CN214411138U

CN214411138U - Wafer cleaning device

Info

Publication number: CN214411138U
Application number: CN202120631833.3U
Authority: CN
Inventors: 陈康; 王宜; 薛灵生; 陈凤
Original assignee: Wuxi Radar Semiconductor Equipment Co ltd
Current assignee: Wuxi Radar Semiconductor Equipment Co ltd
Priority date: 2021-03-29
Filing date: 2021-03-29
Publication date: 2021-10-15
Anticipated expiration: 2031-03-29

Abstract

The utility model relates to a wafer belt cleaning device, including the box, wherein: the inside of box is separated into to be located the drying unit on box upper portion and the washing unit that is located the box lower part with the baffle, the top surface fixed mounting of box has the cylinder, the top difference fixedly connected with roof of piston rod, the bottom surface difference fixed mounting of roof has the connecting rod, the top surface of box is passed to the bottom of supporting rod and extends to in the drying chamber, the bottom surface of drying chamber passes the baffle and is connected with the purge chamber, install in the purge chamber and put the thing basket, the bottom of box is equipped with the vibration dish, the cleaning brush is installed to the top surface of vibration dish. The utility model discloses utilize the purge chamber to go deep into the washing to the wafer, wash through the side of wafer in the cleaning brush opposition thing basket on the vibration dish, improve the cleaning efficiency of wafer, will put the thing basket through the supporting rod and carry and draw to the drying chamber, utilize the gaseous wafer of drying after filtering, can improve cleaning efficiency, and then improve the production quality of follow-up semiconductor product.

Description

Wafer cleaning device

Technical Field

The utility model relates to a wafer cleaning technology field especially relates to a wafer cleaning device.

Background

The wafer refers to a silicon chip with a circular shape in the production of a silicon semiconductor integrated circuit, and is generally a monocrystalline silicon wafer formed by drawing and refining common silica sand, dissolving, purifying, distilling and the like to prepare a monocrystalline silicon rod, and then polishing and slicing the monocrystalline silicon rod. In the prior art, the wafer needs to be fixed at a set position in the cleaning process, so that a cleaning dead angle is easy to appear in the cleaning process, organic matters and impurities adsorbed on the surface of the wafer are not easy to be cleaned, residues are easy to appear, the cleaning efficiency is not high, other devices are needed to be utilized for drying treatment after cleaning, and the quality of a semiconductor product produced subsequently is easy to be influenced.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a wafer belt cleaning device utilizes the bottom surface to go deep into the washing for convex cleaning chamber to wafer surface adsorption's organic matter, wash the side of wafer in the cleaning brush opposition thing basket on the vibration dish, can wash the side of wafer, the cleaning efficiency of wafer has been improved, will put the thing basket through the supporting rod and carry and draw to the drying chamber, utilize the gaseous wafer of drying after filtering, can improve cleaning efficiency, and then improve the production quality of follow-up semiconductor product, the problem of proposing among the above-mentioned background art has been solved.

The utility model discloses a realize through following technical scheme:

a wafer cleaning device structurally comprises a box body, wherein: the drying device comprises a box body, a supporting rod is fixedly arranged on the top surface inside the box body, the bottom end of the supporting rod is fixedly connected with a partition plate arranged inside the box body, the partition plate divides the interior of the box body into a drying unit positioned on the upper portion of the box body and a cleaning unit positioned on the lower portion of the box body, the drying unit and the cleaning unit are mutually independent, a drying chamber is arranged in the drying unit, a cleaning chamber is arranged in the cleaning unit, two cylinders are fixedly arranged on the top surface of the box body, each cylinder comprises a piston rod, the top end of each piston rod is respectively and fixedly connected with a top plate, the bottom surface of each top plate is respectively and fixedly provided with a connecting rod, the bottom end of each connecting rod penetrates through the top surface of the box body and extends into the drying unit, the bottom end of each connecting rod is fixedly connected with the top surface of the corresponding drying chamber, and the inner wall of the drying chamber is connected with an air outlet end of an air outlet pipe, the air inlet end that goes out the tuber pipe is connected with fixed mounting and is in the fan at box top, the bottom of supporting rod is passed the top surface of box extends to in the drying chamber, the bottom surface of drying chamber is passed the baffle is connected with the purge chamber, there is the fixation clamp in the both sides difference fixed mounting of the surface of drying chamber, the fixation clamp with the outer wall fixed connection of purge chamber, install in the purge chamber and put the thing basket, the bottom of box is equipped with the vibration dish, the cleaning brush is installed to the top surface of vibration dish, the outer wall cover of bottom half is equipped with the cushion collar, install the bottom of box and locate the outer gasket of cushion collar, vibration dish electric connection has fixed mounting to be in the motor of gasket bottom surface.

