CN214383795U - Sample holder, sample holder assembly and plasma chemical vapor deposition equipment - Google Patents

Abstract

The utility model provides a sample holds in palm, sample holds in palm subassembly and plasma chemical vapor deposition equipment belongs to plasma equipment field. The sample holds in the palm the subassembly and holds in the palm including basement and sample, is provided with mounting groove on the base member, and the sample holds in the palm fixed the setting in mounting groove. The sample support comprises an integrally formed sample support body and a heat conduction boss, and the heat conduction boss is arranged on the bottom surface of the sample support body. When in use, the heat-conducting boss is in direct or indirect contact with the substrate. Because the temperature of the center of the sample support is higher than the temperature of the edge, and the heat of the center of the sample support can be transferred to the substrate through the heat conduction boss, the temperature uniformity of the sample support is further improved, and the quality of the solid film is improved.

Description

Sample holder, sample holder assembly and plasma chemical vapor deposition equipment

Technical Field

The utility model relates to a plasma chemical vapor deposition equipment field particularly, relates to a sample holds in palm, sample holds in palm subassembly and plasma chemical vapor deposition equipment.

Background

Plasma chemical vapor deposition refers to a technique in which plasma is used to activate a reactive gas to promote a chemical reaction on the surface or near-surface space of a sample substrate to form a solid film. The sample substrate needs to be placed on a sample holder of the vacuum chamber, and the sample holder needs to be cooled because a large amount of heat is generated near the sample holder. In addition, the temperature uniformity of the conventional sample holder is poor, and the quality of a solid film is directly influenced; therefore, it is desirable to improve the temperature uniformity of the sample holder as much as possible.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a sample holds in palm, it can be through setting up the heat conduction boss at the middle part to be convenient for hold in the palm the heat transfer at middle part with the higher sample of temperature away, and then improve the temperature homogeneity that the sample held in the palm.

Another object of the utility model is to provide a sample holds in palm subassembly, it has adopted above-mentioned sample to hold in the palm, and the sample holds in the palm the heat at middle part and can transmit the basement through the heat conduction boss to improve the temperature homogeneity that the sample held in the palm.

Another object of the present invention is to provide a plasma chemical vapor deposition apparatus, which employs the above sample holder and the sample holder assembly.

The utility model discloses a realize like this:

a sample holder comprises a sample holder body and a heat conduction boss, wherein the heat conduction boss is arranged in the middle of the bottom surface of the sample holder body; the bottom surface of the sample support body is also provided with an annular groove, and the annular groove extends around the boss.

Furthermore, the bottom surface of the sample support body is provided with a plurality of annular grooves, and the width or/and the depth of the plurality of annular grooves are gradually reduced from outside to inside.

Further, the bottom surface of the sample support body is a circular surface, and an annular convex part is arranged on the edge of the bottom surface.

Further, the sample holds in the palm the body and is the solid of revolution, the generating line of sample support body includes the indent curve.

The sample support component comprises a substrate and a sample support, wherein a mounting groove is formed in the substrate, and the sample support is mounted in the mounting groove.

Further, the substrate is provided with a cooling channel.

Further, the cooling channel is spiral.

Further, still include the transition and hold in the palm, the transition holds in the palm and is circular platelike structure, the transition holds in the palm and sets up between base and the sample holds in the palm the body.

Further, the substrate is made of oxygen-free copper material.

A plasma chemical vapor deposition device comprises the sample holder or the sample holder assembly.

The utility model has the advantages that:

the utility model discloses a sample that above-mentioned design obtained holds in the palm, sample holds in the palm subassembly and plasma chemical vapor deposition equipment, during the use, heat conduction boss and basement direct or indirect contact. Because the temperature of the center of the sample support is higher than the temperature of the edge, and the heat of the center of the sample support can be transferred to the substrate through the heat conduction boss, the temperature uniformity of the sample support is further improved, and the quality of the solid film is improved.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention, and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.

