CN213752637U - Silicon wafer cleaning device for producing high-voltage fast soft recovery diode - Google Patents
Silicon wafer cleaning device for producing high-voltage fast soft recovery diode Download PDFInfo
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- CN213752637U CN213752637U CN202022777081.XU CN202022777081U CN213752637U CN 213752637 U CN213752637 U CN 213752637U CN 202022777081 U CN202022777081 U CN 202022777081U CN 213752637 U CN213752637 U CN 213752637U
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Abstract
The utility model belongs to the technical field of diode production, especially, silicon chip belt cleaning device is used in production of high pressure quick soft recovery diode to the problem that needs upset silicon chip, now proposes following scheme, including storage water tank and washing case, it is equipped with second bar and first bar to wash incasement bottom both sides level, the second draw-in groove has been seted up on the second bar, first draw-in groove has been seted up on the first bar, be equipped with wiper mechanism in the storage water tank, the vertical welding in side middle part of first bar has the stand, the top of stand is rotated and is connected with the screw rod, it has the installing frame to wash the inner wall that the case is close to storage water tank one side and peg graft, install the filter screen in the installing frame, the installing frame passes through locking structure and washs the case fixed. The utility model discloses avoid the silicon chip to take place the displacement when wasing, guarantee the cleaning performance, can once only wash a plurality of silicon chips, need not to overturn the silicon chip, improve the cleaning efficiency.
Description
Technical Field
The utility model relates to a diode production technical field especially relates to silicon chip belt cleaning device is used in production of high pressure quick soft recovery diode.
Background
The fast soft recovery diode is a derivative of a common rectifier tube, the basic structure and the electrical symbol of the fast soft recovery diode are completely consistent with those of the common rectifier tube, a special process is adopted in the manufacturing process, the switching speed of the fast soft recovery diode is greatly higher than that of the common rectifier tube, and the reduction rate of reverse recovery current is small in the reverse recovery process. When the diode is processed and manufactured, the general production flow comprises six aspects, namely welding, pickling, forming, electroplating, straightening, testing and packaging. The silicon chip is an important component of the high-voltage fast soft recovery diode, and the acid washing step comprises the cleaning of the silicon chip.
Because the silicon wafer is sheet-shaped, the existing silicon wafer cleaning device for producing the high-voltage rapid soft recovery diode can be cleaned in all directions only by manually turning over the silicon wafer during cleaning, and the cleaning efficiency is low; the existing silicon wafer cleaning device for producing the high-voltage rapid soft recovery diode is lack of a fixing mechanism for a silicon wafer, and the silicon wafer is easy to displace during cleaning, so that the cleaning is not clean enough; and the existing silicon wafer cleaning device for producing the high-voltage fast soft recovery diode needs to continuously add cleaning water, so that the waste of water resources is serious.
SUMMERY OF THE UTILITY MODEL
Based on the technical problem who proposes in the background art, the utility model provides a silicon chip belt cleaning device is used in production of high pressure quick soft recovery diode.
The utility model provides a silicon chip belt cleaning device is used in production of high-pressure quick soft recovery diode, including the storage water tank and wash the case, it has second rectangular block to wash incasement bottom near storage water tank one side horizontal welding, the second draw-in groove has been seted up on the second rectangular block, it has first rectangular block to wash incasement bottom and keep away from storage water tank one side horizontal sliding connection, first draw-in groove has been seted up on the first rectangular block, be equipped with wiper mechanism in the storage water tank, the vertical welding in side middle part of first rectangular block has the stand, the top of stand is rotated and is connected with the screw rod, the screw rod runs through and washs case one side and pass through threaded connection with the washing case, it has the installing frame to wash the inner wall that the case is close to storage water tank one side and peg graft, install the filter screen in the installing frame, the installing frame passes through locking structure and washs the case fixedly.
Preferably, the storage water tank and the cleaning tank are arranged side by side, the top of the cleaning tank is of an open structure, and a water filling port is arranged on one side of the top of the storage water tank.
Preferably, the first clamping grooves and the second clamping grooves are respectively provided with a plurality of grooves which are respectively and uniformly distributed on the first bar-shaped blocks and the second bar-shaped blocks, and the first clamping grooves and the second clamping grooves are oppositely arranged.
Preferably, the both ends of first bar piece all weld the slider, the spout has all been seted up to the opposition both sides inner wall bottom of wasing the case, two the slider is sliding connection respectively inside two spouts.
Preferably, the cleaning mechanism comprises a water pump, the water pump is installed at the bottom in the water storage tank, a water outlet of the water pump is communicated with a water outlet pipe, and the other end of the water outlet pipe extends into the cleaning tank.
