CN213538159U - Silicon carbide single crystal growth device - Google Patents
Silicon carbide single crystal growth device Download PDFInfo
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- CN213538159U CN213538159U CN202022053597.XU CN202022053597U CN213538159U CN 213538159 U CN213538159 U CN 213538159U CN 202022053597 U CN202022053597 U CN 202022053597U CN 213538159 U CN213538159 U CN 213538159U
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Abstract
The invention discloses a silicon carbide single crystal growth device, which comprises: the crucible is used for containing silicon carbide raw materials and silicon carbide seed crystals, the periphery of the crucible is wrapped by a heat insulation layer, and the crucible comprises a silicon carbide raw material area at the upper part and a silicon carbide single crystal growth area at the lower part; in the silicon carbide raw material area, a silicon carbide raw material groove with an upward opening is arranged between the inner wall and the outer wall of the crucible, and the upper end of the inner side groove wall of the silicon carbide raw material groove and the inner wall of the upper end of the crucible form a graphite channel; in the silicon carbide single crystal growth region, a graphite tube is arranged in the inner cavity of the crucible, the upper end of the tube wall of the graphite tube is in seamless butt joint with the lower end of the inner wall of the crucible in the silicon carbide raw material region, a silicon carbide seed crystal is positioned at the bottom of the crucible and in the inner cavity of the graphite tube, and the inner cavity of the graphite tube forms a silicon carbide single crystal growth chamber; after heating, the sublimated silicon carbide raw material moves to the silicon carbide single crystal growth chamber through the graphite channel along the gravity direction. The invention provides an apparatus for manufacturing high-quality silicon carbide crystal with shortened process time and reduced cost.
Description
Technical Field
The invention relates to the field of semiconductor crystal growth, in particular to a silicon carbide single crystal growth device.
Background
Since 1960, semiconductor device materials represented by silicon (Si) have been limited by their physical properties, and compound semiconductor materials of various semiconductor device materials have been studied to overcome the limitation.
The widely seen wide bandgap semiconductor materials such as SiC, GaN, ZnO and the like in the third generation semiconductor element materials. But in the third generation of semiconductor materials, single crystal crystals (Ingot) can be grown and only SIC single crystal can be used as the material on substrate wafers of more than 4 inches. Particularly, SiC has excellent thermal stability at 1500 ℃ or lower, is excellent in stability in an oxidizing environment, and has a characteristic of high thermal conductivity of about 4.6W/cm ℃, and therefore, it is required to be more advantageous than compound semiconductors of GaAs, GaN, and the like of iii-v group in an environment in which stability is maintained at a high temperature for a long time, and to be actively promoted and used in the fields of electric vehicles, wide-bandgap high-speed wireless communication, new renewable energy power transmission, and the like by virtue of the advantage.
Although the electron mobility of SiC is smaller than that of silicon (Si), SiC has an energy gap 2 to 3 times as large as that of silicon and has an operation limit temperature of 650 ℃ and is higher than that of silicon having an operation limit temperature of less than 200 ℃. In addition, since the strength is high in chemical and mechanical properties, the element can be manufactured to be usable under extreme environments.
It is an important matter to use a silicon carbide single crystal uniformly and with high quality for the above elements. However, in the conventional process, the silicon carbide single crystal seed crystal is stuck to the top of the crucible, and the problem of sticking the seed crystal caused by the process is not effectively solved (especially when the silicon carbide single crystal seed crystal is grown in a large size with a diameter of more than 4 inches), so that a large amount of polycrystalline (Polytype) silicon carbide and other defects caused by the process cannot be overcome, and the growth of high-quality crystals is quite difficult. In addition, in the crystal growth method in which a silicon carbide single crystal seed crystal used in the initial stage of growth of a silicon carbide single crystal is attached to the bottom of a crucible, since Porous graphite foam (Porous graphite foam) as a raw material gas channel is attached, inflow of unnecessary carbon element particles generated in the process cannot be suppressed, and a new crucible device is desired to be developed in order to solve various problems of both of the above-described apparatuses.
Disclosure of Invention
The invention overcomes the defects of the prior art and provides the silicon carbide single crystal growth device, the silicon carbide single crystal seed crystal is adhered to the upper part of the crucible, the problem of adhering the seed crystal is solved to inhibit the defects of high microtube density and the like and the growth of a large amount of polycrystalline form silicon carbide is realized to realize the growth of high-quality single crystals; the position of the crucible for placing the raw material and the space for growing the single crystal are formed in such a manner that the long and narrow high-density graphite passages are formed in the crucible, whereby the inflow of useless carbon particles occurring in the course of the process when the conventional porous graphite foam is used can be suppressed.
