CN214308622U - High-precision supporting device and system for film thickness measuring optical machine - Google Patents
High-precision supporting device and system for film thickness measuring optical machine Download PDFInfo
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- CN214308622U CN214308622U CN202120341854.1U CN202120341854U CN214308622U CN 214308622 U CN214308622 U CN 214308622U CN 202120341854 U CN202120341854 U CN 202120341854U CN 214308622 U CN214308622 U CN 214308622U
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Abstract
The application provides a high accuracy strutting arrangement and system for thick measurement ray apparatus of membrane, high accuracy strutting arrangement includes four stands, two crossbeams and two supporting shoes, and wherein, the top at two stands is fixed respectively at the both ends of a crossbeam, and the top at two other stands is fixed respectively at the both ends of another crossbeam, two supporting shoes are respectively through bolted connection to on the side surface of two crossbeams, the upper surface of two supporting shoes is used for fixed connection to ray apparatus. According to the high-precision supporting device, the position precision of the optical machine relative to the high-precision platform can be ensured only by ensuring the processing precision of the supporting block and having lower processing precision requirements on other parts, so that the precision processing of most supporting device parts can be avoided; in addition, the gasket is not required to be polished or an adjusting mechanism is not required to be operated, so that the technical capability requirement on the installation and adjustment personnel is reduced, and the manpower, material resources and time are saved.
Description
Technical Field
The application relates to the technical field of semiconductors, in particular to a high-precision supporting device and system for a film thickness measuring optical machine.
Background
The optical equipment is utilized to measure the thickness of the semiconductor silicon wafer, namely film thickness measurement, and the optical thickness measuring equipment realizes non-contact measurement in the process of film thickness measurement, and has the advantages of high measurement precision, nondestructive measurement, no pollution measurement and the like. The optical apparatus for measuring film thickness is widely used for measuring process stages including etching (Etch), Chemical Vapor Deposition (CVD), Photolithography (photoresist), and Chemical Mechanical Polishing (CMP), and can accurately determine fine variations in film thickness in a semiconductor manufacturing process.
The core hardware of the optical equipment for measuring the film thickness is an optical machine, the optical machine is fixed on a high-precision platform by a supporting device, and after the supporting device is fixedly connected with the optical machine, the position precision of the optical machine needs to be ensured to meet the requirement of film thickness measurement. How to ensure the position accuracy of the optical machine connected with the support device at the present stage is a delicate problem, and the position accuracy of most optical machines and support devices is ensured through the following three ways: the first approach is to ensure the position accuracy of the optical machine by restricting the processing accuracy of each part of the supporting device; the second approach is to maintain the proper processing precision of each part of the supporting device, and ensure the position precision by polishing the gasket at the joint part of the supporting device and the optical machine; the third way is to maintain the proper processing precision of each part of the supporting device, and reserve an adjusting mechanism at the joint part of the supporting device and the optical machine to ensure the position precision. The first approach requires the machining precision of each part of the support device to ensure the installation precision of the optical machine, so that a great cost is required, and the second approach and the third approach have high installation and adjustment difficulty, high requirement on the skill of an operator and difficult implementation of the installation process.
SUMMERY OF THE UTILITY MODEL
The application aims to provide a novel high-precision supporting device and system for a semiconductor silicon wafer film thickness measuring optical machine.
According to an aspect of the application, a high accuracy strutting arrangement for thick measurement ray apparatus of membrane is provided, a serial communication port, high accuracy strutting arrangement includes four stands, two crossbeams and two supporting shoes, and wherein, the top at two stands is fixed respectively at the both ends of a crossbeam, and the top at two other stands is fixed respectively at the both ends of another crossbeam, two supporting shoes are respectively through bolted connection to on the side surface of two crossbeams, the upper surface of two supporting shoes is used for fixed connection to the ray apparatus.
In some embodiments, the bolt is loose when transferring the dimensional accuracy of the high-accuracy platform to the opto-mechanical via the two support blocks; and pre-tightening the bolt after the transmission is completed.
In some embodiments, the thickness tolerance of the support block is less than or equal to 0.02 mm.
