CN214004779U - Graphite frame device for preventing PECVD (plasma enhanced chemical vapor deposition) coating edge from becoming red - Google Patents
Graphite frame device for preventing PECVD (plasma enhanced chemical vapor deposition) coating edge from becoming red Download PDFInfo
- Publication number
- CN214004779U CN214004779U CN202022487454.XU CN202022487454U CN214004779U CN 214004779 U CN214004779 U CN 214004779U CN 202022487454 U CN202022487454 U CN 202022487454U CN 214004779 U CN214004779 U CN 214004779U
- Authority
- CN
- China
- Prior art keywords
- frame
- graphite
- graphite frame
- recess
- edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
The utility model discloses a prevent reddish graphite frame device in PECVD coating film edge, including the graphite frame, be equipped with marginal frame and middle frame in the graphite frame, middle frame be vertically and horizontally staggered formula and distribute, crossing formation a plurality of slide glass unit between middle frame and the marginal frame, slide glass unit be used for bearing the silicon chip, the row number of slide glass unit is E, the line number is F, E and F be more than or equal to 2's integer, all slide glass units all be equipped with down sink groove all around, the outside of marginal frame is equipped with the round recess, the recess be located graphite frame inboard, the recess is 2 ~ 4mm apart from the interval of marginal slide glass unit, the degree of depth of recess is greater than 2mm, the degree of depth of recess is less than the thickness of graphite frame, the left and right sides of recess is equipped with the locating hole. The utility model discloses can effectively increase the collision probability of support plate border position plasma, effectively solve the edge and rubed the phenomenon, not only can be used to have the graphite frame that colludes the point still can be used to not have the graphite frame that colludes the point.
Description
Technical Field
The utility model relates to a prevent reddish graphite frame device in PECVD coating film edge.
Background
PECVD (plasma enhanced chemical vapor deposition) is a silicon nitride coating technique commonly used in the solar cell fabrication process. The microwave PECVD equipment works on the principle that a microwave antenna is arranged in a quartz sleeve, and the aim of the quartz sleeve is to isolate reaction gas in a chamber from the microwave antenna and reduce the deposition of the antenna. On the outside of the microwave tube there is a metal hood, the purpose of which is to confine the ammonia gas participating in the reaction in a localized space. And introducing ammonia gas around the microwave tube, ionizing the gas, converging and colliding the gas with silane gas to decompose the gas to form silicon ions, forming silicon nitride, depositing the silicon nitride on the surface of the silicon wafer, and performing antireflection and passivation functions. The microwave PECVD method is a plate type framework, and the carrier plate is a graphite frame.
Due to the influence of air flow and microwave attenuation, the edge of the battery piece close to the edge of the support plate is prone to generate a red phenomenon, the rework rate of the battery piece is increased, and the yield of products is influenced.
SUMMERY OF THE UTILITY MODEL
The utility model aims at solving the defects of the prior art, and providing a graphite frame device which is convenient to connect and can prevent the PECVD coating film edge from reddening.
The utility model provides a prevent that PECVD coating film edge from reddening's graphite frame device, includes the graphite frame, is equipped with marginal frame and middle frame in the graphite frame, middle frame be vertically and horizontally staggered formula and distribute, intersect between middle frame and the marginal frame and form a plurality of slide glass unit, slide glass unit be used for bearing the silicon chip, all slide glass units all be equipped with the undercut all around, the outside of marginal frame is equipped with the round recess, the recess be located graphite frame inboard, the left and right sides of recess is equipped with locating part.
As a further improvement, the positioning component is a positioning hole, a positioning column, a positioning block, a positioning sleeve, a guide plate or a screw.
As a further improvement, the distance between the groove and the edge slide unit is 2-4 mm.
As a further improvement, the depth of the groove is more than or equal to 2 mm.
As a further improvement, the depth of the groove is smaller than the thickness of the graphite frame.
As a further improvement, a plurality of slide glass units are distributed in an array, the number of rows is E, the number of columns is F, and both E and F are integers which are more than or equal to 2.
As a further improvement, the number of rows is 4.
