CN213943561U - Nozzle and nozzle system - Google Patents

Abstract

The utility model discloses a nozzle and nozzle system for process chamber carrier gas in to semiconductor equipment, the nozzle is equipped with first even air cavity, a plurality of first air supply channel and a plurality of second air supply channel, first even air cavity is located in the nozzle, it is a plurality of first air supply channel and a plurality of second air supply channel all encircles the axis setting of nozzle, each first air supply channel's one end all is used for and first air supply intercommunication, each first air supply channel's the other end all with first even air cavity intercommunication, each second air supply channel's one end all with first even air cavity intercommunication, each second air supply channel's the other end all be used for with process chamber intercommunication. The nozzle can solve the problem that the distribution uniformity of process gas in a process chamber is still relatively poor due to different flow rates in different edge air inlet holes caused by different distances between different edge air inlet holes and air supply holes in the conventional nozzle.

Description

Nozzle and nozzle system

Technical Field

The utility model relates to a semiconductor processing equipment technical field especially relates to a nozzle and nozzle system.

Background

During semiconductor processing, it is often necessary to etch the material being etched by means of a plasma generated by ionization of the process gas. Semiconductor equipment includes a process chamber into which process gases are typically injected through a nozzle. In order to improve the distribution uniformity of the process gas in the process chamber, the current nozzles are generally provided with an edge gas inlet structure and a center gas inlet structure to respectively spray the process gas to the edge region and the center region of the process chamber. Because the process chamber is a three-dimensional structure, the edge air inlet structure generally includes a plurality of edge air inlets, and the plurality of edge air inlets are disposed around the central air inlet structure, so as to further improve the uniformity of the process gas sprayed into the process chamber by means of the plurality of edge air inlets. At present, generally set up the gas circuit connecting piece above the nozzle, the gas circuit connecting piece is equipped with annular intercommunication chamber, all communicates with annular intercommunication chamber through making a plurality of edge inlet ports for only set up one on the gas circuit connecting piece with the mutual air feed hole that communicates in annular intercommunication chamber can feed air simultaneously for a plurality of edge inlet ports, thereby can reduce the degree of difficulty of feeding air for a plurality of edge inlet ports.

However, in the implementation process of the above-mentioned technical solutions, because the lengths of the paths between the air feed holes and the different edge air inlet holes are different, in the process of feeding air to the plurality of edge air inlet holes, the flow rate of the edge air inlet hole closer to the air feed hole is greater than the flow rate of the edge air inlet hole farther from the air feed hole, so that the distribution uniformity of the process gas in the process chamber is still relatively poor.

SUMMERY OF THE UTILITY MODEL

The utility model discloses a nozzle and nozzle system to the interval that leads to different marginal inlet ports is different because of the difference in solving present nozzle between the marginal inlet port and the hole of supplying gas, and the distribution uniformity that causes the process gas in the process cavity is relatively poor problem still.

In order to solve the above problem, the utility model adopts the following technical scheme:

in a first aspect, an embodiment of the present invention discloses a nozzle for delivering gas to a process chamber in a semiconductor device, the nozzle is provided with a first gas distribution chamber, a plurality of first gas supply channels and a plurality of second gas supply channels, the first gas distribution chamber is located in the nozzle, the plurality of first gas supply channels and the plurality of second gas supply channels all surround the axis of the nozzle, each of the one ends of the first gas supply channels is used for communicating with a first gas source, each of the other ends of the first gas supply channels is communicated with the first gas distribution chamber, each of the one ends of the second gas supply channels is communicated with the first gas distribution chamber, and each of the other ends of the second gas supply channels is used for communicating with the process chamber.

In a second aspect, an embodiment of the present invention discloses a nozzle system, which includes a gas circuit connector and a nozzle, wherein,

the nozzle is provided with a first air homogenizing cavity, a plurality of first air supply channels and a plurality of second air supply channels, the first air supply channels are communicated with the second air supply channels through the first air homogenizing cavity, the air path connecting piece is provided with a first air source channel, the first air source channel is used for being connected with a first air source, and one end of each first air supply channel is communicated with the first air source channel;

or the nozzle is provided with a first air homogenizing chamber, a second air homogenizing chamber, a plurality of first air supply channels, a plurality of second air supply channels, a plurality of third air supply channels and a plurality of fourth air supply channels, the plurality of first air supply channels are communicated with the plurality of second air supply channels through the first air homogenizing chamber, the plurality of third air supply channels are communicated with the plurality of fourth air supply channels through the second air homogenizing chamber, the air path connecting piece is provided with a first air source channel and a second air source channel, the first air source channel is used for being connected with a first air source, one end of each first air supply channel is communicated with the first air source channel, the second air source channel is used for being connected with a second air source, and one end of each third air supply channel is communicated with the second air source channel.

The utility model discloses a technical scheme can reach following beneficial effect:

the embodiment of the utility model discloses nozzle to process chamber conveying gas in to the semiconductor equipment. One end of each first air supply channel in the nozzle is communicated with a first air source, the other end of each first air supply channel is communicated with a first air homogenizing cavity, and the first air supply channels can convey the air input from the first air source to the first air homogenizing cavity; and one end of each second air supply channel in the nozzle is communicated with the first air homogenizing cavity, and the other end of each second air supply channel is communicated with the process cavity, so that the gas conveyed to the first air homogenizing cavity is conveyed into the process cavity through the second air supply channels. Because the plurality of first gas supply channels and the plurality of second gas supply channels are arranged around the axis of the nozzle, the plurality of second gas supply channels can supply gas to all places of the process cavity; and the plurality of first air supply channels are used for supplying air to the first air homogenizing chamber in a lump, so that the average degree of the air supplied to the first air homogenizing chamber is better, the air input into the first air homogenizing chamber can flow in the first air homogenizing chamber again, the air is averaged and uniformly flowed again in the process of flowing from the first air homogenizing chamber to the plurality of second air supply channels, the air flow in the plurality of second air supply channels is further homogenized, the air flow in each second air supply channel is basically equal, the amount of the air supplied to different positions in the process chamber by different second air supply channels in unit time is basically equal, and the uniformity degree of the air in the process chamber can be further improved.

