CN213887359U

CN213887359U - Brush is from belt cleaning device

Info

Publication number: CN213887359U
Application number: CN202022577197.9U
Authority: CN
Inventors: 王孝军; 范亚飞
Original assignee: Shanghai Yunzhe Mechanical And Electrical Technology Co ltd
Current assignee: Shanghai Yunzhe Mechanical And Electrical Technology Co ltd
Priority date: 2020-11-10
Filing date: 2020-11-10
Publication date: 2021-08-06
Anticipated expiration: 2030-11-10

Abstract

The application discloses brush is from belt cleaning device. The self-cleaning device comprises a lifting assembly, a rotating assembly, a swing arm mechanism, a brush autorotation assembly and a liquid storage mechanism. The lifting assembly provides lifting power for the rotating assembly. The rotating assembly provides rotating power for the swing arm mechanism. One end of the swing arm mechanism is connected with the upper end of the second connecting shaft, and the other end of the swing arm mechanism is connected with the brush. The brush self-rotating mechanism provides rotating power for the self-cleaning of the brush. The liquid storage mechanism is used for storing cleaning liquid. In the process of cleaning the wafer, the lifting assembly is used for lifting the rotating assembly, the swing arm mechanism is used for lifting the brush, the rotating assembly rotates to enable the brush to be over against the liquid storage mechanism, the lifting assembly is used for lowering the brush into cleaning liquid, and finally the brush self-rotating mechanism enables the brush to rotate to complete self-cleaning of the brush. The brush is timely cleaned in the wafer cleaning process, so that the good quality of the wafer can be effectively guaranteed, the working efficiency of an enterprise is improved, and manpower and time are saved.

Description

Brush is from belt cleaning device

Technical Field

The utility model relates to a cleaning equipment technical field especially relates to a brush is from belt cleaning device for wash the brush in the wafer cleaning process.

Background

With the rapid development of high and new technologies and the increase of uncertainty of international relations, the semiconductor technology, the LED technology, the camera technology and the like in China are rapidly developed at present, and the performance requirements on products are higher and higher.

Most of the semiconductor devices, LED devices and third generation compound semiconductor devices have photoresist overflowing to the surface of the wafer after photolithography. In these high-precision products, even a small amount of contamination affects the quality of the next process. These stains are typically cleaned by a brush, but the brush itself is also susceptible to contamination during the cleaning process. The brush can cause cross contamination among different products, the quality of the products is reduced, and the brush can be cleaned at any time, so that a large amount of time and manpower are needed, and the working efficiency of enterprises is restricted.

SUMMERY OF THE UTILITY MODEL

The utility model discloses a main aim at provides a brush is from belt cleaning device can wash the brush as required in the wafer cleaning process, and work efficiency is high, can effectively ensure the quality of wafer.

Another object of the utility model is to provide a brush is from belt cleaning device, through lift subassembly and rotating assembly lift and rotatory brush that can be in good time in the wafer cleaning process, make the brush effectively wash, improve work efficiency, save time and human cost.

Another object of the utility model is to provide a brush is from belt cleaning device, cooperation through slide rail and slider can effectively stabilize rotating assembly's lift.

Another object of the utility model is to provide a brush is from belt cleaning device, the rotation that can effectively spacing brush through the cooperation of arc stop groove and stop block, the wafer washs and the brush washs between the fast switch-over, improves work efficiency.

Another object of the present invention is to provide a self-cleaning device for brush, which can be cleaned by the cooperation of the second sensor and the second sensing element, so that the brush can be more quickly inserted into the liquid storage mechanism.

Another object of the utility model is to provide a brush is from belt cleaning device, can rinse thoroughly through making brush autogiration in the cleaning process the brush effectively improves the cleaning performance of brush.

Another object of the utility model is to provide a brush is from belt cleaning device, through set up inlet and liquid outlet at the reservoir and change the washing requirement of the different products of adaptation that different washing liquids can be faster, improve the change speed of washing liquid.

