CN213378155U

CN213378155U - Semiconductor equipment part cleaning table

Info

Publication number: CN213378155U
Application number: CN202022218264.8U
Authority: CN
Inventors: 杨志勇; 单庆喜; 刘芳亮; 田飞
Original assignee: Yangzhou Sipuer Technology Co
Current assignee: Yangzhou Sipuer Technology Co
Priority date: 2020-09-30
Filing date: 2020-09-30
Publication date: 2021-06-08
Anticipated expiration: 2030-09-30

Abstract

The utility model discloses a semiconductor equipment part clean bench, include: the heating water tank is fixedly arranged on the left side of the box body, and a heating rod is arranged on the cover of the heating water tank; pipelines are fixedly arranged on two sides of the box body, and the upper ends of the pipelines penetrate through holes in the side wall of the box body, extend to the middle of the box body and are fixedly connected with the water pipe; a plurality of nozzles are uniformly distributed on the water pipe; the top of the box body is fixedly provided with a first air heater, the side wall of the box body is provided with a second air heater, four corners of the box body are fixedly provided with air cylinders, the air cylinders are hinged with filter plates, the bottom of the box body is provided with a waste water tank, and a water outlet is formed below the waste water tank; and a box door is arranged outside the box body and is hinged with the box body through a rotating shaft. The utility model discloses the cleaning performance is good, practices thrift the cost.

Description

Semiconductor equipment part cleaning table

Technical Field

The utility model relates to a part washs the field, concretely relates to semiconductor equipment part clean bench.

Background

In the use process of the semiconductor equipment, the parts of the semiconductor equipment need to be cleaned regularly, the cleanliness of the parts can be kept, the efficiency of the semiconductor equipment can be effectively maintained, and the service life of the equipment is prolonged. The cleaning method generally uses acid or alkaline cleaning solution to wash the parts of the semiconductor equipment, but in order to avoid the cleaning solution remaining on the parts and corroding the parts, a large amount of clean water is needed for washing subsequently, and the cleaning effect is better when the clean water is heated to warm water.

The problems existing in the prior art are as follows: the cleaning effect of the existing semiconductor equipment part cleaning table is mostly poor, parts are easy to damage in the cleaning process, unnecessary loss is caused, in addition, a filter plate is not easy to replace in the using process, and the cleaning effect is reduced after long-term use, so that the semiconductor equipment part cleaning table is required to be provided, has the advantages of good cleaning effect, easy replacement of a cleaning device and the like, is convenient to maintain and is beneficial to long-term use.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a semiconductor equipment part clean bench to solve the problem that proposes in the above-mentioned technical background.

In order to solve the above problem, the utility model provides a following technical scheme: a semiconductor device part cleaning station comprising: the cleaning device comprises a box body, a heating water tank and a pipeline, wherein the heating water tank is fixedly arranged on the left side of the box body, a cleaning liquid tank is fixedly arranged on the right side of the box body, the heating water tank is provided with a heating water tank cover, and a heating rod is arranged on the heating water tank cover; pipelines are fixedly arranged on two sides of the box body, the lower end of the left pipeline penetrates through a through hole in a heating water tank cover and extends into the heating water tank, and the lower end of the right pipeline penetrates through a through hole in the cleaning liquid tank and extends into the cleaning liquid tank; the upper ends of the pipelines penetrate through the through holes in the side wall of the box body and extend to the middle of the box body, and the pipelines are fixedly connected with the water pipe; a plurality of nozzles are uniformly distributed on the water pipe;

the top of the box body is fixedly provided with a first air heater, the side wall of the box body is provided with a second air heater, four corners of the box body are fixedly provided with air cylinders, the air cylinders are hinged with filter plates, the filter plates are provided with fixed blocks, the fixed blocks are provided with buckle belts, the bottom of the box body is provided with a waste water tank, an inclined plate is fixedly arranged above the waste water tank, and a water outlet is formed below the waste water tank;

the box body is provided with a box door outside, the box door is hinged with the box body through a rotating shaft, and the box door is provided with a handle.