Drawings

The accompanying drawings, which are described herein, serve to provide a further understanding of the invention and constitute a part of this specification, and the exemplary embodiments and descriptions thereof are provided for explaining the invention without unduly limiting it. In the drawings:

FIG. 1 is an assembled cross-sectional view of a nozzle according to an embodiment of the present invention;

FIG. 2 is a cross-sectional view of the nozzle assembly of the present invention in another orientation;

fig. 3 is a schematic structural view of a nozzle body in the nozzle disclosed in the embodiment of the present invention;

FIG. 4 is a schematic cross-sectional view of the structure shown in FIG. 3, taken along A-A;

fig. 5 is a schematic structural view of a nozzle head in a nozzle disclosed in an embodiment of the present invention;

FIG. 6 is a schematic cross-sectional view of the structure shown in FIG. 5 in the direction B-B;

fig. 7 is a schematic perspective view of a nozzle according to an embodiment of the present invention;

fig. 8 is a schematic perspective view of a partial structure in a nozzle according to an embodiment of the present invention;

fig. 9 is a schematic perspective view of the structure of the other part of the nozzle disclosed in the embodiment of the present invention;

fig. 10 is another schematic structural view of a nozzle head in a nozzle according to an embodiment of the present invention.

Description of reference numerals:

100-nozzle body, 110-first air feed channel, 130-third air feed channel, 150-fifth air feed channel,

200-nozzle head, 210-first air homogenizing chamber, 220-second air supply channel, 230-second air homogenizing chamber, 240-fourth air supply channel, 260-sixth air supply channel,

300-gas path connector, 310-first gas source channel, 320-second gas source channel, 330-gas path channel,

410-screw, 420-pin, 430-sealing ring, 440-nozzle snap ring, 450-fixing piece, 460-ceramic upper cover, 470-coil.

Detailed Description

To make the purpose, technical solution and advantages of the present invention clearer, the following will combine the embodiments of the present invention and the corresponding drawings to clearly and completely describe the technical solution of the present invention. It is to be understood that the embodiments described are only some embodiments of the invention, and not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

The technical solutions disclosed in the embodiments of the present invention are described in detail below with reference to the accompanying drawings.

As shown in fig. 1-10, an embodiment of the present invention discloses a nozzle, which can be used in a nozzle system, the nozzle system further includes a gas circuit connector 300, and the nozzle can be connected with the gas circuit connector 300 to deliver gas to a process chamber in a semiconductor device. In detail, one end of the nozzle is connected to the gas path connector 300, and the other end of the nozzle may communicate with a process chamber of the semiconductor device, so that the process gas input from the gas path connector 300 is fed into the process chamber through the nozzle.

The nozzle is provided with a first air homogenizing chamber 210, a plurality of first air supply channels 110 and a plurality of second air supply channels 220, the first air homogenizing chamber 210 is positioned in the nozzle, the plurality of first air supply channels 110 and the plurality of second air supply channels 220 are arranged around the axis of the nozzle, one end of each first air supply channel 110 is communicated with a first air source, the other end of each first air supply channel 110 is communicated with the first air homogenizing chamber 210, one end of each second air supply channel 220 is communicated with the first air homogenizing chamber 210, and the other end of each second air supply channel 220 is communicated with the process chamber so as to convey process gas input by the first air source into the process chamber through the nozzle, wherein the first air source can be equipment such as an air storage tank.

Specifically, the number of the first air supply channel 110 and the number of the second air supply channel 220 may be equal or unequal, and parameters such as the cross-sectional shape and the cross-sectional area of the first air supply channel 110 and the second air supply channel 220 may be determined according to actual conditions, and similarly, the cross-sectional shape of the first air homogenizing chamber 210 may also be selected according to actual requirements. The first air supply channel 110 and the second air supply channel 220 may be formed by etching, drilling, or the like, and the first air uniforming chamber 210 may be formed in the nozzle by limiting the etching direction, or the like.

In order to ensure that the gas flow rates in the second gas supply channels 220 are as equal as possible, the cross-sectional areas of the second gas supply channels 220 may be equal, and optionally, the cross-sectional shapes of the second gas supply channels 220 are also the same, which may further enable the gas flow rates in different second gas supply channels 220 to be approximately equal, thereby ensuring that the supply amounts of the process gases at different positions in the process chamber corresponding to the second gas supply channels 220 are substantially equal, and improving the distribution uniformity of the process gases in the process chamber. In addition, the cross-sectional areas of the first gas supply channels 110 may be the same or different, for example, the cross-sectional area of the first gas supply channel 110 closer to the first gas source among the first gas supply channels 110 may be relatively smaller, and the cross-sectional area of the first gas supply channel 110 farther from the first gas source may be relatively larger, which may also make the flow rates of the gases in the first gas supply channels 110 more uniform.

Moreover, the distribution manner of the second gas supply channels 220 may also be determined according to the overall shape of the process chamber, for example, if the process chamber is in a cubic shape, the second gas supply channels 220 may be arranged in a rectangular shape, and if the process chamber is in a cylindrical cavity, the second gas supply channels 220 may be arranged in a circular shape, thereby ensuring that the overall distribution uniformity of the process gas in the process chamber is high. In addition, the second gas supply channels 220 may be uniformly distributed to ensure that the volumes of the regions in the process chamber corresponding to the second gas supply channels 220 are substantially equal, so that the second gas supply channels 220 may uniformly supply the process gas to different positions in the process chamber.

Accordingly, the arrangement of the first air uniforming chamber 210 is also related to the distribution of the plurality of first air supply channels 110 and the plurality of second air supply channels 220, and the first air uniforming chamber 210 functions to allow the plurality of second air supply channels 220 to communicate with the plurality of first air supply channels 110 through an intermediate medium of the first air uniforming chamber 210.