Preferably, the top end of the water outlet pipe is horizontally communicated with a transverse pipe, the transverse pipe is installed above the inner wall of one side of the cleaning box, a plurality of spray heads are installed on the transverse pipe, and the plurality of spray heads are uniformly distributed on the transverse pipe.
Preferably, locking structure includes first magnet and second magnet, first magnet is inlayed in one side of installing frame, the second magnet is inlayed inside the one side inner wall of wasing the case, first magnet and second magnet magnetism attract each other, the handle has been welded to the opposite side of installing frame.
The utility model provides a beneficial effect does:
1. this silicon chip belt cleaning device is used in production of high pressure quick soft recovery diode through being provided with first bar and second bar, inside inserting the second draw-in groove on the second bar with silicon chip bottom one corner, rotates the screw rod again and drives the stand and move forward, and the stand drives first bar and moves to second bar direction, and it is inside to insert the first draw-in groove on the first bar until another angle in silicon chip bottom to fix the silicon chip, avoid the silicon chip to take place the displacement when wasing, guarantee the cleaning performance.
2. This silicon chip belt cleaning device is used in production of high pressure quick soft recovery diode through being provided with a plurality of first draw-in grooves and second draw-in groove, can once only fix a plurality of silicon chips between a plurality of first draw-in grooves and second draw-in groove respectively to can once only wash a plurality of silicon chips, and the silicon chip is vertical places, can directly all wash the two sides of silicon chip, need not to overturn the silicon chip, improve the cleaning efficiency.
3. This silicon chip belt cleaning device is used in production of quick soft recovery diode of high pressure, through being provided with the filter screen, through the inside water of water pump extraction storage water tank wash the silicon chip through the outlet pipe with violently managing to spout by the shower nozzle, wash the interior sewage of washing of incasement and get back to the reuse in the storage water tank again after the filter screen filters, need not constantly to add and wash water, the water economy resource, and can take out the installing frame from wasing incasement wall inside and clear up the filter screen, the installation dismantlement of filter screen is just swift in the mean square.
The parts of the device not involved are the same as or can be implemented using prior art.
Drawings
Fig. 1 is a schematic structural view of a silicon wafer cleaning device for producing a high-voltage fast soft recovery diode according to the present invention;
FIG. 2 is a side sectional view of the silicon wafer cleaning device for producing the high-voltage fast soft recovery diode according to the present invention;
fig. 3 is the utility model provides a silicon chip belt cleaning device's washing case one side inner wall cross-sectional view is used in production of high pressure quick soft recovery diode.
In the figure: 1. a water storage tank; 2. a transverse tube; 3. a spray head; 4. filtering with a screen; 5. a screw; 6. a chute; 7. a slider; 8. a first card slot; 9. a first bar; 10. a column; 11. a second card slot; 12. a second bar block; 13. installing a frame; 14. a cleaning tank; 15. a water outlet pipe; 16. a water pump; 17. a first magnet; 18. a second magnet.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
Referring to fig. 1, the silicon wafer cleaning device for producing the high-pressure fast soft recovery diode comprises a water storage tank 1 and a cleaning tank 14, wherein a second strip-shaped block 12 is horizontally welded at one side of the bottom in the cleaning tank 14, which is close to the water storage tank 1, a second clamping groove 11 is formed in the second strip-shaped block 12, a first strip-shaped block 9 is horizontally and slidably connected at one side of the bottom in the cleaning tank 14, a first clamping groove 8 is formed in the first strip-shaped block 9, a cleaning mechanism is arranged in the water storage tank 1, an upright post 10 is vertically welded at the middle of the side surface of the first strip-shaped block 9, a screw 5 is rotatably connected at the top end of the upright post 10, the screw 5 penetrates through one side of the cleaning tank 14 and is in threaded connection with the cleaning tank 14, one corner of the bottom of a silicon wafer is inserted into the second clamping groove 11 in the second strip-shaped block 12, the screw 5 is rotated to drive the upright post 10 to move forwards, the first strip-shaped block 9 is driven by the upright post 10 to move towards the direction of the second strip-shaped block 12, until inside another corner inserts first draw-in groove 8 on the first bar-shaped piece 9 of silicon chip bottom, thereby fix the silicon chip, avoid the silicon chip to take place the displacement when wasing, guarantee the cleaning performance, it has installing frame 13 to wash the inner wall that case 14 is close to storage water tank 1 one side to peg graft, install filter screen 4 in the installing frame 13, installing frame 13 is fixed through locking structure and washing case 14, wash the interior sewage of washing of case 14 and get back to storage water tank 1 interior reuse again after filter through filter screen 4, need not constantly to add and wash water, the water economy resource.