Preferably, the side wall of the heating water tank is provided with a temperature sensor, a high water level sensor and a low water level sensor, and the inner wall of the cleaning liquid tank is provided with the high water level sensor and the low water level sensor.

Preferably, the pipelines on the two sides are both fixedly provided with water pumps.

Preferably, the inner wall of the wastewater tank is provided with an anti-corrosion layer.

Compared with the prior art, the beneficial effects of the utility model are that: the utility model discloses the filter of installing is changed easily, has avoided long-term use filter to block up the shortcoming that influences the cleaning performance, compares with traditional semiconductor equipment part clean bench, does benefit to long-term use more, the utility model has the advantages of the cleaning performance is good, and the filter is changed conveniently, easy operation.

Drawings

FIG. 1 is a schematic view of the internal structure of the present invention;

FIG. 2 is a schematic view of the external structure of the present invention;

fig. 3 is a schematic view of the water pipe of the present invention.

In the figure: the device comprises a box body 1, a heating water tank 2, a cleaning solution tank 3, a pipeline 4, a water pump 5, a first air heater 6, a water pipe 7, a spray head 8, a second air heater 9, a filter plate 10, an air cylinder 11, a rotating shaft 12, a fixed block 13, a buckle belt 14, a slant plate 15, a waste water tank 16, an anti-corrosion layer 17, a water outlet 18, a box door 19, a handle 20, a heating water tank cover 21, a heating rod 22, a high water level sensor 23, a temperature sensor 24 and a low water level sensor 25.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the present application, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, other embodiments obtained by those skilled in the art without inventive achievements all belong to the protection scope of the present invention.

As shown in the figure, the utility model provides a technical scheme: a semiconductor device part cleaning station comprising: box 1, heating water tank 2 and

pipeline

4, 1 left side fixed mounting of box has

heating water tank

2, 1 right side fixed mounting of box has cleaning solution case 3, heating water tank 2 is equipped with heating water tank lid 21, temperature sensor 24, high water level inductor 23 and low water level inductor 25 are installed to 2 lateral walls of heating water tank, and temperature sensor 24 can detect temperature in the water tank, and control temperature is to suitable washing temperature, and the water level inductor makes things convenient for staff's monitoring water yield in the water tank, in time adds. The heating water tank cover 21 is provided with a heating rod 22; pipelines 4 are fixedly arranged on two sides of the box body 1, water pumps 5 are fixedly arranged on the pipelines 4 on the two sides, the lower end of the pipeline 4 on the left side penetrates through a through hole in a heating water tank cover 21 and extends into the heating water tank 2, the lower end of the pipeline 4 on the right side penetrates through a through hole in the cleaning liquid tank 3 and extends into the cleaning liquid tank 3, and a high water level sensor 23 and a low water level sensor 25 are arranged on the inner wall of the cleaning liquid tank 3; the upper ends of the pipelines 4 penetrate through holes in the side wall of the box body 1, extend to the middle of the box body 1 and are fixedly connected with the water pipe 7; a plurality of nozzles 8 are uniformly distributed on the water pipe 7 and used for uniformly spraying cleaning liquid or clean water on the parts to be cleaned.

1 top fixed mounting of box has an air heater 6, two 9 air heaters are all installed to 1 lateral wall of box, equal fixed mounting has cylinder 11 on 1 four corners of box, all articulated four angles that have filter 10 on the cylinder 11, be equipped with fixed block 13 on the filter 10, install on the fixed block 13 and detain area 14, prevent that part removes striking box 1 and produces the damage in the cleaning process, 1 bottom of box is equipped with

wastewater disposal basin

16, 16 top fixed mounting of wastewater disposal basin has hang plate 15, and the lower one end of hang plate 15 is near 16 water inlets of wastewater disposal basin, 16 below of wastewater disposal basin is equipped with

delivery port

18, 16 inner walls of wastewater disposal basin are equipped with anti-corrosion layer 17, prevent that long-term storage waste liquid from producing the harm to 16 wastewater disposal basins.

A box door 19 is arranged outside the box body 1, the box door 19 is hinged with the box body 1 through a rotating shaft 12, and a handle 20 is arranged on the box door 19.

