CN214346335U - Reactor and uninterrupted reaction device for preparing electronic-grade carbon tetrafluoride - Google Patents

Reactor and uninterrupted reaction device for preparing electronic-grade carbon tetrafluoride Download PDF

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CN214346335U
CN214346335U CN202120295590.0U CN202120295590U CN214346335U CN 214346335 U CN214346335 U CN 214346335U CN 202120295590 U CN202120295590 U CN 202120295590U CN 214346335 U CN214346335 U CN 214346335U
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reaction cavity
reactor
transverse
longitudinal
carbon tetrafluoride
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华祥斌
邱玲
阙祥育
罗浩
刘志强
张剑明
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Fujian Deer Technology Corp
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Fujian Deer Technology Corp
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Abstract

The utility model provides a preparation electron level carbon tetrafluoride's reactor, incessant reaction unit and method. The reactor for preparing electronic-grade carbon tetrafluoride comprises: a transverse reaction chamber; the longitudinal reaction cavity is arranged in the middle of the transverse reaction cavity and is communicated with the transverse reaction cavity; the air inlet pipelines are symmetrically arranged at two ends of the transverse reaction cavity; the ash removal valve is used for sealing the transverse reaction cavity; the water bath is used for accommodating the transverse reaction cavity and cooling the transverse reaction cavity; the temperature sensor is arranged at the middle lower part of the longitudinal reaction cavity; the spray pipeline comprises a plurality of nozzles annularly arranged at the upper part of the longitudinal reaction cavity; the feed inlet and the gas outlet are respectively arranged at the top of the longitudinal reaction cavity; and the controller is used for controlling the spraying pipeline to spray and cool the longitudinal reaction cavity when the temperature of the temperature sensor exceeds 210-250 ℃.

