CN212883677U - Wafer surface cleaning device for semiconductor test - Google Patents
Wafer surface cleaning device for semiconductor test Download PDFInfo
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- CN212883677U CN212883677U CN202020624465.5U CN202020624465U CN212883677U CN 212883677 U CN212883677 U CN 212883677U CN 202020624465 U CN202020624465 U CN 202020624465U CN 212883677 U CN212883677 U CN 212883677U
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- cleaning device
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Abstract
The utility model discloses a surface cleaning device is made to wafer for semiconductor test, comprises a workbench, the equal fixedly connected with backup pad in workstation bottom both sides, the equal fixedly connected with baffle in workstation top both sides, the workstation top has placed the filter screen, two between two baffles fixedly connected with horizontal pole, the outer movable sleeve of horizontal pole is equipped with the sleeve pipe, sleeve pipe top fixedly connected with water storage box, the equal fixedly connected with drain pipe in water storage box both sides bottom, drain pipe bottom fixedly connected with spray pipe, sleeve pipe bottom fixedly connected with electric putter, electric putter bottom is in two spray pipe below fixedly connected with brush boards, brush board bottom is equipped with the brush hair, a plurality of small openings have been seted up on the brush board. The utility model discloses can use the washing liquid to wash in the clearance, the clearance is effectual, and the wafer of being convenient for is fixed, and is stable not rock during the clearance, improves the efficiency of clearance.
Description
Technical Field
The utility model relates to a semiconductor wafer technical field especially relates to a wafer is made surface cleaning device for semiconductor test.
Background
With the continuous perfection of the process manufacturing of semiconductor devices, the size of the devices is smaller and smaller, the utilization rate is higher and higher, the influence of the quality of a semiconductor substrate, particularly the quality of the surface of a wafer, on the reliability and stability of the devices is larger and larger, the cleaning of the surface of the wafer is the most important and last link in the wafer processing process and is an indispensable step for obtaining a high-quality surface, and the cleaning of the surface of the wafer aims to remove various residual substances in the previous process and obtain a fresh, flat and clean surface.
The existing cleaning device has a single cleaning mode, cannot ensure that dust and impurities on the surface are completely removed, and needs to manually adjust the position of the wafer, so that the operation is troublesome.
SUMMERY OF THE UTILITY MODEL
The utility model aims at solving the problems in the prior art and providing a wafer surface cleaning device for semiconductor test.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
the utility model provides a surface cleaning device is made to wafer for semiconductor test, comprises a workbench, the equal fixedly connected with backup pad in workstation bottom both sides, the equal fixedly connected with baffle in workstation top both sides, the filter screen has been placed between two baffles at the workstation top, two fixedly connected with horizontal pole between the baffle, the outer movable sleeve of horizontal pole is equipped with the sleeve pipe, sleeve pipe top fixedly connected with water storage box, the equal fixedly connected with drain pipe in water storage box both sides bottom, drain pipe bottom fixedly connected with spray line, sleeve pipe bottom fixedly connected with electric putter, electric putter bottom is in two spray line below fixedly connected with brush boards, brush board bottom is equipped with the brush hair, a plurality of small openings have been seted up on the brush board.
The filter screen is characterized in that the filter screen top is connected with a placing plate in a sliding mode, two sides of the top of the placing plate are symmetrically hinged to form buckles, one side of each baffle in the opposite direction is fixedly connected with a reciprocating push rod, and one end of each reciprocating push rod is fixedly connected with the placing plate.
Wherein, install the governing valve on the drain pipe.
Wherein, a liquid collecting drawer is movably connected between the two supporting plates.
Wherein, the bottom of the spraying pipeline is provided with a plurality of water spraying ports.
The sliding blocks are fixedly connected to two sides of the bottom of the placing plate, and the sliding grooves matched with the sliding blocks are horizontally formed in the workbench.
Compared with the prior art, the utility model discloses possess following advantage:
1. the utility model discloses a set up water storage box, shower pipe, electric putter, brush board, small opening and brush hair, can use the washing liquid to wash in the clearance, dual cleanness, the clearance is effectual.
2. The utility model discloses a board, buckle and reciprocal push rod are placed in the setting, and the wafer of being convenient for is fixed, and stable not rocking during the clearance, and reciprocal push rod drives simultaneously and places the efficiency that board horizontal migration can improve the clearance.
