CN213242498U - Diffusion furnace clean bench clean system - Google Patents
Diffusion furnace clean bench clean system Download PDFInfo
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- CN213242498U CN213242498U CN202022319475.0U CN202022319475U CN213242498U CN 213242498 U CN213242498 U CN 213242498U CN 202022319475 U CN202022319475 U CN 202022319475U CN 213242498 U CN213242498 U CN 213242498U
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Abstract
A diffusion furnace purification table purification system comprises a purification table frame and a purification device, wherein the purification device comprises an air filtering purifier, a fan and an air inlet; the air filtering purifier, the fan and the air inlet are arranged above the purifying table frame; the utility model discloses a set up the filtration clarifier and purify the gas that gets into and remove the boat structure, impurity such as dust in the one of which can effectively prevent the air from to the production technology production influence of silicon chip, its two can improve the radiating efficiency of silicon chip, just the utility model discloses a with the introducing port of air current with to export set up respectively in the side of filtration clarifier and the side in wind gap, effectively prevent impurity such as dust from getting into along introducing port or export and remove the inside of boat structure.
Description
Technical Field
The utility model relates to a semiconductor manufacturing equipment field especially relates to a diffusion furnace clean bench clean system.
Background
The diffusion furnace is one of important devices of semiconductor device process equipment, is widely applied to the industries of integrated circuits, power electronics, solar cell production and the like, and is mainly used for doping monocrystalline silicon wafers and polycrystalline silicon wafers to form PN junctions in the photovoltaic industry. With the development of the photovoltaic industry, people are always pursuing the improvement of the productivity. During the fabrication process, there are many thermal processes, such as thermal oxidation, Chemical Vapor Deposition (CVD), thermal diffusion, metal alloying, impurity activation, dielectric film densification, etc. These thermal processes are very sensitive to temperature, which is a critical parameter affecting the film formation uniformity and growth rate of silicon wafers, especially in the fabrication of semiconductor devices.
Generally, silicon wafers are loaded in a quartz crystal, are carried into a furnace tube by a boat carrying mechanism, and are carried out of the furnace tube after the reaction is completed. In the heat treatment process of the semiconductor device, the boat moving mechanism generates a large amount of heat when moving in and out the silicon wafers. In addition to the cooling devices in the furnace, a complete cooling system is also required to support the operation of the whole process. The traditional heat dissipation mode only sets up the system air outlet and carries out the heat extraction, and some heat is discharged from the system air outlet like this, but most heat still accumulates inside the system, not only influences production efficiency, and these heats still probably cause the harm to device itself moreover, and influence equipment performance and life-span. Therefore, how to improve the internal heat dissipation effect, ensure that equipment can work stably for a long time to satisfy the demand of rapid purification and cooling technology, develop the outside clean system of furnace body that the price/performance ratio is high, be the technical problem who awaits a urgent need to solve.
Disclosure of Invention
The to-be-solved technical problem of the utility model overcomes the deficiencies of the prior art, and provides a simple structure, can purify diffusion furnace and remove the gaseous clean system of boat part.
The utility model adopts the following technical scheme:
a diffusion furnace purification table purification system comprises a purification table frame and a purification device, wherein the purification device comprises an air filtering purifier, a fan and an air inlet; the air filtering purifier, the fan and the air inlet are arranged above the purifying table frame.
Further, the number of the air filtering purifiers is at least one; the air filtering purifier is communicated with the inner space of the purifying table frame through an air pipeline structure.
Further, the air filtering purifier adopts an air filter element for purification.
Further, filtration clarifier sets up to two sets ofly, is first filtration clarifier and second filtration clarifier respectively, first filtration clarifier and second filtration clarifier set up respectively on the adjacent apex angle at clean bench frame top.
Furthermore, the air inlets are arranged into two groups, namely a first air inlet and a second air inlet, and the air inlets are arranged as air suction inlets inside the purification platform frame.
Further, the air filter purifier is in a shape of a right quadrangular prism, and cylindrical openings are formed in two opposite side surfaces of the air filter purifier and extend outwards to serve as air flow inlet openings.
Furthermore, the side surface of the air inlet is provided with an air flow outlet.
Adopt the beneficial effects of the utility model reside in that:
the utility model discloses a set up the filtration clarifier and purify the gas that gets into the clean bench frame, impurity such as the one of which can effectively prevent to cross in the air dust produces the influence to the production technology of silicon chip, and its two can improve the radiating efficiency of silicon chip.
Compared with the prior art, the utility model discloses install clean system additional at clean bench frame top, can also greatly reduced the inside temperature of equipment during operation when realizing purification performance for the temperature is unlikely to too high and influences the normal work of equipment.