In order to achieve the purpose, the invention adopts the technical scheme that: a silicon carbide single crystal growth apparatus comprising: the crucible is used for containing silicon carbide raw materials and silicon carbide seed crystals, the periphery of the crucible is wrapped by a heat insulation layer, and the crucible comprises a silicon carbide raw material area at the upper part and a silicon carbide single crystal growth area at the lower part; in the silicon carbide raw material area, a silicon carbide raw material groove with an upward opening is arranged between the inner wall and the outer wall of the crucible, and the upper end of the inner side groove wall of the silicon carbide raw material groove and the inner wall of the upper end of the crucible form a graphite channel; in the silicon carbide single crystal growth region, a graphite tube is arranged in the inner cavity of the crucible, the upper end of the tube wall of the graphite tube is in seamless butt joint with the lower end of the inner wall of the crucible in the silicon carbide raw material region, a silicon carbide seed crystal is positioned at the bottom of the crucible and in the inner cavity of the graphite tube, and the inner cavity of the graphite tube forms a silicon carbide single crystal growth chamber; after heating, the sublimated silicon carbide raw material moves to the silicon carbide single crystal growth chamber through the graphite channel along the gravity direction.
The longitudinal section of the crucible inner cavity corresponding to the silicon carbide single crystal growth region is an isosceles trapezoid of which the upper side length is smaller than the lower side length.
The silicon carbide raw material area circumference be provided with at least one silicon carbide raw material groove, silicon carbide raw material inslot side cell wall upper end inwards transversely extends and forms the graphite passageway with crucible upper end inner wall.
The silicon carbide raw material area is provided with at least one graphite channel, and the inner diameter of the graphite channel is 1-10 mm.
The sublimed silicon carbide raw material enters a crucible inner cavity corresponding to the silicon carbide raw material area through a graphite channel and then enters a silicon carbide single crystal growth chamber.
The crucible is heated by a coil induction heating group and/or a resistance.
And the silicon carbide raw material region and the silicon carbide single crystal growth region are both provided with temperature measuring components.
The longitudinal section of the graphite tube is rectangular or trapezoidal.
The temperature range of the silicon carbide raw material area is 2100-2500 ℃; the temperature range of the silicon carbide single crystal growth region is 1800-.
The slope of the temperature curve of the silicon carbide single crystal growth region is a constant.
In a preferred embodiment of the present invention, the seed crystal for growth is 3C,4H,6H,15R, whereby the crystal polymorphism (allotype) for seed crystal growth is 3C,4H,6H, 15R.
The present invention relates to a method for producing a high-quality silicon carbide single crystal by passing a raw material gas vaporized from a heated silicon carbide raw material through a high-density graphite passage having a predetermined length and installed in the upper part of a crucible to produce a raw material gas free of unwanted carbon particles, and moving the raw material gas onto a silicon carbide seed crystal placed on the bottom of the crucible.
In addition, a cylindrical graphite tube is manufactured around the silicon carbide single crystal seed crystal arranged at the bottom of the crucible, the longitudinal section of the graphite tube can also be of a trapezoidal structure, and the graphite tubes with different diameters are replaced, so that the diameter of the silicon carbide single crystal required by growth is controlled.
The silicon carbide single crystal can be grown by any one of sublimation and chemical vapor deposition. As the two crystal growth methods used here, two heating methods, that is, a coil induction heating method and a resistance heating method, can be used.
The crucible wall is graphite or carbon, both of which must be made of high density material and have strong heat resistance.
The invention solves the defects in the background technology, and has the following beneficial effects:
(1) the process of sticking the silicon carbide single crystal seed crystal on the upper part of the crucible solves the problem of sticking the seed crystal to inhibit the defects of large micropipe density and the like and the generation of a large amount of polycrystalline form silicon carbide to realize the growth of high-quality single crystals.
(2) The position of the crucible for placing the raw material and the space for growing the single crystal are formed in such a manner that the long and narrow high-density graphite passages are formed in the crucible, whereby the inflow of useless carbon particles occurring in the course of the process when the conventional porous graphite foam is used can be suppressed.