To sum up, the utility model discloses can use the washing liquid to wash in the clearance, dual cleanness, the clearance is effectual, the wafer of being convenient for fixed, stably does not rock during the clearance, and reciprocal push rod drives simultaneously and places the efficiency that board horizontal migration can improve the clearance.
Drawings
FIG. 1 is a schematic structural diagram of an embodiment of a wafer surface cleaning apparatus for semiconductor testing according to the present invention;
FIG. 2 is a schematic structural diagram of a second embodiment of a wafer surface cleaning apparatus for semiconductor testing according to the present invention;
fig. 3 is an enlarged view of a wafer for semiconductor testing as a surface cleaning apparatus according to the present invention.
In the figure: 1 workstation, 2 backup pads, 3 baffles, 4 filter screens, 5 horizontal poles, 6 sleeve pipes, 7 water storage tanks, 8 drain pipes, 9 shower lines, 10 electric putter, 11 brush boards, 12 brush hairs, 13 small openings, 14 place the board, 15 buckles, 16 reciprocal push rods.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments.
The first embodiment is as follows:
referring to fig. 1, a surface cleaning device is made to wafer for semiconductor test, including workstation 1, the equal fixedly connected with backup pad 2 in 1 bottom both sides of workstation, the equal fixedly connected with baffle 3 in 1 top both sides of workstation, filter screen 4 has been placed at 1 top of workstation between two baffles 3, fixedly connected with horizontal pole 5 between two baffles 3, the outer movable sleeve of horizontal pole 5 is equipped with sleeve pipe 6, 6 top fixedly connected with water storage box 7 of sleeve pipe, the equal fixedly connected with drain pipe 8 in 7 both sides bottoms of water storage box, 8 bottom fixedly connected with spray pipe 9 of drain pipe, 6 bottom fixedly connected with electric putter 10 of sleeve pipe, electric putter 10 bottom is in two spray pipe 9 below fixedly connected with brush boards 11, 11 bottoms of brush boards are equipped with brush hair 12, a plurality of small openings 13 have been seted up on brush board 11.
Wherein, the drain pipe 8 is provided with a regulating valve.
Wherein, a liquid collecting drawer is movably connected between the two supporting plates 2.
Wherein, the bottom of the spraying pipeline 9 is provided with a plurality of water spraying openings.
Wherein, place the equal fixedly connected with slider in 14 bottom both sides of board, the workstation 1 is improved level and is seted up with slider assorted spout.
The utility model discloses in, during the use, directly place the wafer on filter screen 4, then remove sleeve pipe 6 on the horizontal pole 5, let brush hair 12 on the brush board 11 clear up wafer surface dust, can open the governing valve on the drain pipe 8 in the clearance, let the washing liquid in the water storage box 7 spray brush hair 12 through spray piping 9 on, brush hair 12 cooperates the washing liquid to wash clean wafer, dual cleanness, and it is effectual to clear up.
Example two:
referring to fig. 2-3, a surface cleaning device is made to wafer for semiconductor test, including workstation 1, 1 bottom both sides of workstation equal fixedly connected with backup pad 2, 1 top both sides of workstation equal fixedly connected with baffle 3, filter screen 4 has been placed at 1 top of workstation between two baffles 3, fixedly connected with horizontal pole 5 between two baffles 3, the outer movable sleeve of horizontal pole 5 is equipped with sleeve pipe 6, 6 top fixedly connected with water storage box 7 of sleeve pipe, 7 both sides bottom equal fixedly connected with drain pipe 8 of water storage box, 8 bottom fixedly connected with spray pipes 9 of drain pipe, 6 bottom fixedly connected with electric putter 10 of sleeve pipe, electric putter 10 bottom is in two spray pipes 9 below fixedly connected with brush board 11, 11 bottoms of brush board are equipped with brush hair 12, a plurality of small openings 13 have been seted up on brush board 11.
Wherein, 4 top sliding connection of filter screen have place board 14, place the equal symmetry in board 14 top both sides and articulate and have buckle 15, the equal fixedly connected with reciprocal push rod 16 in one side in opposite directions of two baffles 3, 16 one ends of reciprocal push rod with place board 14 fixed connection.
Wherein, the drain pipe 8 is provided with a regulating valve.
