CN213793156U - Semiconductor device cleaning machine - Google Patents
Semiconductor device cleaning machine Download PDFInfo
- Publication number
- CN213793156U CN213793156U CN202022198220.3U CN202022198220U CN213793156U CN 213793156 U CN213793156 U CN 213793156U CN 202022198220 U CN202022198220 U CN 202022198220U CN 213793156 U CN213793156 U CN 213793156U
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- cleaning
- cleaning box
- semiconductor device
- mounting table
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Abstract
The utility model discloses a semiconductor device cleaning machine, which belongs to the technical field of semiconductor device production equipment and comprises a cleaning box, wherein the cleaning box is of a hollow structure with an open top surface; a liquid pump is fixed on the side wall of the cleaning box, the input end of the liquid pump is connected with the bottom of the cleaning box through a pipeline, and the output end of the liquid pump is connected with the upper part of the cleaning box through a pipeline; the semiconductor device cleaning device is characterized in that a mounting table is arranged above the cleaning box and fixed by a fixing frame arranged on one side of the cleaning box, a telescopic cylinder is arranged on the mounting table, a cylinder body of the telescopic cylinder is fixed on the mounting table, a piston end of the telescopic cylinder downwards penetrates through the mounting table and is connected with the cleaning table, and a plurality of placing grooves for placing semiconductor devices are formed in the upper surface of the cleaning table. The utility model discloses can be fast high-efficient with semiconductor device sanitization, improve work efficiency.
Description
Technical Field
The utility model belongs to the technical field of semiconductor device production facility, especially, relate to a semiconductor device cleaning machine.
Background
In order to improve the product qualification rate of semiconductor device manufacture, in the cleaning process of the semiconductor device, chemical substances on the semiconductor device need to be cleaned completely, and no chemical substance can be left, so that the cleaning time length needs to be increased and cleaning equipment needs to be expanded to ensure that the chemical substances are completely removed, but if the cleaning time length is increased and the cleaning equipment is expanded, the working efficiency obviously can be reduced, and the enterprise cost is also greatly influenced.
Disclosure of Invention
An object of the utility model is to overcome the not enough of above-mentioned technique, provide a semiconductor device cleaning machine, can be fast high-efficient with the semiconductor device sanitization, improve work efficiency.
The utility model discloses a do not realize above-mentioned utility model purpose, the utility model discloses a technical scheme be:
a semiconductor device cleaning machine comprises a cleaning box, wherein the cleaning box is of a hollow structure with an open top surface, and is characterized in that the cleaning box is connected with a liquid supply tank through a pipeline, and the liquid supply tank supplies and supplements cleaning liquid for the cleaning box; a liquid pump is fixed on the side wall of the cleaning box, the input end of the liquid pump is connected with the bottom of the cleaning box through a pipeline, and the output end of the liquid pump is connected with the upper part of the cleaning box through a pipeline; the semiconductor device cleaning device is characterized in that a mounting table is arranged above the cleaning box and fixed by a fixing frame arranged on one side of the cleaning box, a telescopic cylinder is arranged on the mounting table, a cylinder body of the telescopic cylinder is fixed on the mounting table, a piston end of the telescopic cylinder downwards penetrates through the mounting table and is connected with the cleaning table, and a plurality of placing grooves for placing semiconductor devices are formed in the upper surface of the cleaning table.
The utility model discloses a further improvement lies in, the mount includes a vertical rotating electrical machines, the rotating electrical machines sets up in the one side of wasing the case, the output of rotating electrical machines passes through the lateral wall rigid coupling of a horizontally linking arm and mount table, and after wasing the completion, the clean bench rises, and the rotatory departure of rotating electrical machines drive mount table washs the case top, and the clean bench descends, and the staff of being convenient for takes out the semiconductor device who washs after finishing.
The utility model discloses a further improvement lies in, settle tank bottom portion has seted up vertical weeping hole, prevents to settle inslot deposit washing liquid.
The utility model discloses a further improvement lies in, wash the incasement and be equipped with level sensor for the washing liquid level of incasement is washd in the monitoring, when being less than the setting value, then the confession fluid reservoir is for wasing the case and supply the washing liquid.
The utility model has the advantages that: the utility model discloses a liquid pump forces the disturbance to the washing liquid that washs the incasement, can adopt lift cylinder and rotating electrical machines simultaneously to the chemical substance above the sanitization semiconductor device high efficiency ground, realizes that the decline of semiconductor device is immersed, is risen to leave and is rolled out and keep away from the washing case, and the staff of being convenient for carries out the washing of semiconductor device in batches.
Drawings
Fig. 1 is a schematic structural diagram of the present invention.
In the figure: cleaning box 1, liquid supply tank 2, liquid pump 3, mount table 4, mount bracket 5, telescopic cylinder 6, clean bench 7, arrangement groove 8, rotating electrical machines 9, linking arm 10, weeping hole 11, level sensor 12.