Description

Reactor and uninterrupted reaction device for preparing electronic-grade carbon tetrafluoride
Technical Field
The utility model relates to a preparation electron level carbon tetrafluoride's reactor, incessant reaction unit.
Background
Carbon tetrafluoride (CF)4) The plasma etching gas with the largest consumption in the microelectronic industry is widely used for etching thin film materials such as silicon, silicon dioxide, silicon nitride, phosphosilicate glass, tungsten and the like, and also has a large amount of applications in the aspects of cleaning the surfaces of electronic devices, producing solar batteries, laser technology, low-temperature refrigeration, gas insulation, leakage detection agents, controlling the attitudes of space rockets, detergents in printed circuit production, lubricants, brake fluids and the like. CF due to its extremely strong chemical stability4It can also be used in metal smelting and plastics industries. The characteristics and development trend of electronic gas used by the current ultra-large scale integrated circuit are that the ultra-pure ultra-clean multi-variety multi-specification various countries increasingly attach more importance to the development of special electronic gas production technology for promoting the microelectronic industry development of the country. The existing method for producing carbon tetrafluoride by fluorocarbon synthesis has become the most commonly adopted method for industrial production of carbon tetrafluoride due to the advantages of easy obtainment of raw materials, controllable process and the like.
However, the reaction for directly synthesizing carbon tetrafluoride from fluorocarbon is violent, so that the danger of explosion exists, the initial reaction of the traditional reactor is easy to carry out, but more and more ash content can be accumulated in the reactor along with the reaction, so that the contact area of fluorine gas and activated carbon is smaller and smaller, the reactor and a pipeline are blocked, and finally the production efficiency is low. Therefore, how to suppress the explosion and make the reaction stable and complete quickly is the key of the synthesis process.
SUMMERY OF THE UTILITY MODEL
The utility model provides a preparation electron level carbon tetrafluoride's reactor, incessant reaction unit can effectively solve above-mentioned problem.
The utility model discloses a realize like this:
the utility model provides a preparation electron level carbon tetrafluoride's reactor, include:
a transverse reaction chamber;
the longitudinal reaction cavity is arranged in the middle of the transverse reaction cavity and is communicated with the transverse reaction cavity;
the air inlet pipelines are symmetrically arranged at two ends of the transverse reaction cavity;
the ash removal valve is used for sealing the transverse reaction cavity;
the water bath is used for accommodating the transverse reaction cavity and cooling the transverse reaction cavity;
the temperature sensor is arranged at the middle lower part of the longitudinal reaction cavity;
the spray pipeline comprises a plurality of nozzles annularly arranged at the upper part of the longitudinal reaction cavity;
the feed inlet and the gas outlet are respectively arranged at the top of the longitudinal reaction cavity;
and the controller is used for controlling the spraying pipeline to spray and cool the longitudinal reaction cavity when the temperature of the temperature sensor exceeds 210-250 ℃.
The utility model discloses further provide an incessant reaction unit of preparation electron level carbon tetrafluoride, including at least two above-mentioned reactors, the admission line of reactor is always admitted air the pipeline UNICOM with the fluorine through first valve respectively, and the admission line is always admitted air the pipeline UNICOM with nitrogen gas through the third valve respectively; and the gas outlet of the reactor is communicated with the main gas outlet pipeline through a second valve respectively, and the gas outlet of the reactor is communicated with the waste gas pipeline through a fourth valve respectively.
The utility model has the advantages that: the reactor for preparing electronic-grade carbon tetrafluoride provided by the utility model has the advantages that by arranging the horizontal reaction section, fluorine gas is uniformly fed into two ends, so that the reaction is fully and stably; in addition, the temperature of the reaction zone is interlocked by intelligent regulation of the water bath and the spray pipe, so that the temperature is kept in a set value area, byproducts are less, the product yield is improved, and the safety coefficient is high. In addition, the utility model provides an incessant reaction unit and control method thereof can carry out incessant serialization production, and at last, blow nitrogen through nitrogen gas and cool off and detach unnecessary fluorine gas in the first reactor to reduce the harm of harmful gas to the human body when feeding in raw materials and reserve.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention, and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
Fig. 1 is a schematic structural diagram of a reactor for preparing electronic-grade carbon tetrafluoride according to an embodiment of the present invention.
Fig. 2 is a schematic structural diagram of an uninterruptible reaction device for preparing electronic-grade carbon tetrafluoride according to an embodiment of the present invention.
Fig. 3 is a flowchart illustrating a control method of an uninterruptible reaction device for preparing electronic-grade carbon tetrafluoride according to an embodiment of the present invention.
Detailed Description
To make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the drawings of the embodiments of the present invention are combined to clearly and completely describe the technical solutions of the embodiments of the present invention, and obviously, the described embodiments are some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention. Thus, the following detailed description of the embodiments of the present invention, presented in the accompanying drawings, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In the description of the present invention, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically limited otherwise.
Referring to fig. 1, an embodiment of the present invention provides a reactor for preparing electronic-grade carbon tetrafluoride, including:
a transverse reaction chamber 11;