Wherein, a liquid collecting drawer is movably connected between the two supporting plates 2.
Wherein, the bottom of the spraying pipeline 9 is provided with a plurality of water spraying openings.
Wherein, place the equal fixedly connected with slider in 14 bottom both sides of board, the workstation 1 is improved level and is seted up with slider assorted spout.
The utility model discloses in, during the use, directly place the wafer on filter screen 4, then remove sleeve pipe 6 on the horizontal pole 5, let brush hair 12 on the brush board 11 clear up wafer surface dust, can open the governing valve on the drain pipe 8 in the clearance, let the washing liquid in the water storage box 7 spray brush hair 12 through spray piping 9 on, brush hair 12 cooperates the washing liquid to wash clean wafer, dual cleanness, and it is effectual to clear up.
The buckle 15 on the placing plate 14 can facilitate the fixing of the wafer, the wafer is stably not shaken during cleaning, and meanwhile, the reciprocating push rod 16 drives the placing plate 14 to move horizontally so as to improve the cleaning efficiency.
Above, only be the concrete implementation of the preferred embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art is in the technical scope of the present invention, according to the technical solution of the present invention and the design of the present invention, equivalent replacement or change should be covered within the protection scope of the present invention.
Claims (6)
1. The wafer surface cleaning device for semiconductor testing comprises a workbench (1) and is characterized in that supporting plates (2) are fixedly connected to two sides of the bottom of the workbench (1), baffles (3) are fixedly connected to two sides of the top of the workbench (1), a filter screen (4) is placed between the two baffles (3) at the top of the workbench (1), a cross rod (5) is fixedly connected between the two baffles (3), a sleeve (6) is movably sleeved outside the cross rod (5), a water storage tank (7) is fixedly connected to the top of the sleeve (6), drain pipes (8) are fixedly connected to two sides of the water storage tank (7), spray pipelines (9) are fixedly connected to the bottoms of the drain pipes (8), an electric push rod (10) is fixedly connected to the bottom of the sleeve (6), and a brush plate (11) is fixedly connected to the bottom of the electric push rod (10) below the two spray pipelines (9), the bottom of the brush plate (11) is provided with brush bristles (12), and the brush plate (11) is provided with a plurality of leakage holes (13).
2. The wafer surface cleaning device for the semiconductor test is characterized in that a placing plate (14) is connected to the top of the filter screen (4) in a sliding mode, buckles (15) are hinged to two sides of the top of the placing plate (14) symmetrically, reciprocating push rods (16) are fixedly connected to opposite sides of the two baffles (3), and one end of each reciprocating push rod (16) is fixedly connected with the placing plate (14).
3. The wafer surface cleaning apparatus for semiconductor test as recited in claim 1, wherein the drain pipe (8) is provided with a regulating valve.
4. The wafer surface cleaning device for the semiconductor test as recited in claim 1, wherein a liquid collecting drawer is movably connected between the two support plates (2).
5. The wafer surface cleaning device for the semiconductor test as recited in claim 1, wherein a plurality of water jets are provided at the bottom of the shower pipe (9).
6. The wafer surface cleaning device for the semiconductor test is characterized in that sliding blocks are fixedly connected to two sides of the bottom of the placing plate (14), and sliding grooves matched with the sliding blocks are horizontally formed in the workbench (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020624465.5U CN212883677U (en) | 2020-04-23 | 2020-04-23 | Wafer surface cleaning device for semiconductor test |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020624465.5U CN212883677U (en) | 2020-04-23 | 2020-04-23 | Wafer surface cleaning device for semiconductor test |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212883677U true CN212883677U (en) | 2021-04-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020624465.5U Active CN212883677U (en) | 2020-04-23 | 2020-04-23 | Wafer surface cleaning device for semiconductor test |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212883677U (en) |
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2020
- 2020-04-23 CN CN202020624465.5U patent/CN212883677U/en active Active
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Address after: 314000 Workshop 12, Heping Street food standard workshop Park, Jiaxing Economic and Technological Development Zone, Zhejiang Province Patentee after: Zhejiang Jinlian Technology Co.,Ltd. Address before: 314000 Workshop 12, Heping Street food standard workshop Park, Jiaxing Economic and Technological Development Zone, Zhejiang Province Patentee before: ZHEJIANG JINLIANJIE TECHNOLOGY Co.,Ltd. |