According to another aspect of this application, provide a system for thick measurement ray-apparatus of membrane, its characterized in that, the system includes this application high accuracy strutting arrangement, high accuracy platform and two gage blocks of high accuracy, wherein, high accuracy strutting arrangement fixes high accuracy platform top, two gage blocks are placed high accuracy platform top just makes the upper surface of two gage blocks withstands respectively two supporting shoes of high accuracy strutting arrangement, the upper surface of two supporting shoes is used for fixed connection to the ray-apparatus.
In some embodiments, the high-precision platform, the two gauge blocks, and the two support blocks form a precision dimensional chain to transmit the dimensional precision of the high-precision platform to the optical machine through the two support blocks.
In some embodiments, the bolts between each support block and the crossbar to which it is connected are loose when transferring the dimensional accuracy of the high-accuracy platform through the support blocks to the opto-machinery; and pre-tightening the bolt after the transmission is completed.
Compared with the prior art, the method has the following advantages: according to the high-precision supporting device, the position precision of the optical machine relative to the high-precision platform can be ensured only by ensuring the processing precision of the supporting block and ensuring that other parts have lower processing precision requirements, so that the precision processing of most supporting device parts can be avoided; moreover, the gasket is not required to be polished or an adjusting mechanism is not required to be operated, so that the technical capability requirement on the installation and adjustment personnel is reduced, and the manpower, material resources and time are saved; in addition, the high-precision supporting device reduces the processing technology difficulty, optimizes the installation method, improves the installation efficiency of the optical machine on the supporting device, and has higher installation and adjustment level tolerance for installation technicians.
Drawings
Other features, objects and advantages of the present application will become more apparent upon reading of the following detailed description of non-limiting embodiments thereof, made with reference to the accompanying drawings in which:
FIG. 1 is a schematic structural diagram of a high-precision supporting device for a film thickness measuring optical machine according to an embodiment of the present application;
FIG. 2 shows a schematic diagram of a system for a film thickness measurement light engine according to one embodiment of the present application.
The same or similar reference numbers in the drawings identify the same or similar elements.
Detailed Description
Before discussing exemplary embodiments in greater detail, it should be noted that some exemplary embodiments describe the various operations involved as a sequential process, but many of the operations can be performed in parallel, concurrently, or simultaneously. In addition, the order of the operations may be re-arranged. The process may be terminated when its operations are completed, but may have other additional steps.
Specific structural and functional details disclosed herein are merely representative and are provided for purposes of describing example embodiments of the present application. This application may, however, be embodied in many alternate forms and should not be construed as limited to only the embodiments set forth herein.
The present application is described in further detail below with reference to the attached figures.
According to an aspect of the application, a high accuracy strutting arrangement for thick measurement ray apparatus of membrane is provided, a serial communication port, high accuracy strutting arrangement includes four stands, two crossbeams and two supporting shoes, and wherein, the top at two stands is fixed respectively at the both ends of a crossbeam, and the top at two other stands is fixed respectively at the both ends of another crossbeam, two supporting shoes are respectively through bolted connection to on the side surface of two crossbeams, the upper surface of two supporting shoes is used for fixed connection to the ray apparatus. Based on the high-precision supporting device, the position precision of the optical machine relative to the mounting platform can be within a controllable range, and meanwhile, the optical machine can be stably and reliably supported and fixed.
In some embodiments, the four columns are vertically arranged, two columns are arranged on the same side, two ends of each beam are respectively fixed at the top ends of the two columns arranged on the same side, the two beams are parallel, and each support block is connected to the middle position of the side surface of the corresponding beam, so that the support block can be used for supporting the light machine.
The two supporting blocks are used as main parts for transmitting the position precision size chain of the optical machine and need to have precise linear size and form and position tolerance, and other parts in the high-precision supporting device only need to have lower processing precision requirements, so that the position precision of the optical machine and the high-precision supporting device can meet the requirements only by ensuring the processing precision of the two supporting blocks. In some embodiments, the linear dimension tolerance of each support block in the vertical direction, i.e. the thickness, is not more than 0.02mm, the difference in thickness between the two support blocks is not more than 0.02mm, and the parallelism of the upper and lower surfaces of each support block in the vertical direction is not more than 0.02 mm. It should be noted that, in practical applications, the linear dimension and the form and position tolerance of the supporting block can be designed based on requirements, and the application is not limited to this.