The utility model discloses at the during operation, pulling handle 20, chamber door 19 are rotatory to horizontal position through pivot 12, and the part that will wash is fixed on filter 10 through detaining area 14, closes chamber door 19. Starting a right-side water pump 5, enabling cleaning liquid to reach a water pipe 7 through a pipeline 4, spraying the cleaning liquid through a spray head 8, starting air cylinders 11 on the periphery of a box body 1, starting the four air cylinders 11 together by adopting two on the same side, starting the other two immovable modes in a circulating and sequential manner, driving a filter plate 10 to swing in the box body 1 under the driving of the air cylinders 11 so as to ensure that the cleaning liquid can be sprayed to each part of a part and prevent dead corners, closing the right-side water pump 5 after the cleaning step of the cleaning liquid is finished, connecting a heating rod 22 with a power supply, starting the water in a heating water tank 2 to heat up, starting a key heating rod 22 power supply and a left-side water pump 5 when a temperature sensor 24 displays that the water temperature reaches a proper temperature, washing the surface of the part with a large amount of warm water in the same mode, closing the left-side water pump 5 after the part is washed clean, simultaneously starting a first, and drying the part, and finishing the cleaning operation when no liquid is left on the surface of the part.

The utility model discloses long-term after using, can be stopped up by the foul that washs on the filter 10, influence the cleaning performance, can open chamber door 19 this moment, take the filter 10 that stops up out, change into new filter 10, convenient operation has prolonged the life of clean bench, effectively practices thrift the cost.

Although the present invention has been described in terms of the above embodiments, the inventive concepts are not limited to the embodiments, and any modifications that utilize the inventive concepts will be within the scope of the appended claims.

Claims

1. A semiconductor device part cleaning station comprising: the device comprises a box body (1), a heating water tank (2) and a pipeline (4), and is characterized in that the heating water tank (2) is fixedly arranged on the left side of the box body (1), a cleaning solution tank (3) is fixedly arranged on the right side of the box body (1), the heating water tank (2) is provided with a heating water tank cover (21), and a heating rod (22) is arranged on the heating water tank cover (21); pipelines (4) are fixedly mounted on two sides of the box body (1), the lower end of the pipeline (4) on the left side penetrates through a through hole in a heating water tank cover (21) and extends into the heating water tank (2), and the lower end of the pipeline (4) on the right side penetrates through a through hole in the cleaning liquid tank (3) and extends into the cleaning liquid tank (3); the upper ends of the pipelines (4) penetrate through holes in the side wall of the box body (1) to extend to the middle of the box body (1) and are fixedly connected with the water pipe (7); a plurality of nozzles (8) are uniformly distributed on the water pipe (7);

the air heater is characterized in that a first air heater (6) is fixedly mounted at the top of the box body (1), a second air heater (9) is mounted on the side wall of the box body (1), air cylinders (11) are fixedly mounted at four corners of the box body (1), filter plates (10) are hinged to the air cylinders (11), fixed blocks (13) are arranged on the filter plates (10), fastening belts (14) are mounted on the fixed blocks (13), a waste water tank (16) is arranged at the bottom of the box body (1), an inclined plate (15) is fixedly mounted above the waste water tank (16), and a water outlet (18) is formed below the waste water tank (16);

the refrigerator is characterized in that a refrigerator door (19) is arranged outside the refrigerator body (1), the refrigerator door (19) is hinged to the refrigerator body (1) through a rotating shaft (12), and a handle (20) is arranged on the refrigerator door (19).

2. The semiconductor device part cleaning station as defined in claim 1, wherein: temperature sensor (24), high water level inductor (23) and low water level inductor (25) are installed to heating water tank (2) lateral wall, high water level inductor (23) and low water level inductor (25) are installed to cleaning solution case (3) inner wall.

3. The semiconductor device part cleaning station as defined in claim 1, wherein: and the pipelines (4) on the two sides are fixedly provided with water pumps (5).

4. The semiconductor device part cleaning station as defined in claim 1, wherein: and an anti-corrosion layer (17) is arranged on the inner wall of the wastewater tank (16).