Preferably, the filter is installed at the air outlet end of the air outlet pipe, and a plurality of air outlet holes are uniformly distributed on the filter.

Preferably, the clamping rod is a telescopic rod body.

Preferably, the connection part of the clamping rod and the box body and the connection part of the clamping rod and the drying chamber are provided with connecting pieces for limiting the movement direction of the clamping rod.

Preferably, the bottom of the cleaning chamber and the bottom of the vibration plate are arc-shaped.

Preferably, the storage basket is cylindrical.

Preferably, the cleaning brush is a soft brush.

Compared with the prior art, the beneficial effects of the utility model are that:

1. the utility model discloses a bottom surface is convex purge chamber and columniform and puts the thing basket and washs the wafer, can effectively wash away the adsorbed organic matter in wafer surface, is applicable to the batch washing of wafer.

2. The utility model discloses an add cleaning brush isotructure on the vibration dish, can utilize the side of pappus brush opposition thing basket in the wafer to wash, can avoid the wafer side not by clean, improve the cleaning efficiency of wafer.

3. The utility model discloses an utilize the supporting rod will put the thing basket and carry and draw to the drying chamber, through the gaseous wafer of drying after filtering, improved the cleaning efficiency, improve the production quality of follow-up semiconductor product.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without creative efforts.

FIG. 1 is a schematic structural view of the present invention;

fig. 2 is a schematic view of the local enlarged structure of the cleaning brush of the present invention.

In the drawings, the components represented by the respective reference numerals are listed below:

1-a box body; 2-a separator; 3-a drying unit; 4-a cleaning unit; 5-a support rod; 6-cylinder; 7-a piston rod; 8-a top plate; 9-a connecting rod; 10-a drying chamber; 11-an air outlet pipe; 12-a fan; 13-a clamping rod; 14-a connector; 15-a cleaning chamber; 16-a fixing clip; 17-a storage basket; 18-a vibrating pan; 19-cleaning brushes; 20-a motor; 21-a buffer sleeve; 22-a gasket; 23-support column.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts belong to the protection scope of the present invention.

The present invention will be further described with reference to the following examples.

Example 1:

as shown in fig. 1, the present embodiment provides a wafer cleaning apparatus, which includes a case 1, wherein: the bottom surface of the box body 1 is fixedly provided with a support column 23, the side surface of the box body 1 is provided with a liquid inlet for introducing cleaning liquid, the liquid inlet is positioned below the drying chamber 10 and can prevent the cleaning liquid from polluting the drying chamber 10, the bottom surface of the box body 1 is provided with a liquid outlet for discharging the cleaning liquid, the top surface inside the box body 1 is fixedly provided with a support rod 5 for fixing the partition plate 2, the bottom end of the support rod 5 is fixedly connected with the partition plate 2 installed inside the box body 1, the partition plate 2 divides the inside of the box body 1 into a drying unit 3 positioned at the upper part of the box body 1 and a cleaning unit 4 positioned at the lower part of the box body 1, the drying unit 3 and the cleaning unit 4 are mutually independent, the drying chamber 10 for drying and cleaning wafers after cleaning is installed in the drying unit 3, the cleaning chamber 15 is installed in the cleaning unit 4, the top surface of the box body 1 is fixedly provided with two air cylinders 6 for changing the height of the drying chamber 10, the cylinder 6 all includes piston rod 7, the top of piston rod 7 is fixedly connected with roof 8 respectively, the bottom surface of roof 8 fixed mounting respectively has the connecting rod 9 that is used for connecting drying chamber 10, the bottom of connecting rod 9 all passes the top surface of box 1 and extends to in the drying unit 3, the bottom of connecting rod 9 and the equal fixed connection of top surface of drying chamber 10, the inner wall connection of drying chamber 10 has the air-out end of tuber pipe 11, the filter that is used for filtering dry gas is installed to the air-out end of tuber pipe 11, evenly laid a plurality of exhaust vents on the filter, can evenly air-out, drying efficiency is improved, the air inlet end of tuber pipe 11 is connected with fan 12 of fixed mounting at box 1 top, the tuber pipe 11 is used for letting in dry gaseous stoving wafer.