The utility model discloses a lead-in port with to the export of air current set up respectively in the side of filtration clarifier and the side of air intake, prevent effectively that impurity such as dust from getting into the inside of clean bench frame along lead-in port or export.
Drawings
FIG. 1 is an overall system diagram of the present invention;
fig. 2 is a frame diagram of the purification table of the present invention.
Description of reference numerals: the air purifier comprises a first air filtering purifier 11, a second air filtering purifier 12, a fan 2, a first air inlet 31, a second air inlet 32, a water cooling disc 5, a water cooling disc fan 6, a water inlet and outlet pipe 7, a purifying table frame 9 and a furnace body frame 10.
Detailed Description
In order to make the technical field personnel understand the utility model discloses the scheme, will combine the drawing in the embodiment of the utility model below, to the technical scheme in the embodiment of the utility model carries out clear, complete description.
All directional indicators (such as upper, lower, left, right, front, rear, horizontal, vertical … …) in the embodiments of the present invention are only used to explain the relative position relationship between the components, the motion situation, etc. in a specific posture, if the specific posture changes, the directional indicator changes accordingly.
The first embodiment is as follows:
as shown in fig. 1, the cooling and purifying device of the purification table comprises a purification table frame 9, a purifying device and a cooling device, wherein the cooling and purifying device comprises an air filtering purifier (11, 12), a fan 2, an air inlet (31, 32) and a water cooling disc 5; the number of the fans 2 is two; the air filtering purifier (11, 12), the fan 2 and the air inlet (31, 32) are sequentially and transversely arranged above the purifying table frame 9 and connected through a pipeline, and the water cooling disc 5 is arranged on the front side of the air filtering purifier (11, 12). The clean bench frame 9 is arranged adjacent to the furnace body frame 10.
Wherein purifier comprises filtration clarifier (11, 12), fan 2 and air intake (31, 32), and filtration clarifier (11, 12), fan 2 and air intake (31, 32) set up in the top of clean bench frame 9 and link to each other through the pipeline, in this embodiment, filtration clarifier (11, 12) adopt air filter to purify, are the physics mode of purifying. Wherein the air filtering purifiers (11, 12) are at least one group, and two groups of air filtering purifiers (11, 12) are provided in the embodiment, namely a first air filtering purifier 11 and a second air filtering purifier 12. The first air filter purifier 11 and the second air filter purifier 12 are respectively communicated with the inner space of the purification platform frame 9 through an air pipeline structure (not marked in the figure). The first air filtering purifier 11 and the second air filtering purifier 12 are used for purifying the air outside the purifying table frame 9 by the fan 2 and then introducing the air into the purifying table frame 9, and the air introduced into the purifying table frame needs to be filtered and purified firstly because the silicon wafer process needs to be clean. The first air filtering purifier 11 is arranged at the upper left corner of the top of the purifying table frame 9 in the embodiment; second filtration clarifier 12 sets up in the upper right corner of clean bench frame 9, and filtration clarifier (11, 12) set up to two sets of purposes in this embodiment can guarantee that the inside air current of clean bench frame 9 is even, avoids appearing the emergence of the big air current little condition of one side of air current, guarantees that the heat dissipation of silicon chip is even. The inside cooling of clean bench frame 9 and not introducing the pollution can be realized to very big degree to the cold air after letting in the purification through setting up first filtration clarifier 11 and second filtration clarifier 12.
The first air filter purifier 11 and the second air filter purifier 12 have the same shape and structure, and taking the first air filter purifier 11 as an example, the first air filter purifier 11 is entirely in the shape of a straight quadrangular prism, and cylindrical openings are provided on two opposite side surfaces of the first air filter purifier 11, and extend outward as air flow introduction ports (not shown). The purpose of the openings being arranged on the side surfaces instead of the top surface is to prevent ash layers from falling into the device, which affects the filtering efficiency of the air filter cleaner (11, 12).
The fan 2 and the air inlets (31, 32) are used for further ensuring air circulation inside the purification table frame 9, and the number of the air inlets (31, 32) is two, namely a first air inlet 31 and a second air inlet 32; the two fans 2 are respectively connected with the first air inlet 31 and the second air inlet 32. The first air inlet 31 and the second air inlet 32 are respectively provided with an air flow outlet (not labeled), wherein the air flow outlet is arranged on the side of the air inlets (31, 32), so as to prevent dust from falling into the interior of the clean bench frame 9 along the air inlets (31, 32) when the air inlets (31, 32) do not work. The gas outside the clean bench rack 9 can be drawn into the interior of the clean bench rack 9 along the intake openings (31, 32). The air inlets (31, 32) are combined with air filtering purifiers (11, 12) to realize the air flow circulation inside and outside the purification table frame 9.