(3) And a cylindrical graphite tube is manufactured around the silicon carbide single crystal seed crystal arranged at the bottom of the crucible, so that the diameter of the silicon carbide single crystal required by growth is controlled.
(4) According to the equipment manufactured by the invention, the silicon carbide single crystal seed crystal is placed at the bottom of the crucible, and the raw material gas generated by sublimation of the silicon carbide raw material at the upper part of the crucible during crystal growth moves to the bottom of the crucible to realize growth of high-quality silicon carbide single crystal.
Drawings
The invention is further explained below with reference to the figures and examples;
FIG. 1 is a side view of a single crystal growing apparatus of the present invention;
FIG. 2 is a schematic view of the temperature gradient along the length direction of the novel single crystal growth apparatus used in the present invention;
FIG. 3 is a perspective view of a graphite tube positioned at the bottom of a crucible in the present invention;
in the figure: a crucible 1; a heat insulation layer 2; a silicon carbide raw material 3; a silicon carbide single crystal seed crystal 4; a silicon carbide single crystal 5; a graphite tube 6; a silicon carbide single crystal growth chamber 7.
Detailed Description
The invention will now be described in further detail with reference to the accompanying drawings and examples, which are simplified schematic drawings and illustrate only the basic structure of the invention in a schematic manner, and thus show only the constituents relevant to the invention.
It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "upper", "lower", "inner", "outer", "left", "right" and the like as used herein are for illustrative purposes only and do not denote a unique embodiment.
As shown in fig. 1 to 3, a silicon carbide single crystal growth apparatus includes: the crucible is used for containing silicon carbide raw materials 3 and silicon carbide seed crystals, the periphery of the crucible is wrapped by a heat insulation layer 2, and the crucible comprises a silicon carbide raw material 3 area at the upper part and a silicon carbide single crystal growth area at the lower part; in the area 3 of the silicon carbide raw material, a silicon carbide raw material groove with an upward opening is arranged between the inner wall and the outer wall of the crucible, and the upper end of the inner side groove wall of the silicon carbide raw material groove and the inner wall of the upper end of the crucible form a graphite channel; in the silicon carbide single crystal growth region, a graphite tube 6 is arranged in the inner cavity of the crucible, the upper end of the tube wall of the graphite tube 6 is in seamless butt joint with the lower end of the inner wall of the crucible in the silicon carbide raw material 3 region, a silicon carbide seed crystal is positioned at the bottom of the crucible and in the inner cavity of the graphite tube 6, and the inner cavity of the graphite tube 6 forms a silicon carbide single crystal growth chamber 7; after heating, the sublimated silicon carbide raw material 3 moves to the silicon carbide single crystal growth chamber 7 through the graphite passage in the direction of gravity. The longitudinal section of the crucible inner cavity corresponding to the silicon carbide single crystal growth area is an isosceles trapezoid of which the upper side length is less than the lower side length.
The 3 district circumference of carborundum raw materials are provided with 3 grooves of at least one carborundum raw materials, and 3 inslot side cell wall upper ends of carborundum raw materials inwards transversely extend and form the graphite passageway with crucible upper end inner wall.
The area 3 of the silicon carbide raw material is provided with at least one graphite channel, and the inner diameter of the graphite channel is 1-10 mm.
The sublimated silicon carbide raw material 3 enters the inner cavity of the crucible corresponding to the silicon carbide raw material 3 area through the graphite channel and then enters the silicon carbide single crystal growth chamber 7.
The crucible is heated by a coil induction heating group and/or resistance heating.
The silicon carbide raw material 3 area and the silicon carbide single crystal growth area are both provided with temperature measuring components.
The longitudinal section of the graphite tube 6 is rectangular or trapezoidal.
The temperature range of the silicon carbide raw material 3 zone is 2100-2500 ℃; the temperature range of the silicon carbide single crystal growth region is 1800 and 2350 ℃.
The slope of the temperature curve in the growth region of the silicon carbide single crystal is constant.
In a preferred embodiment of the present invention, the seed crystal for growth is 3C,4H,6H,15R, whereby the crystal polymorphism (allotype) for seed crystal growth is 3C,4H,6H, 15R.
The present invention is to produce a raw material gas containing no unnecessary carbon particles by passing a raw material gas evaporated from a heated silicon carbide raw material 3 through a high-density graphite passage of a certain length installed in the upper part of a crucible, and to grow a high-quality silicon carbide single crystal by moving the raw material gas onto a silicon carbide seed crystal placed on the bottom of the crucible.