The bottom of a clamping rod 13 for clamping a storage basket 17 penetrates through the top surface of a box body 1 and extends into a drying chamber 10, the bottom surface of the drying chamber 10 penetrates through a partition plate 2 and is connected with a cleaning chamber 15, the outer wall surface of the drying chamber 10 is in sliding connection with the partition plate 2, two sides of the outer surface of the drying chamber 10 are respectively and fixedly provided with a fixing clamp 16, the fixing clamps 16 are fixedly connected with the outer wall of the cleaning chamber 15, the fixing clamps 16 are used for fixing the cleaning chamber 15 and the drying chamber 10, the storage basket 17 for storing wafers is arranged in the cleaning chamber 15, the bottom of the box body 1 is provided with a vibrating disc 18, the vibrating disc 18 is used for improving the cleaning efficiency, the top surface of the vibrating disc 18 is provided with a cleaning brush 19, the cleaning brush 19 is used for cleaning the side surface of the wafers, the outer wall at the bottom of the box body 1 is sleeved with a buffer sleeve 21 for reducing the vibration amplitude generated by cleaning, the bottom of the box body 1 is provided with a gasket 22 arranged outside the buffer sleeve 21, the gasket 22 is used for protecting the device, the vibrating disk 18 is electrically connected with the motor 20 fixedly installed on the bottom surface of the gasket 22, and the motor 20 is used for providing driving force for the vibrating disk 18.

Example 2:

as shown in fig. 1, the present embodiment provides a wafer cleaning apparatus, which includes a case 1, wherein: the bottom surface of the box body 1 is fixedly provided with a support column 23, the side surface of the box body 1 is provided with a liquid inlet for introducing cleaning liquid, the liquid inlet is positioned below the drying chamber 10 and can prevent the cleaning liquid from polluting the drying chamber 10, the bottom surface of the box body 1 is provided with a liquid outlet for discharging the cleaning liquid, the top surface inside the box body 1 is fixedly provided with a support rod 5 for fixing the partition plate 2, the bottom end of the support rod 5 is fixedly connected with the partition plate 2 installed inside the box body 1, the partition plate 2 divides the inside of the box body 1 into a drying unit 3 positioned at the upper part of the box body 1 and a cleaning unit 4 positioned at the lower part of the box body 1, the drying unit 3 and the cleaning unit 4 are mutually independent, the drying chamber 10 for drying and cleaning wafers after cleaning is installed in the drying unit 3, the cleaning chamber 15 is installed in the cleaning unit 4, the top surface of the box body 1 is fixedly provided with two air cylinders 6 for changing the height of the drying chamber 10, the cylinder 6 all includes piston rod 7, the top of piston rod 7 is fixedly connected with roof 8 respectively, the bottom surface of roof 8 is fixed mounting respectively has the connecting rod 9 that is used for connecting drying chamber 10, the bottom of connecting rod 9 all passes the top surface of box 1 and extends to in the drying unit 3, the bottom of connecting rod 9 and the equal fixed connection of top surface of drying chamber 10, the inner wall connection of drying chamber 10 has the air-out end of tuber pipe 11, the air inlet end of tuber pipe 11 is connected with fan 12 of fixed mounting at box 1 top, the tuber pipe 11 is used for letting in dry gaseous stoving wafer.

The clamping rod 13 is a telescopic rod body, the bottom of the clamping rod 13 for clamping the article basket 17 penetrates through the top surface of the box body 1 and extends into the drying chamber 10, the connecting part of the clamping rod 13 and the box body 1 and the connecting part of the clamping rod 13 and the drying chamber 10 are both provided with a connecting piece 14 for limiting the movement direction of the clamping rod 13, the bottom surface of the drying chamber 10 penetrates through the partition plate 2 and is connected with the cleaning chamber 15, the outer wall surface of the drying chamber 10 is in sliding connection with the partition plate 2, two sides of the outer surface of the drying chamber 10 are respectively and fixedly provided with a fixing clamp 16, the fixing clamp 16 is fixedly connected with the outer wall of the cleaning chamber 15, the fixing clamp 16 is used for fixing the cleaning chamber 15 and the drying chamber 10, the article basket 17 for placing wafers is arranged in the cleaning chamber 15, the bottom of the box body 1 is provided with a vibrating disc 18, the vibrating disc 18 is used for improving the cleaning efficiency, the top surface of the vibrating disc 18 is provided with a cleaning brush 19, and the cleaning brush 19 is used for cleaning the side surface of the wafers, the outer wall cover of box 1 bottom is equipped with and is used for reducing the cushion collar 21 because of the vibrations range of wasing the production, and the gasket 22 outside cushion collar 21 is installed to the bottom of box 1, and gasket 22 is used for protection device, and vibration dish 18 electric connection has motor 20 of fixed mounting in the gasket 22 bottom surface, and motor 20 is used for providing drive power for vibration dish 18.