In order to realize the utility model discloses above at least one purpose, the utility model provides a brush is from belt cleaning device for wash the brush in the wafer cleaning process, wherein from belt cleaning device includes:

a lifting assembly;

a rotating assembly, wherein the rotating assembly comprises a rotating body, wherein the rotating body is connected to the lifting assembly in a liftable manner;

one end of the swing arm mechanism is fixedly connected to the upper end of the rotating main body, and the other end of the swing arm mechanism is connected with the brush;

the liquid storage mechanism is used for storing cleaning liquid, and is provided with a cleaning opening, and the liquid storage mechanism is matched with the swing arm mechanism and is fixedly arranged at a preset position so that the brush can directly penetrate through the cleaning opening to finish cleaning in the cleaning liquid after being lifted and rotated; and

and the brush rotation assembly is matched with the swing arm mechanism so as to drive the brush to automatically rotate at a preset position.

In the wafer cleaning process, when the brush needs to be cleaned, the rotating assembly is firstly lifted through the lifting assembly, and after the rotating assembly is lifted to a certain height, the rotating main body is rotated, so that the brushes at the end parts of the swing arm mechanism and the swing arm mechanism are driven to rotate until the brushes reach the liquid storage mechanism, the brushes are just opposite to a cleaning opening of the liquid storage mechanism, and then the rotating main body is lowered, so that the brushes extend into the cleaning liquid to perform self-cleaning of the brushes. And after the cleaning is finished, returning according to the original path, and enabling the brush to continuously clean the wafer.

Therefore, the brush self-cleaning device can flexibly self-clean the brush in the process of cleaning the wafer, can well and timely remove the contamination attached to the brush in the process of cleaning the wafer, does not influence the quality of the wafer, can effectively save the labor cost, improves the working efficiency and relieves the burden of enterprises.

Further, the lifting assembly comprises a first motor, a limiting mechanism, a vertically arranged first screw rod and a screw rod connecting block, the first screw rod is matched with the first screw rod and sleeved with the first screw rod, the first screw rod is fixedly connected to the output end of the first motor, the screw rod connecting block is matched with the limiting mechanism to enable the first screw rod to rotate, the screw rod connecting block moves up and down along the length direction of the first screw rod, and the rotating body is fixedly connected with the screw rod connecting block.

Further, stop gear includes first limiting plate, first limiting plate is followed the length direction of first lead screw is provided with first spacing groove, first spacing groove with the lead screw connecting block cooperatees, with when first lead screw is rotatory in the length direction of first spacing groove is spacing the lead screw connecting block.

Further, the rotating assembly further comprises a sliding plate, wherein the sliding plate is provided with a first plate surface and a second plate surface which are opposite to each other so as to be connected with the first limiting plate and the rotating main body respectively, a sliding block is arranged on the first plate surface along the length direction of the first limiting groove, and a sliding rail matched with the sliding block is arranged on the first limiting plate.

Further, rotatory main part includes second motor, second mounting bracket, second connecting axle and second bearing mechanism, wherein second mounting bracket fixed connection in the second face, second motor fixed connection in the bottom surface of second mounting bracket, second bearing mechanism fixed connection in the top surface of second mounting bracket, second connecting axle fixed connection the output of second motor to pass the second mounting bracket with fixed connection behind the second bearing mechanism the swing arm mechanism.

Further, the second mounting bracket has the roof of fixing second bearing mechanism, the roof is followed the arc has been seted up to the direction of rotation of second connecting axle and has been stopped the position groove, the fixed cover of second connecting axle be equipped with stop position groove matched with stop block, with spacing rotating assembly's rotation.

Further, a second sensor is installed on the second installation frame, the second connecting shaft is connected with a second sensing element which generates sensing with the second sensor, and therefore the brush is opposite to the cleaning opening when the second sensing element rotates to the position of the second sensor.

Further, the liquid storage mechanism is a liquid storage tank which is provided with a liquid inlet and a liquid outlet, so that cleaning liquid in the liquid storage mechanism can be conveniently replaced.

