CN213507186U - 一种基片台 - Google Patents
一种基片台 Download PDFInfo
- Publication number
- CN213507186U CN213507186U CN202020446071.5U CN202020446071U CN213507186U CN 213507186 U CN213507186 U CN 213507186U CN 202020446071 U CN202020446071 U CN 202020446071U CN 213507186 U CN213507186 U CN 213507186U
- Authority
- CN
- China
- Prior art keywords
- vacuum cavity
- metal
- wall
- plasma
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn - After Issue
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 52
- 239000002184 metal Substances 0.000 claims abstract description 52
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 abstract description 28
- 238000000034 method Methods 0.000 abstract description 13
- 230000000694 effects Effects 0.000 abstract description 6
- 230000005684 electric field Effects 0.000 abstract description 2
- 239000006227 byproduct Substances 0.000 abstract 1
- 210000002381 plasma Anatomy 0.000 description 32
- 229910003460 diamond Inorganic materials 0.000 description 6
- 239000010432 diamond Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 239000012535 impurity Substances 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 4
- 238000005498 polishing Methods 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 238000001467 acupuncture Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202020446071.5U CN213507186U (zh) | 2020-03-31 | 2020-03-31 | 一种基片台 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202020446071.5U CN213507186U (zh) | 2020-03-31 | 2020-03-31 | 一种基片台 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN213507186U true CN213507186U (zh) | 2021-06-22 |
Family
ID=76378553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN202020446071.5U Withdrawn - After Issue CN213507186U (zh) | 2020-03-31 | 2020-03-31 | 一种基片台 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN213507186U (zh) |
-
2020
- 2020-03-31 CN CN202020446071.5U patent/CN213507186U/zh not_active Withdrawn - After Issue
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Legal Events
Date | Code | Title | Description |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 201799 west side of Building 2, No. 500, Huapu Road, Qingpu District, Shanghai Patentee after: Shanghai Zhengshi Technology Co.,Ltd. Address before: 201799 west side of Building 2, No. 500, Huapu Road, Qingpu District, Shanghai Patentee before: SHANGHAI ZHENGSHI TECHNOLOGY Co.,Ltd. |
|
AV01 | Patent right actively abandoned | ||
AV01 | Patent right actively abandoned | ||
AV01 | Patent right actively abandoned |
Granted publication date: 20210622 Effective date of abandoning: 20240130 |
|
AV01 | Patent right actively abandoned |
Granted publication date: 20210622 Effective date of abandoning: 20240130 |