Example 3:

as shown in fig. 1-2, the present embodiment provides a wafer cleaning apparatus, which includes a case 1, wherein: the bottom surface of the box body 1 is fixedly provided with a support column 23, the side surface of the box body 1 is provided with a liquid inlet for introducing cleaning liquid, the liquid inlet is positioned below the drying chamber 10 and can prevent the cleaning liquid from polluting the drying chamber 10, the bottom surface of the box body 1 is provided with a liquid outlet for discharging the cleaning liquid, the top surface inside the box body 1 is fixedly provided with a support rod 5 for fixing the partition plate 2, the bottom end of the support rod 5 is fixedly connected with the partition plate 2 installed inside the box body 1, the partition plate 2 divides the inside of the box body 1 into a drying unit 3 positioned at the upper part of the box body 1 and a cleaning unit 4 positioned at the lower part of the box body 1, the drying unit 3 and the cleaning unit 4 are mutually independent, the drying chamber 10 for drying and cleaning wafers after cleaning is installed in the drying unit 3, the cleaning chamber 15 is installed in the cleaning unit 4, the top surface of the box body 1 is fixedly provided with two air cylinders 6 for changing the height of the drying chamber 10, the cylinder 6 all includes piston rod 7, the top of piston rod 7 is fixedly connected with roof 8 respectively, the bottom surface of roof 8 is fixed mounting respectively has the connecting rod 9 that is used for connecting drying chamber 10, the bottom of connecting rod 9 all passes the top surface of box 1 and extends to in the drying unit 3, the bottom of connecting rod 9 and the equal fixed connection of top surface of drying chamber 10, the inner wall connection of drying chamber 10 has the air-out end of tuber pipe 11, the air inlet end of tuber pipe 11 is connected with fan 12 of fixed mounting at box 1 top, the tuber pipe 11 is used for letting in dry gaseous stoving wafer.

The supporting rod 13 is the telescopic body of rod, a top surface that is used for box 1 is passed to the bottom of the supporting rod 13 of centre gripping thing basket 17 and extends to in the drying chamber 10, the junction of supporting rod 13 and box 1, the connecting piece 14 that is used for injecing supporting rod 13 direction of motion is all installed to the junction of supporting rod 13 and drying chamber 10, the bottom surface of drying chamber 10 passes baffle 2 and is connected with purge chamber 15, the bottom of purge chamber 15 is established to the arc, make columniform thing basket 17 of putting roll in the bottom of purge chamber 15, can improve the cleaning efficiency of wafer. The outer wall surface of the drying chamber 10 is in sliding connection with the partition plate 2, two sides of the outer surface of the drying chamber 10 are respectively and fixedly provided with a fixing clamp 16, the fixing clamp 16 is fixedly connected with the outer wall of the cleaning chamber 15, the fixing clamp 16 is used for fixing the cleaning chamber 15 and the drying chamber 10, a material placing basket 17 used for placing wafers is installed in the cleaning chamber 15, the bottom of the box body 1 is provided with a vibrating disk 18, the bottom of the vibrating disk 18 is in an arc shape, the vibrating disk 18 is used for improving the cleaning efficiency, the top surface of the vibrating disk 18 is provided with a cleaning brush 19, the cleaning brush 19 is used for cleaning the side surfaces of the wafers, the wafers can be prevented from being damaged due to the fact that the cleaning brush 19 is a soft brush, the outer wall of the bottom of the box body 1 is sleeved with a buffer sleeve 21 used for reducing vibration amplitude generated by cleaning, the bottom of the box body 1 is provided with a gasket 22 arranged outside the buffer sleeve 21, the gasket 22 is used for a protection device, the vibrating disk 18 is electrically connected with a motor 20 fixedly installed on the bottom surface of the gasket 22, the motor 20 is used to provide a driving force for the vibratory pan 18.

The utility model discloses an operating principle as follows, places a plurality of wafers in putting thing basket 17, pours the washing liquid into to the purge chamber 15 from the inlet of box 1 side, because the inlet is located the below of drying chamber 10, can avoid washing liquid pollution drying chamber 10. Starting the cylinder 6, the piston rod 7 drives the top plate 8 and the connecting rod 9 to move downwards, so that the drying chamber 10 drives the connected cleaning chamber 15 to move downwards, and the cylindrical object placing basket 17 rolls at the arc-shaped bottom of the cleaning chamber 15, so that the surface of the wafer is fully contacted with the cleaning liquid. And meanwhile, the motor 20 is started to drive the vibration disc 18 to vibrate, the bottom of the vibration disc 18 is arc-shaped, the side surfaces of the wafers in the storage basket 17 can be cleaned from multiple angles by using the cleaning brush 19, the wafers can be prevented from being damaged due to the fact that the cleaning brush 19 is a soft brush, the cleaning efficiency is improved, and in the cleaning process, the buffer sleeve 21 and the gasket 22 can reduce the vibration amplitude of the device caused by cleaning.