In some embodiments, the four posts are identical, i.e., the parameters (e.g., shape, height, etc.) of each post are identical; similarly, the two beams are also identical, and the two support blocks are also identical. It should be noted that, the present application does not specifically limit the parameters of the size and shape of the columns, the beams, and the supporting blocks, and in practical applications, the parameters related to the above components may be designed based on practical requirements.
In some embodiments, the bolt is loose when transferring the dimensional accuracy of the high-accuracy platform to the opto-mechanical device through the support block; and pre-tightening the bolt after the transmission is completed. Specifically, when the high-precision support device is used to realize the size chain transmission of the position precision of the optical machine, the high-precision support device needs to be fixed on the high-precision platform firstly, then the high-precision support device needs to finish the fixation of the optical machine on the high-precision platform, and auxiliary tools, namely, two high-precision gauge blocks are used, the two high-precision gauge blocks are placed at corresponding positions above the high-precision platform, the upper surface of each gauge block is abutted against one support block in the high-precision support device (namely, one gauge block is arranged below each support block), and the upper surface of each support block is abutted against the optical machine, so that a precision size chain consisting of the high-precision platform, the two high-precision gauge blocks and the two support blocks in the high-precision support device is formed, and the position precision of the optical machine relative to the high-precision platform can be ensured based on the precision size chain, the costs of the three approaches described in the background can thus be effectively avoided. In some embodiments, each support block in the high-precision support device is movable due to the loose bolts for connecting the support block and the corresponding beam, so that the dimensional precision of the high-precision platform can be transferred to the optical machine through two support blocks in the high-precision support device, and then the two support blocks in the high-precision support device can be fixed (namely, pre-tightening bolts), thereby ensuring the position precision of the optical machine and the high-precision support device.
In some embodiments, the thickness tolerance of the support block is less than or equal to 0.02 mm.
Fig. 1 shows a schematic structural diagram of a high-precision supporting device for a film thickness measuring optical machine according to an embodiment of the present application. The high-precision supporting device comprises two supporting blocks 1, four stand columns 2 and 2 cross beams 3, wherein two ends of one cross beam 3 are respectively fixed at the top ends of the two stand columns 2 on the left side, two ends of the other cross beam 3 are respectively fixed at the top ends of the two stand columns 2 on the right side, and one supporting block 1 is fixed on the side surface of each cross beam 3 through a bolt. Based on this high accuracy strutting arrangement, supporting shoe 1 has accurate linear dimension and form and position tolerance as the essential part of conduction ray apparatus position accuracy size chain, and other parts then have lower machining precision demand among this high accuracy strutting arrangement, promptly, guarantee that ray apparatus and this high accuracy strutting arrangement's position accuracy can reach the requirement through the machining precision of guaranteeing the supporting shoe.
According to the scheme of the application, a novel high-precision supporting device for a film thickness measuring optical machine is provided, only the processing precision of a supporting block needs to be guaranteed in the high-precision supporting device, and other parts have lower processing precision requirements, so that the position precision of the optical machine relative to a high-precision platform can be guaranteed, and therefore the precision processing of most supporting device parts can be avoided; moreover, the gasket is not required to be polished or an adjusting mechanism is not required to be operated, so that the technical capability requirement on the installation and adjustment personnel is reduced, and the manpower, material resources and time are saved; in addition, the high-precision supporting device reduces the processing technology difficulty, optimizes the installation method, improves the installation efficiency of the optical machine on the supporting device, and has higher installation and adjustment level tolerance for installation technicians.
According to another aspect of this application, provide a system for thick measurement ray-apparatus of membrane, its characterized in that, the system includes this application high accuracy strutting arrangement, high accuracy platform and two gage blocks of high accuracy, wherein, high accuracy strutting arrangement fixes high accuracy platform top, two gage blocks are placed high accuracy platform top just makes the upper surface of two gage blocks withstands respectively two supporting shoes of high accuracy strutting arrangement, the upper surface of two supporting shoes is used for fixed connection to the ray-apparatus. The height of the gauge block is also the height of the supporting block from the high-precision platform.
In some embodiments, the two gauge blocks are identical, i.e., the parameters (e.g., size, shape, etc.) of each gauge block are identical. It should be noted that, the present application does not specifically limit the parameters such as the size and the shape of the gauge block, and in practical applications, the gauge block may be selected or designed according to practical requirements (in combination with design parameters of a high-precision supporting device that is actually used).