Fig. 1 is an isometric view of a sample holder assembly provided by an embodiment of the present invention;

fig. 2 is a front view of a sample holder assembly provided by an embodiment of the present invention;

fig. 3 is a cross-sectional view of a sample holder assembly provided by an embodiment of the present invention;

fig. 4 is a cross-sectional view of a sample holder provided by an embodiment of the present invention;

fig. 5 is an isometric view of a substrate provided by an embodiment of the invention.

Icon: 100-sample holder; 110-a sample holder body; 112-an annular groove; 120-thermally conductive bosses; 130-an annular projection; 140-a transition tray; 150-a substrate; 152-cooling channels.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the drawings of the embodiments of the present invention will be combined to clearly and completely describe the technical solutions of the embodiments of the present invention.

In the description of the present invention, it is to be understood that the terms indicating orientation or positional relationship are based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplification of description, and do not indicate or imply that the equipment or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.

In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," and "fixed" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate the position or positional relationship based on the position or positional relationship shown in the drawings, or the position or positional relationship which is usually placed when the product of the present invention is used, and are only for convenience of description and simplification of the description, but do not indicate or imply that the device or element referred to must have a specific position, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.

In the present disclosure, unless otherwise expressly stated or limited, the first feature may comprise both the first and second features directly contacting each other, and also may comprise the first and second features not being directly contacting each other but being in contact with each other by means of further features between them. Also, the first feature being above, on or above the second feature includes the first feature being directly above and obliquely above the second feature, or merely means that the first feature is at a higher level than the second feature. A first feature that underlies, and underlies a second feature includes a first feature that is directly under and obliquely under a second feature, or simply means that the first feature is at a lesser level than the second feature.

Example (b):

referring to fig. 1-5, the present embodiment provides a sample holder assembly 010, which includes a substrate 150 and a sample holder 100, wherein the substrate is provided with a mounting groove, and the sample holder 100 is fixedly disposed in the mounting groove. The sample holder 100 includes an integrally formed sample holder body 110 and a heat conducting boss 120, and the heat conducting boss 120 is disposed on a bottom surface of the sample holder body 110.

Specifically, referring to fig. 2-4, the sample holder 100 is integrally formed, and includes a sample holder body 110, a heat-conducting boss 120 and an annular protrusion 130. The sample holder body 110 is a solid body of revolution, and the generatrix of the solid body of revolution includes a section of concave curve and a vertical straight line (using the orientation of the use state as a reference), and the generatrix rotates one circle around the vertical axis to form the side surface of the sample holder body 110, and forms a circular top surface and a circular bottom surface. The heat conducting boss 120 is cylindrical and is arranged in the middle of the bottom surface; the annular protrusion 130 is circular and is disposed at the edge of the bottom surface. An annular groove with a relatively large width is formed between the heat conduction boss 120 and the annular protrusion 130, that is, the heat conduction boss 120 and the annular protrusion 130 are formed by processing the annular groove on the circular bottom surface. The annular protrusion 130 is adapted to fit into the mounting recess of the base 150, thereby facilitating positioning and mounting.

After the heat-conducting boss 120 is disposed, it makes the bottom surface between the annular protrusion 130 and the heat-conducting boss 120 not directly contact with the lower part, but the annular boss directly contacts with the lower part. Therefore, the temperature at the center of the sample holder 100 can be effectively and directly transferred to the lower part through the heat conducting boss 120, and the heat conduction efficiency of the rest parts is low; the annular protrusion 130 has a small width and has a small influence on the heat transfer efficiency of the rim. In summary, the design of the bottom of the sample holder 100 can effectively improve the temperature uniformity, and thus the quality of the solid film can be improved. In other embodiments, the annular protrusion 130 may not be provided; the sample holder 100 is directly connected to the lower part via the thermally conductive bosses 120.