The utility model discloses in, storage water tank 1 sets up side by side with wasing case 14, and the top of wasing case 14 is uncovered structure, and top one side of storage water tank 1 is equipped with the filler.
The utility model discloses in, first draw-in groove 8 and second draw-in groove 11 all are equipped with a plurality ofly, evenly distributed on first bar-shaped piece 9 and second bar-shaped piece 12 respectively of a plurality of first draw-in grooves 8 and second draw-in groove 11, first draw-in groove 8 and the opposition of second draw-in groove set up, through being provided with a plurality of first draw-in grooves 8 and second draw-in groove 11, can once only fix a plurality of silicon chips respectively between a plurality of first draw-in grooves 8 and second draw-in groove 11, thereby can once only wash a plurality of silicon chips, and the vertical placing of silicon chip, can directly all wash the two sides of silicon chip, need not to overturn the silicon chip, improve the cleaning efficiency.
The utility model discloses in, slider 7 has all been welded at the both ends of first bar 9, has all seted up spout 6 bottom the opposition both sides inner wall of washing case 14, and two slider 7 difference sliding connection are inside two spout 6, and slider 7 and spout 6 carry on spacingly to the removal of first bar 9, make it can only keep the horizontally back-and-forth movement that carries on.
Referring to fig. 2, the silicon wafer cleaning device for producing the high-voltage fast soft recovery diode comprises a water pump 16, wherein the water pump 16 is installed at the bottom in a water storage tank 1, a water outlet of the water pump 16 is communicated with a water outlet pipe 15, and the other end of the water outlet pipe 15 extends into a cleaning tank 14.
The utility model discloses in, the top level intercommunication of outlet pipe 15 has violently the pipe 2, violently manages 2 and install in one side inner wall top of wasing case 14, violently installs shower nozzle 3 on pipe 2, and shower nozzle 3 is equipped with a plurality ofly, and a plurality of shower nozzles 3 evenly distributed violently manage 2, through 16 extraction water storage tank 1 inside water through outlet pipe 15 with violently manage 2 and spout to the silicon chip and wash the silicon chip by shower nozzle 3.
Referring to fig. 3, silicon chip belt cleaning device is used in production of high-pressure quick soft recovery diode, locking structure includes first magnet 17 and second magnet 18, first magnet 17 inlays in one side of installing frame 13, second magnet 18 inlays inside in the one side inner wall of wasing case 14, first magnet 17 and 18 magnetism of second magnet attract mutually, the opposite side welding of installing frame 13 has the handle, can pull handle and take out installing frame 13 from wasing 14 inner walls inside and clear up filter screen 4, when installing frame 13 inserts and washs 14 inner walls inside, first magnet 17 and 18 attracting mutually of second magnet fix installing frame 13 position, can take out installing frame 13 from wasing 14 inner walls inside and clear up filter screen 4, the installation dismantlement of filter screen 4 is just swift in the mean square.
The working principle is as follows: by arranging the first bar-shaped block 9 and the second bar-shaped block 12, one corner of the bottom of the silicon chip is inserted into the second clamping groove 11 on the second bar-shaped block 12, then the screw 5 is rotated to drive the upright post 10 to move forwards, the upright post 10 drives the first bar-shaped block 9 to move towards the second bar-shaped block 12 until the other corner of the bottom of the silicon chip is inserted into the first clamping groove 8 on the first bar-shaped block 9, so that the silicon chip is fixed, the silicon chip is prevented from being displaced during cleaning, and the cleaning effect is ensured; by arranging the plurality of first clamping grooves 8 and the plurality of second clamping grooves 11, the plurality of silicon wafers can be respectively fixed between the plurality of first clamping grooves 8 and the plurality of second clamping grooves 11 at one time, so that the plurality of silicon wafers can be cleaned at one time, the silicon wafers are vertically arranged, both sides of the silicon wafers can be directly cleaned, the silicon wafers do not need to be turned over, and the cleaning efficiency is improved; through being provided with filter screen 4, through water pump 16 extraction storage water tank 1 inside water through outlet pipe 15 with violently manage 2 and spout by shower nozzle 3 and wash the silicon chip, wash the interior sewage of washing of case 14 and filter the back through filter screen 4 and get back to storage water tank 1 in the reuse again, need not constantly to add and wash water, the water economy resource, and can clear up filter screen 4 with installing frame 13 from wasing 14 inner walls inside taking out, filter screen 4's installation dismantlement is just swift in the mean square.
The above, only be the concrete implementation of the preferred embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art is in the technical scope of the present invention, according to the technical solution of the present invention and the utility model, the concept of which is equivalent to replace or change, should be covered within the protection scope of the present invention.