The embodiment of the utility model discloses nozzle, nozzle can be to the process chamber conveying gas in the semiconductor equipment. One end of each first air supply channel 110 in the nozzle is communicated with a first air source, the other end of each first air supply channel 110 is communicated with a first air homogenizing chamber 210, and the first air supply channel 110 can convey the gas input from the first air source to the first air homogenizing chamber 210; and, one end of each second air supply channel 220 in the nozzle is communicated with the first air homogenizing chamber 210, and the other end of each second air supply channel 220 can be communicated with the process chamber, so that the gas delivered to the first air homogenizing chamber 210 is delivered into the process chamber through the second air supply channel 220. Since the plurality of first gas delivery channels 110 and the plurality of second gas delivery channels 220 are disposed around the axis of the nozzle, the plurality of second gas delivery channels 220 can deliver gas everywhere in the process chamber; moreover, the plurality of first air supply channels collectively supply air to the first air homogenizing chamber 210, so that the average degree of the air supplied to the first air homogenizing chamber 210 is better, and the air supplied into the first air homogenizing chamber 210 can flow in the first air homogenizing chamber 210 again, so that the air is averaged and uniformly flowed again in the process of flowing from the first air homogenizing chamber 210 to the plurality of second air supply channels 220, the air flow in the plurality of second air supply channels 220 is further homogenized, the air flow in each second air supply channel 220 is basically equal, the amount of the air supplied to different positions in the process chamber by different second air supply channels 220 in unit time is basically equal, and the uniformity degree of the air in the process chamber can be further improved.

As described above, the first air homogenizing chamber 210 is disposed in a manner related to the plurality of first air feeding channels 110 and the plurality of second air feeding channels 220, and optionally, the first air homogenizing chamber 210 may be a closed annular space, that is, the gas may flow circularly in the first air homogenizing chamber 210 along a certain direction, and when the above technical solution is adopted, the gas delivered from the plurality of first air feeding channels 110 into the first air homogenizing chamber 210 has better fluidity in the first air homogenizing chamber 210, so that the distribution of the process gas in the first air homogenizing chamber 210 is more uniform, and further, the gas in the first air homogenizing chamber 210 may flow more uniformly to each of the second air feeding channels 220, thereby further improving the uniformity of the gas flow in each of the second air feeding channels 220. Also, the specific shape of the first plenum chamber 210 may be determined according to the arrangement of the plurality of second air supply channels 220, and is not limited herein.

To further promote uniformity of gas flow within each second plenum channel 220, optionally, the first plenum channels 110 are interleaved with the second plenum channels 220 along the axial direction of the nozzle. That is, the first air supply channel 110 is not opposite to the second air supply channel 220 in the axial direction of the nozzle, or one first air supply channel 110 is located between two adjacent second air supply channels 220 in the circumferential direction of the nozzle.

Since the gas has a certain flow rate during the gas transportation process, if a certain first gas channel 110 is disposed opposite to a certain second gas channel 220, the gas transported from the certain first gas channel 110 to the first gas homogenizing chamber 210 may directly flow into the second gas channel 220 opposite to the first gas channel 110 due to inertia, and cannot flow into the first gas homogenizing chamber 210, thereby weakening the gas homogenizing effect of the first gas homogenizing chamber 210. By adopting the above technical solution, the inner wall of the first air homogenizing chamber 210 can intercept the gas input from the first air supplying channel 110, so that the gas flows along the first air homogenizing chamber 210 to the opposite sides of the first air supplying channel 110, and under the condition that the gas conveyed by the plurality of first air supplying channels 110 performs the above actions, the gas input into the first air homogenizing chamber 210 from the plurality of first air supplying channels 110 can be more uniformly distributed at each position in the first air homogenizing chamber 210, so that the flow rates of the gas flowing into each second air supplying channel 220 are closer to or even equal to each other.

Specifically, the first air supply channel 110 and the second air supply channel 220 may be uniformly distributed, and when the number of the first air supply channel 110 is different from that of the second air supply channel 220, the arrangement of the first air supply channel 110 and the arrangement of the second air supply channel 220 may be determined according to the actual number of the first air supply channel 110 and the actual number of the second air supply channel 220. For example, if the number of the first air supply channels 110 is two and the number of the second air supply channels 220 is four, the four second air supply channels 220 can be uniformly distributed on two opposite sides of the connecting line between the two first air supply channels 110.

Preferably, the number of the first air supply channels 110 is equal to that of the second air supply channels 220, and the plurality of first air supply channels 110 and the plurality of second air supply channels 220 are alternately arranged along the circumferential direction of the nozzle, so that two opposite sides of any one first air supply channel 110 correspond to one second air supply channel 220, and two opposite sides of any one second air supply channel 220 are provided with one first air supply channel 110, which can further improve the uniformity of the gas flow in each second air supply channel 220. Of course, in the above embodiment, the cross-sectional areas of the first air supply channels 110 may be equal to each other, so as to further improve the uniformity of the gas flow in the second air supply channels 220.

Further, the angle of the interval between any one first air supply channel 110 and the two adjacent second air supply channels 220 may be equal, that is, the first air supply channel 110 is located at the middle position of the two second air supply channels 220. More specifically, the total number n of the first air feed channels 110 and the second air feed channels 220, and the angles α, n and α sandwiched between any adjacent first air feed channels 110 and second air feed channels 220 are correlated with each other, as shown in fig. 8, where α is 360/2n, that is, 180/n.

Optionally, the sum of the cross-sectional areas of the plurality of first gas delivery channels 110 is greater than the sum of the cross-sectional areas of the plurality of second gas delivery channels 220, in which case, the flow rate of the gas in the second gas delivery channels 220 is greater than the flow rate of the gas in the first gas delivery channels 110, so that the gas can be sprayed into the process chamber at a greater speed, ensuring a higher uniformity of the gas in the process chamber; meanwhile, under the condition of adopting the above technical scheme, the gas can be subjected to a certain pressure in the process of flowing from the first gas supply channel 110 to the second gas supply channel 220, so that the gas is not easy to directly flow to the second gas supply channel 220, but the gas flows from the first gas supply channel 110 to the first gas homogenizing chamber 210, and then the gas tends to flow in the first gas homogenizing chamber 210 to the opposite sides of the first gas supply channel 110, and the distribution uniformity of the gas in the first gas homogenizing chamber 210 is further improved.