As a further improvement, the number of columns is 6.
Has the advantages that:
the utility model provides an outside of edge frame is equipped with the round recess, can effectively increase the collision probability of support plate border position plasma, makes the thick increase of edge membrane, effectively solves the edge red phenomenon. The utility model discloses not only can be used to have the graphite frame that colludes the point still can be used to not have the graphite frame that colludes the point, and does not have the influence to the battery productivity.
Drawings
FIG. 1 is a schematic diagram of the general structure of a graphite frame device for preventing the red color at the edge of a PECVD coating film;
1. the graphite frame 2, the frame groove 3, the slide glass unit 4, the edge frame 5, the middle frame 6, the positioning hole 7, the groove 8 and the sinking groove.
Detailed Description
In order to deepen the understanding of the present invention, the present invention will be further described in detail with reference to the following embodiments and the attached drawings, and the embodiments are only used for explaining the present invention, and do not constitute the limitation to the protection scope of the present invention.
The first embodiment is as follows: as shown in fig. 1, a graphite frame 1, a frame groove 2, a slide glass unit 3, an edge frame 4, a middle frame 5, a positioning hole 6, a groove 7, and a sink groove 8.
The utility model provides a prevent reddish graphite frame device in PECVD coating film edge, includes graphite frame 1, is equipped with marginal frame 4 and middle frame 5 in the graphite frame 1, middle frame 5 be criss-cross formula and distribute, intersect between middle frame 5 and the marginal frame 4 and form a plurality of slide glass unit 3, slide glass unit 3 be used for bearing the silicon chip, the row number of slide glass unit 3 is E, the column number is F, E and F be more than or equal to 2's integer, all slide glass unit 3 all around all be equipped with down heavy groove 8, the outside of marginal frame 4 is equipped with round recess 7, recess 7 be located graphite frame 1 inboardly, the recess 7 is 2 ~ 4mm apart from the interval of marginal slide glass unit 3, the degree of depth of recess 7 is greater than 2mm, the degree of depth of recess 7 is less than the thickness of graphite frame, the left and right sides of recess 7 are equipped with locating hole 6.
When the silicon nitride anti-reflection film is used, the PECVD starts to work, the plasma is the aggravation of the thermal motion of substance molecules, the gas molecules are ionized due to the mutual collision, a layer of silicon nitride anti-reflection film is deposited on the surface of a silicon wafer, the transmission of light irradiated on the silicon wafer is increased, and the reflection is reduced; the edge of the battery piece close to the edge of the carrier plate is prone to reddening, the circle of groove on the periphery of the graphite frame edge carrier plate unit increases the collision probability of plasma at the edge of the carrier plate, the edge film thickness is increased, the problem of the reddening phenomenon at the edge is solved, and the operation is simple.
Example two:
wherein, the left and right sides of the groove 7 are provided with positioning guide sleeves, and the rest parts are the same as the first embodiment.
Example three:
wherein, the left and right sides of the groove 7 are provided with positioning columns, and the rest parts are the same as the first embodiment.
The above description is only a preferred embodiment of the present invention, and should not be taken as limiting the invention, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (8)
1. The utility model provides a prevent reddish graphite frame device in PECVD coating film edge, its characterized in that, includes the graphite frame, is equipped with marginal frame and middle frame in the graphite frame, middle frame be vertically and horizontally staggered formula and distribute, intersect between middle frame and the marginal frame and form a plurality of slide glass unit, slide glass unit be used for bearing the silicon chip, all slide glass units all be equipped with down sink groove all around, the outside of marginal frame is equipped with the round recess, the recess be located graphite frame inboard, the left and right sides of recess is equipped with locating part.
2. The apparatus of claim 1, wherein the positioning member is a positioning hole, a positioning post, a positioning block, a positioning sleeve, a guiding plate or a screw.
3. The graphite frame device for preventing the red color at the edge of the PECVD coating film as recited in claim 1, wherein the distance between the groove and the edge slide unit is 2-4 mm.
4. The graphite frame device for preventing the red color at the edge of a PECVD coating film as recited in claim 1, wherein the depth of the groove is greater than or equal to 2 mm.