Further, brush rotation subassembly includes slewing mechanism, third follower and brush rotation axis, wherein the brush rotation axis rotatably runs through from top to bottom swing arm mechanism, the brush installed in the bottom of brush rotation axis, the fixed cover of third follower is located the top of brush rotation axis, slewing mechanism is fixed in predetermined position, and with the third follower cooperatees, with during the brush self-cleaning, through the third follower drives the brush is rotatory, slewing mechanism includes transmission complex third motor and third action wheel, the third action wheel with the meshing of third follower is connected.

These and other objects, features and advantages of the present invention will become more fully apparent from the following detailed description.

Drawings

FIG. 1 is a schematic diagram of a brush self-cleaning apparatus according to a preferred embodiment of the present application.

FIG. 2 is a schematic diagram of the internal structure of a brush self-cleaning apparatus according to a preferred embodiment of the present application.

Fig. 3 is a schematic view showing the structure of the top plate and the stopper engaged with each other according to a preferred embodiment of the present invention.

Detailed Description

The preferred embodiments in the following description are given by way of example only, and other obvious variations will occur to those skilled in the art. The basic principles of the invention, as defined in the following description, may be applied to other embodiments, variations, modifications, equivalents and other technical solutions without departing from the spirit and scope of the invention.

It will be understood by those skilled in the art that in the disclosure of the specification, the terms "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate orientations or positional relationships that are based on those shown in the drawings, which are merely for convenience in describing the invention and to simplify the description, and do not indicate or imply that the device or element so referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore the terms should not be construed as limiting the invention.

Referring to fig. 1 and 2 of the drawings, a brush self-cleaning apparatus according to a preferred embodiment of the present invention is used for cleaning a brush 100 during a wafer cleaning process, wherein the self-cleaning apparatus includes a lifting assembly 10, a rotating assembly 20, a swing arm mechanism 30, a liquid storage mechanism 40, and a brush rotation assembly 50.

The lifting assembly 10 provides lifting power for the rotating assembly 20, wherein the lifting assembly 10 comprises a first motor 11, a limiting mechanism 12, a first vertically-arranged screw rod 13 and a screw rod connecting block 14 which is matched with the first screw rod 13 and sleeved on the first screw rod 13. The first lead screw 13 is fixedly connected to the output end of the first motor 11, and the first motor 11 provides rotary power for the first lead screw 13. The screw rod connecting block 14 is matched with the limiting mechanism 12, so that when the first screw rod 13 rotates, the screw rod connecting block 14 can only move up and down along the length direction of the first screw rod 13.

Preferably, the limiting mechanism 12 includes a first limiting plate 121. The first limiting plate 121 is provided with a first limiting groove 122 along the length direction of the first lead screw 13. The first limiting groove 122 is matched with the lead screw connecting block 14, so that when the first lead screw 13 rotates, the lead screw connecting block 14 is limited in the length direction of the first limiting groove 122. By utilizing the principle of screw rod transmission, the first limit groove 122 limits the screw rod connecting block 14 to prevent the screw rod connecting block 14 from rotating along with the first screw rod 13, so that the rotation of the screw rod connecting block 14 relative to the first screw rod 13 is converted into the directional movement of the screw rod connecting block 14 in the first limit groove 122.

The rotating assembly 20 comprises a rotating body 21. The screw rod connecting block 14 of the lifting assembly 10 is connected through the rotating body 21, so that the rotating assembly 20 is driven to synchronously ascend or descend when the lifting assembly 10 moves up and down.

It is worth mentioning that the rotating assembly 20 further comprises a sliding plate 22. The sliding plate 22 has a first plate surface 221 and a second plate surface opposite to each other to connect the first stopper plate 121 and the rotating body 21, respectively. The first plate surface 221 is provided with a sliding block 221-1 along the length direction of the first limiting groove 122. The first stopper plate 121 is provided with a slide rail 121-1 engaged with the slider 221-1, so that the rotating body 21 slides on the first stopper plate 121 through the sliding plate 22 during the up-and-down movement of the rotating assembly 20. The rotating assembly 20 can effectively improve the stability of the rotating assembly 20 when the rotating assembly 20 ascends or descends through the cooperation of the sliding block 221-1 and the sliding rail 121-1 on the sliding plate 22 while moving up and down on the first lead screw 13 through the lead screw connecting block 14, thereby improving the stability of the brush 100 in the self-cleaning process.