In some embodiments, the high-precision platform, the two gauge blocks, and the two support blocks form a precision dimensional chain to transmit the dimensional precision of the high-precision platform to the optical machine through the two support blocks. Based on the system, contact surfaces exist between the optical machine and each supporting block, between each supporting block and the corresponding gauge block and between each gauge block and the high-precision platform, and the dimensional precision of the high-precision platform can be transmitted to the optical machine through the contact surfaces.
In some embodiments, the bolts between each support block and the crossbar to which it is connected are loose when transferring the dimensional accuracy of the high-accuracy platform through the support blocks to the opto-machinery; and pre-tightening the bolt after the transmission is completed. In some embodiments, each support block is movable due to the loose bolts, so that the two support blocks can transmit the dimensional accuracy of the high-accuracy platform to the optical engine, and then the two support blocks in the high-accuracy support device are fixed (i.e. the pre-tightening bolts), thereby ensuring the position accuracy of the optical engine and the high-accuracy support device. In some embodiments, it is ensured that the thickness tolerance of the two movable supporting blocks is within 0.02mm firstly, and that bolts for connecting each supporting block with the corresponding beam (i.e. the supporting body) are loosened when the optical machine, the supporting blocks and the gauge block on the high-precision platform are contacted together so as to ensure that the dimensional precision of the high-precision platform is transmitted to the optical machine through the gauge block, and then the bolts for connecting each supporting block with the corresponding beam are pre-tightened.
Fig. 2 shows a schematic diagram of a system for a film thickness measurement optical-mechanical system according to an embodiment of the present application, which can also be regarded as a dimension chain transfer diagram for ensuring the position accuracy of the optical-mechanical system. The high-precision supporting device is fixed on the high-precision platform, two high-precision gauge blocks are further arranged above the high-precision platform, the upper surface of each gauge block abuts against one supporting block of the high-precision supporting device, and the upper surface of each supporting block abuts against the optical machine; as shown in fig. 2, contact surfaces exist between the optical engine and each supporting block, between each supporting block and the corresponding gauge block, and between each gauge block and the high-precision platform, so that a precision dimension chain consisting of the high-precision platform, the two gauge blocks and the two supporting blocks is formed, and the position precision of the optical engine relative to the high-precision platform is ensured.
It will be evident to those skilled in the art that the present application is not limited to the details of the foregoing illustrative embodiments, and that the present application may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the application being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned. Furthermore, it is obvious that the word "comprising" does not exclude other elements or steps, and the singular does not exclude the plural. A plurality of units or means recited in the system claims may also be implemented by one unit or means in software or hardware. The terms first, second, etc. are used to denote names, but not any particular order.
Claims (6)
1. The utility model provides a high accuracy strutting arrangement for thick measurement ray apparatus of membrane which characterized in that, high accuracy strutting arrangement includes four stands, two crossbeams and two supporting shoes, and wherein, the top at two stands is fixed respectively at the both ends of a crossbeam, and the top at two other stands is fixed respectively at the both ends of another crossbeam, two supporting shoes are respectively through bolted connection to on the side surface of two crossbeams, the upper surface of two supporting shoes is used for fixed connection to ray apparatus.
2. The high precision support apparatus of claim 1, wherein the bolt is loose when transferring the dimensional precision of the high precision platform to the opto-mechanical via the two support blocks; and pre-tightening the bolt after the transmission is completed.
3. A high accuracy supporting apparatus according to claim 1 or 2, wherein the thickness tolerance of said supporting block is less than or equal to 0.02 mm.
4. A system for a film thickness measuring carriage, comprising the high precision support device of any one of claims 1 to 3, a high precision platform, and two high precision gauge blocks, wherein the high precision support device is fixed above the high precision platform, the two gauge blocks are placed above the high precision platform and make the upper surfaces of the two gauge blocks respectively abut against the two support blocks of the high precision support device, and the upper surfaces of the two support blocks are used for being fixedly connected to the carriage.
5. The system of claim 4, wherein the high-precision platform, the two gauge blocks, and the two support blocks comprise a precision dimensional chain to transfer the dimensional precision of the high-precision platform to the optical machine through the two support blocks.
6. The system of claim 5, wherein bolts between each support block and the crossbar to which it is connected are loose when transferring the dimensional accuracy of the high accuracy platform through the support blocks to the opto-machinery; and pre-tightening the bolt after the transmission is completed.
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