the longitudinal reaction cavity 10 is arranged in the middle of the transverse reaction cavity 11 and communicated with the transverse reaction cavity 11;
the air inlet pipelines 13 are symmetrically arranged at two ends of the transverse reaction cavity 11;
a deashing valve 15 for sealing the transverse reaction chamber 11;
the water bath 12 is used for accommodating the transverse reaction cavity 11 and cooling the transverse reaction cavity 11;
a temperature sensor 16 arranged at the middle lower part of the longitudinal reaction chamber 10;
the spray pipeline 17 comprises a plurality of nozzles annularly arranged at the upper part of the longitudinal reaction cavity 10;
a feed inlet 18 and an air outlet 19 are respectively arranged at the top of the longitudinal reaction chamber 10;
and the controller is used for controlling the spraying pipeline 17 to spray and cool the longitudinal reaction cavity 10 when the temperature of the temperature sensor 16 exceeds 210-250 ℃.
As a further improvement, the longitudinal reaction chamber 10 comprises a top cylindrical section 101 and a bottom closing section 102, wherein the tube diameter of the closing section 102 decreases in a vertical downward direction. More preferably, the minimum pipe diameter of the closing-in section 102 is defined as D, and the pipe diameter of the cylindrical section 101 is defined as D, wherein D ranges from 0.8D to 0.9D. In one embodiment, D ranges from 0.85D. Because the upper part of the closing-in section 102 is the outer flame area of the whole reaction, the reaction temperature is high, the reaction is rapid, if the diameter is too large, once the reaction is too rapid, the material is rapidly descended, the reaction is violent, even uncontrollable explosion occurs, therefore, the closing-in section 102 is arranged, the descending speed of the material is reduced, and the safety performance is improved.
As a further improvement, in one of the embodiments, the diameter of the transverse reaction chamber 11 is 50 cm, and the length is 150 cm; and the diameter of the longitudinal reaction chamber 10 is 50 cm and the height is 150 cm. The height h of the temperature sensor 16 from the smallest tube diameter of the throat section 102 is 50 cm, the outer flame zone of the reaction. By controlling the outer flame zone of the reaction to be at the upper part of the closing-in section 102, the overall reaction intensity can be controlled, the reaction efficiency can be improved, and the byproducts can be reduced.
As a further improvement, the controller is used for controlling the spraying pipeline 17 to spray and cool the longitudinal reaction chamber 10 when the temperature of the temperature sensor 16 exceeds 230 ℃. More preferably, the temperature of the outer flame area can be controlled to be 220-230 ℃.
Referring to fig. 2, an embodiment of the present invention further provides an uninterrupted reactor for preparing electronic grade carbon tetrafluoride, which includes at least two reactors as described above, wherein the gas inlet pipes 13 of the reactors are respectively communicated with the fluorine gas main gas inlet pipe 20 through first valves 21, and the gas inlet pipes 13 are respectively communicated with the nitrogen gas main gas inlet pipe 25 through third valves 24; the gas outlets 19 of the reactors are respectively communicated with a main gas outlet pipeline 22 through second valves 23, and the gas outlets 19 of the reactors are respectively communicated with a waste gas pipeline 27 through fourth valves 26.
Referring to fig. 3, an embodiment of the present invention further provides a control method of the above-mentioned uninterruptible reaction device for preparing electronic grade carbon tetrafluoride, including the following steps:
and S1, controlling one first reactor to react and feeding the other second reactor for standby.
In step S1, when the first reactor is reacted, the corresponding first valve 21 and second valve 23 are opened, so that fluorine gas is introduced and the product gas is discharged; however, the second reactor has its corresponding first valve 21 and second valve 23 in the closed state. And when the first reactor is used for reaction, the reaction pressure is controlled to be 500 Pa-1 kPa.
And S2, when the temperature of the first reactor reaction is lower than 210 ℃, switching to the second reactor reaction through the first valve 21, and simultaneously filling nitrogen into the first reactor through the third valve 24 to carry out nitrogen blowing cooling and remove redundant fluorine gas in the first reactor.
Repeated verification is provided, and if the temperature of the first reactor is lower than 210 ℃, the first reactor can be judged to have less material and increased by-products. At this time, the reaction in the second reactor can be switched by the first valve 21, and the excess fluorine gas in the first reactor can be removed by blowing nitrogen to cool the first reactor by filling nitrogen gas through the third valve 24. That is, the first valve 21 and the second valve 23 corresponding to the first reactor are closed, and the first valve 21 and the fourth valve 26 corresponding to the second reactor are opened. At this time, the fluorine gas and the carbon particles in the second reactor automatically react to rapidly reach the reaction temperature. When the reaction temperature reaches about 230 ℃, the corresponding fourth valve 26 of the second reactor can be closed, and the second valve 23 can be opened to discharge gas.
As a further improvement, in step S2, the step of simultaneously filling the nitrogen gas into the first reactor through the third valve 24 to perform nitrogen-blowing cooling and removing the excessive fluorine gas in the first reactor comprises: and opening a third valve 24 and a fourth valve 26 corresponding to the first reactor, introducing nitrogen until the first reactor is cooled to room temperature, and then continuously purging the nitrogen for 2-10 hours, thereby exhausting the fluorine gas.
S3, opening the ash removal valve 15 of the first reactor to remove ash, and then adding for later use.
In step S3, the step of charging the feed for use includes: feeding carbon particles from the feed port 18 until the carbon particles are located 15 to 20 cm from the top of the longitudinal reaction chamber 10. The reason why the filling is not performed is to facilitate the subsequent generation of carbon tetrafluoride to be discharged from the gas outlet 19 at the top, thereby preventing the gas outlet 19 from being blocked.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (5)