The cooling device of the purification platform comprises an air cooling device, the air cooling device comprises air inlets (31, 32), an air outlet and a fan 2, and the air outlet is located inside the purification platform. In order to further improve the cooling efficiency inside the purification table frame 9, a mode that an air cooling device is combined with a water cooling device can be adopted, the water cooling device comprises a water cooling disc 5 and a water cooling pipeline (not marked in the figure), the water cooling disc 5 and the water cooling pipeline form a closed circulation loop, a water cooling disc fan 6 is arranged on one side of the water cooling disc 5, and the water cooling disc fan 6 arranged on the water cooling disc is used for realizing rapid cooling of the water cooling disc. The hot air inside the clean bench 9 can be extracted to be cooled by a water cooling disc and then discharged to the outside of the clean bench 9 or discharged to the inside of the clean bench to realize internal circulation. When the hot air flow in the purification platform 9 passes through the water-cooling disc, the hot air flow and the heat dissipation fins arranged on the coil pipe of the water-cooling disc generate heat exchange, so that the temperature of the hot air flow is reduced, the cooled hot air flow can be directly discharged to the outside or led to the inside, and the heat dissipation fins are made of aluminum or copper materials. In this embodiment, the water-cooling disc 5 is further provided with a water inlet and outlet pipe 7. The water inlet and outlet pipe 7 is vertically arranged at the top of the purification platform frame 9, and the water inlet and outlet pipe 7 is communicated with the water cooling disc 5 through a valve and a pipeline. Wherein the water-cooling pipeline can set up in one of the top of clean bench frame 9, side, inside three or its combination, and the water-cooling pipeline sets up in the top of clean bench frame 9, side and inside in this embodiment, combines the forced air cooling through the water-cooling, realizes the inside rapid cooling of clean bench frame 9. In order to further improve the water cooling efficiency, the water medium can be replaced by a specific cooling liquid.
Although the present invention has been described with reference to the preferred embodiments, it is not intended to limit the present invention. The technical solution of the present invention can be used by anyone skilled in the art to make many possible variations and modifications, or to modify equivalent embodiments, without departing from the scope of the technical solution of the present invention, using the technical content disclosed above. Therefore, any simple modification, equivalent change and modification made to the above embodiments by the technical entity of the present invention should fall within the protection scope of the technical solution of the present invention.
Claims (7)
1. A diffusion furnace purification table purification system is characterized by comprising a purification table frame and a purification device, wherein the purification device comprises an air filtering purifier, a fan and an air inlet; the air filtering purifier, the fan and the air inlet are arranged above the purifying table frame.
2. The diffusion furnace clean bench cleaning system of claim 1, wherein there is at least one air filtration cleaner; the air filtering purifier is communicated with the inner space of the purifying table frame through an air pipeline structure.
3. The diffusion furnace clean bench cleaning system of claim 1, wherein the air filtration purifier employs an air filter cartridge for cleaning.
4. The diffusion furnace purification table of claim 2, wherein the air filtering purifiers are arranged in two groups, namely a first air filtering purifier and a second air filtering purifier, and the first air filtering purifier and the second air filtering purifier are respectively arranged on adjacent top corners of the top of the purification table frame.
5. The purification system of claim 3, wherein the air inlets are arranged in two groups, namely a first air inlet and a second air inlet, and the air inlets are arranged as air inlets inside the purification platform frame.
6. The purification system of claim 1, wherein the air filter purifier is in the shape of a right quadrangular prism, and cylindrical openings are provided on opposite sides of the air filter purifier and extend outward as an air flow inlet.
7. The purification system of claim 1, wherein the side of the air inlet is provided with an air outlet.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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CN201921753679 | 2019-10-18 | ||
CN2019217536796 | 2019-10-18 |
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Publication Number | Publication Date |
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CN213242498U true CN213242498U (en) | 2021-05-18 |
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CN202022319475.0U Active CN213242498U (en) | 2019-10-18 | 2020-10-17 | Diffusion furnace clean bench clean system |
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- 2020-10-17 CN CN202022319475.0U patent/CN213242498U/en active Active
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Address after: No.1, Jikang Road, Kengzi street, Pingshan District, Shenzhen City, Guangdong Province Patentee after: Laplace New Energy Technology Co.,Ltd. Address before: No.1, Jikang Road, Kengzi street, Pingshan District, Shenzhen City, Guangdong Province Patentee before: SHENZHEN LAPLACE ENERGY TECHNOLOGY Co.,Ltd. |