensional color engraving of a three-dimensional figure can be performed. Based on the dispersion effect of grating diffraction and the nonlinear effect in the femtosecond laser process, the method can write grating structures in various transparent glasses to obtain colorful three-dimensional patterns.
SUMMERY OF THE UTILITY MODEL
To this restriction of the space three-dimensional pattern that the colored interior carving of glass is difficult to form multiple colour simultaneously, utilize the dispersion effect of grating diffraction, the utility model provides a device of femto second laser irradiation glass colored patterning.
The technical scheme of the utility model as follows:
the utility model discloses a femto second laser instrument, half wave plate, attenuator, beam expander, X axle galvanometer, Y axle galvanometer, objective, the accurate displacement platform of triaxial and glass, femto second laser instrument sends laser, and laser loops through half wave plate, attenuator, beam expander and incides the X axle galvanometer after inciting, and on permeating objective inciting into the accurate displacement bench face's of triaxial glass after X axle galvanometer, Y axle galvanometer reflection in proper order again, the accurate displacement platform of triaxial is located the below of objective.
The half-wave plate, the attenuation plate and the beam expander are arranged on a first optical axis, a second optical axis is perpendicular to the first optical axis, the X-axis galvanometer is arranged at the intersection of the second optical axis and the first optical axis, a third optical axis is perpendicular to the second optical axis, the Y-axis galvanometer is arranged at the intersection of the second optical axis and the third optical axis, and the objective lens is arranged on the third optical axis.
The first optical axis is along the Y-axis direction that is on a parallel with the accurate displacement platform of triaxial, the second optical axis is along the X-axis direction that is on a parallel with the accurate displacement platform of triaxial, the third optical axis is along the Z axle negative direction that is on a parallel with the accurate displacement platform of triaxial.
The X-axis galvanometer, the Y-axis galvanometer and the three-axis precise displacement table are all connected to and controlled by an external control terminal to work.
The center wavelength of the femtosecond laser is 1030nm, and the power is 6 w.
The repetition frequency of the femtosecond laser is 1-200kHz, and the single pulse energy is 1-6 muJ.
The pulse width range of the femtosecond laser is 226fs-6 ps.
The utility model has the advantages that:
the utility model discloses it is easy and simple to handle, extensive applicability is general, can carry out the carving of grating structure in all kinds of clear glass, can be used to the multicolour pattern and the anti-fake processing to glassware, and the parallel grating interval and the colour that the sculpture formed are controllable, can form grating structure at its inside under the prerequisite that does not influence glassware surface morphology to show the colored three-dimensional pattern of charming under the sunlight condition.
Drawings
Fig. 1 is a diagram of a femtosecond laser irradiation glass color patterning device.
In the figure, a femtosecond laser 1, a half-wave plate 2, an attenuation plate 3, a beam expander 4, an X-axis galvanometer 5, a Y-axis galvanometer 6, an objective lens 7, a three-axis precise displacement table 8, glass 9, a first optical axis 10, a second optical axis 11 and a third optical axis 12 are adopted.
Detailed Description
As shown in fig. 1, the utility model discloses a femto second laser 1, half wave plate 2, attenuator 3, beam expander 4, the X axle shakes mirror 5, the Y axle shakes mirror 6, objective 7, the accurate displacement platform of triaxial 8 and glass 9, femto second laser 1 sends laser, laser loops through half wave plate 2, attenuator 3, incide X axle behind the beam expander 4 and shakes mirror 5, after shaking mirror 5 through the X axle again in proper order, the Y axle shakes and sees through objective 7 after the mirror 6 reflection and incides on the accurate displacement platform of triaxial 8 above glass 9, the accurate displacement platform of triaxial 8 is located objective 7's below. The X-axis galvanometer 5, the Y-axis galvanometer 6 and the three-axis precise displacement table 8 which are implemented specifically are all connected to and controlled by an external control terminal to work.
The three-axis precise displacement table comprises a first optical axis 10, a half-wave plate 2, an attenuation plate 3 and a beam expander 4, wherein the first optical axis 10 is parallel to the Y-axis direction of a three-axis precise displacement table 8, the half-wave plate 2, the attenuation plate 3 and the beam expander 4 are arranged on the first optical axis 10, a second optical axis 11 is parallel to the X-axis direction of the three-axis precise displacement table 8, the second optical axis 11 is perpendicular to the first optical axis 10, a third optical axis 12 is parallel to the Z-axis negative direction of the three-axis precise displacement table 8, an X-axis galvanometer 5 is arranged at the intersection of the second optical axis 11 and the first optical axis 10, the third optical axis 12 is perpendicular to the second optical axis 11, a Y-axis galvanometer 6 is arranged at the intersection of the second optical axis 11 and the third optical axis 12, and an objective lens 7 is arranged on the third optical axis 12.
The center wavelength of the femtosecond laser 1 is 1030nm, the power is 6w, the repetition frequency of the femtosecond laser 1 is 1-200kHz, the single-pulse energy is 1-6 muJ, and the pulse width adjustable range is 226fs-6 ps. The half-wave plate 2 is used for adjusting the polarization direction of the pulse laser, the power of the laser in a light path is controlled through the attenuation plate 3, and the diameter of a laser spot is adjusted through the beam expander 4.