A plurality of annular grooves 112 are further formed in the bottom surface of the sample holder body 110, and the annular grooves 112 are located between the heat conduction boss 120 and the annular convex portion 130; the annular groove 112 is disposed concentrically with the heat conductive boss 120. And, the width and/or depth of the plurality of annular grooves 112 are gradually reduced from the outside to the inside. Because the temperature at the center of the sample holder 100 is significantly higher than the temperature at the edge of the sample holder 100, the above design can reduce the heat dissipation efficiency at the edge of the sample holder 100, and further can further improve the temperature uniformity of the whole sample holder 100.

Further, aiming at the characteristic that the edge electric field of the sample holder 100 is lower than the central electric field in the TM mode, the outer edge of the top surface of the sample holder 100 is rounded, so that the edge electric field is flattened.

Referring to fig. 3 and 5, in order to effectively cool the substrate 150, a cooling water channel is formed on the substrate 150. Specifically, the lower surface of the base 150 is provided with a spiral groove, and a sealing plate (not shown) is provided at the lower portion of the base 150; the cooling water passages are formed between the spiral grooves and the sealing plate after the sealing plate is hermetically connected to the base 150. The middle of the sealing plate is provided with a water inlet, and the cooling water cools the middle of the substrate 150 and then flows out through a water outlet at the edge. In other embodiments, the cooling water passages may be provided as a plurality of concentric annular water tanks, with adjacent water tanks communicating. The substrate 150 is made of an oxygen-free copper material, which can improve heat transfer efficiency.

Further, if the temperature variation of the cooling water is large, it may cause the temperature variation rate of the sample holder 100 to be too high to affect the quality of the solid film. Therefore, a transition tray 140 is further disposed between the sample tray 100 and the substrate 150, the transition tray 140 is a circular plate-shaped structure, and heat at the center of the sample tray 100 is firstly transferred to the transition tray 140 through the heat conducting boss 120 and then transferred to the substrate 150 through the transition tray 140. The transition tray 140 can effectively reduce the temperature change rate of the sample tray 100. During assembly, the transition support 140 is embedded in the installation groove of the substrate 150, and the thickness of the transition support is smaller than the depth of the installation groove; the sample holder 100 is then mated with the mounting slot by the annular ledge 130 of the rim. At this time, the bottoms of the heat-conducting boss 120 and the annular protrusion 130 of the sample holder 100 are in direct contact with the upper surface of the transition holder 140.

It should be noted that the present embodiment is only one of many embodiments; in other embodiments, the transition tray 140 may not be provided, and the heat conducting boss 120 of the sample tray 100 may be directly connected to the bottom of the mounting groove of the substrate 150.

The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (10)

1. A sample holder is characterized by comprising a sample holder body and a heat conduction boss, wherein the heat conduction boss is arranged in the middle of the bottom surface of the sample holder body; the bottom surface of the sample support body is also provided with an annular groove, and the annular groove extends around the boss.

2. The sample holder according to claim 1, wherein a plurality of annular grooves are arranged on the bottom surface of the sample holder body, and the width or/and the depth of the plurality of annular grooves gradually decreases from outside to inside.

3. The sample holder according to claim 1, wherein the bottom surface of the sample holder body is a circular surface, and the edge of the bottom surface is provided with an annular convex part.

4. The sample holder according to claim 1, wherein the sample holder body is a solid of revolution, and a generatrix of the sample holder body comprises a concave curve.

5. A sample holder assembly, comprising a base and a sample holder according to any one of claims 1 to 4, wherein a mounting recess is provided in the base, and the sample holder is mounted in the mounting recess.

6. The sample holder assembly of claim 5, wherein the base is provided with cooling channels.

7. The sample holder assembly of claim 6, wherein the cooling channel is helical.

8. The sample holder assembly of claim 5, further comprising a transition holder, the transition holder being a circular plate-like structure, the transition holder being disposed between the base and the sample holder body.

9. The sample holder assembly of claim 5, wherein the base is of an oxygen free copper material.

10. A plasma chemical vapour deposition apparatus comprising a sample holder according to any of claims 1 to 4 or a sample holder assembly according to any of claims 5 to 9.

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