In addition, as a preferred embodiment of the present invention, the rotating body 21 includes a second motor 211, a second mounting frame 212, a second connecting shaft 213 and a second bearing mechanism 214. The second mounting bracket 212 is fixedly attached to the second panel. The second motor 211 is fixedly connected to the bottom surface of the second mounting bracket 212. The second bearing mechanism 214 is fixedly attached to the top surface of the second mounting bracket 212. The second connecting shaft 213 is fixedly connected to an output end of the second motor 211, and is fixedly connected to the swing arm mechanism 30 after passing through the second mounting bracket 212 and the second bearing mechanism 214. The second motor 211 fixed to the bottom surface of the second mounting bracket 212 provides a rotating power to drive the second connecting shaft 213 to rotate in the second bearing mechanism 214. It should be noted that the second bearing mechanism 214 is a conventional one, and includes a bearing housing fixed to the second mounting bracket 212 and a rotary bearing located in the bearing housing, wherein an inner ring of the rotary bearing is sleeved on the second connecting shaft 213, so that the second connecting shaft 213 can rotate freely. The second bearing mechanism 214 is therefore not described in detail herein.

With reference to fig. 3, the second mounting bracket 212 has a top plate 212-1 for fixing the second bearing mechanism 214. The top plate 212-1 is provided with an arc-shaped stop groove 212-2 in the rotation direction of the second connecting shaft 213. The second connecting shaft 213 is fixedly sleeved with a stop block 213-1 engaged with the stop groove 212-2 to limit the rotation of the rotating assembly 20, wherein preferably, the arc-shaped stop groove 212-2 is arranged to limit the brush 100 to rotate back and forth only between the wafer cleaning worktable and the liquid storage mechanism 40, so as to avoid the wafer cleaning delay or brush self-cleaning due to excessive rotation of the rotating assembly 20, thereby improving the working efficiency; of course, the arc-shaped stop slot 212-2 and the stop block 213-1 are designed to prevent the rotating assembly 20 from rotating too much, and the brush 100 or the swing arm mechanism 30 can be prevented from touching other surrounding devices and damaging the devices.

In addition, it is worth mentioning that the second mounting bracket 212 can also be provided with a second sensor 212-3. The second connection shaft 213 is connected to a second sensing element 213-2 which senses the second sensor 212-3, so that the brush 100 faces the cleaning opening of the liquid storage mechanism 40 when the second sensing element 213-2 rotates to the position of the second sensor 212-3. The coarse positioning of the brush 100 is realized on the basis of the matching of the arc-shaped stop groove 212-2 and the stop block 213-1, and then the accurate positioning of the brush 100 during self-cleaning is realized through the second sensor 212-3 and the second sensing element 213-2, so that the self-cleaning efficiency can be further improved, and the brush 100 is directly conveyed into the liquid storage mechanism 40 for cleaning. Obviously, it can be understood by those skilled in the art that between the second sensor 212-3 and the second sensing element 213-2, the second sensor 212-3 can be configured as a U-shaped structure, the second sensing element 213-2 can be configured as a sensing piece structure, and the second sensing element 213-2 faces the opening of the U-shaped structure. During rotation, the second inductive element 213-2 may be located right inside the opening of the U-shaped structure to achieve a good inductive fit.

The left end of the swing arm mechanism 30 is fixedly connected to the upper end of the rotating body 21. The right end of the swing arm mechanism 30 is connected to the brush 100. Obviously, it will be understood by those skilled in the art that the swing arm mechanism 30 serves as a connection between the brush 100 and the rotating assembly 20 only as a support arm or a connection arm, wherein the specific shape or structure of the swing arm mechanism 30 is not limited, and the swing arm mechanism 30 may be plate-shaped, cylindrical or prism-shaped.

The liquid storage mechanism 40 is used for storing a cleaning liquid, wherein the liquid storage mechanism 40 is matched with the swing arm mechanism 30 and is fixedly arranged at a predetermined position, so that the brush 100 can directly pass through a cleaning opening of the liquid storage mechanism 40 to be cleaned in the cleaning liquid after being lifted and rotated.