The process of femtosecond laser irradiation glass color patterning based on a grating structure comprises the following specific steps:
1) and (3) turning on a laser lamp in the femtosecond laser 1, and adjusting the positions of the half-wave plate 2, the attenuation plate 3, the beam expander 4 and the objective lens 7 to enable laser emitted by the laser lamp to sequentially pass through the centers of the half-wave plate 2, the attenuation plate 3, the beam expander 4 and the objective lens 7.
2) After adjusting the pulse width and repetition frequency of the femtosecond laser 1, the attenuation sheet 3 is adjusted to change the pulse energy of the laser light emitted in the laser lamp.
3) The height of the three-axis precision displacement table 8 in the Z-axis direction is observed and adjusted through a coaxial CCD camera, so that laser passing through the objective lens 7 is focused inside the glass 9.
4) And controlling an X-axis galvanometer 5, a Y-axis galvanometer 6 and a three-axis precise displacement table 8 according to a path file of a design pattern to move the focused laser in the glass 9 according to a set path at a set displacement speed, and writing in the glass 9 to form a grating structure.
In specific implementation, the grating structure is written in multiple layers by laser, and the writing process of the grating structure is regulated and controlled by the control terminal on the X-axis galvanometer 5, the Y-axis galvanometer 6 and the three-axis precise displacement table 8 respectively or simultaneously. The inside of the pattern is filled with parallel lines, and the space between adjacent parallel lines is the line space between adjacent writing gratings.
The invention is capable of modification in various ways that will be obvious to those skilled in the art and may be embodied in other forms, structures, arrangements, proportions, and with other components, materials, and parts.
Claims (6)
1. The utility model provides a device of femto second laser irradiation glass multicolour pattern based on grating structure which characterized in that: the laser comprises a femtosecond laser (1), a half-wave plate (2), an attenuation plate (3), a beam expander (4), an X-axis galvanometer (5), a Y-axis galvanometer (6), an objective lens (7), a three-axis precise displacement platform (8) and glass (9), wherein the femtosecond laser (1) emits laser, the laser sequentially passes through the half-wave plate (2), the attenuation plate (3) and the beam expander (4) and then is incident to the X-axis galvanometer (5), then is reflected by the X-axis galvanometer (5) and the Y-axis galvanometer (6) and then is incident to the glass (9) on the three-axis precise displacement platform (8) through the objective lens (7), and the three-axis precise displacement platform (8) is located below the objective lens (7).
2. The device for femtosecond laser irradiation glass color patterning based on a grating structure as claimed in claim 1, wherein: the half-wave plate (2), the attenuator (3) and the beam expander (4) are arranged on a first optical axis (10), a second optical axis (11) is perpendicular to the first optical axis (10), the X-axis galvanometer (5) is arranged at the intersection of the second optical axis (11) and the first optical axis (10), a third optical axis (12) is perpendicular to the second optical axis (11), the Y-axis galvanometer (6) is arranged at the intersection of the second optical axis (11) and the third optical axis (12), and the objective lens (7) is arranged on the third optical axis (12).
3. The device for femtosecond laser irradiation glass color patterning based on a grating structure as claimed in claim 2, wherein: the first optical axis (10) is along the Y-axis direction that is on a parallel with the accurate displacement platform of triaxial (8), the second optical axis (11) is along the X-axis direction that is on a parallel with the accurate displacement platform of triaxial (8), third optical axis (12) is along the Z axle negative direction that is on a parallel with the accurate displacement platform of triaxial (8).
4. The device for femtosecond laser irradiation glass color patterning based on a grating structure as claimed in claim 1, wherein: the center wavelength of the femtosecond laser (1) is 1030nm, and the power is 6 w.
5. The device for femtosecond laser irradiation glass color patterning based on a grating structure as claimed in claim 1, wherein: the repetition frequency of the femtosecond laser (1) is 1-200kHz, and the single pulse energy is 1-6 muJ.
6. The device for femtosecond laser irradiation glass color patterning based on a grating structure as claimed in claim 1, wherein: the pulse width range of the femtosecond laser (1) is 226fs-6 ps.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022792180.5U CN214417947U (en) | 2020-11-27 | 2020-11-27 | Device for femtosecond laser irradiation glass color patterning |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022792180.5U CN214417947U (en) | 2020-11-27 | 2020-11-27 | Device for femtosecond laser irradiation glass color patterning |
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| CN214417947U true CN214417947U (en) | 2021-10-19 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114105466A (en) * | 2021-12-22 | 2022-03-01 | 华中科技大学 | Large-width laser hole cutting method for glass |
| CN114789298A (en) * | 2022-04-15 | 2022-07-26 | 武汉华日精密激光股份有限公司 | Method and device for color inner carving inside glass |
-
2020
- 2020-11-27 CN CN202022792180.5U patent/CN214417947U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114105466A (en) * | 2021-12-22 | 2022-03-01 | 华中科技大学 | Large-width laser hole cutting method for glass |
| CN114789298A (en) * | 2022-04-15 | 2022-07-26 | 武汉华日精密激光股份有限公司 | Method and device for color inner carving inside glass |
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