In addition, a cylindrical graphite tube 6 is manufactured around the silicon carbide single crystal seed crystal 4 arranged at the bottom of the crucible, the longitudinal section of the graphite tube 6 can also be in a trapezoidal structure, and the graphite tubes 6 with different diameters are replaced, so that the diameter of the silicon carbide single crystal required by growth is controlled.
The silicon carbide single crystal can be grown by any one of sublimation and chemical vapor deposition. As the two crystal growth methods used here, two heating methods, that is, a coil induction heating method and a resistance heating method, can be used.
The invention belongs to a sublimation method, and the invention discloses a method for growing SiC single crystals.
When the SiC single crystal is grown by the chemical vapor deposition method, the seed crystal can be placed on the inner surface of the crucible, such as the upper portion, the bottom portion, and the side surface.
The crucible wall is made of graphite and is made of high-density graphite, and the heat resistance is strong.
In light of the foregoing description of the preferred embodiment of the present invention, it is to be understood that various changes and modifications may be made by one skilled in the art without departing from the spirit and scope of the invention. The technical scope of the present invention is not limited to the content of the specification, and must be determined according to the scope of the claims.
Claims (10)
1. A silicon carbide single crystal growth apparatus comprising: the crucible is used for containing silicon carbide raw materials and silicon carbide seed crystals, and the periphery of the crucible is wrapped by a heat insulation layer; in the silicon carbide raw material area, a silicon carbide raw material groove with an upward opening is arranged between the inner wall and the outer wall of the crucible, and the upper end of the inner side groove wall of the silicon carbide raw material groove and the inner wall of the upper end of the crucible form a graphite channel; in the silicon carbide single crystal growth region, a graphite tube is arranged in the inner cavity of the crucible, the upper end of the tube wall of the graphite tube is in seamless butt joint with the lower end of the inner wall of the crucible in the silicon carbide raw material region, a silicon carbide seed crystal is positioned at the bottom of the crucible and in the inner cavity of the graphite tube, and the inner cavity of the graphite tube forms a silicon carbide single crystal growth chamber; after heating, the sublimated silicon carbide raw material moves to the silicon carbide single crystal growth chamber through the graphite channel along the gravity direction.
2. A silicon carbide single crystal growth apparatus according to claim 1, wherein: the longitudinal section of the crucible inner cavity corresponding to the silicon carbide single crystal growth region is an isosceles trapezoid of which the upper side length is smaller than the lower side length.
3. A silicon carbide single crystal growth apparatus according to claim 1, wherein: the silicon carbide raw material area circumference be provided with at least one silicon carbide raw material groove, silicon carbide raw material inslot side cell wall upper end inwards transversely extends and forms the graphite passageway with crucible upper end inner wall.
4. A silicon carbide single crystal growth apparatus according to claim 3, wherein: the silicon carbide raw material area is provided with at least one graphite channel, and the inner diameter of the graphite channel is 1-10 mm.
5. A silicon carbide single crystal growth apparatus according to claim 4, wherein: the sublimed silicon carbide raw material enters a crucible inner cavity corresponding to the silicon carbide raw material area through a graphite channel and then enters a silicon carbide single crystal growth chamber.
6. The silicon carbide single crystal growth apparatus according to claim 1 or 2, characterized in that: the crucible is heated by a coil induction heating group and/or a resistance.
7. The silicon carbide single crystal growth apparatus according to claim 1 or 2, characterized in that: and the silicon carbide raw material region and the silicon carbide single crystal growth region are both provided with temperature measuring components.
8. The silicon carbide single crystal growth apparatus according to claim 1 or 2, characterized in that: the longitudinal section of the graphite tube is rectangular or trapezoidal.
9. The silicon carbide single crystal growth apparatus according to claim 1 or 2, characterized in that: the temperature range of the silicon carbide raw material area is 2100-2500 ℃; the temperature range of the silicon carbide single crystal growth region is 1800-.
10. A silicon carbide single crystal growth apparatus according to claim 9, wherein: the slope of the temperature curve of the silicon carbide single crystal growth region is a constant.
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| CN112126975A (en) * | 2020-09-18 | 2020-12-25 | 山东国晶电子科技有限公司 | Silicon carbide single crystal growth device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112126975A (en) * | 2020-09-18 | 2020-12-25 | 山东国晶电子科技有限公司 | Silicon carbide single crystal growth device |
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