Preferably, the reservoir mechanism 40 is a reservoir. The liquid storage tank is provided with a liquid inlet and a liquid outlet so as to facilitate replacement of the cleaning liquid in the liquid storage mechanism 40. In order to realize the overall automation, the cleaning liquid is automatically replaced under a preset condition through a programmed design, for example, when the cleaning liquid is dirty or different cleaning liquids need to be replaced due to the cleaning of different wafers, the cleaning liquid is automatically replaced through the liquid inlet and the liquid outlet.

The brush rotation assembly 50 is engaged with the swing arm mechanism 30 to drive the brush 100 to rotate automatically at a predetermined position. The brush rotation assembly 50 includes a rotation mechanism 51, a third driven wheel 52, and a brush rotation shaft 53. The brush rotating shaft 53 rotatably penetrates the swing arm mechanism 30 up and down. The brush 100 is installed at the bottom end of the brush rotating shaft 53. The third driven wheel 52 is fixedly secured to the tip end of the brush rotating shaft 53. The rotating mechanism 51 is fixedly disposed at a predetermined position and engaged with the third driven wheel 52 to rotate the brush 100 via the third driven wheel 52 when the brush 100 is self-cleaned, wherein the rotating mechanism comprises a third motor 511 and a third driving wheel 512 in transmission engagement, and the third driving wheel 512 is engaged with the third driven wheel 52.

As will be appreciated by those skilled in the art, there is a way to clean by soaking when the brush 100 is self-cleaning; in addition, the third motor 511 drives the third driving wheel 512 to rotate, and then the third driven wheel 52 and the brush rotating shaft 53 drive the brush 100 to rotate, so that the cleaning of the brush 100 can be strengthened, the cleaning effect is better, and the quality of the wafer can be effectively ensured.

In addition, some cleaning mechanisms are devices that directly drive the brush 100 to rotate on the swing arm mechanism 30, which greatly increases the weight of the swing arm mechanism 30, and thus increases the burden of the second motor 211 in the rotating body 21, which results in large energy consumption and affects the service life of the second motor 211; at the same time, the swing arm mechanism 30 will also have a large rotational inertia, which is not conducive to the brush self-cleaning apparatus rotating back and forth between wafer cleaning and self-cleaning. Therefore, in the preferred embodiment, the third motor 511 and the third driving wheel 512 are disposed at a position other than the swing arm mechanism 30, and when the brush 100 is self-cleaning, the brush 100 is rotated to make the third driven wheel 52 of the swing arm mechanism 30 directly lean against the third driving wheel 512 for engaging transmission, which not only does not affect the self-cleaning efficiency and the self-cleaning quality of the brush 100, but also effectively reduces the weight of the swing arm mechanism 30, thereby solving the above problems. It will be apparent to those skilled in the art that the third motor 511 and the third drive wheel 512 can be mounted on any support or platform adjacent the brush self-cleaning apparatus and are not limited in detail herein.

Specifically, in the wafer cleaning process, when the brush 100 needs to be cleaned, the rotating assembly 20 is lifted up through the lifting assembly 10, and after the brush 100 is lifted to a certain height, the second connecting shaft 213 is rotated through the second motor 211, so that the swing arm mechanism 30 and the brush 100 at the right end of the swing arm mechanism 30 are driven to rotate until the liquid storage mechanism 40 is located, the brush 100 is opposite to a cleaning opening of the liquid storage mechanism 40, the brush 100 is gradually lowered, the brush 100 extends into the cleaning liquid, and finally the third driving wheel 512 is driven through the third motor 511, so that the brush 100 is driven to rotate automatically to perform self-cleaning through the third driven wheel 52 and the brush rotating shaft 53. After the cleaning is finished, the wafer is returned according to the original path, and the brush 100 is enabled to continuously clean the wafer.