Claims (7)
1. The silicon wafer cleaning device for the production of the high-pressure rapid soft recovery diode comprises a water storage tank (1) and a cleaning tank (14), and is characterized in that a second bar-shaped block (12) is horizontally welded at one side, close to the water storage tank (1), of the bottom in the cleaning tank (14), a second clamping groove (11) is formed in the second bar-shaped block (12), a first bar-shaped block (9) is horizontally and slidably connected at one side, far away from the water storage tank (1), of the bottom in the cleaning tank (14), a first clamping groove (8) is formed in the first bar-shaped block (9), a cleaning mechanism is arranged in the water storage tank (1), a stand column (10) is vertically welded at the middle of the side face of the first bar-shaped block (9), a screw rod (5) is rotatably connected at the top end of the stand column (10), the screw rod (5) penetrates through one side of the cleaning tank (14) and is in threaded connection with the cleaning tank (14), and a mounting frame (13) is inserted into the inner wall, close to one side of the water storage tank (1), of the cleaning tank (14), install filter screen (4) in installing frame (13), installing frame (13) are fixed through locking structure and washing case (14).
2. The silicon wafer cleaning device for the production of the high-voltage fast soft recovery diode according to claim 1, wherein the water storage tank (1) and the cleaning tank (14) are arranged side by side, the top of the cleaning tank (14) is of an open structure, and a water filling port is arranged on one side of the top of the water storage tank (1).
3. The silicon wafer cleaning device for the production of the high-voltage fast soft recovery diode according to claim 2, wherein a plurality of first clamping grooves (8) and a plurality of second clamping grooves (11) are respectively arranged, the plurality of first clamping grooves (8) and the plurality of second clamping grooves (11) are respectively and uniformly distributed on the first bar-shaped block (9) and the second bar-shaped block (12), and the first clamping grooves (8) and the second clamping grooves (11) are oppositely arranged.
4. The silicon wafer cleaning device for the production of the high-voltage fast soft recovery diode according to claim 3, wherein sliding blocks (7) are welded at two ends of the first bar-shaped block (9), sliding grooves (6) are formed in the bottoms of the inner walls of two opposite sides of the cleaning box (14), and the two sliding blocks (7) are respectively connected inside the two sliding grooves (6) in a sliding manner.
5. The silicon wafer cleaning device for the production of the high-voltage fast soft recovery diode according to claim 4, wherein the cleaning mechanism comprises a water pump (16), the water pump (16) is installed at the bottom in the water storage tank (1), a water outlet of the water pump (16) is communicated with a water outlet pipe (15), and the other end of the water outlet pipe (15) extends into the cleaning tank (14).
6. The silicon wafer cleaning device for the production of the high-voltage fast soft recovery diode according to claim 5, wherein the top end of the water outlet pipe (15) is horizontally communicated with a transverse pipe (2), the transverse pipe (2) is installed above the inner wall of one side of the cleaning box (14), a plurality of spray heads (3) are installed on the transverse pipe (2), and the plurality of spray heads (3) are uniformly distributed on the transverse pipe (2).
7. The silicon wafer cleaning device for the production of the high-voltage fast soft recovery diode according to claim 6, wherein the locking structure comprises a first magnet (17) and a second magnet (18), the first magnet (17) is embedded in one side of the installation frame (13), the second magnet (18) is embedded in the inner wall of one side of the cleaning box (14), the first magnet (17) and the second magnet (18) are attracted magnetically, and a handle is welded on the other side of the installation frame (13).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022777081.XU CN213752637U (en) | 2020-11-26 | 2020-11-26 | Silicon wafer cleaning device for producing high-voltage fast soft recovery diode |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022777081.XU CN213752637U (en) | 2020-11-26 | 2020-11-26 | Silicon wafer cleaning device for producing high-voltage fast soft recovery diode |
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| CN213752637U true CN213752637U (en) | 2021-07-20 |
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| CN202022777081.XU Active CN213752637U (en) | 2020-11-26 | 2020-11-26 | Silicon wafer cleaning device for producing high-voltage fast soft recovery diode |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115582340A (en) * | 2022-08-20 | 2023-01-10 | 浙江艾科半导体设备有限公司 | Silicon chip cleaning machine sprays water firing equipment |
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2020
- 2020-11-26 CN CN202022777081.XU patent/CN213752637U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115582340A (en) * | 2022-08-20 | 2023-01-10 | 浙江艾科半导体设备有限公司 | Silicon chip cleaning machine sprays water firing equipment |
| CN115582340B (en) * | 2022-08-20 | 2023-08-15 | 浙江艾科半导体设备有限公司 | Water heating equipment is sprayed to silicon chip cleaning machine |
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