1. A reactor for producing electronic grade carbon tetrafluoride, comprising:
a transverse reaction chamber (11);
the longitudinal reaction cavity (10) is arranged in the middle of the transverse reaction cavity (11) and is communicated with the transverse reaction cavity (11);
the air inlet pipelines (13) are symmetrically arranged at two ends of the transverse reaction cavity (11);
a deashing valve (15) for sealing the transverse reaction chamber (11);
the water bath (12) is used for accommodating the transverse reaction cavity (11) and cooling the transverse reaction cavity (11);
the temperature sensor (16) is arranged at the middle lower part of the longitudinal reaction cavity (10);
the spray pipeline (17) comprises a plurality of nozzles annularly arranged at the upper part of the longitudinal reaction cavity (10);
a feed inlet (18) and an air outlet (19) are respectively arranged at the top of the longitudinal reaction cavity (10);
the controller is used for controlling the spraying pipeline (17) to spray and cool the longitudinal reaction cavity (10) when the temperature of the temperature sensor (16) exceeds 210-250 ℃;
the longitudinal reaction chamber (10) comprises a top cylindrical section (101) and a bottom closing section (102), wherein the pipe diameter of the closing section (102) is decreased progressively along the vertical downward direction; and defining the minimum pipe diameter of the closing section (102) as D, and the pipe diameter of the columnar section (101) as D, wherein the range of D is 0.85D.
2. The reactor for the preparation of electronic grade carbon tetrafluoride according to claim 1, wherein the transverse reaction chamber (11) has a diameter of 50 cm and a length of 150 cm; and the diameter of the longitudinal reaction cavity (10) is 50 cm, and the height is 150 cm.
3. The reactor for preparing electronic grade carbon tetrafluoride according to claim 2, wherein the height h of the temperature sensor (16) from the smallest tube diameter of the throat section (102) is 50 cm.
4. The reactor for preparing electronic grade carbon tetrafluoride according to claim 3, wherein the controller is configured to control the spray pipe (17) to spray cool the longitudinal reaction chamber (10) when the temperature of the temperature sensor (16) exceeds 230 ℃.
5. An uninterrupted reactor for the production of electronic grade carbon tetrafluoride, comprising at least two reactors according to any of claims 1 to 4, the gas inlet lines (13) of which are each connected via a first valve (21) to a fluorine main gas inlet line (20), and the gas inlet lines (13) are each connected via a third valve (24) to a nitrogen main gas inlet line (25); and the gas outlet (19) of the reactor is communicated with a main gas outlet pipeline (22) through a second valve (23) respectively, and the gas outlet (19) of the reactor is communicated with a waste gas pipeline (27) through a fourth valve (26) respectively.
CN202120295590.0U 2021-02-02 2021-02-02 Reactor and uninterrupted reaction device for preparing electronic-grade carbon tetrafluoride Active CN214346335U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202120295590.0U CN214346335U (en) 2021-02-02 2021-02-02 Reactor and uninterrupted reaction device for preparing electronic-grade carbon tetrafluoride

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202120295590.0U CN214346335U (en) 2021-02-02 2021-02-02 Reactor and uninterrupted reaction device for preparing electronic-grade carbon tetrafluoride

Publications (1)

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CN214346335U true CN214346335U (en) 2021-10-08

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Address after: No. 6, Gongye Road, Jiaoyang industrial concentration zone, Jiaoyang Town, Shanghang County, Longyan City, Fujian Province, 364204

Patentee after: Fujian del Technology Co.,Ltd.

Address before: No. 6, Gongye Road, Jiaoyang industrial concentration zone, Jiaoyang Town, Shanghang County, Longyan City, Fujian Province, 364000

Patentee before: FUJIAN DEER TECHNOLOGY CO.,LTD.

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