After the washing, cylinder 6 is started again, piston rod 7 drives roof 8 and connecting rod 9 and upwards moves, make drying chamber 10 drive the purge chamber 15 of connecting and upwards move, utilize telescopic supporting rod 13 to carry behind the 15 centre gripping of purge chamber's the thing basket 17 of putting to carry to the drying chamber 10 in, start fan 12, the filter is installed to the air outlet of tuber pipe 11, can be dry, clean gas is evenly exported through the exhaust vent of evenly laying, make the wafer of washing clean fully dry, improve the cleaning efficiency of wafer, and then improve the production quality of follow-up semiconductor product. After the cleaning is completed, the cleaned wafer is taken out from the basket 17, and the excess cleaning liquid is discharged from the liquid outlet on the bottom surface of the case 1.

The preferred embodiments of the present invention disclosed above are intended only to help illustrate the present invention. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise embodiments disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and its practical applications, to thereby enable others skilled in the art to best understand the invention for and utilize the invention. The present invention is limited only by the claims and their full scope and equivalents.

Claims

1. The utility model provides a wafer cleaning device, includes box (1), its characterized in that: the drying and cleaning device is characterized in that a supporting rod (5) is fixedly mounted on the top surface inside the box body (1), the bottom end of the supporting rod (5) is fixedly connected with a partition plate (2) inside the box body (1), the partition plate (2) separates the inside of the box body (1) into a drying unit (3) located on the upper portion of the box body (1) and a cleaning unit (4) located on the lower portion of the box body (1), the drying unit (3) and the cleaning unit (4) are mutually independent, a drying chamber (10) is mounted in the drying unit (3), a cleaning chamber (15) is mounted in the cleaning unit (4), a cylinder (6) is fixedly mounted on the top surface of the box body (1), the number of the cylinders (6) is two, the cylinder (6) comprises a piston rod (7), and the top end of the piston rod (7) is fixedly connected with a top plate (8) respectively, the bottom surface of roof (8) is fixed mounting respectively has connecting rod (9), the bottom of connecting rod (9) all passes the top surface of box (1) and extends to in drying unit (3), the bottom of connecting rod (9) with the equal fixed connection of top surface of drying chamber (10), the inner wall of drying chamber (10) is connected with the air-out end that goes out tuber pipe (11), the air inlet end that goes out tuber pipe (11) is connected with fan (12) of fixed mounting at box (1) top, the bottom of supporting rod (13) is passed the top surface of box (1) and is extended to in drying chamber (10), the bottom surface of drying chamber (10) passes baffle (2) and is connected with purge chamber (15), the both sides of the surface of drying chamber (10) are fixed mounting respectively has fixation clamp (16), fixation clamp (16) with the outer wall fixed connection of purge chamber (15), install in purge chamber (15) and put thing basket (17), the bottom of box (1) is equipped with vibration dish (18), cleaning brush (19) are installed to the top surface of vibration dish (18), the outer wall cover of box (1) bottom is equipped with buffer sleeve (21), install the bottom of box (1) and locate buffer sleeve (21) outer gasket (22), vibration dish (18) electric connection has fixed mounting to be in motor (20) of gasket (22) bottom surface.

2. The wafer cleaning apparatus according to claim 1, wherein: the filter is installed to the air-out end of air-out pipe (11), evenly laid a plurality of exhaust vents on the filter.

3. The wafer cleaning apparatus according to claim 1, wherein: the clamping rod (13) is a telescopic rod body.

4. The wafer cleaning apparatus according to claim 3, wherein: and connecting pieces (14) used for limiting the movement direction of the clamping rods (13) are arranged at the joints of the clamping rods (13) and the box body (1) and the joints of the clamping rods (13) and the drying chamber (10).

5. The wafer cleaning apparatus according to claim 1, wherein: the bottoms of the cleaning chamber (15) and the vibrating disk (18) are both arc-shaped.

6. The wafer cleaning apparatus according to claim 1, wherein: the storage basket (17) is cylindrical.

7. The wafer cleaning apparatus according to claim 1, wherein: the cleaning brush (19) is a soft brush.