Specifically, the cross-sectional areas of the first air supply channels 110 and the second air supply channels 220 may be equal to each other, so as to improve the air supply uniformity of the second air supply channels 220. In this case, the gas flow rates of the plurality of first gas supply channels 110 are more uniform, and the design difficulty and the processing difficulty of the plurality of first gas supply channels 110 and the plurality of second gas supply channels 220 can be made lower. Based on the above, the number of the first air supply channels 110 and the number of the second air supply channels 220 may be equal, and in this case, the sectional area of each first air supply channel 110 may be larger than the sectional area of each second air supply channel 220.

Alternatively, both the first gas feed channel 110 and the second gas feed channel 220 may be cylindrical spaces, in which case the first gas feed channel 110 and the second gas feed channel 220 may be processed with relatively small difficulty and the size of the process gas delivery path may be minimized. Optionally, the diameter of each first air supply channel 110 is D6, and may be 0.05mm or more and D6 or less and 0.35mm or less, and correspondingly, the diameter of each second air supply channel 220 is D11, and may be 0.05mm or more and D11 or less and 0.25mm or less. In this case, the sectional area of each first gas supply channel 110 is larger than the sectional area of each second gas supply channel 220, and the sectional areas of the first gas supply channel 110 and the second gas supply channel 220 are relatively small, so that the probability of process gas being ionized in the first gas supply channel 110 and the second gas supply channel 220 is reduced, particles and metal ions generated by etching the inner wall of the nozzle are prevented from polluting the process chamber with particles and metal, and the service life of the nozzle can be prolonged. Still further, 0.1mm ≦ D6 ≦ 0.3mm, correspondingly, 0.1mm ≦ D11 ≦ 0.2mm, optionally, 0.5mm ≦ D6-D11 ≦ 0.2 mm.

Further, a port of the first air supply channel 110, which is away from the first air supply, is connected to the top wall of the first air homogenizing chamber 210, and along the axial direction of the nozzle, a projection of the port of the first air supply channel 110, which is away from the first air supply, is located within a projection of the top wall of the first air homogenizing chamber 210. In other words, the structure of the first air uniforming chamber 210 interconnecting with the first air supply channel 110 is the top wall of the first air uniforming chamber 210, the size of which is larger than the size of the port of the first air supply channel 110 in the corresponding direction. By adopting the technical scheme, the size of the top wall of the first uniform air cavity 210 is relatively large, the situation that the top wall of the first uniform air cavity 210 shields the port of the first air supply channel 110 cannot occur, and the high air supply efficiency of the first air supply channel 110 is ensured.

Specifically, the longitudinal section of the first uniform air cavity 210 may be an inverted triangle, and the longitudinal section of the first uniform air cavity 210 is a section of the first uniform air cavity 210 sectioned by a plane on which the axis of the first uniform air cavity 210 is located. Of course, the longitudinal section of the first air uniforming chamber 210 may also be a circular surface, in which case the top wall of the first air uniforming chamber 210 is the upper half of the inner surface of the first air uniforming chamber 210.

More specifically, the longitudinal section of the first air uniforming chamber 210 may also be a rectangular surface, and the first air uniforming chamber 210 may be an annular space. As shown in fig. 3 and 6, the diameter of the outer side wall and the diameter of the inner side wall of the first plenum chamber 210 are D15 and D14, respectively, as described above, the first air supply channel 110 may be a cylindrical space, and the diameter of the first air supply channel 110 is D6, alternatively, 0 ≦ or (D15-D14)/2-D6 ≦ 1mm, in which case it is ensured that the process gas in the first air supply channel 110 can be uniformly fed into the first plenum chamber 210 for uniform flow.

Further, the depth H of the first uniform air cavity 210 may be determined according to actual requirements, and the depth of the first uniform air cavity 210 is the size of the first uniform air cavity 210 in the axial direction of the nozzle. Alternatively, as shown in FIG. 6, 1mm ≦ H ≦ 2 mm.

In order to guarantee that the utility model discloses the even degree of process gas of nozzle to process cavity internal spraying send is higher, furtherly, the nozzle is equipped with the even air cavity 230 of second, a plurality of third air supply channel 130 and a plurality of fourth air supply channel 240, the even air cavity 230 of second is located the nozzle, and the even air cavity 230 of second is located the inboard of first even air cavity 210, the axis setting around the nozzle is all had to a plurality of third air supply channel 130 and a plurality of fourth air supply channel 240, the one end of each third air supply channel 130 all communicates with the second air supply, the other end of each third air supply channel 130 all communicates with the even air cavity 230 of second, the one end of each fourth air supply channel 240 all communicates with the even air cavity 230 of second, the other end of each fourth air supply channel 240 all is used for communicating with the process cavity.

When the above technical solution is adopted, by providing the plurality of third gas supply channels 130 on the inner sides of the plurality of first gas supply channels 110 and the plurality of fourth gas supply channels 240 on the inner sides of the plurality of second gas supply channels 220, the number of structures (specifically, including the second gas supply channels 220 and the fourth gas supply channels 240) in the nozzle corresponding to the process chamber is further increased, and when the number of the structures is increased, the volume of the region in the process chamber corresponding to each structure is relatively small, or when the regions in the process chamber corresponding to each of the structures are overlapped with each other, the degree of uniformity of distribution of the process gas at each position in the process chamber can be further ensured to be relatively high.

The second air uniforming chamber 230 functions to communicate the plurality of third air supply channels 130 and the plurality of fourth air supply channels 240, and similarly to the first air uniforming chamber 210, the second air uniforming chamber 230 may also extend in the arrangement direction of the plurality of fourth air supply channels 240. Alternatively, the plurality of fourth air supply channels 240 are arranged in a circular ring shape, and the second air uniforming chamber 230 may have an open ring structure or a closed ring structure.

Of course, in the case that a plurality of second air supply channels 220 and a plurality of fourth air supply channels 240 are provided, the plurality of second air supply channels 220 and the plurality of fourth air supply channels 240 are uniformly arranged, and the second air supply channels 220 and the fourth air supply channels 240 are relatively uniformly distributed, so as to ensure that the volumes of the regions in the process chamber corresponding to any one of the second air supply channels 220 or any one of the fourth air supply channels 240 are relatively uniform.

Accordingly, the sectional areas of the plurality of fourth air feeding channels 240 may have the same shape and size. The shape and size of the cross-sectional area of the fourth air supply channel 240 may be the same as or different from the shape and size of the cross-sectional area of the second air supply channel 220.

Further, the number of the third air supply channels 130 and the number of the fourth air supply channels 240 may be equal, and the plurality of third air supply channels 130 and the plurality of fourth air supply channels 240 may be alternately distributed in the circumferential direction of the nozzle, that is, one fourth air supply channel 240 may be disposed between any two third air supply channels 130, and one third air supply channel 130 may be disposed between any two fourth air supply channels 240. Also, any one of the third air supply channels 130 may be located at an intermediate position between the adjacent two fourth air supply channels 240.

Further, both the third air supply channel 130 and the fourth air supply channel 240 may be cylindrical spaces, and the sectional area of any one of the third air supply channels 130 may be larger than the sectional area of any one of the fourth air supply channels 240. Specifically, the diameter of each third air supply channel 130 is D5, and D5 is 0.05mm or more and 0.35mm or less, and correspondingly, the diameter of each fourth air supply channel 240 is D10, and D10 is 0.05mm or more and 0.25mm or less. More specifically, 0.1mm ≦ D5 ≦ 0.3mm, correspondingly, 0.1mm ≦ D10 ≦ 0.2mm, alternatively, 0.5mm ≦ D5-D10 ≦ 0.2 mm.

Further, the number of the third air feed channels 130 and the number of the fourth air feed channels 240 are equal to each other, and the total number of the third air feed channels 130 and the fourth air feed channels 240 is N, and an angle δ is formed between any adjacent third air feed channels 130 and fourth air feed channels 240 in the circumferential direction of the nozzle, where N and δ are correlated with each other, as shown in fig. 9, δ is 360/2N, that is, δ is 180/N.

Based on the above embodiment, the second air homogenizing chamber 230 may also be an annular space, the longitudinal section of the second air homogenizing chamber 230 may be a rectangular structure, the top wall of the second air homogenizing chamber 230 is connected to one end port of the third air feeding channel 130, and in the axial direction of the nozzle, the projection of the port of the third air feeding channel 130 may be located within the projection of the top wall of the second air homogenizing chamber 230. Of course, the second uniform air cavity 230 may have other structures, and is not listed here for brevity.

Optionally, the nozzle is provided with a fifth gas supply channel 150 and a sixth gas supply channel 260, and the axes of the fifth gas supply channel 150 and the sixth gas supply channel 260 coincide with the axis of the nozzle, i.e. the central region of the nozzle is also provided with a channel for delivering gas, so as to further improve the distribution uniformity of the process gas in the process chamber. And one end of the fifth air supply channel 150 is communicated with the second air source, the other end of the fifth air supply channel 150 is communicated with the second air homogenizing chamber 230, one end of the sixth air supply channel 260 is communicated with the second air homogenizing chamber 230, and the other end of the sixth air supply channel 260 is used for being communicated with the process chamber. In the case of the above technical solution, the fifth gas supply channel 150 may cooperate with the plurality of third gas supply channels 130, and all the supplied process gases are supplied into the second gas homogenizing chamber 230, the process gases are homogenized in the second gas homogenizing chamber 230, and then the process gases may be supplied to the sixth gas supply channel 260 and the plurality of fourth gas supply channels 240 in substantially equal amounts, so that the gas flow rates in the sixth gas supply channel 260 and the plurality of fourth gas supply channels 240 are substantially equal, and the amount of the process gases supplied to different regions in the process chamber per unit time is further increased.

Specifically, it is possible to ensure that the fifth air supply channel 150 and the plurality of third air supply channels 130 can be communicated with the second air homogenizing chamber 230 and that the sixth air supply channel 260 and the plurality of fourth air supply channels 240 can be communicated with the second air homogenizing chamber 230 by enlarging the coverage of the second air homogenizing chamber 230. More specifically, the second plenum chamber 230 is a cylindrical space, in which case, on the one hand, the above object can be also achieved, and on the other hand, the volume of the second plenum chamber 230 can be further enlarged, so that the process gas delivered into the second plenum chamber 230 can be more uniformly flowed. More specifically, as shown in fig. 3 and 6, the diameter of the second plenum chamber 230 is D13, and the diameter of the second plenum chamber 230 is related to the distribution of the plurality of third air supply channels 130. Under the condition that the third air supply channels 130 are all cylindrical spaces with equal diameters and the third air supply channels 130 are uniformly arranged in a circular ring shape, D13- (D16+ D5/2) can be more than or equal to 0 and less than or equal to 1mm, wherein D5 is the diameter of the third air supply channel 130, and D16 is the center distance between two third air supply channels 130 which are farthest away from each other in the third air supply channels 130.

As described above, the axes of the fifth air supply channel 150 and the sixth air supply channel 260 coincide with the axis of the nozzle, and the plurality of third air supply channels 130 and the plurality of fourth air supply channels 240 are all disposed around the axis of the nozzle, and it should be noted that the size of the fifth air supply channel 150 needs to be determined according to the distance between two third air supply channels 130 having the smallest distance among the plurality of third air supply channels 130, and similarly, the size of the sixth air supply channel 260 needs to be determined according to the distance between two fourth air supply channels 240 having the smallest distance, so that the fifth air supply channel 150 does not communicate with the third air supply channels 130, and the sixth air supply channel 260 does not communicate with the third air supply channels 130.

Specifically, the third air supply channel 130, the fourth air supply channel 240, the fifth air supply channel 150, and the sixth air supply channel 260 may each be a cylindrical space, and the dimensions of the third air supply channel 130 and the fourth air supply channel 240 may follow the disclosure of the above embodiments. Based on the above situation, the diameter of the fifth air supply channel 150 is D4, the diameter of the sixth air supply channel 260 is D9, and D4 is more than or equal to 0.05mm and less than or equal to 0.35mm, and D9 is more than or equal to 0.05mm and less than or equal to 0.25 mm. More specifically, 0.1mm ≦ D4 ≦ 0.3mm, correspondingly, 0.1mm ≦ D9 ≦ 0.2mm, alternatively, 0.5mm ≦ D4-D9 ≦ 0.2 mm.

Additionally, as described above, the embodiment of the utility model discloses an one end of nozzle can be connected with gas circuit connecting piece 300, be equipped with first gas source passageway 310 and second gas source passageway 320 on the gas circuit connecting piece 300, first gas source passageway 310 and first gas source intercommunication, second gas source passageway 320 and second gas source intercommunication, optionally, still be equipped with gas circuit passageway 330 on the gas circuit connecting piece, first gas source passageway 310 and gas circuit passageway 330 intercommunication, a plurality of first gas channel 110 of supplying air pass through gas circuit passageway 330 and first gas source intercommunication, and gas circuit passageway 330 is closed annular structure, thereby promote process gas carry to gas circuit passageway 330 in back from first gas source passageway 310, the even degree of process gas in gas circuit passageway 330. Correspondingly, the specific distribution structure of the air path channel 330 may be determined according to the distribution of the plurality of first air supply channels 110, and in the case that the plurality of first air supply channels 110 are uniformly distributed in an annular shape, the air path channel 330 may also be an annular space with a rectangular longitudinal section. Also, the fifth air supply channel 150 and the plurality of third air supply channels 130 may be communicated with the second air supply through the second air supply channel 320, in which case, similarly to the air path channel 330, the structure of the second air supply channel 320, which is connected with the fifth air supply channel 150 and the plurality of third air supply channels 130, may also be a cylindrical space.

Specifically, as shown in fig. 1 and 2, the diameter of the structure interconnecting the fifth air supply channel 150 and the plurality of third air supply channels 130 in the second air supply channel 320 is D1, and the value of D1 is related to the distance between the two third air supply channels 130 which are farthest away. The diameter of the inner sidewall of the air path channel 330 is D2, the diameter of the outer sidewall is D3, and the difference between D3 and D2 is related to the size of the first air supply channel 110.

Optionally, the present invention discloses a nozzle comprising a nozzle body 100 and a nozzle head 200, wherein one end of the nozzle body 100 is connected to a first gas source, the other end of the nozzle body 100 is detachably connected to one end of the nozzle head 200, and the other end of the nozzle head 200 is used for communicating with a process chamber. As described above, the nozzle disclosed in the embodiments of the present application includes various structures, for example, the nozzle may be provided with the first air uniforming chamber 210, the plurality of first air supply channels 110, and the plurality of second air supply channels 220, in which case the plurality of first air supply channels 110 are provided in the nozzle body 100, and the plurality of second air supply channels 220 are provided in the nozzle head 200. In other embodiments, the nozzle may be provided with the first air uniforming chamber 210, the second air uniforming chamber 230, the plurality of first air supply channels 110, the plurality of second air supply channels 220, the plurality of third air supply channels 130, and the plurality of fourth air supply channels 240, in which case the plurality of first air supply channels 110 and the plurality of third air supply channels 130 are provided on the nozzle body 100, and the plurality of second air supply channels 220 and the plurality of fourth air supply channels 240 are provided on the nozzle head 200. In another embodiment, the nozzle may be further provided with a fifth air supply channel 150 and a sixth air supply channel 260, in which case the fifth air supply channel 150 may be provided on the nozzle body 100 and the sixth air supply channel 260 may be provided on the nozzle head 200.

As described above, the first, second, third, fourth, fifth, and sixth air feed channels 110, 220, 130, 240, 150, and 260 may each be a cylindrical space. Optionally, as shown in fig. 10, at least one of the six structures may also be in other patterns, such as a spiral structure. In the case of the above technical solution, the difficulty of flowing the process gas in the channel may be increased, so that the gas with a certain flow rate may be prevented from directly flowing from the first gas feeding channel 110 (or the third gas feeding channel 130 or the fifth gas feeding channel 150) into the second gas feeding channel 220 (or the fourth gas feeding channel 240 or the sixth gas feeding channel 260) under the inertia effect, and the distribution uniformity of the gas in the process chamber may be further improved.

It can be seen from the above that, in the using process of the nozzle, one end of the nozzle away from the gas circuit connection part 300 generally needs to extend into the process chamber, and therefore, after the nozzle is used for a period of time, one end of the nozzle away from the gas circuit connection part 300 generally will be reacted by plasma in the process chamber, so that the end of the nozzle is damaged by etching, by adopting the above technical scheme, the nozzle head 200 can extend into the process chamber, if the nozzle head 200 is damaged by plasma etching, in order to prevent the process from being affected by metal ions, the whole nozzle can be taken down from the process chamber, and the nozzle head 200 is taken down from the nozzle body 100, and a new nozzle head 200 is replaced. This may reduce the process cost to some extent. In addition, the nozzle head 200 can be coated to further prevent the inner wall of the nozzle from being etched by the plasma, so that the service life of the nozzle is prolonged, and the yield of the process can be improved.

Specifically, the nozzle head 200 and the nozzle body 100 may be detachably connected to each other to be fixed to each other by snap-fitting or the like, or the nozzle head 200 may be fixed to the nozzle body 100 by screws 410, in which case, through-holes may be formed in the nozzle body 100 and fitting holes may be formed at corresponding positions of the nozzle head 200, and the nozzle head 200 may be stably fixed to the nozzle body 100 by passing the screws 410 through the through-holes and protruding into the fitting holes. Further, the number of the through holes and the number of the fitting holes may be plural, and the plural through holes and the plural fitting holes correspond to each other one by one and are provided with the screws 410. Specifically, as shown in fig. 3 and 5, the diameter of the through hole may be D8, the diameter of the mating hole may be determined according to the size of the screw 410, and the screw 410 may be an M4 flat head resin screw 410, so as to ensure that a relatively stable fixed relationship can be formed between the nozzle body 100 and the nozzle head 200.

Further, pin holes may be formed in both the nozzle body 100 and the nozzle tip 200 to provide a positioning function by the pins 420 during the assembly of the nozzle body 100 and the nozzle tip 200, thereby reducing the difficulty of assembly between the nozzle body 100 and the nozzle tip 200. Specifically, as shown in fig. 3 and 5, the diameter of the pin hole in the nozzle body 100 may be D7, the diameter of the pin hole in the nozzle head 200 may be D12, and accordingly, the size of the pin 420 may be correspondingly determined according to the size of the two pin holes. The pin hole may be provided at a middle position between the adjacent two through holes.

As described above, the first air supply passages 110 are provided in the nozzle body 100, and the second air supply passages 220 are provided in the nozzle head 200. In the case that the size of the nozzle in the axial direction is not changed, compared to the case of the integrated nozzle, the processing difficulty of the first air supply channel 110 and the second air supply channel 220 is relatively low, and the diameter of the hole that can be processed becomes smaller for the smaller axial size based on the processing capability of the existing drilling process, and further, in the case that the above technical solution is adopted, the respective hole diameters of the second air supply channel 220, the fourth air supply channel 240, and the sixth air supply channel 260 can be processed to be smaller, so that the air supply accuracy when the process gas is supplied by the above structures is higher, the air supply uniformity is further improved, and on the other hand, the process gas in the second air supply channel 220, the fourth air supply channel 240, and the sixth air supply channel 260 is not easily ionized by reducing the sectional area and the volume of the above components, or the process gas in the second gas supply channel 220, the fourth gas supply channel 240 and the sixth gas supply channel 260 is ionized in a small amount, so that the inside of the nozzle can be prevented from being etched, and the process yield can be improved.

As described above, in the case where the nozzle body 100 and the nozzle head 200 are separately molded, in order to prevent leakage from a gap therebetween, it is preferable that a sealing ring 430 is provided between the nozzle body 100 and the nozzle head 200 as shown in fig. 2, and further, the number of the sealing rings 430 between the nozzle body 100 and the nozzle head 200 may be plural, so that the first air supply passage 110 and the third air supply passage 130 are isolated from each other, and the first air supply passage 110 is isolated from the outside of the nozzle, thereby precisely ensuring the ratio of air supply in the edge region and the center region of the nozzle. Similarly, a plurality of sealing rings 430 may be disposed between the air path connector 300 and the nozzle body 100 to isolate the first air source channel 310 and the air path channel 330 from each other and isolate the air path channel 330 from the outside of the air path connector 300.

In the case where the nozzle body 100 and the nozzle head 200 are separately molded, optionally, the first uniforming air chamber 210 is formed on a surface of the nozzle head 200 on a side facing the nozzle body 100, that is, a side of the nozzle head 200 facing the nozzle body 100 is provided with a recess, and the closed first uniforming air chamber 210 is formed by fitting the nozzle head 200 and the nozzle body 100 to each other. Under the condition of adopting above-mentioned technical scheme, can reduce the processing degree of difficulty of first even air cavity 210 on the one hand by a wide margin, on the other hand can promote the machining precision of first even air cavity 210 by a wide margin. Further, in the case where the second air uniforming chamber 230 is provided in the nozzle, the second air uniforming chamber 230 may also be provided on a side surface of the nozzle head 200 facing the nozzle body 100.

Of course, the nozzle may be mounted to the process chamber by other structures, including the nozzle retainer 440, the fixing member 450 and the air path connector 300, and the nozzle may be fixed to the ceramic cover 460 by the nozzle retainer 440 and the fixing member 450, and the sealing ring 430 may be disposed between the nozzle retainer 440 and the nozzle to further improve the sealing performance of the nozzle. In addition, the ceramic upper cover 460 may be provided with a coil 470, and the coil 470 may include a solid coil and/or a planar coil.

Based on the nozzle disclosed in any of the above embodiments, the embodiment of the present application further discloses a nozzle system, which includes the air path connector 300 and any of the above nozzles. As described above, there are various nozzle configurations, and accordingly, in the case where the nozzle configuration is different, the configuration of the air path connector 300 may be changed adaptively so that the air path connector 300 corresponds to the nozzle.

For example, in the case that the nozzle is provided with the first air uniforming chamber 210, the plurality of first air supply channels 110 and the plurality of second air supply channels 220, the plurality of first air supply channels 110 may be supplied with air by the first air source, in this case, the air path connector 300 is provided with the first air supply channel 310, the first air supply channel 310 is communicated with the first air supply, and the first air supply channel 310 can be communicated with the plurality of first air supply channels 110, so that the process gas input from the first air supply is input into the process chamber through the first air supply channel 110 and the second air supply channels 220.

In order to further improve the consistency of the gas input from the first gas source channel 310 into the plurality of first gas supply channels 110, the gas path connector 300 is further provided with a gas path channel 330, the first gas source channel 310 is communicated with the gas path channel 330, and the gas path channel 330 may be an annular space, so that the gas input from the first gas source channel 310 may be averaged in the gas path channel 330, and the flow rate of the gas flowing from the gas path channel 330 into each first gas supply channel 110 is approximately equal to each other. More specifically, the specific shape and the arrangement position of the air path channel 330 may be determined according to the arrangement orientation of the plurality of first air supply channels 110, so as to ensure that the plurality of first air supply channels 110 can all communicate with the air path channel 330.

In the above embodiment, the nozzle may be provided with a first uniform air cavity 210, a second uniform air cavity 230, a plurality of first air supply channels 110, a plurality of second air supply channels 220, a plurality of third air supply channels 130 and a plurality of fourth air supply channels 240, in this case, the plurality of first air supply channels 110 and the plurality of third air supply channels 130 are all required to be communicated with an air source, further, the air path connector 300 may be provided with a first air source channel 310 and a second air source channel 320, the plurality of first air supply channels 110 are communicated with the first air source channel 310, the plurality of second air supply channels 220 are communicated with the second air source channel, the first air source channel 310 is further communicated with the first air source, and the second air source channel 320 is further communicated with the second air source, so as to respectively supply the process gas into the process chamber through the plurality of second air supply channels 220 and the plurality of fourth air supply channels 240, thereby improving the uniformity of the gas in the process chamber.

The utility model discloses what the key description in the above embodiment is different between each embodiment, and different optimization characteristics are as long as not contradictory between each embodiment, all can make up and form more preferred embodiment, consider that the literary composition is succinct, then no longer describe here.

The above description is only an example of the present invention, and is not intended to limit the present invention. Various modifications and changes may occur to those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the claims of the present invention.

Claims (10)

1. A nozzle is used for supplying gas to a process cavity in semiconductor equipment, and is characterized in that the nozzle is provided with a first gas homogenizing cavity (210), a plurality of first gas supply channels (110) and a plurality of second gas supply channels (220), the first gas homogenizing cavity (210) is located in the nozzle, the plurality of first gas supply channels (110) and the plurality of second gas supply channels (220) are arranged around the axis of the nozzle, one end of each first gas supply channel (110) is used for being communicated with a first gas source, the other end of each first gas supply channel (110) is communicated with the first gas homogenizing cavity (210), one end of each second gas supply channel (220) is communicated with the first gas homogenizing cavity (210), and the other end of each second gas supply channel (220) is used for being communicated with the process cavity.

2. The nozzle of claim 1, wherein the first plenum chamber (210) is a closed annular space.

3. The nozzle of claim 1, wherein the first air delivery channel (110) and the second air delivery channel (220) are staggered with respect to each other along an axial direction of the nozzle.

4. The nozzle of claim 1, wherein a sum of cross-sectional areas of a plurality of the first air feed channels (110) is greater than a sum of cross-sectional areas of a plurality of the second air feed channels (220).

5. The nozzle of claim 4, wherein the first air feed channel (110) and the second air feed channel (220) are cylindrical spaces, each first air feed channel (110) has a diameter D6, 0.05mm D6 mm 0.35mm, each second air feed channel (220) has a diameter D11, 0.05mm D11 mm 0.25 mm.

6. The nozzle of claim 1, wherein a port of the first air supply channel (110) facing away from the first air supply is connected to a top wall of the first air uniforming chamber (210), and a projection of the port of the first air supply channel (110) facing away from the first air supply is located within a projection of the top wall of the first air uniforming chamber (210) in an axial direction of the nozzle.

7. The nozzle of claim 1, wherein the nozzle is further provided with a second plenum chamber (230), a plurality of third air feed channels (130), and a plurality of fourth air feed channels (240), the second plenum chamber (230) being located in the nozzle, the second air homogenizing chamber (230) is located on the inner side of the first air homogenizing chamber (210), the third air supply channels (130) and the fourth air supply channels (240) are arranged around the axis of the nozzle, one end of each third air supply channel (130) is used for being communicated with a second air source, the other end of each third air supply channel (130) is communicated with the second air homogenizing chamber (230), one end of each fourth air supply channel (240) is communicated with the second air homogenizing chamber (230), and the other end of each fourth air supply channel (240) is used for being communicated with the process chamber.

8. The nozzle of claim 7, wherein the nozzle is provided with a fifth air supply channel (150) and a sixth air supply channel (260), the axes of the fifth air supply channel (150) and the sixth air supply channel (260) are coincident with the axis of the nozzle, one end of the fifth air supply channel (150) is communicated with the second air supply source, the other end of the fifth air supply channel (150) is communicated with the second air homogenizing chamber (230), one end of the sixth air supply channel (260) is communicated with the second air homogenizing chamber (230), and the other end of the sixth air supply channel (260) is used for being communicated with the process chamber.

9. A nozzle according to claim 1, characterized in that the nozzle comprises a nozzle body (100) and a nozzle head (200), the nozzle body (100) being detachably connected with the nozzle head (200); wherein the content of the first and second substances,

the first air supply channels (110) are arranged on the nozzle body (100), the second air supply channels (220) are arranged on the nozzle head (200), and the first air homogenizing chamber (210) is positioned at one end, facing the nozzle body (100), of the nozzle head (200);

or, a plurality of the first air supply channels (110) are all arranged on the nozzle body (100), a plurality of the second air supply channels (220) are all arranged on the nozzle head (200), and the first air homogenizing chamber (210) is positioned at one end of the nozzle head (200) facing the nozzle body (100); the nozzle body (100) is also provided with a plurality of third air supply channels (130), the nozzle head (200) is also provided with a second air homogenizing chamber (230) and a plurality of fourth air supply channels (240), the second gas uniformizing chamber (230) is located at one end of the nozzle head (200) facing the nozzle body (100), the second air homogenizing chamber (230) is located on the inner side of the first air homogenizing chamber (210), the third air supply channels (130) and the fourth air supply channels (240) are arranged around the axis of the nozzle, one end of each third air supply channel (130) is used for being communicated with a second air source, the other end of each third air supply channel (130) is communicated with the second air homogenizing chamber (230), one end of each fourth air supply channel (240) is communicated with the second air homogenizing chamber (230), and the other end of each fourth air supply channel (240) is used for being communicated with the process chamber.

10. A nozzle system, comprising an air channel connection (300) and a nozzle according to any of claims 1-9,

the nozzle is provided with a first air homogenizing chamber (210), a plurality of first air supply channels (110) and a plurality of second air supply channels (220), the plurality of first air supply channels (110) are communicated with the plurality of second air supply channels (220) through the first air homogenizing chamber (210), the air path connecting piece (300) is provided with a first air source channel (310), the first air source channel (310) is used for being connected with a first air source, and one end of each first air supply channel (110) is communicated with the first air source channel (310);

or the nozzle is provided with a first air homogenizing chamber (210), a second air homogenizing chamber (230), a plurality of first air supply channels (110), a plurality of second air supply channels (220), a plurality of third air supply channels (130) and a plurality of fourth air supply channels, the plurality of first air supply channels (110) are communicated with the plurality of second air supply channels (220) through the first air homogenizing chamber (210), the plurality of third air supply channels (130) are communicated with the plurality of fourth air supply channels (240) through the second air homogenizing chamber (230), the air path connecting piece (300) is provided with a first air source channel (310) and a second air source channel (320), the first air source channel (310) is used for being connected with a first air source, one end of each first air supply channel (110) is communicated with the first air source channel (310), and the second air source channel (320) is used for being connected with a second air source, and one end of each third air supply channel (130) is communicated with the second air supply channel (320).

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