Therefore, the brush self-cleaning device can flexibly self-clean the brush in the process of cleaning the wafer, and can well and timely remove the contamination attached to the brush in the process of cleaning the wafer, so that the quality of the wafer is not affected, the labor cost can be effectively saved, the working efficiency is improved, and the burden of an enterprise is reduced.

It should be noted that the terms "first, second and third" in the present invention are used for descriptive purposes only, do not denote any order, are not to be construed as indicating or implying any relative importance, and are to be interpreted as names.

It will be appreciated by persons skilled in the art that the embodiments of the invention shown in the foregoing description are given by way of example only and are not limiting of the invention. The objects of the present invention have been fully and effectively accomplished. The functional and structural principles of the present invention have been shown and described in the embodiments without departing from the principles, embodiments of the present invention may have any deformation or modification.

Claims

1. A brush self-cleaning apparatus for cleaning a brush in a wafer cleaning process, wherein the brush self-cleaning apparatus comprises:

a lifting assembly;

2. The brush self-cleaning apparatus of claim 1, wherein the lifting assembly comprises a first motor, a limiting mechanism, a vertically disposed first lead screw, and a lead screw connecting block engaged with the first lead screw and sleeved on the first lead screw, wherein the first lead screw is fixedly connected to an output end of the first motor, the lead screw connecting block is engaged with the limiting mechanism to enable the first lead screw to rotate, the lead screw connecting block moves up and down along a length direction of the first lead screw, and wherein the rotating body is fixedly connected with the lead screw connecting block.

3. The brush self-cleaning apparatus of claim 2, wherein the limiting mechanism comprises a first limiting plate having a first limiting groove along a length of the first screw, the first limiting groove cooperating with the screw connecting block to limit the screw connecting block in a length direction of the first limiting groove when the first screw rotates.

4. The brush self-cleaning apparatus of claim 3, wherein the rotating assembly further comprises a sliding plate having first and second opposing plate surfaces for engaging the first retainer plate and the rotating body, respectively, the first plate surface having a sliding block disposed along a length of the first retainer groove, the first retainer plate having a sliding track for engaging the sliding block.

5. The brush self-cleaning apparatus of claim 4, wherein the rotating body comprises a second motor, a second mounting bracket, a second connecting shaft, and a second bearing mechanism, wherein the second mounting bracket is fixedly attached to the second deck, the second motor is fixedly attached to a bottom surface of the second mounting bracket, the second bearing mechanism is fixedly attached to a top surface of the second mounting bracket, and the second connecting shaft is fixedly attached to an output of the second motor and fixedly attached to the swing arm mechanism after passing through the second mounting bracket and the second bearing mechanism.

6. The brush self-cleaning apparatus of claim 5, wherein the second frame has a top plate for mounting the second bearing mechanism, the top plate defines an arc-shaped stop slot along a rotation direction of the second connecting shaft, and the second connecting shaft is fixedly sleeved with a stop block cooperating with the stop slot to limit rotation of the rotating assembly.

7. The brush self-cleaning apparatus of claim 5 or 6, wherein a second sensor is mounted to the second mounting bracket, and a second sensing element is coupled to the second coupling shaft and is responsive to the second sensor such that the brush faces the cleaning opening when the second sensing element is rotated to the position of the second sensor.

8. The brush self-cleaning apparatus of claim 1, wherein the reservoir is a reservoir.

9. The brush self-cleaning apparatus of claim 8, wherein the reservoir is provided with a liquid inlet and a liquid outlet to facilitate replacement of cleaning liquid within the reservoir.

10. The brush self-cleaning apparatus of claim 1, wherein the brush rotation assembly comprises a rotation mechanism, a third driven wheel and a brush rotation shaft, wherein the brush rotation shaft rotatably extends up and down through the swing arm mechanism, the brush is mounted at a bottom end of the brush rotation shaft, the third driven wheel is fixedly mounted at a top end of the brush rotation shaft, the rotation mechanism is fixed at a predetermined position and is engaged with the third driven wheel so as to rotate the brush through the third driven wheel when the brush is self-cleaning, the rotation mechanism comprises a third motor and a third driving wheel which are in transmission engagement, and the third driving wheel is engaged with the third driven wheel.