Detailed Description
In order to make the technical problem, technical solution and advantageous effects to be solved by the present invention more clearly understood, the following description is given in conjunction with the accompanying drawings and embodiments to illustrate the present invention in further detail. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
As shown in fig. 1, a semiconductor device cleaning machine comprises a cleaning box 1, wherein the cleaning box 1 is a hollow structure with an open top surface, the cleaning box 1 is connected with a liquid supply tank 2 through a pipeline, and the liquid supply tank 2 supplies and supplements cleaning liquid for the cleaning box 1; a liquid pump 3 is fixed on the side wall of the cleaning box 1, the input end of the liquid pump 3 is connected with the bottom of the cleaning box 1 through a pipeline, and the output end of the liquid pump 3 is connected with the upper part of the cleaning box 1 through a pipeline; wash 1 top of case and be equipped with mount table 4, mount table 4 is fixed by setting up in the mount 5 that washs 1 one side of case, is equipped with telescopic cylinder 6 on mount table 4, and telescopic cylinder 6's cylinder body is fixed on mount table 4, and telescopic cylinder 6's piston end passes mount table 4 and connects a wash platform 7 downwards, and a plurality of arrangement groove 8 that supply semiconductor device to put into are seted up to the upper surface of wash platform 7.
Above-mentioned mount 5 includes a vertical rotating electrical machines 9, and rotating electrical machines 9 sets up in the one side of wasing case 1, and rotating electrical machines 9's output passes through the lateral wall rigid coupling of a horizontally linking arm 10 and mount table 4, and after the washing is accomplished, wash table 7 rises, and rotating electrical machines 9 drive mount table 4 is rotatory to leave and washs case 1 top, and wash table 7 descends, is convenient for the staff and takes out the semiconductor device after the washing finishes.
The bottom of the placing groove 8 is provided with a vertical liquid leakage hole 11 to prevent cleaning liquid from depositing in the placing groove 8.
The cleaning tank 1 is internally provided with a liquid level sensor 12 for monitoring the liquid level of the cleaning liquid in the cleaning tank 1, and when the liquid level is lower than a set value, the liquid supply tank 2 supplements the cleaning liquid for the cleaning tank 1.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element.
It will be understood that the terms "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in an orientation or positional relationship indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the device or element so referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the invention.
The technical means disclosed by the scheme of the present invention is not limited to the technical means disclosed by the above embodiments, but also includes the technical scheme formed by the arbitrary combination of the above technical features. It should be noted that, for those skilled in the art, without departing from the principle of the present invention, several improvements and modifications can be made, and these improvements and modifications are also considered as the protection scope of the present invention.
Claims (4)
1. A semiconductor device cleaning machine comprises a cleaning box, wherein the cleaning box is of a hollow structure with an open top surface, and is characterized in that the cleaning box is connected with a liquid supply tank through a pipeline, and the liquid supply tank supplies and supplements cleaning liquid for the cleaning box; a liquid pump is fixed on the side wall of the cleaning box, the input end of the liquid pump is connected with the bottom of the cleaning box through a pipeline, and the output end of the liquid pump is connected with the upper part of the cleaning box through a pipeline; the semiconductor device cleaning device is characterized in that a mounting table is arranged above the cleaning box and fixed by a fixing frame arranged on one side of the cleaning box, a telescopic cylinder is arranged on the mounting table, a cylinder body of the telescopic cylinder is fixed on the mounting table, a piston end of the telescopic cylinder downwards penetrates through the mounting table and is connected with the cleaning table, and a plurality of placing grooves for placing semiconductor devices are formed in the upper surface of the cleaning table.
2. The semiconductor device cleaning machine according to claim 1, wherein the fixing frame comprises a vertical rotating motor, the rotating motor is arranged at one side of the cleaning box, and an output end of the rotating motor is fixedly connected with the side wall of the mounting table through a horizontal connecting arm.
3. The semiconductor device cleaning machine according to claim 1, wherein the bottom of the placement groove is provided with a vertical liquid leakage hole.
4. The semiconductor device cleaning machine according to claim 1, wherein a liquid level sensor is provided in the cleaning tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022198220.3U CN213793156U (en) | 2020-09-29 | 2020-09-29 | Semiconductor device cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022198220.3U CN213793156U (en) | 2020-09-29 | 2020-09-29 | Semiconductor device cleaning machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213793156U true CN213793156U (en) | 2021-07-27 |
Family
ID=76956495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022198220.3U Active CN213793156U (en) | 2020-09-29 | 2020-09-29 | Semiconductor device cleaning machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213793156U (en) |
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2020
- 2020-09-29 CN CN202022198220.3U patent/CN213793156U/en active Active
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