5. The graphite frame device for preventing the red color at the edge of the PECVD coating film as recited in claim 1, wherein the depth of the groove is less than the thickness of the graphite frame.
6. The graphite frame device for preventing the red edge of the PECVD coating film as claimed in claim 1, wherein a plurality of slide units are distributed in an array, the number of rows is E, the number of columns is F, and both E and F are integers which are more than or equal to 2.
7. The apparatus of claim 6, wherein the number of rows is 4.
8. The apparatus of claim 6, wherein the number of columns is 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022487454.XU CN214004779U (en) | 2020-11-02 | 2020-11-02 | Graphite frame device for preventing PECVD (plasma enhanced chemical vapor deposition) coating edge from becoming red |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022487454.XU CN214004779U (en) | 2020-11-02 | 2020-11-02 | Graphite frame device for preventing PECVD (plasma enhanced chemical vapor deposition) coating edge from becoming red |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214004779U true CN214004779U (en) | 2021-08-20 |
Family
ID=77302848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022487454.XU Active CN214004779U (en) | 2020-11-02 | 2020-11-02 | Graphite frame device for preventing PECVD (plasma enhanced chemical vapor deposition) coating edge from becoming red |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214004779U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114774888A (en) * | 2021-09-30 | 2022-07-22 | 苏州迈为科技股份有限公司 | PECVD (plasma enhanced chemical vapor deposition) coating carrier plate and coating equipment |
-
2020
- 2020-11-02 CN CN202022487454.XU patent/CN214004779U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114774888A (en) * | 2021-09-30 | 2022-07-22 | 苏州迈为科技股份有限公司 | PECVD (plasma enhanced chemical vapor deposition) coating carrier plate and coating equipment |
| CN114774888B (en) * | 2021-09-30 | 2024-02-23 | 苏州迈为科技股份有限公司 | PECVD coating film carrier plate and coating equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4438724A (en) | Grooved gas gate | |
| CN214004779U (en) | Graphite frame device for preventing PECVD (plasma enhanced chemical vapor deposition) coating edge from becoming red | |
| CN100594622C (en) | Ultrathin silicon based particle detector and preparing method thereof | |
| CN110449734B (en) | Method for preparing conductive pattern by laser-induced reverse transfer under gas protection | |
| US4537795A (en) | Method for introducing sweep gases into a glow discharge deposition apparatus | |
| US20230027683A1 (en) | Chamber injector | |
| CA2524482A1 (en) | Substrate transfer device for thin-film deposition apparatus | |
| CN106435522B (en) | The PECVD depositing operation of crystal silicon solar battery aluminum oxide passivation film | |
| CN101748378B (en) | Film-forming carrier board and production method of solar batteries | |
| CN201681788U (en) | Reaction chamber part and plasma processing device employing same | |
| CN105304730A (en) | MWT cell with back passive film and preparation method thereof | |
| CN205443442U (en) | A support plate for HIT solar cell coating film | |
| CN103413868A (en) | Preparing process for multilayer film of crystalline silicon solar cell | |
| CN101859801A (en) | Discharge electrode plate array for thin film solar cell settling | |
| JPS60116126A (en) | Plasma cvd device | |
| US20080289687A1 (en) | Methods for depositing a silicon layer on a laser scribed transmitting conductive oxide layer suitable for use in solar cell applications | |
| CN106048561A (en) | Atomic layer deposition device and method | |
| JP2002093722A (en) | Plasma cvd system, method of forming thin film and method of manufacturing solar cell | |
| CN104952978A (en) | Solar cell coating technology | |
| CN113192822A (en) | Wafer electroplating method and wafer electroplating clamp | |
| CA1214751A (en) | Baffle system for glow discharge deposition apparatus | |
| KR100927509B1 (en) | A method of depositing a silicon layer over a laser scribed transmissive conductive oxide layer suitable for use in the solar cell field | |
| CN216738528U (en) | Novel graphite boat | |
| CN203071117U (en) | Graphite plate | |
| CN109119322A (en) | A kind of enhanced plasma source of magnetic |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |