CN213103420U - Substrate cleaning brush and substrate cleaning device - Google Patents

Substrate cleaning brush and substrate cleaning device Download PDF

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Publication number
CN213103420U
CN213103420U CN202021508200.5U CN202021508200U CN213103420U CN 213103420 U CN213103420 U CN 213103420U CN 202021508200 U CN202021508200 U CN 202021508200U CN 213103420 U CN213103420 U CN 213103420U
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China
Prior art keywords
rotating shaft
brush
substrate cleaning
bearing
cleaning brush
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CN202021508200.5U
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Chinese (zh)
Inventor
黄超越
刘闽
史海洋
李望
李良
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Chengdu BOE Display Technology Co Ltd
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Chengdu CEC Panda Display Technology Co Ltd
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Priority to CN202021508200.5U priority Critical patent/CN213103420U/en
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Abstract

The utility model provides a substrate cleaning brush and a substrate cleaning device, wherein, the substrate cleaning brush comprises a rotating shaft and at least two brush sleeves; the two brush sleeves are sleeved on the rotating shaft and are arranged at intervals along the axial direction of the rotating shaft to form an installation interval; an adjusting mechanism is arranged in the mounting interval and is rotatably mounted on the rotating shaft, so that the rotating shaft can rotate under the action of the driving mechanism to drive the brush sleeve to rotate, and further, the substrate is cleaned; the adjusting mechanism is configured to be the pivot of can bending from top to bottom to the axiality of adjustment pivot is in predetermineeing the within range, makes the brush sleeve all in predetermineeing the within range along the contact volume of pivot axial and base plate, and the brush sleeve is even along the contact volume of pivot axial and base plate, thereby makes the brush sleeve even to the contact force of base plate, improves the cleaning performance to the base plate, is favorable to improving the yield of product.

Description

Substrate cleaning brush and substrate cleaning device
Technical Field
The utility model relates to a show technical field, especially relate to a base plate cleaning brush and base plate belt cleaning device.
Background
In the manufacturing process of the display panel, the substrate is left with contaminants during the storage, transfer and unloading processes, and therefore, a cleaning device is required to remove the contaminants on the surface of the substrate.
The existing substrate cleaning equipment generally comprises a Brush (Brush) arranged above a substrate, wherein the Brush is arranged on a rotating shaft, a driving motor rotates through the rotating shaft to drive the Brush to rotate, and the substrate is cleaned along the movement of the substrate in the direction perpendicular to the axis of the Brush.
Because the axial size of the brush is long, the weight is large, the middle part of the brush easily sinks to cause the bending of the brush, so that the contact amount of the brush and the substrate along the axial direction is uneven, the contact amount of the middle part of the brush and the substrate is large, the contact amount of the two ends of the brush and the substrate is small, the contact force of the brush to the substrate is uneven, the substrate is easily scratched by the middle part of the brush, the two ends of the brush are not cleaned completely, and the yield of products is finally reduced.
SUMMERY OF THE UTILITY MODEL
The utility model provides a base plate cleaning brush and base plate belt cleaning device to solve current brush middle part and sink and cause the bending, make the brush inhomogeneous to the contact force of base plate, lead to the technical problem that the product yield descends.
In order to solve the technical problem, the utility model discloses a following technical scheme:
the utility model provides a substrate cleaning brush in the first aspect, which comprises a rotating shaft and at least two brush sleeves; the two brush sleeves are sleeved on the rotating shaft and are arranged at intervals along the axial direction of the rotating shaft to form an installation interval; the installation interval is internally provided with an adjusting mechanism, the adjusting mechanism is rotatably installed on the rotating shaft, and the adjusting mechanism is configured to be capable of bending the rotating shaft up and down so as to adjust the coaxiality of the rotating shaft within a preset range.
Compared with the prior art, the utility model discloses a base plate cleaning brush that the first aspect provided has following advantage:
the utility model provides a substrate cleaning brush, which comprises a rotating shaft and at least two brush sleeves; the two brush sleeves are sleeved on the rotating shaft and are arranged at intervals along the axial direction of the rotating shaft to form an installation interval; an adjusting mechanism is arranged in the mounting interval and is rotatably mounted on the rotating shaft, so that the rotating shaft can rotate under the action of the driving mechanism to drive the brush sleeve to rotate, and further, the substrate is cleaned; the adjusting mechanism is configured to be the pivot of can bending from top to bottom to the axiality of adjustment pivot is in predetermineeing the within range, makes the brush sleeve all in predetermineeing the within range along the contact volume of pivot axial and base plate, and the brush sleeve is even along the contact volume of pivot axial and base plate, thereby makes the brush sleeve even to the contact force of base plate, improves the cleaning performance to the base plate, is favorable to improving the yield of product.
As an improvement of the substrate cleaning brush of the present invention, the adjusting mechanism includes a first bearing, a first bearing seat and a driver; the first bearing is sleeved on the rotating shaft, and the first bearing seat is sleeved outside the first bearing; the output end of the driver is in transmission connection with the first bearing seat, and the driver drives the rotating shaft to be bent and deformed up and down by driving the first bearing seat and the first bearing so as to adjust the coaxiality of the rotating shaft within a preset range.
As an improvement of the above-mentioned substrate cleaning brush, guiding mechanism still includes support frame and drive assembly, the bottom of support frame with primary shaft bearing fixed connection, the top of support frame with drive assembly's output transmission is connected, drive assembly's input with the output transmission of driver is connected.
As an improvement of the substrate cleaning brush of the present invention, the driver is a motor; the transmission assembly comprises a transmission worm wheel, a transmission rod and a nut assembly; the transmission rod comprises a worm part and a screw rod part arranged below the worm part, the nut component is fixed on the support frame, and the nut component is connected with the screw rod part; the transmission worm wheel is in transmission connection with an output shaft of the motor, and the transmission worm wheel is meshed with the worm part.
As the utility model discloses an improvement of above-mentioned base plate cleaning brush, the base plate cleaning brush still includes frame and the mounting panel of fixed mounting on the frame top, the motor is fixed on the mounting panel.
As an improvement of the above-mentioned substrate cleaning brush, be provided with sliding construction on the mounting panel, be provided with on the support frame with sliding construction matched with cooperation structure, cooperation structure with sliding construction is configured to can follow vertical direction and slides.
As an improvement of the above-mentioned base plate cleaning brush of the utility model, sliding structure with one of cooperation structure is along the slide rail of vertical extension, sliding structure with another one of cooperation structure is along the spout of vertical extension, the slide rail with vertical direction relative slip can be followed to the spout.
As an improvement of the above-mentioned substrate cleaning brush of the present invention, the adjusting mechanism further includes two and the support bearing assembly that the transfer line is connected, one of them support bearing assembly is fixed on the mounting panel, wherein another the support bearing assembly is fixed on the support frame.
As an improvement of the above-mentioned substrate cleaning brush of the present invention, the substrate cleaning brush further comprises a controller, the controller with the adjustment mechanism is electrically connected.
A second aspect of the utility model provides a substrate cleaning device, it includes workstation and two at least parallel arrangement the substrate cleaning brush, the substrate cleaning brush is fixed on the workstation, just the crisscross setting in pivot axial position is followed to the installation interval of substrate cleaning brush.
The utility model discloses a substrate cleaning device that second aspect provided, because it includes the first aspect the substrate cleaning brush, consequently the utility model discloses a substrate cleaning device that second aspect provides also have with the first aspect the same advantage of substrate cleaning brush.
Drawings
In order to illustrate more clearly the embodiments of the invention or the technical solutions in the prior art, the drawings which are needed in the description of the embodiments of the invention or the prior art will be briefly described below, it is obvious that the drawings in the following description are only a part of the embodiments of the invention, and the drawings and the description are not intended to limit the scope of the disclosed concept in any way, but to illustrate the disclosed concept for a person skilled in the art by referring to a specific embodiment, and for a person skilled in the art, other drawings can be obtained from the drawings without inventive effort.
Fig. 1 is a schematic structural diagram of a substrate cleaning brush according to an embodiment of the present invention;
FIG. 2 is a front view of a substrate cleaning brush according to an embodiment of the present invention;
FIG. 3 is a left side view of a substrate cleaning brush according to an embodiment of the present invention;
FIG. 4 is a partial exploded view of a substrate cleaning brush according to an embodiment of the present invention;
fig. 5 is a schematic structural view of an adjusting mechanism of a substrate cleaning brush according to an embodiment of the present invention;
fig. 6 is a partial exploded view of an adjustment mechanism of a substrate cleaning brush according to an embodiment of the present invention;
figure 7 is a left side view of an adjustment mechanism for a substrate cleaning brush provided in an embodiment of the present invention;
fig. 8 is a sectional view taken along line a-a of fig. 7.
Description of reference numerals:
1: a rotating shaft;
2: a brush sleeve; 21: an end cap;
3: an adjustment mechanism; 30: a bearing; 31: a first bearing housing; 311: a base; 312: a top seat; 32: a driver; 321: an output shaft of the motor; 33: a support frame; 331: a mating structure; 34: a transmission assembly; 341: a transmission rod; 3411: a worm part; 3412: a wire rod part; 342: a nut assembly; 35: supporting a bearing assembly; 37: bearing bushes;
4: installing intervals;
5: a frame; 51: a stringer; 52: erecting a beam; 53: a sliding structure; 531: a slide base; 5311: a fixing hole; 532: a slider;
6: and (7) mounting the plate.
Detailed Description
The Brush (Brush) of the existing substrate cleaning equipment is arranged on a rotating shaft, a driving motor rotates through the rotating shaft to drive the Brush to rotate, and the substrate is cleaned along the movement of the substrate in the direction vertical to the axis of the Brush. However, the axial size of the brush is long, the weight of the brush is large, the middle of the brush is easy to sink to cause the bending of the brush, namely, the coaxiality of the rotating shaft exceeds a preset range, so that the contact amount of the brush with the substrate along the axial direction is uneven, the contact amount of the middle of the brush with the substrate is large, the contact amount of the two ends of the brush with the substrate is small, the contact force of the brush with the substrate is uneven, the substrate is easily scratched by the middle of the brush, the two ends of the brush are not cleaned completely, and finally the yield.
In view of this, the utility model provides a base plate cleaning brush and have its base plate belt cleaning device, wherein, the base plate cleaning brush includes the pivot, two at least brush covers and at least one guiding mechanism, two brush covers set up along the axial interval of pivot, and form the installation interval of installation guiding mechanism between two brush covers, the rotatable installation of guiding mechanism is in the pivot, so that the pivot drives the brush cover and rotates under driving motor's drive, guiding mechanism is configured to can follow the axiality of vertical direction bending pivot in order to adjust the pivot, make the axiality of pivot in predetermineeing the within range, and then make the contact volume of brush hair on the brush cover in the axial of pivot even with the base plate, thereby make the contact force of brush hair to the base plate even, improve the cleaning performance to the base plate, be favorable to improving the yield of product.
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary and intended to be used for explaining the present invention, and should not be construed as limiting the present invention.
First, referring to fig. 1 to 4, wherein fig. 1 is a schematic structural diagram of a substrate cleaning brush according to an embodiment of the present invention; FIG. 2 is a front view of a substrate cleaning brush according to an embodiment of the present invention; FIG. 3 is a left side view of a substrate cleaning brush according to an embodiment of the present invention; fig. 4 is a partial exploded view of a substrate cleaning brush according to an embodiment of the present invention.
As shown in fig. 1 to 4, an embodiment of the present invention provides a substrate cleaning brush, which includes: a rotating shaft 1 and at least two brush sleeves 2; the two brush sleeves 2 are sleeved on the rotating shaft 1, and the two brush sleeves 2 are arranged at intervals along the axial direction of the rotating shaft 1 to form an installation interval 4; the installation space 4 is internally provided with an adjusting mechanism 3, the adjusting mechanism 3 is rotatably installed on the rotating shaft 1, and the adjusting mechanism 3 is configured to be capable of bending the rotating shaft 1 up and down to adjust the coaxiality of the rotating shaft 1 within a preset range.
The rotating shaft 1 can be a metal shaft, such as a steel shaft, and is high in rigidity and beneficial to reducing the bending degree. The rotary shaft 1 extends in the X direction, i.e., the axial direction of the rotary shaft 1 is in the X direction. At least one end transmission of pivot 1 is connected with actuating mechanism, and actuating mechanism includes driving motor, and driving motor is used for driving pivot 1 to rotate to drive brush housing 2 and rotate, realize the washing to the base plate. Of course, the driving mechanism further comprises a transmission component, i.e. the end of the rotating shaft 1 can be in transmission connection with the driving motor through the transmission component, such as a gear, a transmission shaft, etc. The embodiment of the utility model provides a do not restrict to pivot 1 realizes its pivoted actuating mechanism concrete structure.
The two ends of the rotating shaft 1 can be respectively provided with a lifting mechanism, the lifting mechanism comprises a lifting driver and a transmission piece, the lifting driver drives the rotating shaft 1 and the brush sleeve 2 to move up and down through the transmission piece so as to adjust the distance between the brush sleeve 2 and the substrate, namely, when the substrate is cleaned, the lifting driver drives the rotating shaft 1 and the brush sleeve 2 to move downwards through the transmission piece so that the brush sleeve 2 reaches a preset cleaning position; after the cleaning is finished, the lifting driver drives the rotating shaft 1 and the brush sleeve 2 to move upwards through the transmission part, so that the substrate is convenient to replace, and the next substrate is cleaned. It can be understood that when the rotating shaft 1 and the brush sleeve 2 move up and down under the driving of the lifting mechanism, the moving direction and distance of the adjusting mechanism 3 and the lifting mechanism are the same. The embodiment of the utility model provides a do not restrict elevating system's structure.
Referring to fig. 1 to 4, end caps 21 are provided at both ends of the rotating shaft 1, and the end caps 21 are fixed to the rotating shaft to prevent the brush holder 2 from falling off from the rotating shaft 1.
Brush holder 2 is as contacting with the base plate, carrying out abluent part to the base plate, and it can include the sleeve and set up the cleaning brush in the sleeve outside, and the cleaning brush can be the brush, and the cleaning brush can also be the sponge brush, the utility model provides a cleaning brush of brush holder 2 is not limited to this, and it can be other soft cleaning brush. The sleeve can be a rigid cylinder and can be sleeved and connected to the outer side of the rotating shaft 1 through key connection, interference connection and the like; the sleeve can also be a rubber tube which can be sleeved outside the rotating shaft 1 by utilizing elastic force.
In this embodiment, at least two brush sleeves 2 are provided, and a mounting space 4 is formed between adjacent brush sleeves 2 for mounting the adjusting mechanism 3. In some examples, the substrate cleaning brush includes two brush holders 2 and one adjustment mechanism 3, and a mounting interval 4 for mounting the adjustment mechanism 3 is formed between the two brush holders 2. At this time, the two brush sleeves 2 may be the same or different in size along the axial direction of the rotating shaft 1, that is, the installation space 4 may be located in the middle of the rotating shaft 1, the installation space 4 may also be located in other positions, that is, the adjusting mechanism 3 may be installed in the middle of the rotating shaft 1, the adjusting mechanism 3 may also be installed in other positions of the rotating shaft 1, and preferably, the adjusting mechanism 3 is installed in the middle of the rotating shaft 1, so that the coaxiality of the rotating shaft 1 can be adjusted more accurately and conveniently.
In other examples, the substrate cleaning brush comprises N brush sleeves 2 and N-1 adjusting mechanisms 3, wherein the N brush sleeves 2 are arranged at intervals along the axial direction of the rotating shaft 1 to form N-1 installation intervals 4, and one adjusting mechanism 3 is installed in each installation interval 4, wherein N is a positive integer greater than 2. For example, the substrate cleaning brush includes three brush holders 2 and two adjustment mechanisms 3. The embodiment of the utility model provides a do not restrict brush holder 2 and guiding mechanism 3's quantity, the technical personnel in the field can be according to the size of base plate, the size of pivot 1 and the quantity that factors such as the convenience of processing and installation set up brush holder 2 and guiding mechanism 3 comprehensively. This example sets up a plurality of guiding mechanism 3, is favorable to improving the precision of adjustment pivot 1 axiality for pivot 1 is more straight, further improves the cleaning performance of base plate.
In this example, the adjustment mechanism 1 is rotatably mounted on the shaft 1, i.e. the adjustment mechanism 1 does not affect the rotation of the shaft 1. For example, the adjusting mechanism 1 may be connected to the rotating shaft 1 through a bearing, and for example, a through hole is formed at a bottom end of the adjusting mechanism 1, so that the rotating shaft 1 passes through the through hole and the rotating shaft 1 can rotate relative to the through hole.
The adjustment mechanism 1 of this example is configured as can be crooked pivot 1 from top to bottom, that is to say, the both ends of pivot 1 are fixed by elevating system or actuating mechanism, adjustment mechanism 1 can stretch the crookedness of pivot 1 adjustment pivot 1 from top to bottom, with the axiality of adjustment pivot 1 in predetermineeing the within range, so, make brush holder 2 all within a predetermined range along the contact volume of pivot 1 axial and base plate, brush holder 2 is even along the contact volume of 1 axial of pivot and base plate, thereby make brush holder 2 even to the contact force of base plate, improve the cleaning performance to the base plate, be favorable to improving the yield of product.
In this embodiment, the substrate cleaning brush includes a rotation shaft 1 and at least two brush covers 2; the two brush sleeves 2 are sleeved on the rotating shaft 1, and the two brush sleeves 2 are arranged at intervals along the axial direction of the rotating shaft 1 to form an installation interval 4; an adjusting mechanism 3 is arranged in the mounting interval 4, and the adjusting mechanism 3 is rotatably mounted on the rotating shaft 1, so that the rotating shaft 1 can rotate under the action of the driving mechanism to drive the brush sleeve 2 to rotate, and further, the substrate is cleaned; the adjusting mechanism 3 is configured to be the pivot 1 that can bend from top to bottom to the axiality of adjustment pivot 1 is in predetermineeing the within range, makes brush holder 2 all in predetermineeing the within range along the contact volume of 1 axial of pivot and base plate, and brush holder 2 is even along the contact volume of 1 axial of pivot and base plate, thereby makes brush holder 2 even to the contact force of base plate, improves the cleaning performance to the base plate, is favorable to improving the yield of product.
With continued reference to fig. 1 to 4, in one possible implementation, the adjustment mechanism 3 includes a first bearing 30, a first bearing seat 31, and a driver 32; the first bearing 30 is sleeved on the rotating shaft 1, and a first bearing seat 31 is sleeved outside the first bearing 30; the output end of the driver 32 is in transmission connection with the first bearing seat 31, and the driver 32 drives the rotating shaft 1 to move up and down by driving the first bearing seat 31 and the first bearing 30, so as to adjust the coaxiality of the rotating shaft 1 within a preset range.
The first bearing 30 may be an existing bearing, for example, a tapered roller bearing, and the embodiment of the present invention does not limit the type of the first bearing 30. The first bearing housing 31 is used for protecting and supporting the first bearing 30, and may include a base 311 and a top seat 312, and the base 311 and the top seat 312 are fixed by a fastener, for example, a screw or a bolt. The base seat 311 and the top seat 312 form an annular receiving space to receive the first bearing 30. Optionally, a bearing bush 37 is further disposed between the first bearing 30 and the first bearing seat 31 to protect the first bearing 30 from friction. The specific structure of the bearing bush 37 is not limited in this implementation manner, and the bearing bush may be an integrated bearing bush or a split bearing bush.
The driver 32 is a power component for driving the shaft 1 to bend and deform up and down, and may be a linear driver, such as an air cylinder, a hydraulic cylinder, etc., the driver 32 may also be a motor, and when the driver 32 is a motor, the adjusting mechanism 3 further includes a transmission assembly 34 for converting the rotation of the motor into a linear motion. The output end of the driver 32 may be directly connected to the first bearing seat 31, and the driver 32 drives the rotating shaft 1 to deform and bend up and down through the first bearing seat 31 and the first bearing 30, so as to adjust the coaxiality of the rotating shaft 1. The output end of the driver 32 may be connected to the first bearing seat 31 through a transmission structure, and the driver 32 drives the rotating shaft 1 to deform and bend up and down through the transmission structure, the first bearing seat 31 and the first bearing 30, so as to adjust the coaxiality of the rotating shaft 1.
In the present implementation, the adjusting mechanism 3 includes a first bearing 30, a first bearing seat 31, and a driver 32, and the adjusting mechanism 3 is rotatably connected to the rotating shaft 1 through the first bearing 30, so that the rotating shaft 1 can rotate. The first bearing 30, the first bearing seat 31 and the driver 32 may all adopt the existing structure, which is beneficial to simplifying the structure of the adjusting mechanism 3 and reducing the processing cost of the substrate cleaning brush.
On the basis of the above embodiment, the adjusting mechanism 3 further includes a supporting frame 33 and a transmission assembly 34, the bottom end of the supporting frame 33 is fixedly connected with the first bearing seat 31, the top end of the supporting frame 33 is in transmission connection with the output end of the transmission assembly 34, and the input end of the transmission assembly 34 is in transmission connection with the output end of the driver 32.
The support frame 33 can comprise a cross rod and a vertical rod which are connected to form a truss structure, and the support frame 33 can also be a flat plate structure, so that the processing and the installation are convenient. The bottom end of the supporting frame 33 is fixedly connected to the first bearing seat 31, for example, the bottom end of the supporting frame 33 is fixedly connected to the first bearing seat 31 through a fastener such as a screw, etc., and for example, the bottom end of the supporting frame 33 is fixedly connected to the first bearing seat 31 through a clamping member. Preferably, referring to fig. 1 and 4, the supporting frame 33 is an integral piece with the top seat 312 of the first bearing seat 31, so as to simplify the assembly process of the adjusting mechanism 3.
The top end of the supporting frame 33 is in transmission connection with the driver 32 through the transmission assembly 34, that is, the output end and the input end of the transmission assembly 34 are in transmission connection with the supporting frame 33 and the driver 32 respectively. The drive assembly 34 may include, among other things, a drive worm gear and shaft, a worm gear, a drive rack, and the like.
With reference to fig. 5 to 8, fig. 5 is a schematic structural diagram of an adjusting mechanism of a substrate cleaning brush according to an embodiment of the present invention; fig. 6 is a partial exploded view of an adjustment mechanism of a substrate cleaning brush according to an embodiment of the present invention; figure 7 is a left side view of an adjustment mechanism for a substrate cleaning brush provided in an embodiment of the present invention; fig. 8 is a sectional view taken along line a-a of fig. 7. When the driver 32 is a motor, the transmission assembly 34 transmits the worm wheel, the transmission rod 341, and the nut assembly 342; the transmission rod 341 includes a worm 3411 and a screw 3412 disposed below the worm 3411, the nut 342 is fixed on the support frame 33, and the nut 342 is connected to the screw 3412; the transmission worm wheel is in transmission connection with the output shaft 321 of the motor, and the transmission worm wheel is meshed with the worm portion 3411.
Here, a worm wheel is mounted on the output shaft 321 of the motor, and the worm wheel is engaged with the worm portion 3411 of the transmission rod 341. The rotational force output from the output shaft 321 of the motor is transmitted to the transmission rod 341 through the worm wheel and worm gear 3411, that is, the transmission rod 341 is rotated by the motor. The transmission assembly 34 includes a worm wheel and a worm, which makes the adjusting mechanism 3 compact and stable in transmission, and is beneficial to improving the stability of the adjusting rotating shaft 1.
The transmission rod 341 is a rod-shaped structure that is vertically disposed, that is, the transmission rod 341 is disposed in the Z direction in the drawing. A screw portion 3412 is provided at a lower end of the worm portion 3411, and the screw portion 3412 is threadedly coupled to the nut assembly 342 to convert rotation of the transmission rod 341 into vertical linear motion of the nut assembly 342. The nut assembly 342 may include a screw base fixed to the support bracket 33 and balls disposed between the screw base and the screw portion 3412. The rotation of the transmission rod 341 is converted into the vertical linear motion of the nut component 342 through the screw rod 3412 and the nut component 342, so that the transmission is stable, and the stability of the adjusting rotating shaft 1 is improved.
The nut assembly 342 is fixed on the support frame 33, for example, the screw seat of the nut assembly 342 is fixed on the support frame 33 by a screw, and the connection mode is simple and reliable.
The working principle of the adjusting mechanism 3 provided by the embodiment of the present invention is described in detail below:
referring to fig. 1 to 8, the worm gear on the output shaft of the motor driver rotates, thereby rotating the worm portion 3411 engaged with the worm gear, that is, the transmission rod 341; the screw rod 3412 rotates, the screw rod 3412 is in threaded connection with the nut component 342, the nut component 342 moves up and down along the axial direction of the screw rod 3412, and the support frame 33 fixedly connected with the nut component 342 moves up and down, so that the rotating shaft 1 is driven by the first bearing seat 31 and the first bearing 30 to be bent up and down, and the coaxiality of the rotating shaft 1 is adjusted. The rotating shaft 1 is bent downwards, and the driver 32 drives the rotating shaft 1 to be bent upwards to compensate the bending degree of the rotating shaft through the transmission worm wheel, the transmission rod 341, the nut component 342, the support frame 33, the first bearing seat 31 and the first bearing 30, so that the rotating shaft 1 is straight along the X direction, and the coaxiality of the rotating shaft 1 is within a preset range.
Here, the substrate cleaning brush may be provided with a coaxiality measuring mechanism, and the amount of adjustment of the spindle 1 required may be determined by measuring the coaxiality of the spindle 1. Alternatively, the operator may make adjustments by inspection and multiple trials. Specifically, when the brush sleeve 2 is in contact with the substrate, the brush sleeve 2 can vibrate the substrate due to rotation, and an operator can sense whether the nearby area vibrates by touching the substrate, so as to judge whether the brush sleeve 2 is in contact with the substrate. That is to say, in actual operation, operating personnel let rotate 1 earlier and drive brush sleeve 2 and rotate, and operating personnel passes through the touch substrate along 1 axial different positions of pivot, and whether the perception base plate vibrates, and then judges whether brush sleeve 2 contacts with the base plate. If some positions of the substrate do not vibrate, which indicates that the substrate at the positions is not in contact with the brush sleeve 2, the coaxiality of the substrate is adjusted by downwards moving the adjusting mechanism 3 and pressing the rotating shaft 3; if the vibration intensity of some positions of the base plate is too large, which indicates that the contact amount of the base plate and the brush sleeve 2 at the positions is too large, the coaxiality of the base plate and the brush sleeve is adjusted by lifting the rotating shaft 3 through the upward movement of the adjusting mechanism 3. Of course, the substrate cleaning brush can also be provided with a vibration monitor to detect the vibration intensity of different positions of the substrate.
With continued reference to figures 1-4, in some embodiments, the substrate cleaning brush further comprises a frame 5 and a mounting plate 6 fixedly mounted to a top end of the frame 5, the motor being secured to the mounting plate 6.
The frame 5 includes a longitudinal beam 51 and an upright beam 52, wherein the longitudinal beam 51 extends in the X direction, and the upright beam 52 extends in the Z direction. In the present embodiment, two longitudinal beams 51 are provided, the two longitudinal beams 51 are arranged at intervals along the Y direction, and two ends of the mounting plate 6 are respectively fixedly connected with the two longitudinal beams 51; four upright members 52 are provided, and the four upright members 52 are provided at both end portions of the two longitudinal members 51, respectively. Of course, the structure of the frame 5 is not limited to this, for example, the frame 5 may further include a cross beam, the cross beam extends along the Y direction, and both ends of the cross beam are respectively connected with the two longitudinal beams 51; the crossbeam can also be provided with a plurality ofly, and a plurality of crossbeams set up along the X direction interval to improve the structural strength of frame 5. For another example, a reinforcing beam may be disposed between the two vertical beams 52 on the same side of the two longitudinal beams 51, and the reinforcing beam may be disposed obliquely with respect to the vertical beams 52 to improve the structural stability of the frame 5.
The mounting panel 6 sets up on longeron 51 for support the installation motor, for example, the shell body of motor is provided with the fixed plate, connects through bolt and nut between fixed plate and the mounting panel 6, improves the stability of motor installation, avoids the motor vibration and influences the stability of pivot 1.
In one possible embodiment, the mounting plate 6 is provided with a sliding structure 53, the supporting frame 33 is provided with a matching structure 331 matching with the sliding structure 53, and the matching structure 331 and the sliding structure 53 are configured to be able to slide in the vertical direction, that is, the matching structure 331 and the sliding structure 53 are configured to be able to slide in the Z direction.
When the driver 32 drives the matching structure 331 to move upward relative to the sliding structure 53, the supporting frame 33 drives the first bearing seat 31 and the first bearing 30 to move upward, so as to stretch the rotating shaft 1 upward, thereby adjusting the coaxiality of the rotating shaft 1. When the driver 32 drives the matching structure 331 to move downward relative to the sliding structure 53, the supporting frame 33 drives the first bearing seat 31 and the first bearing 30 to move downward, so as to press the rotating shaft 1 downward, thereby adjusting the coaxiality of the rotating shaft 1.
Specifically, one of the sliding structure 53 and the mating structure 331 is a sliding rail extending in the vertical direction, and the other of the sliding structure 53 and the mating structure 331 is a sliding groove extending in the vertical direction, and the sliding rail and the sliding groove can slide relatively in the vertical direction.
In some examples, the sliding structure 53 may be a sliding rail, the engaging structure 331 is a sliding slot, for example, the sliding structure 53 is a sliding rail disposed on the mounting plate 6 and extending along the Z direction, the engaging structure 331 is a sliding block disposed on the supporting frame 33, and the sliding block is provided with a sliding slot; for another example, the engaging structure 331 is a sliding slot disposed on the supporting frame 33 and extending along the Z-direction, and the sliding structure 53 is a sliding rail accommodated in the sliding slot.
In other examples, the sliding structure 53 may be a sliding slot, and the engaging structure 331 is a sliding rail, for example, the sliding structure 53 is a sliding slot disposed on the mounting plate 6 and extending along the Z-direction, and the engaging structure 331 is a sliding rail disposed on the supporting frame 33; for another example, the sliding structure 53 is a sliding block disposed on the mounting plate 6, the sliding block is provided with a sliding slot, and the engaging structure 331 is a sliding rail disposed on the supporting frame 33 and extending along the Z-direction.
In a specific example, referring to fig. 4, 6 and 8, the fitting structure 311 is a slide rail disposed on the support bracket 33 and extending in the Z direction; the sliding structure 53 includes a sliding seat 531 and a sliding block 532, the sliding seat 531 is fixedly connected to the mounting plate 6, the sliding seat 531 is a flat plate structure extending along the Z direction, the sliding block 532 is fixed on the sliding seat 531, and a sliding groove is formed in the sliding block 532. Referring to fig. 8, a fixing hole 5311 is provided on the sliding base 531, a threaded hole is provided on the slider 532, and a screw is respectively in threaded connection with the fixing hole 5311 and the threaded hole, so as to fixedly connect the slider 532 to the sliding base 531.
It should be noted that the sliding structure 53 is not limited to be fixed to the mounting plate 6, and the sliding structure 53 may be fixed to the longitudinal beam 51 of the frame 5.
In order to improve the stability of the adjusting mechanism 3, the sliding structure 53 and the engaging structure 331 may be provided in plurality. For example, two sliding structures 53 and a fitting structure 331 are provided at intervals in the Y direction. Specifically, the two ends of the mounting plate 6 along the Y direction are respectively provided with the sliding structures 53, and the two sides of the support frame 33 along the Y direction are respectively provided with the matching structures 331, which is beneficial to improving the stability of the adjustment of the adjusting mechanism 3, and further improving the accuracy of the adjustment.
With continued reference to fig. 5-7, the adjustment mechanism 3 of the present embodiment further includes two support bearing assemblies 35 coupled to the drive link 341, one of the support bearing assemblies 35 being secured to the mounting plate 6, and the other support bearing assembly 35 being secured to the support bracket 33.
That is, the transmission rod 341 further includes a polished rod portion for connection with the support bearing assembly 35. Specifically, the support bearing assembly 35 includes a support bearing, which may be an existing bearing, and a second bearing seat, which is fitted over the polish rod portion of the transmission rod 341; the second bearing block is arranged outside the support bearing and is fixedly connected to the mounting plate 6 or the support bracket 33.
The adjusting mechanism 3 of the present embodiment supports the transmission rod 341 through two support bearing assemblies 35, so as to improve the transmission stability of the transmission rod 341 and further improve the stability of the adjusting mechanism 3.
In some specific embodiments, the substrate cleaning brush further comprises a controller, the controller is electrically connected with the adjustment mechanism 3, specifically, the controller is electrically connected with the driver 32 of the adjustment mechanism 3, and the adjustment amount of the spindle 1 is controlled by controlling the operation state of the driver 32. The controller may be provided with an input device, and the operator adjusts the control parameters based on the monitoring. The controller is also electrically connected with the drivers of the lifting mechanism and the rotating mechanism to control the lifting and rotating states of the rotating shaft 1. The controller of this embodiment may be separately provided, and may also be integrated with a control system of the substrate cleaning apparatus.
The embodiment of the utility model provides a still provide a base plate belt cleaning device, its base plate cleaning brush that includes workstation and two at least parallel arrangement, the base plate cleaning brush is fixed on the workstation, and the crisscross setting in 1 axial position in pivot is followed to the installation interval 4 of base plate cleaning brush. Wherein, the workstation is used for bearing the weight of the base plate. The substrate cleaning brushes are arranged at intervals along the Y direction, and the installation intervals 4 are opposite to the brush sleeves 2 of the adjacent substrate cleaning brushes, that is, the installation intervals 4 are arranged in a staggered mode in the axial direction along the rotating shaft 1, so that the existence of cleaning leakage areas is avoided, and the substrates are cleaned comprehensively. The structure, function, and effect of the substrate cleaning brush according to this embodiment are the same as those of the above embodiment, and specific reference may be made to the above embodiment, which is not described herein again.
Here, the mounting intervals 4 are staggered, that is, the mounting interval 4 of one of the substrate brushes faces the brush casing 2 of the adjacent substrate brush, and the residual cleaning region existing in the mounting interval 4 of the substrate brush is cleaned by the brush casing 2 of the adjacent substrate brush, so that the substrate can be cleaned in its entirety and the residual cleaning region can be prevented from existing.
The embodiment of the utility model provides a substrate cleaning device because it includes foretell substrate cleaning brush, consequently the embodiment of the utility model provides a substrate cleaning device also has the same advantage with foretell substrate cleaning brush.
In the description above, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present invention.

Claims (10)

1. A substrate cleaning brush, comprising: the rotating shaft and the at least two brush sleeves;
the two brush sleeves are sleeved on the rotating shaft and are arranged at intervals along the axial direction of the rotating shaft to form an installation interval;
the installation interval is internally provided with an adjusting mechanism, the adjusting mechanism is rotatably installed on the rotating shaft, and the adjusting mechanism is configured to be capable of bending the rotating shaft up and down so as to adjust the coaxiality of the rotating shaft within a preset range.
2. The substrate cleaning brush of claim 1, wherein the adjustment mechanism comprises a first bearing, a first bearing block, and a driver; the first bearing is sleeved on the rotating shaft, and the first bearing seat is sleeved outside the first bearing; the output end of the driver is in transmission connection with the first bearing seat, and the driver drives the rotating shaft to be bent and deformed up and down by driving the first bearing seat and the first bearing so as to adjust the coaxiality of the rotating shaft within a preset range.
3. The substrate cleaning brush according to claim 2, wherein the adjusting mechanism further includes a supporting frame and a transmission assembly, the bottom end of the supporting frame is fixedly connected to the first bearing block, the top end of the supporting frame is in transmission connection with the output end of the transmission assembly, and the input end of the transmission assembly is in transmission connection with the output end of the driver.
4. The substrate cleaning brush of claim 3, wherein the drive is a motor; the transmission assembly comprises a transmission worm wheel, a transmission rod and a nut assembly; the transmission rod comprises a worm part and a screw rod part arranged below the worm part, the nut component is fixed on the support frame, and the nut component is connected with the screw rod part;
the transmission worm wheel is in transmission connection with an output shaft of the motor, and the transmission worm wheel is meshed with the worm part.
5. The substrate cleaning brush of claim 4, further comprising a frame and a mounting plate fixedly mounted to a top end of the frame, wherein the motor is secured to the mounting plate.
6. The substrate cleaning brush according to claim 5, wherein a sliding structure is provided on the mounting plate, and an engagement structure engaged with the sliding structure is provided on the supporting frame, and the engagement structure and the sliding structure are configured to be slidable in a vertical direction.
7. The substrate cleaning brush according to claim 6, wherein one of the sliding structure and the engagement structure is a slide rail extending in a vertical direction, and the other of the sliding structure and the engagement structure is a slide groove extending in a vertical direction, the slide rail and the slide groove being capable of sliding relative to each other in the vertical direction.
8. The substrate cleaning brush of claim 5, wherein the adjustment mechanism further comprises two back-up bearing assemblies coupled to the drive link, one of the back-up bearing assemblies being secured to the mounting plate and the other of the back-up bearing assemblies being secured to the support bracket.
9. The substrate cleaning brush of any of claims 1-8, further comprising a controller, wherein the controller is electrically coupled to the adjustment mechanism.
10. A substrate cleaning apparatus comprising a table and at least two substrate cleaning brushes according to any one of claims 1 to 9 arranged in parallel, wherein the substrate cleaning brushes are fixed to the table and the mounting intervals of the substrate cleaning brushes are staggered in the axial direction of the rotary shaft.
CN202021508200.5U 2020-07-27 2020-07-27 Substrate cleaning brush and substrate cleaning device Active CN213103420U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202021508200.5U CN213103420U (en) 2020-07-27 2020-07-27 Substrate cleaning brush and substrate cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202021508200.5U CN213103420U (en) 2020-07-27 2020-07-27 Substrate cleaning brush and substrate cleaning device

Publications (1)

Publication Number Publication Date
CN213103420U true CN213103420U (en) 2021-05-04

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202021508200.5U Active CN213103420U (en) 2020-07-27 2020-07-27 Substrate cleaning brush and substrate cleaning device

Country Status (1)

Country Link
CN (1) CN213103420U (en)

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Address after: No. 1778, Qinglan Road, Huangjia Street, Shuangliu District, Chengdu, Sichuan 610200

Patentee after: Chengdu BOE Display Technology Co.,Ltd.

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Address before: No. 1778, Qinglan Road, Gongxing street, Shuangliu District, Chengdu, Sichuan 610200

Patentee before: CHENGDU ZHONGDIAN PANDA DISPLAY TECHNOLOGY Co.,Ltd.

Country or region before: China